Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
01/2011
01/13/2011WO2011005055A2 Wafer drying device and a wafer drying method employing the same
01/13/2011WO2011004991A1 Wide area stamp for antireflective surface
01/13/2011WO2011004987A2 Substrate-processing apparatus and substrate-processing method for selectively inserting diffusion plates
01/13/2011WO2011004956A1 Probe card
01/13/2011WO2011004945A1 Semiconductor device having stacked array structure, nand flash memory array using same and manufacturing method therefor
01/13/2011WO2011004942A1 Wafer cleaning apparatus and wafer cleaning method using the same
01/13/2011WO2011004904A1 Method for producing group iii metal nitride single crystal
01/13/2011WO2011004891A1 Magnetization-reversing apparatus, memory element, and magnetic field-generating apparatus
01/13/2011WO2011004874A1 Anti-fuse element
01/13/2011WO2011004850A1 Euv-lithography reflection-type mask blank
01/13/2011WO2011004825A1 Wafer-pasting adhesive sheet and wafer processing method using the same
01/13/2011WO2011004816A1 Microwave plasma-treatment apparatus and dielectric plate
01/13/2011WO2011004815A1 Heat exchanger, x-ray examination method for power module provided with said heat exchanger and jig used in said method
01/13/2011WO2011004803A1 Coil component
01/13/2011WO2011004793A1 Polishing liquid composition for silicon wafers
01/13/2011WO2011004770A1 Etching method and etching treatment apparatus
01/13/2011WO2011004769A1 Etching device and substrate processing method
01/13/2011WO2011004755A1 Semiconductor device and method for manufacturing the same
01/13/2011WO2011004746A1 Method for manufacturing semiconductor device
01/13/2011WO2011004729A1 Substrate-storing container
01/13/2011WO2011004724A1 Method for manufacturing semiconductor device
01/13/2011WO2011004723A1 Semiconductor device and manufacturing method the same
01/13/2011WO2011004721A1 Composition for forming resist underlayer film and method for forming resist pattern using same
01/13/2011WO2011004717A1 Contact-hole forming method
01/13/2011WO2011004712A1 Vapor phase growth device and vapor phase growth method
01/13/2011WO2011004706A1 Adhesive composition, adhesive sheet, circuit board and semiconductor device both produced using these, and processes for producing these
01/13/2011WO2011004681A1 Electronic circuit device
01/13/2011WO2011004670A1 Semiconductor device
01/13/2011WO2011004659A1 Film for semiconductor and semiconductor device manufacturing method
01/13/2011WO2011004658A1 Film for semiconductor and semiconductor device manufacturing method
01/13/2011WO2011004657A1 Film for semiconductor and semiconductor device manufacturing method
01/13/2011WO2011004624A1 Thin-film transistor producing method
01/13/2011WO2011004621A1 Vacuum processing apparatus
01/13/2011WO2011004617A1 Bonding apparatus and method of correcting bonding position in bonding apparatus
01/13/2011WO2011004602A1 Epitaxial wafer and method of producing same
01/13/2011WO2011004573A1 Alkali-soluble resin, positive photosensitive resin composition, cured film, protective film, insulating film, and semiconductor device and display device using the cured film
01/13/2011WO2011004544A1 Component mounting apparatus and method thereof
01/13/2011WO2011004542A1 Electronic component unit and reinforcement adhesive
01/13/2011WO2011004535A1 Field-effect transistor
01/13/2011WO2011004533A1 Charged particle beam device
01/13/2011WO2011004528A1 Pattern formation method
01/13/2011WO2011004527A1 Chemically amplified resist material and pattern formation method using same
01/13/2011WO2011004474A1 Semiconductor device and method for manufacturing the semiconductor device
01/13/2011WO2011004469A1 Semiconductor device and method for manufacturing same
01/13/2011WO2011004099A1 System for converting energy with an enhanced electric field
01/13/2011WO2011003910A1 Method for producing an integrated circuit and resulting foil chip
01/13/2011WO2011003880A2 Method and device for treating substrates
01/13/2011WO2011003484A1 Damaged substrate handling apparatus and method for substrate processing systems
01/13/2011WO2011003366A1 Method for forming substrate with insulating buried layer
01/13/2011WO2010132181A3 Polishing head zone boundary smoothing
