Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
10/2009
10/06/2009US7598103 Liquid crystal display panel with different substrate materials and method of making the liquid crystal display panel
10/06/2009US7598102 Method for fabricating pixel structure
10/06/2009US7598101 LED of side view type and the method for manufacturing the same
10/06/2009US7598100 Manufacturing method of semiconductor integrated circuit device
10/06/2009US7598099 Method of controlling a fabrication process using an iso-dense bias
10/06/2009US7598098 Monitoring the reduction in thickness as material is removed from a wafer composite and test structure for monitoring removal of material
10/06/2009US7598097 Method of fabricating a magnetic shift register
10/06/2009US7598096 Methods of forming ferroelectric crystals as storage media and structures formed thereby
10/06/2009US7598095 Ferroelectric memory and ferroelectric capacitor with Ir-alloy electrode or Ru-alloy electrode and method of manufacturing same
10/06/2009US7598020 Forming image with high resolving power; producing extremely fine circuit pattern; utilizing excimer laser light emitted from annular shaped source passed through mask having phase shifter
10/06/2009US7598005 An approximated curve to the curve of the actual pattern, mask pattern can be formed based on an individual and specific polygonal approximation in accordance with the shapes
10/06/2009US7598004 Film-depositing target and preparation of phase shift mask blank
10/06/2009US7597816 Wafer bevel polymer removal
10/06/2009US7597814 Structure formed with template having nanoscale features
10/06/2009US7597813 Element substrate and method of manufacturing the same
10/06/2009US7597774 Apparatus and method for fabricating bonded substrate
10/06/2009US7597769 forming a solar cell conductive feature using monodisperse silver or silver alloy fine particles coated with a ceramic or metal; silver particles made in an aerosol stream and coated by vapor deposition
10/06/2009US7597765 Post etch wafer surface cleaning with liquid meniscus
10/06/2009US7597763 Electroless plating systems and methods
10/06/2009US7597758 Chemical precursor ampoule for vapor deposition processes
10/06/2009US7597729 edge polishing a semiconductor substrate using a mixture containing imidazole and the imidazole derivative contribute to an improvement of the polishing ability; silica abrasives, tetramethylammonium hydroxide, a water-soluble polymer, a chelating agent, and water, and containing no oxidizing agent
10/06/2009US7597531 Method of controlling mover device
10/06/2009US7597530 Method for conveying and apparatus using the same
10/06/2009US7597492 Coating and developing system, coating and developing method and storage medium
10/06/2009US7597491 Apparatus for and method of processing substrate
10/06/2009US7597234 Method for mounting a flip chip on a substrate
10/06/2009US7597183 Kinematic pin with shear member and substrate carrier for use therewith
10/06/2009US7596862 Method of making a circuitized substrate
10/06/2009CA2412419C Improved buffer for growth of gan on sapphire
10/06/2009CA2412370C Use of a u-groove as an alternative to using a v-groove for protecting silicon against dicing induced damage
10/06/2009CA2311061C Molecular beam epitaxy (mbe) growth of semi-insulating c-doped gan
10/01/2009WO2009120986A2 Mixed source growth apparatus and method of fabricating iii-nitride ultraviolet emitters
10/01/2009WO2009120974A2 System for selectively filling pin holes, weak shunts and/or scribe lines in photovoltaic devices and photovoltaic cells made thereby
10/01/2009WO2009120961A1 Hermetically sealed device with transparent window and method of manufacturing same
10/01/2009WO2009120845A2 Techniques for improved uniformity tuning in an ion implanter system
10/01/2009WO2009120804A2 Improved pad properties using nanoparticle additives
10/01/2009WO2009120729A1 Temperature measurement and control of wafer support in thermal processing chamber
10/01/2009WO2009120727A2 Processes and solutions for substrate cleaning and electroless deposition
10/01/2009WO2009120722A2 Methods and apparatus for conserving electronic device manufacturing resources
10/01/2009WO2009120721A2 Plasmostor: a-metal-oxide-si field effect plasmonic modulator
10/01/2009WO2009120687A2 Vapor phase rework station and methods
10/01/2009WO2009120686A1 Methods and apparatus for using reduced purity silane to deposit silicon
10/01/2009WO2009120641A2 Improved carrier head membrane
10/01/2009WO2009120631A2 Surface cleaning and texturing process for crystalline solar cells
10/01/2009WO2009120612A2 Semiconductor devices having tensile and/or compressive strain and methods of manufacturing and design structure
10/01/2009WO2009120567A1 Structure and method to control oxidation in high-k gate structures
10/01/2009WO2009120552A2 Integrated process system and process sequence for production of thin film transistor arrays using doped or compounded metal oxide semiconductor
10/01/2009WO2009120487A1 Magnetic tunnel junction cell including multiple vertical magnetic domains
10/01/2009WO2009120482A1 Sip substrate
