Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
12/2009
12/16/2009CN101602232A Wire butting machine tool
12/16/2009CN101602055A Cleaning method
12/16/2009CN100571489C Methods of forming printed circuit boards
12/16/2009CN100571476C Laser irradiation device, patterning method and method of fabricating organic light emitting display
12/16/2009CN100571342C Solid-state imaging device and method of manufacturing the same
12/16/2009CN100571137C Transport system
12/16/2009CN100570981C Apparatus and method for operation controlling of multi-electric power usage system
12/16/2009CN100570909C Semiconductor light emitting element
12/16/2009CN100570902C Dye sensitization nanocrystalline thin-film solar cell high pore space flexible carbon to electric pole and preparation method thereof
12/16/2009CN100570899C Semiconductor apparatus and method of manufacturing the same
12/16/2009CN100570898C Non-volatile memory device for multi-digit storage and its making method
12/16/2009CN100570896C Thin-film transistor, active array substrate and manufacturing method thereof
12/16/2009CN100570895C Thin film transistor and method of manufacturing the same
12/16/2009CN100570894C Vertical fin-FET MOS devices
12/16/2009CN100570892C Semiconductor device and method for manufacturing the same
12/16/2009CN100570891C High breakdown voltage semiconductor device and fabrication method of the same
12/16/2009CN100570890C Lateral semiconductor device using trench structure and method of manufacturing the same
12/16/2009CN100570889C Structures and methods for manufacturing dislocation free stressed channels in bulk silicon and SOI CMOS devices
12/16/2009CN100570888C Semiconductor device
12/16/2009CN100570886C A structure and the corresponding manufacturing method for reducing the extended electrode capacity of the transistor
12/16/2009CN100570885C Voltage pinch-off device with high breakdown voltage and method for fabricating same
12/16/2009CN100570884C Semiconductor structure and manufacturing method thereof
12/16/2009CN100570881C Image sensor
12/16/2009CN100570880C Method for producing complementary metal-oxide-semiconductor transistor image sensor
12/16/2009CN100570876C Semiconductor structures and methods for fabrication thereof
12/16/2009CN100570873C Capacitor and forming method thereof
12/16/2009CN100570872C Electric signal transmission line
12/16/2009CN100570868C 电路板及其制造方法 The circuit board and its manufacturing method
12/16/2009CN100570864C Pixel structure and its manufacture method
12/16/2009CN100570863C Pixel structure and manufacturing method thereof
12/16/2009CN100570862C Method for fabricating flash memory device
12/16/2009CN100570861C Ferroelectric memory device and method of manufacture of same
12/16/2009CN100570860C Dual stress memory technique method and related semicondutor device
12/16/2009CN100570859C Semiconductor device and method for fabricating the same
12/16/2009CN100570858C Method of manufacturing semiconductor device
12/16/2009CN100570857C Metal oxide semiconductor element and manufacturing method therefor
12/16/2009CN100570856C Device having dual etch stop liner and reformed silicide layer and related methods
12/16/2009CN100570855C Integrate circuit design system and method
12/16/2009CN100570854C Method of formation of a damascene structure utilizing a protective film
12/16/2009CN100570853C Semiconductor component and manufacturing method thereof
12/16/2009CN100570852C Method of forming dual damascene structure of no-etch stop layer
12/16/2009CN100570851C Method of forming bit line of semiconductor device
12/16/2009CN100570850C Method for manufacturing semiconductor device
12/16/2009CN100570849C Shallow groove isolated forming process
12/16/2009CN100570848C Method of manufacturing semiconductor device and processing method for electric connection part
12/16/2009CN100570847C Three-dimensional integrate circuit realization method of transfer-free disc
12/16/2009CN100570846C High, depth and width three-dimensional uprightness interconnect and realization method of three-dimensional integrate circuit
12/16/2009CN100570845C Convex point production method capable of preventing blue film
12/16/2009CN100570844C Package method for multiple chip integrated circuit
12/16/2009CN100570843C A semiconductor package manufacturing method and semiconductor apparatus
