Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
01/2009
01/28/2009CN101355845A Substrate with conductive projection and technique thereof
01/28/2009CN101355142A Sealing method for display element
01/28/2009CN101355122A Method for preparing gallium nitride substrate
01/28/2009CN101355120A Preparation method for LED and tool for preparing the LED
01/28/2009CN101355105A Semiconductor device and method of manufacturing the same
01/28/2009CN101355104A Semiconductor device and method of manufacturing the same
01/28/2009CN101355103A DMOS type semiconductor device and manufacturing method thereof
01/28/2009CN101355102A Semiconductor device and method for forming the same
01/28/2009CN101355101A Electrostatic induction device with multi-groove structure and preparation method thereof
01/28/2009CN101355100A Bipolar transistor and method for the production thereof
01/28/2009CN101355099A Gate dielectric material silicic acid lanthanum film with high dielectric coefficient as well as preparation method and use thereof
01/28/2009CN101355097A Electrooptical device, electronic apparatus, and method for producing electrooptical device
01/28/2009CN101355096A Organic light emitting display and method of manufacturing the same
01/28/2009CN101355095A Organic thin film transistor array panel and method for manufacturing the same
01/28/2009CN101355091A Case for housing solid-state imaging element, manufacturing method thereof, and solid-state imaging device
01/28/2009CN101355090A Thin-film transistor array substrate and preparation method thereof
01/28/2009CN101355089A 显示装置 The display device
01/28/2009CN101355088A Display panel and method for the same
01/28/2009CN101355086A Capacitorless dram and methods of manufacturing and operating the same
01/28/2009CN101355085A Vertical floating body cell of a semiconductor device and method for fabricating the same
01/28/2009CN101355084A Semiconductor structure, method for disposing bipolar transistor as well as manufacturing semiconductor device
01/28/2009CN101355082A Display panel and test system
01/28/2009CN101355081A Semiconductor device, wafer and method of designing and manufacturing the same
01/28/2009CN101355079A Semiconductor device and method of fabricating the same
01/28/2009CN101355078A Crosstalk-free wlcsp structure for high frequency application
01/28/2009CN101355076A Integrated circuit having a semiconductor substrate with a barrier layer
01/28/2009CN101355075A Loading belt for smart card, encapsulation module for smart card using the same and manufacturing method thereof
01/28/2009CN101355071A Conductor holder type semiconductor package and making method thereof
01/28/2009CN101355069A Semiconductor packages with through hole silicon and method of fabricating the same
01/28/2009CN101355068A Bond pad stacks for ESD under pad and active under pad bonding
01/28/2009CN101355067A Improved electrical connections for multichip modules
01/28/2009CN101355066A Packaging structure and manufacturing method thereof
01/28/2009CN101355065A Semiconductor device having external connection terminals and method of manufacturing the same
01/28/2009CN101355064A Semiconductor device and method of manufacturing same
01/28/2009CN101355063A Electronic device and method for manufacturing electronic device
01/28/2009CN101355061A High performance semiconductor module with sealant device on substrate carrier and corresponding production method
01/28/2009CN101355058A Semiconductor device and method of manufacturing the same
01/28/2009CN101355057A Isolating ring substrate, mask plate and forming method thereof
01/28/2009CN101355056A Method of fabricating a thin film transistor substrate and a photosensitive composition used in the thin film transistor substrate
01/28/2009CN101355055A Flash memory device and method of manufacturing the same
01/28/2009CN101355054A Method for preparing complementary type metal-oxide-semiconductor transistor
01/28/2009CN101355053A Multiple gate field effect transistor structure
01/28/2009CN101355052A Proton irradiation method capable of improving imaging quality of CMOS image sensor
01/28/2009CN101355051A Semiconductor device having a copper metal line and method of forming the same
01/28/2009CN101355050A Novel ladder poly etching back process for word line poly planarization
01/28/2009CN101355049A Method for implementing air bridge interconnection and chip with air bridge interconnection structure
01/28/2009CN101355048A Metal interconnection method and metallic layer graphic method
01/28/2009CN101355047A Method for forming through hole in low dielectric coefficient medium layer
