Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
04/2010
04/13/2010US7694651 High velocity method for deposing diamond films from a gaseous phase in SHF discharge plasma and device for carrying out said method
04/13/2010US7694650 Exhaust monitoring cup
04/13/2010US7694647 Cluster tool architecture for processing a substrate
04/13/2010CA2452656C A method of depositing an inorganic film on an organic polymer
04/13/2010CA2436424C Method for thermally treating substrates
04/08/2010WO2010040121A1 Production process for surface-mounting ceramic led package, surface-mounting ceramic led package produced by said production process, and mold for producing said package
04/08/2010WO2010040100A2 Methods for preparing nanocrystals using electron transfer agents
04/08/2010WO2010040032A2 Methods for preparation of znte nanocrystals
04/08/2010WO2010040011A2 Vapor phase epitaxy system
04/08/2010WO2010039936A2 Use of surfactant/defoamer mixtures for enhanced metals loading and surface passivation of silicon substrates
04/08/2010WO2010039883A2 Multi-electrode pecvd source
04/08/2010WO2010039810A2 Solute stabilization of sheets formed from a melt
04/08/2010WO2010039807A2 Thermal modulation of implant process
04/08/2010WO2010039760A2 Lavacoat pre-clean and pre-heat
04/08/2010WO2010039695A2 Platen cooling mechanism for cryogenic ion implanting
04/08/2010WO2010039689A2 Fluid delivery mechanism for vaccum wafer processing system
04/08/2010WO2010039672A2 Platen cooling mechanism for cryogenic ion implanting
04/08/2010WO2010039629A2 Method of patterning a metal on a vertical sidewall of an excavated feature, method of forming an embedded mim capacitor using same, and embedded memory device produced thereby
04/08/2010WO2010039520A2 Methods for simultaneously forming n-type and p-type doped regions using non-contact printing processes
04/08/2010WO2010039462A2 Balanced purge slit valve
04/08/2010WO2010039444A2 Process/design methodology to enable high performance logic and analog circuits using a single process
04/08/2010WO2010039410A2 Brush box cleaner with force control
04/08/2010WO2010039409A2 Apparatus and method for cleaning semiconductor substrate using pressurized fluid
04/08/2010WO2010039363A2 Methods for forming silicon nitride based film or silicon carbon based film
04/08/2010WO2010039284A1 Silicon carbide barrier diode
04/08/2010WO2010039231A1 Cmos device comprising nmos transistors and pmos transistors having increased strain-inducing sources and closely spaced metal silicide regions
04/08/2010WO2010039208A2 Guard ring structures and method of fabricating thereof
04/08/2010WO2010039207A2 Semiconductor structure with an electric field stop layer for improved edge termination capability
04/08/2010WO2010039177A2 A semiconductor device having a multi-layer substrate and a method of forming the semiconductor device
04/08/2010WO2010038972A2 Source gas supply apparatus
04/08/2010WO2010038963A2 Apparatus for manufacturing a stratified structure
04/08/2010WO2010038954A2 Transparent conductive film, and transparent electrode comprising same
04/08/2010WO2010038949A2 Space transformer comprising an isolation resistor for a probe card, and method for manufacturing same
04/08/2010WO2010038900A1 Silicon oxide film, method for forming silicon oxide film, and plasma cvd apparatus
04/08/2010WO2010038894A1 Treatment method using plasma
04/08/2010WO2010038888A1 Silicon oxynitride film and process for production thereof, computer-readable storage medium, and plasma cvd device
04/08/2010WO2010038887A1 Silicon dioxide film and process for production thereof, computer-readable storage medium, and plasma cvd device
04/08/2010WO2010038886A1 Method for depositing silicon nitride film, computer-readable storage medium, and plasma cvd device
04/08/2010WO2010038885A1 Silicon nitride film and process for production thereof, computer-readable storage medium, and plasma cvd device
04/08/2010WO2010038883A1 Defect observation device and defect observation method
04/08/2010WO2010038871A1 Semiconductor device
04/08/2010WO2010038823A1 Screening method employed in magnetoresistive storage device, and magnetoresistive storage device
04/08/2010WO2010038819A1 Display device
04/08/2010WO2010038788A1 Current control element and method for manufacturing the current control element
04/08/2010WO2010038780A1 Exposure apparatus, supporting apparatus, and device manufacturing method
04/08/2010WO2010038742A1 Crosslinking agent, negative resist composition, and pattern forming method using the negative resist composition
04/08/2010WO2010038740A1 Method for manufacturing semiconductor light-emitting element
