Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
04/2010
04/20/2010US7700411 Semiconductor device package and manufacturing method
04/20/2010US7700410 Chip-in-slot interconnect for 3D chip stacks
04/20/2010US7700409 Method and system for stacking integrated circuits
04/20/2010US7700407 Method of forming a bump-on-lead flip chip interconnection having higher escape routing density
04/20/2010US7700406 Methods of assembling integrated circuit packages
04/20/2010US7700405 Microelectronic assembly with improved isolation voltage performance and a method for forming the same
04/20/2010US7700403 Manufacturing method of semiconductor device
04/20/2010US7700402 Method for production of a film
04/20/2010US7700401 Image sensor and method for manufacturing the same
04/20/2010US7700400 Back junction solar cell and process for producing the same
04/20/2010US7700399 Method of making CMOS image sensor—hybrid silicide
04/20/2010US7700398 Method for fabricating an integrated device comprising a structure with a solid electrolyte
04/20/2010US7700397 Process for packaging components, and packaged components
04/20/2010US7700396 Image sensor and fabricating method thereof
04/20/2010US7700395 Hybrid integration based on wafer-bonding of devices to AlSb monolithically grown on Si
04/20/2010US7700393 Method of manufacturing enhancement type semiconductor probe and information storage device having the semiconductor probe using the same
04/20/2010US7700392 Manufacturing method of semiconductor laser devices and manufacturing apparatus of the same
04/20/2010US7700391 Method of fabricating optical device using multiple sacrificial spacer layers
04/20/2010US7700390 Method for fabricating three-dimensional photonic crystal
04/20/2010US7700389 Method of improving the flatness of a microdisplay surface and method of manufacturing liquid crystal on silicon (LCOS) display panel the same
04/20/2010US7700388 Manufacturing method of pixel structure
04/20/2010US7700387 Method of fabricating optical device using multiple sacrificial spacer layers
04/20/2010US7700386 Packaging method of LED of high heat-conducting efficiency and structure thereof
04/20/2010US7700385 Electro-optical device, method of manufacturing the same, and electronic apparatus
04/20/2010US7700384 Nitride semiconductor light emitting device and manufacturing method thereof
04/20/2010US7700383 Manufacturing method for semiconductor device and determination method for position of semiconductor element
04/20/2010US7700382 Impurity introducing method using optical characteristics to determine annealing conditions
04/20/2010US7700381 Semiconductor wafer with ID mark, equipment for and method of manufacturing semiconductor device from them
04/20/2010US7700380 Surface contamination analyzer for semiconductor wafers, method used therein and process for fabricating semiconductor device
04/20/2010US7700379 Methods of conducting wafer level burn-in of electronic devices
04/20/2010US7700378 Method and system for line-dimension control of an etch process
04/20/2010US7700377 Method for reducing etch-induced process uniformities by omitting deposition of an endpoint detection layer during patterning of stressed overlayers in a semiconductor device
04/20/2010US7700376 Edge temperature compensation in thermal processing particularly useful for SOI wafers
04/20/2010US7700367 ion beams simultaneously sputter etch; scanning ion microscope analysis; semiconductors
04/20/2010US7700362 Method for screening therapeutic agents for disuse muscular atrophy using interaction between selected proteins and a polyubiquitin chain
04/20/2010US7700268 Exposure system and pattern formation method using the same
04/20/2010US7700246 patterned conductive photolithographic film over dielectric layer, which is not removed during development
04/20/2010US7700244 Mask blank providing system, mask blank providing method, mask blank transparent substrate manufacturing method, mask blank manufacturing method, and mask manufacturing method
04/20/2010US7700156 Method and apparatus for forming silicon oxide film
04/20/2010US7700054 Substrate processing apparatus having gas side flow via gas inlet
04/20/2010US7700032 Formation of microspheres through laser irradiation of a surface
04/20/2010US7699998 Method of substantially uniformly etching non-homogeneous substrates
04/20/2010US7699997 Method of reclaiming silicon wafers
04/20/2010US7699945 Performing a treatment on the ruthenium substrate to allow the crystal orientation of the surface, on which the copper film isto be formed, to have a small lattice mismatch with the copper; a film forming rate for a thin film on the base material is increased;improved adhesion; semiconductors
