| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 04/01/2008 | US7351300 Peeling method and method of manufacturing semiconductor device |
| 04/01/2008 | US7351293 Method and device for rotating a wafer |
| 04/01/2008 | US7351292 Assembly for processing substrates |
| 04/01/2008 | US7351291 Semiconductor processing system |
| 04/01/2008 | US7351286 One hundred millimeter single crystal silicon carbide wafer |
| 04/01/2008 | US7351282 Cutting method and apparatus for ingot, wafer, and manufacturing method of solar cell |
| 04/01/2008 | US7351131 Method for manufacturing semiconductor device and polishing apparatus |
| 04/01/2008 | US7350720 Active material emitting device |
| 04/01/2008 | US7350686 Method for supplying solder |
| 04/01/2008 | US7350684 Apparatus and method for forming bump |
| 04/01/2008 | US7350544 Station for controlling and purging a mini-environment |
| 04/01/2008 | US7350476 Method and apparatus to determine consumable part condition |
| 04/01/2008 | US7350446 Wafer dividing apparatus |
| 04/01/2008 | US7350316 Meniscus proximity system for cleaning semiconductor substrate surfaces |
| 04/01/2008 | US7350315 Edge wheel dry manifold |
| 04/01/2008 | US7350293 Low profile ball-grid array package for high power |
| 04/01/2008 | CA2346042C A method and apparatus for performing wavelength-conversion using phosphors with light emitting diodes |
| 04/01/2008 | CA2177276C Method for fabricating self-assembling microstructures |
| 03/27/2008 | WO2008036963A2 Feram manufacture using gas cluster ion beam |
| 03/27/2008 | WO2008036915A1 Mask position detection |
| 03/27/2008 | WO2008036849A2 Particle trap / filter for recirculating a dilution gas in a plasma enhanced chemical vapor deposition system |
| 03/27/2008 | WO2008036837A2 Release strategies for making transferable semiconductor structures, devices and device components |
| 03/27/2008 | WO2008036810A2 Bi-layer capping of low-k dielectric films |
| 03/27/2008 | WO2008036806A2 Method for forming a pre-metal dielectric layer using an energy beam treatment |
| 03/27/2008 | WO2008036722A2 Locking feature and method for manufacturing transfer molded ic packages |
| 03/27/2008 | WO2008036681A1 Active regions with compatible dielectric layers |
| 03/27/2008 | WO2008036603A1 Trench gate fet with self-aligned features |
| 03/27/2008 | WO2008036552A2 Array of non-volatile memory cells with floating gates formed of spacers in substrate trenches |
| 03/27/2008 | WO2008036521A1 System with dual laser for separation of bonded wafers, each laser emitting a laser beam with a predetermined wavelength |
| 03/27/2008 | WO2008036496A1 Method for double patterning a developable anti-reflective coating |
| 03/27/2008 | WO2008036385A1 Dielectric spacers for metal interconnects and method to form the same |
| 03/27/2008 | WO2008036256A1 Aspect ratio trapping for mixed signal applications |
| 03/27/2008 | WO2008036208A2 Wafer level chip package and a method of fabricating thereof |
| 03/27/2008 | WO2008036115A1 Novel structure and method for metal integration |
| 03/27/2008 | WO2008036047A1 Triple well transmit-receive switch transistor |
| 03/27/2008 | WO2008035961A2 Device for electrochemically depositing a material on a plateshaped substrate |
| 03/27/2008 | WO2008035822A1 Semiconductor devices and manufacturing method thereof |
| 03/27/2008 | WO2008035820A1 Silicone resin composition and method for forming trench isolation |
| 03/27/2008 | WO2008035819A2 Electronic component mounting structure |
| 03/27/2008 | WO2008035786A1 Semiconductor device and semiconductor device manufacturing method |
| 03/27/2008 | WO2008035679A1 Laser processing method and laser processing apparatus |
| 03/27/2008 | WO2008035678A1 Plasma cleaning process and plasma cvd method |
| 03/27/2008 | WO2008035676A1 Method for forming resist pattern |
| 03/27/2008 | WO2008035672A1 Method for manufacturing transparent cured film using positive-working photosensitive resin layer for half exposure |
| 03/27/2008 | WO2008035641A1 Composition for formation of resist protection film, and method for formation of resist pattern using the same |
| 03/27/2008 | WO2008035640A1 Composition for formation of resist protection film, and method for formation of resist pattern using the same |
| 03/27/2008 | WO2008035632A1 PROCESS FOR PRODUCING GaN SINGLE-CRYSTAL, GaN THIN-FILM TEMPLATE SUBSTRATE AND GaN SINGLE-CRYSTAL GROWING APPARATUS |
| 03/27/2008 | WO2008035620A1 Material for formation of protective film, method for formation of photoresist pattern, and solution for washing/removal of protective film |
| 03/27/2008 | WO2008035613A1 Resin sealing device |
| 03/27/2008 | WO2008035610A1 Laser processing method |
| 03/27/2008 | WO2008035598A1 Complementary mis semiconductor device |
