Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
05/2008
05/15/2008WO2008056969A1 Method for drying a substrate
05/15/2008WO2008056816A1 Suspension support for linear nucleic acid molecule, method of extending linear nucleic acid molecule and linear nucleic acid molecule specimen
05/15/2008WO2008056805A1 Conveyer system
05/15/2008WO2008056773A1 Adhesive film, and connection structure and connecting method for circuit member
05/15/2008WO2008056750A1 Photosensitive resin composition
05/15/2008WO2008056748A1 Interlayer insulating film, wiring structure, electronic device and method for manufacturing the interlayer insulating film, the wiring structure and the electronic device
05/15/2008WO2008056742A1 Barrier film forming method
05/15/2008WO2008056735A1 Holding unit, position detecting system and exposure system, moving method, position detecting method, exposure method, adjusting method of detection system, and device producing method
05/15/2008WO2008056698A1 Silicon carbide semiconductor device and process for producing the same
05/15/2008WO2008056672A1 Method of neutralizing waste developing solution containing tetraalkylammonium hydroxide
05/15/2008WO2008056671A1 Method of neutralizing developer waste liquid containing tetraalkylammonium hydroxide
05/15/2008WO2008056627A1 Probe card for inspecting solid state image sensor
05/15/2008WO2008056614A1 Reflow method, pattern-forming method, and method for manufacturing tft
05/15/2008WO2008056610A1 Reflow method, pattern-forming method, and method for manufacturing tft
05/15/2008WO2008056583A1 Server device, information processing method, and program
05/15/2008WO2008056559A1 Semiconductor integrated circuit
05/15/2008WO2008056558A1 Method of imprinting
05/15/2008WO2008056557A1 Method for forming silicon based thin film by plasma cvd method
05/15/2008WO2008056556A1 Method and device for forming silicon dot and silicon dot and method and device for forming substrate with insulating film
05/15/2008WO2008056549A1 Substrate container
05/15/2008WO2008056537A1 Electroless plating method
05/15/2008WO2008056468A1 Semiconductor integrated circuit and layout technique thereof
05/15/2008WO2008056437A1 Copolymer for immersion lithography and compositions
05/15/2008WO2008056418A1 Tcp handling device, and method for positional alignment of connecting terminals in the device
05/15/2008WO2008056295A1 A semiconductor device and a method of manufacturing thereof
05/15/2008WO2008056289A1 Method of manufacturing a fet gate
05/15/2008WO2008055736A1 Apparatus for passivating a component, and method for producing the apparatus
05/15/2008WO2008055518A1 Method for producing sunk contact structures in a silicon wafer for solar cells and solar cell
05/15/2008WO2008037634B1 Design rules for on-chip inductors
05/15/2008WO2008033708A3 Methods and apparatus for bonding electrical member to substrate
05/15/2008WO2008030966B1 Semiconductor thin films formed from group iv nanoparticles
05/15/2008WO2008027240A3 Selective etch chemistries for forming high aspect ratio features and associated structures
05/15/2008WO2008027027A3 Transistor with fluorine treatment
05/15/2008WO2008024566B1 Overall defect reduction for pecvd films
05/15/2008WO2008010959A3 Beam ablation lithography
05/15/2008WO2008002326A3 A method of microminiaturizing a nano-structure
05/15/2008WO2007100873A3 Hybrid wafer -holding pin
05/15/2008WO2000058806A3 Ferroelectric based memory devices utilizing hydrogen barriers and getters
05/15/2008US20080114089 Photocurable acrylated oligomer; second acrylated oligomer having a viscosity less than the first; wax; acrylated monomer; photoinitiators
05/15/2008US20080113590 Polishing method for semiconductor wafer and polishing apparatus for semiconductor wafer
05/15/2008US20080113521 METHOD OF FORMING ULTRA-THIN SiN FILM BY PLASMA CVD
05/15/2008US20080113520 Method of Forming Organic Layer on Semiconductor Substrate
05/15/2008US20080113519 Method and apparatus for forming oxynitride film and nitride film, oxynitride film, nitride film, and substrate
05/15/2008US20080113518 Wet etching method using ultraviolet light and method of manufacturing semiconductor device
05/15/2008US20080113517 Methods of fabricating semiconductor devices including selectively reacting reactant gases
05/15/2008US20080113516 Selectivity control in a plasma processing system
05/15/2008US20080113515 Methods of Forming Semiconductor Devices
05/15/2008US20080113514 Methods for the manufacture of notched trailing shields
05/15/2008US20080113513 hydrophobic chemical mechanical polishing pads comprising an organic polymers and metal agents including beta-diketonate ligands
05/15/2008US20080113512 Method of fabricating isolation layer of semiconductor device