01/28/2009CN101355046A On-line measurement apparatus for high-temperature mechanics behavior of multi-layer film basal body structure
01/28/2009CN101355045A Substrate detection apparatus and substrate processing apparatus
01/28/2009CN101355044A System in package and method for fabricating the same
01/28/2009CN101355043A Encapsulation body for electronic element and preparation method thereof
01/28/2009CN101355042A Thin plastic leadless package with exposed metal die paddle
01/28/2009CN101355041A Method for producing silicon avalanche rectifier diode for primary welding automobile
01/28/2009CN101355040A Stacking structure for multiple chips and manufacturing method thereof
01/28/2009CN101355039A Encapsulation body for image sensing element and preparation method thereof
01/28/2009CN101355038A Method and chip for integrating micro electromechanical system device and integrated circuit
01/28/2009CN101355037A 显示装置及其制造方法 Display device and method of manufacturing
01/28/2009CN101355036A Trench gate semiconductor device and method for fabricating the same
01/28/2009CN101355035A Method for manufacturing semiconductor device
01/28/2009CN101355034A Method for forming photoetch pattern and method for manufacturing dual-damascene structure
01/28/2009CN101355033A Method for forming medium layer and method for manufacturing dual-damascene structure
01/28/2009CN101355032A Method for polishing a substrate composed of semiconductor material
01/28/2009CN101355031A Method for preparing p-type transparent oxide semiconductor CuCrO2 film material
01/28/2009CN101355030A Method for manufacturing memory bank, memory device as well as method for operating and accessing the memory device
01/28/2009CN101355029A Method for forming grids of semiconductor device
01/28/2009CN101355028A Method for repairing grid pole oxide layer
01/28/2009CN101355027A Ion injection method of semiconductor device
01/28/2009CN101355026A Manufacturing method of silicon carbide semiconductor apparatus
01/28/2009CN101355025A Method of manufacturing thin film semiconductor device
01/28/2009CN101355024A Method for preparing substrate with insulation buried layer
01/28/2009CN101355023A Manufacturing method of semiconductor device
01/28/2009CN101355022A Film formation method and apparatus for semiconductor process
01/28/2009CN101355021A Substrate transfer module and substrate processing system
01/28/2009CN101355020A Substrate treatment apparatus
01/28/2009CN101355019A Substrate cleaning device and substrate processing apparatus including the same
01/28/2009CN101355018A Gas-tight module and exhaust method therefor
01/28/2009CN101355017A Plasma etching method, plasma etching apparatus and storage medium
01/28/2009CN101355016A Method for cleaning semiconductor device
01/28/2009CN101355015A Method for fabricating photoresist pattern
01/28/2009CN101355014A Beam irradiation apparatus, beam irradiation method, and method for manufacturing a thin film transistor
01/28/2009CN101355013A Process for fabricating a structure for epitaxy without an exclusion zone
01/28/2009CN101355012A Endpoint detection device for realizing real-time control of plasma reactor, plasma reactor with endpoint detection device, and endpoint detection method
01/28/2009CN101355011A Method and system for stamping wafer laser
01/28/2009CN101355010A Air-intake installation and reaction chamber
01/28/2009CN101355009A Etching device
01/28/2009CN101355008A Method for forming film
01/28/2009CN101355004A Plasma reactor with reduced electrical skew using electrical bypass elements
01/28/2009CN101354917A Non-volatile memory devices including stacked nand-type resistive memory cell strings and methods of fabricating the same
01/28/2009CN101354542A Method for removing photoresist
01/28/2009CN101354541A Integrated post-exposure bake track
01/28/2009CN101354540A Exposure apparatus, exposure method, and method for producing device
01/28/2009CN101354539A Exposure apparatus and method for producing device
01/28/2009CN101354536A Apparatus and method for controlling distribution of photoresist
01/28/2009CN101354535A Method for forming and coating multi-layer mask layer
01/28/2009CN101354529A Photomask data generation method, photomask generation method, exposure method, and device manufacturing method
01/28/2009CN101354514A Liquid crystal display device and electronic device provided with the same
01/28/2009CN101354513A Liquid crystal display device and method of manufacturing the liquid crystal display device
01/28/2009CN101354511A Liquid crystal display device and electronic device
01/28/2009CN101354509A Method for manufacturing substrate, liquid crystal display apparatus and method for manufacturing the same, and electronic device