10/01/2009WO2009120437A1 Methods for forming doped regions in semiconductor substrates using non-contact printing processes and dopant-comprising inks for forming such doped regions using non-contact printing processes
10/01/2009WO2009120404A1 Super lattice/quantum well nanowires
10/01/2009WO2009120360A2 High throughput cleaner chamber
10/01/2009WO2009120302A2 Chemical treatments to enhance photovoltaic performance of cigs
10/01/2009WO2009120169A1 Solution processed thin films and laminates, devices comprising such thin films and laminates, and method for the use and manufacture
10/01/2009WO2009120034A2 Substrate processing apparatus and method
10/01/2009WO2009120000A2 Substrate processing apparatus and method
10/01/2009WO2009119983A2 Fpd substrate and semiconductor wafer inspection system using duplicate images
10/01/2009WO2009119968A1 Oxide semiconductor thin film and fabrication method thereof
10/01/2009WO2009119962A1 Boron-doped zinc oxide based transparent conducting film and manufacturing method of thereof
10/01/2009WO2009119937A1 Plasma cleaning apparatus for a semiconductor panel with cleaning chambers
10/01/2009WO2009119894A1 Positive resist composition and pattern forming method using the same
10/01/2009WO2009119878A1 Positive photosensitive resin composition and method of forming cured film from the same
10/01/2009WO2009119848A1 Method of etching
10/01/2009WO2009119805A1 Microwave plasma processing device
10/01/2009WO2009119804A1 Thin film interconnect for electronic component, and sputtering target material for formation of thin film interconnect
10/01/2009WO2009119803A1 Capacitor, semiconductor device comprising the same, method for manufacturing the capacitor, and method for manufacturing the semiconductor device
10/01/2009WO2009119799A1 Loop element and noise analyzer
10/01/2009WO2009119735A1 Semiconductor device, and method for manufacturing the same
10/01/2009WO2009119727A1 Parallel-processing semiconductor integrated circuit device, method for parallel processing, and program
10/01/2009WO2009119666A1 Sram cell and sram device
10/01/2009WO2009119658A1 Nonvolatile semiconductor memory element and semiconductor device
10/01/2009WO2009119650A1 Etching end point detecting pattern and method for etching
10/01/2009WO2009119627A1 Method of depositing metallic film and memory medium
10/01/2009WO2009119583A1 Material for chemical vapor deposition, silicon-containing insulating film and process for production thereof
10/01/2009WO2009119580A1 Processing apparatus and processing method
10/01/2009WO2009119527A1 Semiconductor memory and method for manufacturing the same
10/01/2009WO2009119500A1 Gas feeding device, treating device, treating method, and storage medium
10/01/2009WO2009119485A1 Metal polishing liquid and polishing method using the polishing liquid
10/01/2009WO2009119427A1 Semiconductor device and manufacturing method for the same
10/01/2009WO2009119418A1 Temperature-measuring apparatus, and mounting table structure and heat treatment apparatus having the same
10/01/2009WO2009119411A1 Process for producing zno single crystal, self-supporting zno single-crystal wafer obtained by the same, self-supporting wafer of mg-containing zno mixed single crystal, and process for producing mg-containing zno mixed single crystal for use in the same
10/01/2009WO2009119377A1 Non-contact carrier device
10/01/2009WO2009119365A1 Film deposition apparatus and method of film deposition
10/01/2009WO2009119357A1 Epitaxial substrate for semiconductor element, semiconductor element, and process for producing epitaxial substrate for semiconductor element
10/01/2009WO2009119356A1 Epitaxial substrate for smeiconductor element, semiconductor element, and process for producing epitaxial substrate for semiconductor element
10/01/2009WO2009119343A1 Apparatus for treating surface and method of treating surface
10/01/2009WO2009119341A1 Semiconductor light emitting element and method for manufacturing the same
10/01/2009WO2009119314A1 Method for classifying defects, computer storage medium, and device for classifying defects
10/01/2009WO2009119285A1 Shower plate and plasma processing device using the same
10/01/2009WO2009119248A1 Semiconductor device
10/01/2009WO2009119241A1 Plasma processing apparatus
10/01/2009WO2009119201A1 Resist underlayer film, composition for resist underlayer film formation, and method for resist underlayer film formation
10/01/2009WO2009119193A1 Apparatus and method for mounting electronic component
10/01/2009WO2009119178A1 Colloidal silica with modified surface and polishing composition for cmp containing the same
10/01/2009WO2009119177A1 Film forming method, film forming apparatus and storage medium
10/01/2009WO2009119175A1 Semiconductor device
10/01/2009WO2009119159A1 Substrate for optical device and method for manufacturing the substrate
10/01/2009WO2009119155A1 Coat film forming method and coat film forming apparatus
10/01/2009WO2009119148A1 Film forming method and semiconductor device manufacturing method
10/01/2009WO2009119147A1 Method for film formation, apparatus for film formation, and computer-readable recording medium