05/15/2008US20080113511 Method of forming fine patterns using double patterning process
05/15/2008US20080113510 Semiconductor Wafer Fabricating Method and Semiconductor Wafer Mirror Edge Polishing Method
05/15/2008US20080113509 Polishing method and polishing device
05/15/2008US20080113508 Method of fabricating metal interconnects using a sacrificial layer to protect seed layer prior to gap fill
05/15/2008US20080113507 Poly filled substrate contact on soi structure
05/15/2008US20080113506 Fabrication process of a semiconductor device
05/15/2008US20080113505 Method of forming a through-substrate via
05/15/2008US20080113504 Low fabrication cost, high performance, high reliability chip scale package
05/15/2008US20080113503 Low fabrication cost, high performance, high reliability chip scale package
05/15/2008US20080113502 Electronic device
05/15/2008US20080113501 Methods of Forming Semiconductor Constructions
05/15/2008US20080113500 Method for fabricating semiconductor device including recess gate
05/15/2008US20080113499 Semiconductor device with mushroom electrode and manufacture method thereof
05/15/2008US20080113498 Variable resurf semiconductor device and method
05/15/2008US20080113497 SEMICONDUCTOR DEVICE ON GaN SUBSTRATE HAVING SURFACE BIDIRECTIONALLY INCLINED TOWARD <1-100> AND <11-20> DIRECTIONS RELATIVE TO {0001} CRYSTAL PLANES
05/15/2008US20080113496 METHOD FOR HETEROEPITAXIAL GROWTH OF HIGH-QUALITY N-FACE GaN, InN, AND AlN AND THEIR ALLOYS BY METAL ORGANIC CHEMICAL VAPOR DEPOSITION
05/15/2008US20080113495 Method of construction of CTE matching structure with wafer processing and resulting structure
05/15/2008US20080113494 Laser beam processing apparatus for processing semiconductor wafer in production of semiconductor devices, laser beam processing method executed therein, and such semiconductor wafer processed thereby
05/15/2008US20080113493 Method, Device and Diffraction Grating for Separating Semiconductor Elements Formed on a Substrate by Altering Said Diffraction Grating
05/15/2008US20080113492 Method for cutting protective tape of semiconductor wafer and apparatus for cutting the protective tape
05/15/2008US20080113491 EUV pellicle with increased EUV light transmittance
05/15/2008US20080113490 Method for manufacturing semiconductor device
05/15/2008US20080113489 Method for manufacturing semiconductor substrate
05/15/2008US20080113488 Method of Fabricating A Semiconductor Device
05/15/2008US20080113487 Method of Fabricating A Semiconductor Device
05/15/2008US20080113486 Peeling apparatus and manufacturing apparatus of semiconductor device
05/15/2008US20080113485 Method of evaluating the uniformity of the thickness of the polysilicon gate layer
05/15/2008US20080113484 Method of manufacturing semiconductor device
05/15/2008US20080113483 Methods of etching a pattern layer to form staggered heights therein and intermediate semiconductor device structures
05/15/2008US20080113482 Method for enhancing field oxide
05/15/2008US20080113481 Capacitance dielectric layer, capacitor and forming method thereof
05/15/2008US20080113480 Method of manufacturing semiconductor device
05/15/2008US20080113479 Fabricating non-volatile memory with boost structures
05/15/2008US20080113478 Recessed access device for a memory
05/15/2008US20080113477 Fabricating method of complementary metal-oxide-semiconductor (cmos) image sensor
05/15/2008US20080113476 Dual-plane complementary metal oxide semiconductor
05/15/2008US20080113475 Thin film transistor array substrate and fabricating method thereof
05/15/2008US20080113474 Methods of forming semiconductor-on-insulating (soi) field effect transistors with body contacts
05/15/2008US20080113473 Method of manufacturing a thin-film transistor substrate
05/15/2008US20080113472 Film and chip packaging process using the same
05/15/2008US20080113471 Method of Making Multi-Chip Package with High-Speed Serial Communications between Semiconductor Dice
05/15/2008US20080113470 Method of forming a wall structure in a microelectronic assembly
05/15/2008US20080113469 Methods of fabricating a semiconductor device including a self-aligned cell diode
05/15/2008US20080113467 STRUCTURE FOR AND METHOD OF FABRICATING A HIGH-SPEED CMOS-COMPATIBLE Ge-ON-INSULATOR PHOTODETECTOR
05/15/2008US20080113465 Angular rate sensor and method of manufacturing the same
05/15/2008US20080113464 Asymmetric chalcogenide device
05/15/2008US20080113462 Method of manufacturing vertical light emitting device
05/15/2008US20080113461 Method for manufacturing a lower substrate of a liquid crystal display device
05/15/2008US20080113460 Laser Lift-Off of Sapphire From a Nitride Flip-Chip
05/15/2008US20080113459 Method for dividing wafer, method for manufacturing silicon devices, and method for manufacturing liquid ejecting heads