Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
05/2008
05/27/2008US7378337 Laser-based termination of miniature passive electronic components
05/27/2008US7378336 Split poly-SiGe/poly-Si alloy gate stack
05/27/2008US7378335 Plasma implantation of deuterium for passivation of semiconductor-device interfaces
05/27/2008US7378334 Nitride semiconductor device comprising bonded substrate and fabrication method of the same
05/27/2008US7378333 Semiconductor device and manufacturing method thereof
05/27/2008US7378332 Laminated substrate, method of manufacturing the substrate, and wafer outer periphery pressing jigs used for the method
05/27/2008US7378331 Methods of vertically stacking wafers using porous silicon
05/27/2008US7378330 Cleaving process to fabricate multilayered substrates using low implantation doses
05/27/2008US7378329 Method for manufacturing semiconductor device
05/27/2008US7378328 Method of fabricating memory device utilizing carbon nanotubes
05/27/2008US7378327 Method for fabricating a junction varactor with high Q factor
05/27/2008US7378326 Printed circuit board with embedded capacitors therein and manufacturing process thereof
05/27/2008US7378325 Semiconductor device and manufacturing method thereof
05/27/2008US7378324 Selective links in silicon hetero-junction bipolar transistors using carbon doping and method of forming same
05/27/2008US7378323 Silicide process utilizing pre-amorphization implant and second spacer
05/27/2008US7378322 Semiconductor device having non-uniformly thick gate oxide layer for improving refresh characteristics
05/27/2008US7378321 Method for patterning a semiconductor component
05/27/2008US7378320 Method of forming asymmetric MOS transistor with a channel stopping region and a trench-type gate
05/27/2008US7378319 Method of forming double gate dielectric layers and semiconductor device having the same
05/27/2008US7378318 System and method for ensuring migratability of circuits by masking portions of the circuits while improving performance of other portions of the circuits
05/27/2008US7378317 Superjunction power MOSFET
05/27/2008US7378316 Method for fabricating semiconductor vertical NROM memory cells
05/27/2008US7378315 Method for fabricating semiconductor device
05/27/2008US7378314 Source side injection storage device with control gates adjacent to shared source/drain and method therefor
05/27/2008US7378313 Methods of fabricating double-sided hemispherical silicon grain electrodes and capacitor modules
05/27/2008US7378312 Recess gate transistor structure for use in semiconductor device and method thereof
05/27/2008US7378311 Method of forming memory cells in an array
05/27/2008US7378310 Method for manufacturing a memory device having a nanocrystal charge storage region
05/27/2008US7378309 Method of fabricating local interconnects on a silicon-germanium 3D CMOS
05/27/2008US7378308 CMOS devices with improved gap-filling
05/27/2008US7378307 Gate of a semiconductor device and method for forming the same
05/27/2008US7378306 Selective silicon deposition for planarized dual surface orientation integration
05/27/2008US7378305 Semiconductor integrated circuit and fabrication process thereof
05/27/2008US7378304 Method of forming silicon oxide layer and method of manufacturing thin film transistor thereby
05/27/2008US7378303 Method of fabricating thin film transistor
05/27/2008US7378301 Method for molding a small form factor digital memory card
05/27/2008US7378300 Integrated circuit package system
05/27/2008US7378299 Leadless semiconductor package and manufacturing method thereof
05/27/2008US7378298 Method of making stacked die package
05/27/2008US7378297 Methods of bonding two semiconductor devices
05/27/2008US7378296 Print mask and method of manufacturing electronic components using the same
05/27/2008US7378295 CMOS image sensor and fabricating method thereof
05/27/2008US7378294 Wafer-level sealed microdevice having trench isolation and methods for making the same
05/27/2008US7378293 MEMS fabrication method
05/27/2008US7378292 Method of fabricating semiconductor optical device
05/27/2008US7378290 Isolation circuit
05/27/2008US7378289 Method for forming photomask having test patterns in blading areas
05/27/2008US7378288 Systems and methods for producing light emitting diode array
05/27/2008US7378287 Wafer matching methods for use in assembling micromirror array devices
05/27/2008US7378229 Pattern formation method