| 03/27/2008 | WO2008035581A1 Ultrasonic cleaning apparatus |
| 03/27/2008 | WO2008035552A1 Heat treatment apparatus |
| 03/27/2008 | WO2008035536A1 Semiconductor chip, semiconductor mounting module, mobile communication device, and process for producing semiconductor chip |
| 03/27/2008 | WO2008035532A1 Switching device and testing apparatus |
| 03/27/2008 | WO2008035530A1 Cutting method and epitaxial wafer manufacturing method |
| 03/27/2008 | WO2008035529A1 Cutting method |
| 03/27/2008 | WO2008035513A1 Cutting method |
| 03/27/2008 | WO2008035508A1 Component for processing apparatus, processing apparatus, method for manufacturing component for processing apparatus, and method for manufacturing processing apparatus |
| 03/27/2008 | WO2008035490A1 Semiconductor device and method for manufacturing same |
| 03/27/2008 | WO2008035468A1 THIN NANODIAMOND FILM HAVING n-TYPE CONDUCTIVITY AND PROCESS FOR PRODUCING THE SAME |
| 03/27/2008 | WO2008035403A1 Field-effect transistor |
| 03/27/2008 | WO2008035395A1 Feeding structure of electrostatic chuck, method for producing the same, and method for regenerating feeding structure of electrostatic chuck |
| 03/27/2008 | WO2008035270A2 Method of manufacturing a vertical contact in a semiconductor substrate |
| 03/27/2008 | WO2008035261A1 Electronic device and method for making the same |
| 03/27/2008 | WO2008035134A1 Semiconductor device and method of forming a semiconductor device |
| 03/27/2008 | WO2008034823A1 Method of producing precision vertical and horizontal layers in a vertical semiconductor structure |
| 03/27/2008 | WO2008034744A1 Method and device for wetting the bumps of a semiconductor chip with soldering flux |
| 03/27/2008 | WO2008034404A1 Method for producing a zncdo semiconductor material |
| 03/27/2008 | WO2008034343A1 Method of online predicting apparatus maintenance |
| 03/27/2008 | WO2008009105B1 Thin film transistor array having test circuitry |
| 03/27/2008 | WO2008008977A3 Nanocrystalline materials for electronic applications |
| 03/27/2008 | WO2008008738A3 Variable lot size load port |
| 03/27/2008 | WO2008005916A3 Method for making planar nanowire surround gate mosfet |
| 03/27/2008 | WO2008005092A3 Silicon carbide switching devices including p-type channels and methods of forming the same |
| 03/27/2008 | WO2008005087A3 A nano imprint technique with increased flexibility with respect to alignment and feature shaping |
| 03/27/2008 | WO2007148072A3 Ic germanium insulator substrate and method of manufacture of ic substrate |
| 03/27/2008 | WO2007144371A3 Semiconductor optoelectronic device with polymer layers |
| 03/27/2008 | WO2007142852A3 Producing soi structure using ion shower |
| 03/27/2008 | WO2007140425A9 Process chamber for dielectric gapfill |
| 03/27/2008 | WO2007137729A3 Method for the production of a semiconductor array comprising an insulation structure, semiconductor array, and use thereof |
| 03/27/2008 | WO2007130151A3 Soi active layer with different surface orientation |
| 03/27/2008 | WO2007083654A8 Process for producing siliceous film and substrate with siliceous film produced thereby |
| 03/27/2008 | US20080077269 Method and system for managing wafer processing |
| 03/27/2008 | US20080076849 Polybenzoxazole precursor, photosensitive resin composition using the same, and manufacturing method of semiconductor device |
| 03/27/2008 | US20080076690 Non-hermetic encapsulant removal for module rework |
| 03/27/2008 | US20080076336 Surface plate protecting device in CMP apparatus |
| 03/27/2008 | US20080076335 Polishing apparatus and polishing method |
| 03/27/2008 | US20080076330 Chemical mechanical polishing with napped poromeric |
| 03/27/2008 | US20080076269 Process for Forming Thin Film and System for Forming Thin Film |
| 03/27/2008 | US20080076268 Fluorine plasma treatment of high-k gate stack for defect passivation |
| 03/27/2008 | US20080076267 Manufacturing Method of Semiconductor Device and Laser Processing Apparatus |
| 03/27/2008 | US20080076266 Method for forming insulation film having high density |
| 03/27/2008 | US20080076265 Process for wafer thinning |
| 03/27/2008 | US20080076264 Film formation apparatus for semiconductor process and method for using the same |
| 03/27/2008 | US20080076263 Method of reducing electron beam damage on post W-CMP wafers |
| 03/27/2008 | US20080076262 Method and system for treating a dielectric film |
| 03/27/2008 | US20080076261 Method of manufacturing semiconductor device, apparatus of manufacturing semiconductor device and semiconductor device |
| 03/27/2008 | US20080076260 Separation-material composition for photo-resist and manufacturing method of semiconductor device |
| 03/27/2008 | US20080076259 Plasma Etching Method |