12/16/2009CN100570842C Wafer stage package cutting method protecting connection pad
12/16/2009CN100570841C Method of making a circuitized substrate
12/16/2009CN100570840C Method of fabricating semiconductor device with FINFET
12/16/2009CN100570839C Structure of MOS component
12/16/2009CN100570838C Method for preparing power MOS tube capable of improving grid oxic horizon homogeneity
12/16/2009CN100570837C Method for producing semiconductor elements
12/16/2009CN100570836C Polysilicon thin-film transistor and method for producing the same
12/16/2009CN100570835C Metal-insulator-semiconductor device production method
12/16/2009CN100570834C Method for manufacturing display device
12/16/2009CN100570833C Method for producing AlGaN/AlInN composite potential barrier gallium nitride field effect pipe
12/16/2009CN100570832C Method for manufacturing insulated gate bipolar transistor with variable buffer layer concentration inner transparent collecting zone
12/16/2009CN100570831C Apparatus and method for improving silica layer growth on wafer
12/16/2009CN100570830C Method for etching carbon-containing layer and method for manufacturing semiconductor device
12/16/2009CN100570829C Method for controlling aperture difference of different hatches simultaneously and etching technique
12/16/2009CN100570828C Method for etching aluminium nitride thin film micrographics
12/16/2009CN100570827C Polishing slurry and polishing material using same
12/16/2009CN100570826C Polishing mat and method of manufacturing semiconductor device
12/16/2009CN100570825C Method for fabricating semiconductor device with recess gate
12/16/2009CN100570824C Mask and method for forming polycrystalline silicon layer using the same
12/16/2009CN100570823C A method for obtaining low bit discrepancy density extension thin film via using neck down extension
12/16/2009CN100570822C Exposure device, exposing method, and device manufacturing method
12/16/2009CN100570821C Inorganic nanocomposite film and manufacturing method thereof, method for fabricating photovoltaic cell, field effect transistor and manufacturing method thereof
12/16/2009CN100570820C Method for diagnosing electrostatic chuck and vacuum processing apparatus
12/16/2009CN100570819C Two-stage back type etching method
12/16/2009CN100570818C Plasma processing apparatus
12/16/2009CN100570817C Substrate processing apparatus and substrate handling method
12/16/2009CN100570816C Method for processing over etching
12/16/2009CN100570815C Chip bonding machine platform and heating plate thereof
12/16/2009CN100570814C Methods for forming patterns of block copolymers and related semiconductor structure
12/16/2009CN100570813C Method of manufacturing semiconductor device
12/16/2009CN100570780C 外部电极形成方法 The method for forming the external electrodes
12/16/2009CN100570770C Ceramics film and production method therefor, and ferroelectric capacitor, semiconductor device, other elements
12/16/2009CN100570750C Semiconductor memory and preburning test method of semiconductor memory
12/16/2009CN100570684C Organic EL panel
12/16/2009CN100570497C Production of automatic optical approximate correcting regulation
12/16/2009CN100570496C Photo-etching machine silicon slice bench double-bench switching system adopting cross slide rail
12/16/2009CN100570495C Method for testing whether etching solution is valid or not
12/16/2009CN100570494C Lithography
12/16/2009CN100570493C Pattern density control method using edge printing processes
12/16/2009CN100570490C Lithographic apparatus, reticle exchange unit and device manufacturing method
12/16/2009CN100570488C Cooler of static chuck of extreme ultraviolet photolithographic mask platform
12/16/2009CN100570487C Method of determining aberration of a projection system of a lithographic apparatus
12/16/2009CN100570486C Picture drawing device
12/16/2009CN100570485C Two-dimensional nanostructure deep etching method
12/16/2009CN100570484C Coating and developing device, and coating and developing method
12/16/2009CN100570483C Acrylic polymer-containing gap filler forming composition for lithography
12/16/2009CN100570482C Photosensitive resin composition
12/16/2009CN100570480C Method for mask design
12/16/2009CN100570442C Assembling method of liquid-crystal panel
12/16/2009CN100570428C Spatial light modulator using an integrated circuit actuator and method of making and using same