Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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12/16/2009 | CN101602232A Wire butting machine tool |
12/16/2009 | CN101602055A Cleaning method |
12/16/2009 | CN100571489C Methods of forming printed circuit boards |
12/16/2009 | CN100571476C Laser irradiation device, patterning method and method of fabricating organic light emitting display |
12/16/2009 | CN100571342C Solid-state imaging device and method of manufacturing the same |
12/16/2009 | CN100571137C Transport system |
12/16/2009 | CN100570981C Apparatus and method for operation controlling of multi-electric power usage system |
12/16/2009 | CN100570909C Semiconductor light emitting element |
12/16/2009 | CN100570902C Dye sensitization nanocrystalline thin-film solar cell high pore space flexible carbon to electric pole and preparation method thereof |
12/16/2009 | CN100570899C Semiconductor apparatus and method of manufacturing the same |
12/16/2009 | CN100570898C Non-volatile memory device for multi-digit storage and its making method |
12/16/2009 | CN100570896C Thin-film transistor, active array substrate and manufacturing method thereof |
12/16/2009 | CN100570895C Thin film transistor and method of manufacturing the same |
12/16/2009 | CN100570894C Vertical fin-FET MOS devices |
12/16/2009 | CN100570892C Semiconductor device and method for manufacturing the same |
12/16/2009 | CN100570891C High breakdown voltage semiconductor device and fabrication method of the same |
12/16/2009 | CN100570890C Lateral semiconductor device using trench structure and method of manufacturing the same |
12/16/2009 | CN100570889C Structures and methods for manufacturing dislocation free stressed channels in bulk silicon and SOI CMOS devices |
12/16/2009 | CN100570888C Semiconductor device |
12/16/2009 | CN100570886C A structure and the corresponding manufacturing method for reducing the extended electrode capacity of the transistor |
12/16/2009 | CN100570885C Voltage pinch-off device with high breakdown voltage and method for fabricating same |
12/16/2009 | CN100570884C Semiconductor structure and manufacturing method thereof |
12/16/2009 | CN100570881C Image sensor |
12/16/2009 | CN100570880C Method for producing complementary metal-oxide-semiconductor transistor image sensor |
12/16/2009 | CN100570876C Semiconductor structures and methods for fabrication thereof |
12/16/2009 | CN100570873C Capacitor and forming method thereof |
12/16/2009 | CN100570872C Electric signal transmission line |
12/16/2009 | CN100570868C 电路板及其制造方法 The circuit board and its manufacturing method |
12/16/2009 | CN100570864C Pixel structure and its manufacture method |
12/16/2009 | CN100570863C Pixel structure and manufacturing method thereof |
12/16/2009 | CN100570862C Method for fabricating flash memory device |
12/16/2009 | CN100570861C Ferroelectric memory device and method of manufacture of same |
12/16/2009 | CN100570860C Dual stress memory technique method and related semicondutor device |
12/16/2009 | CN100570859C Semiconductor device and method for fabricating the same |
12/16/2009 | CN100570858C Method of manufacturing semiconductor device |
12/16/2009 | CN100570857C Metal oxide semiconductor element and manufacturing method therefor |
12/16/2009 | CN100570856C Device having dual etch stop liner and reformed silicide layer and related methods |
12/16/2009 | CN100570855C Integrate circuit design system and method |
12/16/2009 | CN100570854C Method of formation of a damascene structure utilizing a protective film |
12/16/2009 | CN100570853C Semiconductor component and manufacturing method thereof |
12/16/2009 | CN100570852C Method of forming dual damascene structure of no-etch stop layer |
12/16/2009 | CN100570851C Method of forming bit line of semiconductor device |
12/16/2009 | CN100570850C Method for manufacturing semiconductor device |
12/16/2009 | CN100570849C Shallow groove isolated forming process |
12/16/2009 | CN100570848C Method of manufacturing semiconductor device and processing method for electric connection part |
12/16/2009 | CN100570847C Three-dimensional integrate circuit realization method of transfer-free disc |
12/16/2009 | CN100570846C High, depth and width three-dimensional uprightness interconnect and realization method of three-dimensional integrate circuit |
12/16/2009 | CN100570845C Convex point production method capable of preventing blue film |
12/16/2009 | CN100570844C Package method for multiple chip integrated circuit |
12/16/2009 | CN100570843C A semiconductor package manufacturing method and semiconductor apparatus |