04/20/2010US7699934 Epitaxial wafer production apparatus and susceptor structure
04/20/2010US7699932 Reactors, systems and methods for depositing thin films onto microfeature workpieces
04/20/2010US7699901 Alumina-film-polishing composition and chemical mechanical polishing method using the same
04/20/2010US7699684 CMP porous pad with component-filled pores
04/20/2010US7699574 Work-piece processing system
04/20/2010US7699573 Reticle manipulating device
04/20/2010US7699537 Optical port apparatus and method of making the same
04/20/2010US7699421 Liquid ejecting apparatus
04/20/2010US7699232 Semiconductor device
04/20/2010US7699023 Gas delivery apparatus for atomic layer deposition
04/20/2010US7699022 Device for the zonal surface treatment of an article by dielectric barrier discharge
04/20/2010US7699021 Cluster tool substrate throughput optimization
04/20/2010US7699020 Method and device for applying conductive paste
04/20/2010US7698999 Printing apparatus and device manufacturing method
04/20/2010US7698833 Apparatus for hardening a sealant located between a pair bonded substrates of liquid crystal display device
04/20/2010US7698800 Element arrangement method
04/15/2010WO2010042931A2 Mesa etch method and composition for epitaxial lift off
04/15/2010WO2010042927A2 Continuous feed chemical vapor deposition
04/15/2010WO2010042908A2 System and method for testing an electrostatic chuck
04/15/2010WO2010042907A2 Method of refurbishing bipolar electrostatic chuck
04/15/2010WO2010042883A2 Concentric showerhead for vapor deposition
04/15/2010WO2010042860A2 Rf return path for large plasma processing chamber
04/15/2010WO2010042732A2 Silicon-based nanoscale resistive device with adjustable resistance
04/15/2010WO2010042724A2 Method and apparatus for calibrating optical path degradation useful for decoupled plasma nitridation chambers
04/15/2010WO2010042660A2 Method and apparatus for detecting an idle mode of processing equipment
04/15/2010WO2010042577A2 Advanced platform for processing crystalline silicon solar cells
04/15/2010WO2010042552A2 Selective etching of silicon nitride
04/15/2010WO2010042528A2 A flow control module for a fluid delivery system
04/15/2010WO2010042509A2 Techniques for ion implantation of molecular ions
04/15/2010WO2010042494A2 Reduced implant voltage during ion implantation
04/15/2010WO2010042479A2 Enhancement-mode nitride transistor
04/15/2010WO2010042457A1 Aqueous acidic formulations for copper oxide etch residue removal and prevention of copper electrodeposition
04/15/2010WO2010042448A2 Scissor lift transfer robot
04/15/2010WO2010042410A2 Apparatus for efficient removal of halogen residues from etched substrates
04/15/2010WO2010042380A1 Method of making sub-resolution pillar structures using undercutting technique
04/15/2010WO2010042290A2 Methods of utilizing block copolymer to form patterns
04/15/2010WO2010042289A1 Methods of forming patterns utilizing lithography and spacers
04/15/2010WO2010042265A1 Discontinuous/non-uniform metal cap structure and process for interconnect integration
04/15/2010WO2010042237A2 Method and apparatus for simplified startup of chemical vapor deposition of polysilicon
04/15/2010WO2010042209A1 Process for structuring silicon
04/15/2010WO2010042183A2 Method and apparatus for circuit simulation
04/15/2010WO2010042121A1 Method for contact formation in semiconductor device
04/15/2010WO2010042119A1 Semiconductor device having grooved leads to confine solder wicking
04/15/2010WO2010042117A1 Dual capillary wirebonding
04/15/2010WO2010042076A1 A method for forming metal capped substrate imprints
04/15/2010WO2010041740A1 Semiconductor device manufacturing method
04/15/2010WO2010041719A1 Storage element
04/15/2010WO2010041679A1 High-frequency plasma cvd device, high-frequency plasma cvd method, and semiconductor thin film manufacturing method
04/15/2010WO2010041632A1 Semiconductor device
04/15/2010WO2010041610A1 Electronic component mounting device and mounting method
04/15/2010WO2010041609A1 Process for production of synthetic quartz glass
04/15/2010WO2010041596A1 Pattern-searching condition determining method, and pattern-searching condition setting device
04/15/2010WO2010041562A1 Substrate transfer robot and system
04/15/2010WO2010041522A1 Illumination optical system, aligner, and process for fabricating device
04/15/2010WO2010041510A1 Flexible conductor-clad laminate, flexible printed wiring board for cof, and methods for manufacturing same
04/15/2010WO2010041492A1 Glass substrate packaging device and glass substrate packaging method
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