04/08/2010WO2010038735A1 Substrate detection device and method
04/08/2010WO2010038734A1 Film forming apparatus
04/08/2010WO2010038729A1 Plasma processing apparatus
04/08/2010WO2010038717A1 Method for manufacturing functional device, and method for manufacturing semiconductor device provided with functional device
04/08/2010WO2010038712A1 Semiconductor device
04/08/2010WO2010038706A1 Polishing liquid and polishing method
04/08/2010WO2010038674A1 Method for detecting abnormal placement state of substrate, substrate processing method, computer-readable storage medium and substrate processing apparatus
04/08/2010WO2010038660A1 Resin sealing compression molding method for electronic component and device therefor
04/08/2010WO2010038654A1 Method and apparatus for forming silicon oxide film
04/08/2010WO2010038642A1 High-purity copper or high-purity copper alloy sputtering target, process for manufacturing the sputtering target, and high-purity copper or high-purity copper alloy sputtered film
04/08/2010WO2010038612A1 Semiconductor manufacturing plant
04/08/2010WO2010038600A1 Semiconductor device
04/08/2010WO2010038599A1 Semiconductor device
04/08/2010WO2010038581A1 Semiconductor device
04/08/2010WO2010038574A1 Acrylic dielectric adhesive
04/08/2010WO2010038570A1 Functional layer manufacturing method, functional layer and electronic device
04/08/2010WO2010038566A1 Thin film transistor and method for manufacturing same
04/08/2010WO2010038553A1 Substrate storing tray
04/08/2010WO2010038547A1 Silicon carbide semiconductor device
04/08/2010WO2010038533A1 Apparatus and method for inspecting an object surface defect
04/08/2010WO2010038515A1 Vaporizer and deposition system using the same
04/08/2010WO2010038511A1 Display panel and display device using the same
04/08/2010WO2010038487A1 Wafer bonding apparatus and wafer bonding method
04/08/2010WO2010038464A1 Semiconductor substrate, electronic device and method for manufacturing semiconductor substrate
04/08/2010WO2010038463A1 Semiconductor substrate, electronic device and method for manufacturing semiconductor substrate
04/08/2010WO2010038462A1 Semiconductor device wafer,semiconductor device, design system, manufacturing method and design method
04/08/2010WO2010038461A1 Semiconductor substrate, electronic device and method for manufacturing semiconductor substrate
04/08/2010WO2010038460A1 Semiconductor substrate, electronic device and method for manufacturing semiconductor substrate
04/08/2010WO2010038454A1 Alignment apparatus and alignment method
04/08/2010WO2010038452A1 Leadframe substrate and method for manufacturing same, and semiconductor device
04/08/2010WO2010038450A1 Leadframe substrate and method for manufacturing same
04/08/2010WO2010038445A1 Photomask blank, photomask, process for producing same, and process for producing semiconductor device
04/08/2010WO2010038444A1 Photomask blank, photomask, and process for producing same
04/08/2010WO2010038433A1 Method for manufacturing probe card, probe card, method for manufacturing semiconductor device, and method for forming probe
04/08/2010WO2010038426A1 Arrangement constitution of floating gate type nonvolatile memory
04/08/2010WO2010038425A1 Pressure bonding device and pressure bonding method
04/08/2010WO2010038419A1 Semiconductor device, method for manufacturing same and display device
04/08/2010WO2010038407A1 Silicon carbide single crystal substrate
04/08/2010WO2010038372A1 Surface treatment apparatus
04/08/2010WO2010038371A1 Surface processing apparatus
04/08/2010WO2010038369A1 Diagnosis device of recipe used for scanning electron microscope
04/08/2010WO2010038368A1 Method for measuring sample and measurement device
04/08/2010WO2010038340A1 Resist material and pattern forming method using the same
04/08/2010WO2010038330A1 Semiconductor integrated circuit and electronic device
04/08/2010WO2010038272A1 Substrate holder holding apparatus and substrate holder storing chamber
04/08/2010WO2010038186A2 Lead-free solder bump
04/08/2010WO2010038150A1 Semiconductor device
04/08/2010WO2010037787A1 High temperature-resistant narrow band optical filter
04/08/2010WO2010037739A1 Method for chemically treating a substrate
04/08/2010WO2010037577A1 Dislocation engineering using a scanned laser
04/08/2010WO2010037572A1 Selective chemical etch method for mram freelayers
04/08/2010WO2010037559A1 Method and device for measuring physical parameters
04/08/2010WO2010037523A1 A transistor with embedded si/ge material having reduced offset to the channel region
1 ... 1844 1845 1846 1847 1848 1849 1850 1851 1852 1853 1854 1855 1856 1857 1858 1859 1860 1861 1862 1863 1864 ... 6590