12/16/2009 | CN100570842C Wafer stage package cutting method protecting connection pad |
12/16/2009 | CN100570841C Method of making a circuitized substrate |
12/16/2009 | CN100570840C Method of fabricating semiconductor device with FINFET |
12/16/2009 | CN100570839C Structure of MOS component |
12/16/2009 | CN100570838C Method for preparing power MOS tube capable of improving grid oxic horizon homogeneity |
12/16/2009 | CN100570837C Method for producing semiconductor elements |
12/16/2009 | CN100570836C Polysilicon thin-film transistor and method for producing the same |
12/16/2009 | CN100570835C Metal-insulator-semiconductor device production method |
12/16/2009 | CN100570834C Method for manufacturing display device |
12/16/2009 | CN100570833C Method for producing AlGaN/AlInN composite potential barrier gallium nitride field effect pipe |
12/16/2009 | CN100570832C Method for manufacturing insulated gate bipolar transistor with variable buffer layer concentration inner transparent collecting zone |
12/16/2009 | CN100570831C Apparatus and method for improving silica layer growth on wafer |
12/16/2009 | CN100570830C Method for etching carbon-containing layer and method for manufacturing semiconductor device |
12/16/2009 | CN100570829C Method for controlling aperture difference of different hatches simultaneously and etching technique |
12/16/2009 | CN100570828C Method for etching aluminium nitride thin film micrographics |
12/16/2009 | CN100570827C Polishing slurry and polishing material using same |
12/16/2009 | CN100570826C Polishing mat and method of manufacturing semiconductor device |
12/16/2009 | CN100570825C Method for fabricating semiconductor device with recess gate |
12/16/2009 | CN100570824C Mask and method for forming polycrystalline silicon layer using the same |
12/16/2009 | CN100570823C A method for obtaining low bit discrepancy density extension thin film via using neck down extension |
12/16/2009 | CN100570822C Exposure device, exposing method, and device manufacturing method |
12/16/2009 | CN100570821C Inorganic nanocomposite film and manufacturing method thereof, method for fabricating photovoltaic cell, field effect transistor and manufacturing method thereof |
12/16/2009 | CN100570820C Method for diagnosing electrostatic chuck and vacuum processing apparatus |
12/16/2009 | CN100570819C Two-stage back type etching method |
12/16/2009 | CN100570818C Plasma processing apparatus |
12/16/2009 | CN100570817C Substrate processing apparatus and substrate handling method |
12/16/2009 | CN100570816C Method for processing over etching |
12/16/2009 | CN100570815C Chip bonding machine platform and heating plate thereof |
12/16/2009 | CN100570814C Methods for forming patterns of block copolymers and related semiconductor structure |
12/16/2009 | CN100570813C Method of manufacturing semiconductor device |
12/16/2009 | CN100570780C 外部电极形成方法 The method for forming the external electrodes |
12/16/2009 | CN100570770C Ceramics film and production method therefor, and ferroelectric capacitor, semiconductor device, other elements |
12/16/2009 | CN100570750C Semiconductor memory and preburning test method of semiconductor memory |
12/16/2009 | CN100570684C Organic EL panel |
12/16/2009 | CN100570497C Production of automatic optical approximate correcting regulation |
12/16/2009 | CN100570496C Photo-etching machine silicon slice bench double-bench switching system adopting cross slide rail |
12/16/2009 | CN100570495C Method for testing whether etching solution is valid or not |
12/16/2009 | CN100570494C Lithography |
12/16/2009 | CN100570493C Pattern density control method using edge printing processes |
12/16/2009 | CN100570490C Lithographic apparatus, reticle exchange unit and device manufacturing method |
12/16/2009 | CN100570488C Cooler of static chuck of extreme ultraviolet photolithographic mask platform |
12/16/2009 | CN100570487C Method of determining aberration of a projection system of a lithographic apparatus |
12/16/2009 | CN100570486C Picture drawing device |
12/16/2009 | CN100570485C Two-dimensional nanostructure deep etching method |
12/16/2009 | CN100570484C Coating and developing device, and coating and developing method |
12/16/2009 | CN100570483C Acrylic polymer-containing gap filler forming composition for lithography |
12/16/2009 | CN100570482C Photosensitive resin composition |
12/16/2009 | CN100570480C Method for mask design |
12/16/2009 | CN100570442C Assembling method of liquid-crystal panel |
12/16/2009 | CN100570428C Spatial light modulator using an integrated circuit actuator and method of making and using same |