Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
04/2010
04/08/2010US20100084761 Semiconductor device and fabrication method of the same
04/08/2010US20100084760 Semiconductor device and method for manufacturing same
04/08/2010US20100084755 Semiconductor Chip Package System Vertical Interconnect
04/08/2010US20100084752 Systems and methods for implementing a wafer level hermetic interface chip
04/08/2010US20100084749 Package and fabricating method thereof
04/08/2010US20100084748 Thin foil for use in packaging integrated circuits
04/08/2010US20100084746 Process for producing laminated substrate and laminated substrate
04/08/2010US20100084744 Thermal processing of substrates with pre- and post-spike temperature control
04/08/2010US20100084743 Method for reducing crystal defect of simox wafer and simox wafer
04/08/2010US20100084742 Method for manufacturing semiconductor epitaxial crystal substrate
04/08/2010US20100084741 Integrated Circuit
04/08/2010US20100084739 Semiconductor device and method of manufacturing the same
04/08/2010US20100084735 Semiconductor assembly and method for forming seal ring
04/08/2010US20100084734 Manufacturing method of semiconductor substrate and semiconductor device
04/08/2010US20100084733 Isolation layer of semiconductor device and manufacturing method thereof
04/08/2010US20100084732 Semiconductor Device and Method of Manufacturing the Same
04/08/2010US20100084727 Printed wiring board, a method of manufacturing printed wiring board, a sensor module, and a sensing device
04/08/2010US20100084723 Mems structure and method of manufacturing the same
04/08/2010US20100084722 Method for manufacturing a micromechanical chip and a component having a chip of this type
04/08/2010US20100084720 Gate in semiconductor device and method of fabricating the same
04/08/2010US20100084719 transistor performance with metal gate
04/08/2010US20100084718 Advanced metal gate method and device
04/08/2010US20100084713 Semiconductor device manufacturing method and semiconductor device
04/08/2010US20100084712 Multiple spacer and carbon implant comprising process and semiconductor devices therefrom
04/08/2010US20100084711 Electrostatic discharge projection semiconductor device and method for manufacturing the same
04/08/2010US20100084709 Semiconductor device and method for manufacturing same
04/08/2010US20100084708 Semiconductor device and method of manufacturing the same
04/08/2010US20100084707 Polysilicon control etch-back indicator
04/08/2010US20100084706 Power Semiconductor Devices and Methods of Manufacture
04/08/2010US20100084705 Semiconductor devices having reduced gate-drain capacitance and methods for the fabrication thereof
04/08/2010US20100084702 Nonvolatile semiconductor memory device and method of manufacturing the same
04/08/2010US20100084701 Semiconductor device and a method of manufacturing the same
04/08/2010US20100084700 EEPROM and Method for Manufacturing EEPROM
04/08/2010US20100084699 Flotox-type eeprom and method for manufacturing the same
04/08/2010US20100084698 Semiconductor device having plural dram memory cells and a logic circuit and method for manufacturing the same
04/08/2010US20100084696 Ferroelectric memory device
04/08/2010US20100084695 Method of fabricating cmos image sensor
04/08/2010US20100084694 Image sensor module and method of manufacturing the same
04/08/2010US20100084693 Method of Forming a Semiconductor Device and Semiconductor Device Thereof
04/08/2010US20100084691 Semiconductor component with stress-absorbing semiconductor layer, and associated fabrication method
04/08/2010US20100084688 Enhancement-mode nitride transistor
04/08/2010US20100084687 Aluminum gallium nitride/gallium nitride high electron mobility transistors
04/08/2010US20100084685 Semiconductor device and manufacturing method thereof
04/08/2010US20100084683 Light emitting diode package and fabricating method thereof
