Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
09/2009
09/02/2009CN101521177A Method for preparing transverse phase transition memory by using single-walled carbon nanotube as electrode
09/02/2009CN101521176A Method for manufacturing groove capacitor structure
09/02/2009CN101521175A Semiconductor device and a manufacturing method therefor
09/02/2009CN101521174A Manufacturing method for semiconductor devices
09/02/2009CN101521173A Adhesive tape joining apparatus
09/02/2009CN101521172A Method for teaching carrier means, storage medium and substrate processing apparatus
09/02/2009CN101521171A Cutting blade detection mechanism
09/02/2009CN101521170A Solder contacts and methods of forming same
09/02/2009CN101521169A Semiconductor device and a method of manufacturing the same
09/02/2009CN101521168A Chip encapsulating device and chip encapsulating manufacturing procedure
09/02/2009CN101521167A Semiconductor device and manufacturing method of the same
09/02/2009CN101521166A Method and structure for packaging digital image acquisition module
09/02/2009CN101521165A Chip-scale packaging method
09/02/2009CN101521164A Lead-bonding chip-scale packaging method
09/02/2009CN101521163A Heightened flexible circuit board of bonding pad and manufacturing method thereof
09/02/2009CN101521162A Method for manufacturing transient voltage suppressor with changeable withstand voltage
09/02/2009CN101521161A Table-board manufacture technology for lead-free diode
09/02/2009CN101521160A A method of applying a pattern of metal, metal oxide and/or semiconductor material on a substrate
09/02/2009CN101521159A Method for improving the uniformity of disc and interlayer medium
09/02/2009CN101521158A Plasma etching method and plasma etching apparatus
09/02/2009CN101521157A Method of fabricating a semiconductor device
09/02/2009CN101521156A Method and optical analysing apparatus for determining threshold value of micro-crystallization energy density threshold value
09/02/2009CN101521155A Method for preparing substrate having monocrystalline film
09/02/2009CN101521154A Method for reducing silicon dishing in LDD photoetching process
09/02/2009CN101521153A Method of manufacturing semiconductor device, and resist coating and developing system
09/02/2009CN101521152A Pattern forming method and method of manufacturing semiconductor device by using the same
09/02/2009CN101521151A Microwave plasma processing apparatus and use method thereof
09/02/2009CN101521150A 等离子体处理装置 The plasma processing apparatus
09/02/2009CN101521149A Automatic assembly equipment for assembling IC chips and radiating sheets
09/02/2009CN101521148A Substrate processing apparatus
09/02/2009CN101521147A Microwave plasma processing apparatus, dielectric window, and method for manufacturing the dielectric window
09/02/2009CN101521146A Substrate heating apparatus, semiconductor device manufacturing method, and semiconductor device
09/02/2009CN101521145A Surface treatment unit for semiconductor manufacturing apparatus and manufacturing method thereof
09/02/2009CN101521144A Sintered body and member used for plasma processing apparatus
09/02/2009CN101521143A Lining mechanism for semiconductor processing equipment and manufacturing method thereof
09/02/2009CN101520654A Method for statistical process control of limit truncated production data and computer code
09/02/2009CN101520611A Lithographic apparatus and device manufacturing method
09/02/2009CN101520609A Method, inspection system, computer program and reference substrate for detecting mask defects
09/02/2009CN101520599A Mask, design method thereof, as well as method for manufacturing array substrates thereby
09/02/2009CN101520586A Manufacturing method of electrophoresis display device, electrophoresis display device, and electronic apparatus
09/02/2009CN101520584A Liquid crystal display panel and liquid crystal display device and manufacture method of liquid crystal display panel
09/02/2009CN101520582A Electro-optical device and method of manufacturing electro-optical device
09/02/2009CN101520580A TFT-LCD array substrate structure and manufacturing method thereof
09/02/2009CN101520470A Probe card, manufacturing method of probe card, semiconductor inspection apparatus and manufacturing method of semiconductor device
09/02/2009CN101519796A Controlled edge resistivity in silicon wafer
09/02/2009CN101519774A Plasma processing apparatus
09/02/2009CN101519771A Atomic layer deposition apparatus
09/02/2009CN101519592A Anisotropic silicon etchant composition
09/02/2009CN101519315A Glass substrate thermal treatment platform, manufacturing method thereof and glass substrate thermal treatment method