05/27/2008US7378197 Antireflective coating; making semiconductors at lower wavelengths using reflective masks that can be effectively inspected at multiple wavelengths; wide bandwidth inspection contrast for extreme ultra-violet reticles
05/27/2008US7378196 Method of manufacturing mask for correcting optical proximity effect
05/27/2008US7378053 Method for producing copper-based material with low thermal expansion and high heat conductivity
05/27/2008US7378049 Method for producing ceramic substrate and electronic component module using ceramic substrate
05/27/2008US7378031 Liquid phase etching method and liquid phase etching apparatus
05/27/2008US7378004 Pad designs and structures for a versatile materials processing apparatus
05/27/2008US7378002 Aluminum sputtering while biasing wafer
05/27/2008US7377992 Method and apparatus for detecting end point
05/27/2008US7377991 Ultrasonic assisted etch using corrosive liquids
05/27/2008US7377982 Method for the removal of airborne molecular contaminants using water gas mixtures
05/27/2008US7377978 Method for producing silicon epitaxial wafer and silicon epitaxial wafer
05/27/2008US7377977 High-purity crystal growth
05/27/2008US7377976 Method for growing thin oxide films
05/27/2008US7377836 Versatile wafer refining
05/27/2008US7377788 Electrical connecting apparatus and contact
05/27/2008US7377736 Cylinder, load port using it, and production system
05/27/2008US7377053 Method and device for drying substrate
05/27/2008US7377049 Aligning apparatus
05/27/2008US7377031 Fabrication method of semiconductor integrated circuit device
05/27/2008US7377030 Wiring board manufacturing method
05/27/2008US7377002 Scrubber box
05/22/2008WO2008061194A1 Nonvolatile phase change memory cell having a reduced contact area and method of making
05/22/2008WO2008061128A2 Copper-metallized integrated circuits having an overcoat for protecting bondable metal contacts and improving mold compound adhesion
05/22/2008WO2008061122A2 Semiconductor device manufactured using an electrochemical deposition process for copper interconnects
05/22/2008WO2008061085A1 Selectively doped semi-conductors and methods of making the same
05/22/2008WO2008061069A1 Fast gas switching plasma processing apparatus
05/22/2008WO2008061031A1 Methods of etching a pattern layer to form staggered heights therein and intermediate semiconductor device structures
05/22/2008WO2008060874A1 Substrate with two sided doping and method of producing the same
05/22/2008WO2008060840A1 Removable spacer
05/22/2008WO2008060745A1 Interconnect structure having enhanced electromigration reliability and a method of fabricating same
05/22/2008WO2008060678A2 Formation of carbon and semiconductor nanomaterials using molecular assemblies
05/22/2008WO2008060615A1 Transparent mirrorless light emitting diode
05/22/2008WO2008060585A2 Standing transparent mirrorless light emitting diode
05/22/2008WO2008060531A2 Light emitting diode and laser diode using n-face gan, inn, and ain and their alloys
05/22/2008WO2008060530A1 Ion beam treatment for the structural integrity of air-gap iii-nitride devices produced by photoelectrochemical (pec) etching
05/22/2008WO2008060505A1 Methods for polishing aluminum nitride
05/22/2008WO2008060452A1 Process of purifying wood pulp with caustic-borate solution and recovering the purifying chemical
05/22/2008WO2008060349A2 Method for heteroepitaxial growth of high-quality n-face gan, inn, and ain and their alloys by metal organic chemical vapor deposition
05/22/2008WO2008060293A2 Preparation of nano-tubular titania substrates having gold and carbon particles deposited thereon and their use in photo-electrolysis of water
05/22/2008WO2008060280A1 Board on chip package and process for making same
05/22/2008WO2008060244A2 Net block assembly
05/22/2008WO2008060183A1 Method for growing a multilayer nitride semiconductor heterostructure
05/22/2008WO2008060069A1 Method for cleaning a substrate
05/22/2008WO2008059930A1 Method of manufacturing disk substrate
05/22/2008WO2008059929A1 Glass substrate chamfering apparatus
05/22/2008WO2008059918A1 Composition for upper surface antireflection film, and method for pattern formation using the same
05/22/2008WO2008059916A1 Exposure apparatus, exposure method and device manufacturing method
05/22/2008WO2008059901A1 PROCESS FOR PRODUCTION OF GaN CRYSTALS, GaN CRYSTALS, GaN CRYSTAL SUBSTRATE, SEMICONDUCTOR DEVICES, AND APPARATUS FOR PRODUCTION OF GaN CRYSTALS
05/22/2008WO2008059891A1 Substrate processing method and substrate processing system
05/22/2008WO2008059875A1 Process for producing group iii element nitride crystal