04/08/2010US20100084682 Ohmic electrode and method thereof, semiconductor light emitting element having this
04/08/2010US20100084679 Light-emitting device
04/08/2010US20100084676 Organic el display device and manufacturing method thereof
04/08/2010US20100084669 Light emitting device and method for manufacturing same
04/08/2010US20100084668 Semiconductor color-tunable broadband light sources and full-color microdisplays
04/08/2010US20100084664 Zinc sulfide substrates for group iii-nitride epitaxy and group iii-nitride devices
04/08/2010US20100084662 Semiconductor structure processing using multiple laser beam spots overlapping lengthwise on a structure
04/08/2010US20100084661 Display substrate, method of manufacturing the same, and display apparatus having the same
04/08/2010US20100084656 Particle emission analysis for semiconductor fabrication steps
04/08/2010US20100084655 Field effect transistor and process for production thereof
04/08/2010US20100084649 Oxide thin film transistor and method of fabricating the same
04/08/2010US20100084648 Light-emitting apparatus and production method thereof
04/08/2010US20100084631 Phase-controlled field effect transistor device and method for manufacturing thereof
04/08/2010US20100084629 Quantum dot-metal oxide complex, method of preparing the same, and light-emitting device comprising the same
04/08/2010US20100084626 Electronic device comprising a convertible structure, and a method of manufacturing an electronic device
04/08/2010US20100084624 Dielectric mesh isolated phase change structure for phase change memory
04/08/2010US20100084613 Semiconductor doping process
04/08/2010US20100084556 Optical-infrared composite sensor and method of fabricating the same
04/08/2010US20100084375 Method of producing a reflective mask
04/08/2010US20100084096 Tape adhering apparatus and tape adhering method
04/08/2010US20100084094 Pulsed Etching Cooling
04/08/2010US20100083982 Particle removal apparatus and method and plasma processing apparatus
04/08/2010US20100083755 Mechanical quantity sensor and method of manufacturing the same
04/08/2010US20100083494 Bonding Tool for Mounting Semiconductor Chips
04/08/2010DE19801096B4 Integrierte Halbleiterschaltung mit Grabenisolation A semiconductor integrated circuit with grave insulation
04/08/2010DE112007003452T5 Verfahren und Gerät zum Abbilden eines sich bewegenden Objekts A method and device for imaging a moving object
04/08/2010DE112007002927T5 Fehlerdetektionsvorrichtung, Fehlerdetektionsverfahren, Informationsverarbeitungsvorrichtung, Informationsverarbeitungsverfahren und Programm dafür Error detection device, error detection method, information processing apparatus, information processing method, and program thereof
04/08/2010DE112006001751B4 Leistungs-Halbleiterbauteil und Verfahren zu Herstellung eines Halbleiterbauteils Power semiconductor component and process for producing a semiconductor device
04/08/2010DE112005001828B4 Verfahren zum Herstellen von Halbleiterbauelementen mit planarisieren einer Halbleiterstruktur zum Ausbilden von Austauschmetallgates sowie entsprechende Halbleiterstruktur A process for producing semiconductor devices with planarize a semiconductor structure for forming metal gates as well as exchange of corresponding semiconductor structure
04/08/2010DE112005000665B4 Ladungseinfangende Speicherzellenanordnung und Herstellungsverfahren Charge trapping memory cell array and manufacturing method
04/08/2010DE112005000375B4 Vakuumraummodul für Schablonenrakelanordnung, Schablonendrucker und Verfahren zum Reinigen einer Schablone Vacuum space module for stencil wiper assembly, screen printer and method for cleaning a template
04/08/2010DE112004000586B4 Fin Fet-Bauelement und Verfahren zur Herstellung von Strukturen in Fin Fet-Bauelementen Fin FET device and method for the production of structures in Fin FET devices