01/13/2011WO2010129137A3 Methods of forming a plurality of conductive lines in the fabrication of integrated circuitry, methods of forming an array of conductive lines, and integrated circuitry
01/13/2011WO2010129115A3 Apparatus and system for cleaning substrate
01/13/2011WO2010126698A3 Modeling critical-dimension (cd) scanning-electron-microscopy (cd-sem) cd extraction
01/13/2011WO2010126675A3 Selective etching of reactor surfaces
01/13/2011WO2010126665A3 Doping of semiconductor layer for improved efficiency of semiconductor structures
01/13/2011WO2010123829A3 Fiber laser substrate processing
01/13/2011WO2010123772A3 Led substrate processing
01/13/2011WO2010123707A3 Enhanced scavenging of residual fluorine radicals using silicon coating on process chamber walls
01/13/2011WO2010123680A3 Wafer processing deposition shielding components
01/13/2011WO2010121112A3 Method and apparatus for residue detection in the edge deleted area of a substrate
01/13/2011WO2010121068A3 Improved apparatus for temporary wafer bonding and debonding
01/13/2011WO2010120983A3 Removal of charge between a substrate and an electrostatic clamp
01/13/2011WO2010120956A3 Wafer manufacturing cleaning apparatus, process and method of use
01/13/2011WO2010120778A3 Chemical mechanical fabrication (cmf) for forming tilted surface features
01/13/2011WO2010120650A3 Optical sensors and methods for providing optical sensors
01/13/2011WO2010120569A3 Conjugated icp and ecr plasma sources for wide ribbon ion beam generation and control
01/13/2011WO2010120491A3 Self-cleaning wiresaw apparatus and method
01/13/2011WO2010120473A3 Conductive bumps, wire loops, and methods of forming the same
01/13/2011WO2010120428A3 Robust esd protection circuit, method and design structure for tolerant and failsafe designs
01/13/2011WO2010120423A3 Field effect transistor having a plurality of field plates
01/13/2011WO2010118380A3 Resistive-switching memory elements having improved switching characteristics
01/13/2011WO2010118237A3 Techniques for processing a substrate
01/13/2011WO2010118109A3 Strontium ruthenium oxide interface
01/13/2011WO2010117971A3 Grounded confinement ring having large surface area
01/13/2011WO2010117970A3 Multifrequency capacitively coupled plasma etch chamber
01/13/2011WO2010117969A3 Modulated multi-frequency processing method
01/13/2011WO2010117964A3 Method for low-k dielectric etch with reduced damage
01/13/2011WO2010117818A3 Controlled localized defect paths for resistive memories
01/13/2011WO2010117776A3 Patterning via optical-saturable transitions
01/13/2011WO2010117718A3 Dual sided workpiece handling
01/13/2011WO2010117703A3 Method of selective nitridation
01/13/2011WO2010115171A3 Carbon nanotube contact structures for use with semiconductor dies and other electronic devices
01/13/2011WO2010115128A3 High pressure rf-dc sputtering and methods to improve film uniformity and step-coverage of this process
01/13/2011WO2010115114A3 Enhanced etch deposition profile control using plasma sheath engineering
01/13/2011WO2010115110A3 Plasma processing apparatus
01/13/2011WO2010114954A3 End terminations for electrodes used in ion implantation systems
01/13/2011WO2010114823A3 Sputtering target for pvd chamber
01/13/2011WO2010111632A3 Method for laser singulation of chip scale packages on glass substrates
01/13/2011WO2010111590A3 System and method for improved testing of electronic devices
01/13/2011WO2010111286A3 High temperature thin film transistor on soda lime glass
01/13/2011WO2010111055A3 Anchoring inserts, electrode assemblies, and plasma processing chambers
01/13/2011WO2010107843A3 Reactor lid assembly for vapor deposition
01/13/2011WO2010107842A3 Showerhead for vapor deposition
01/13/2011WO2010107839A3 Heating lamp system and methods thereof
01/13/2011WO2010107837A3 Wafer carrier track
01/13/2011WO2010107835A3 Vapor deposition reactor system and methods thereof
01/13/2011WO2010107616A3 System and method for characterizing solar cell conversion performance and detecting defects in a solar cell
01/13/2011WO2010105091A3 Large area dissolvable template lithography
01/13/2011WO2010105077A3 Minimizing magnetron substrate interaction in large area sputter coating equipment
01/13/2011WO2010104990A3 Pin electronics liquid cooled multi-module for high performance, low cost automated test equipment