09/02/2009CN101518949A Adhesive film position detector and adhesive film joining apparatus
09/02/2009CN101518887A Adhesive sheet for grinding back surface of semiconductor wafer and method for grinding back surface of semiconductor wafer using the same
09/02/2009CN100536628C Retention mechanism for heating coil of high temperature diffusion furnace
09/02/2009CN100536167C Semiconductor device and preparation method thereof
09/02/2009CN100536143C Nrom device
09/02/2009CN100536127C 电路装置 Circuit means
09/02/2009CN100536118C See-through-type integrated thin-film solar cell, method of manufacturing the same and method of electrically series connecting unit cells thereof
09/02/2009CN100536117C Process for preparing thin-film transistor panel
09/02/2009CN100536116C Production method for well region extending structure of non-volatile memory
09/02/2009CN100536115C Separable grid flash memory cell and its forming method
09/02/2009CN100536114C Method of manufacturing a flash memory device
09/02/2009CN100536113C Production method of bulk silicon nano line transistor device
09/02/2009CN100536112C Complementary type metal oxide semiconductor image sensor and manufacturing method therefor
09/02/2009CN100536111C Semiconductor device and manufacturing method thereof, and camera module
09/02/2009CN100536110C Salicide process using cmp for image sensor
09/02/2009CN100536109C Method and structure for manufacturing high-capacitance capacitor by using copper
09/02/2009CN100536108C Semiconductor device and dicing method for semiconductor substrate
09/02/2009CN100536107C Single inlay structure and dual inlay structure and their open hole forming method
09/02/2009CN100536106C Method for producing conductor
09/02/2009CN100536105C Methods of fabricating interconnects for semiconductor components
09/02/2009CN100536104C Substrate carrying mechanism and connecting method
09/02/2009CN100536103C Method of fabricating semiconductor device
09/02/2009CN100536102C Flip chip mounting body, flip chip mounting method and flip chip mounting apparatus
09/02/2009CN100536101C Semiconductor device and method of manufacturing the same
09/02/2009CN100536100C Resin sealing shaping device for electronic parts
09/02/2009CN100536099C Resin material
09/02/2009CN100536098C Wafer-level encapsulation and the method for making the up cover structure
09/02/2009CN100536097C Interconnection and packaging method for biomedical devices with electronic and fluid functions
09/02/2009CN100536096C Method of making semiconductor package with reduced moisture sensitivity
09/02/2009CN100536095C High density microvia substrate with high wireability
09/02/2009CN100536094C Method for forming a semiconductor device having a notched control electrode and structure thereof
09/02/2009CN100536093C Method for growing ZnMgO alloy film on ITO substrate
09/02/2009CN100536092C Method for manufacturing fin-shaped field effect transistor by epitaxial process
09/02/2009CN100536091C Double exposure double resist layer process for forming gate patterns
09/02/2009CN100536090C Method for forming secondary partition sheet used for strain silicon MOS transistor and structure thereof
09/02/2009CN100536089C Method and apparatus for quickly cooling and annealing of wafer
09/02/2009CN100536088C Methods of etching nickel silicide and cobalt silicide and methods of forming conductive lines
09/02/2009CN100536087C Method for producing compressive nitrifier layer and method for forming transistor
09/02/2009CN100536086C Method of controlling the uniformity of PECVD-deposited thin films
09/02/2009CN100536085C Electrical connector with load bearing features
09/02/2009CN100536084C Method of repairing damaged film having low dielectric constant, semiconductor fabricating device and storage medium
09/02/2009CN100536083C A manufacturing method and apparatus of semiconductor
09/02/2009CN100536082C Plasma processing apparatus
09/02/2009CN100536081C 抛光组合物 The polishing composition
09/02/2009CN100536080C Wafer processing method
09/02/2009CN100536079C Semiconductor base plate and its manufacturing method
09/02/2009CN100536078C Method for fabricating semiconductor device including recess gate
09/02/2009CN100536077C Manufacturing method of semiconductor device
09/02/2009CN100536076C Semiconductor manufacturing apparatus, abnormality detection in such semiconductor manufacturing apparatus, method for specifying abnormality cause or predicting abnormality, and recording medium wher
09/02/2009CN100536075C Method for fabricating thin film transistor
09/02/2009CN100536074C Substrate heat treatment apparatus