04/08/2010DE10361257B4 Verfahren zur Herstellung von feinen Mustern A process for producing fine patterns
04/08/2010DE10354939B4 Verfahren zur Zuverlässigkeitsprüfung eines Bauelements einer Schaltung A method for reliability testing of a component of a circuit
04/08/2010DE10354814B4 Verfahren zum Bilden einer Gate-Elektrode in einem Halbleiterbauelement A method of forming a gate electrode in a semiconductor device
04/08/2010DE10296953B4 Herstellungsverfahren für einen Doppelgatetransistor Manufacturing method for a double-gate transistor
04/08/2010DE10296328B4 Prozesslinie und Verfahren zum Steuern eines Ätzprozesses Process line and method for controlling an etching process
04/08/2010DE10257707B4 Verfahren zum Herstellen eines gestapelten Chip-Paketes A method of manufacturing a stacked chip package
04/08/2010DE102009043457A1 Integrierte Schaltungsanordnung und Verfahren zum Verkapseln einer Halbleitervorrichtung An integrated circuit device and method for encapsulating a semiconductor device
04/08/2010DE102009042711A1 Halbleiterbauelement mit Kanalstoppgraben und verfahren Semiconductor device with channel stop digging and procedural
04/08/2010DE102009040627A1 Verfahren zum Herstellen eines elektronischen Systems A method of manufacturing an electronic system
04/08/2010DE102009040556A1 Beschichtungszusammensetzung und Beschichtungsverfahren Coating composition and coating process
04/08/2010DE102009040176A1 Halbleiter-Bauelement Semiconductor component
04/08/2010DE102009038713A1 Elektronikbauelement und Verfahren zu dessen Herstellung An electronics device and process for its preparation
04/08/2010DE102009037418A1 Verfahren zum Ausbilden einer Metallleitung eines Induktors A method of forming a metal line of an inducer
04/08/2010DE102009029692A1 Robustes Leistungshalbleiterbauelement Robust power semiconductor component
04/08/2010DE102009029643A1 MOS-Transistor mit erhöhter Gate-Drain-Kapazität MOS transistor with an increased gate-drain capacitance
04/08/2010DE102009029154A1 Trägerbearbeitungsvorrichtung Beam machining apparatus
04/08/2010DE102008049774A1 Prozessinterne Überwachung der Metallkontamination während der Bearbeitung von Mikrostrukturen In-process monitoring of metal contamination during processing of microstructures
04/08/2010DE102008049725A1 CMOS-Bauelement mit NMOS-Transistoren und PMOS-Transistoren mit stärkeren verformungsinduzierenden Quellen und Metallsilizidgebieten mit geringem Abstand CMOS device with NMOS transistors and PMOS transistors with increased strain-inducing source and metal silicide at a small distance
04/08/2010DE102008049723A1 Transistor mit eingebettetem Si/Ge-Material mit einer besseren substratüberspannenden Gleichmäßigkeit Transistor with embedded Si / Ge material with a better substrate spanning uniformity
04/08/2010DE102008049719A1 Asymmetrische Transistorbauelemente, die durch asymmetrische Abstandshalter und eine geeignete Implantation hergestellt sind Asymmetric transistor devices which are prepared by asymmetric spacer and a suitable implantation
04/08/2010DE102008049678A1 Thyristor mit kathodenseitiger Feldstoppzone und Verfahren zur Herstellung eines Thyristors mit kathodenseitiger Feldstoppzone Thyristor with cathode-side field stop zone and method for manufacturing a thyristor with a cathode-side field stop zone
04/08/2010DE102008049175B3 Method for treating a surface of silicon carbide substrate for epitaxial layer growth on the treated silicon carbide surface, comprises applying polishing slurry containing calcium fluoride particles and/or oxidation agent, on the surface
04/08/2010DE102008048834A1 Vorrichtung zum Prüfen von Solarzellen A device for testing solar cells
04/08/2010DE102008048498A1 Verfahren zum Herstellen eines Halbleiterbauelementes, insbesondere einer Solarzelle, auf Basis einer Siliziumdünnschicht A method of manufacturing a semiconductor device, in particular a solar cell, based on a silicon thin film