Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
01/2011
01/20/2011WO2011008937A2 Conductive heating
01/20/2011WO2011008925A2 Methods for forming dielectric layers
01/20/2011WO2011008919A1 High-gain wide bandgap darlington transistors and related methods of fabrication
01/20/2011WO2011008918A2 Grooved cmp polishing pad
01/20/2011WO2011008895A1 Semiconductor-on-insulator with back side body connection
01/20/2011WO2011008894A2 Semiconductor-on-insulator with back side support layer
01/20/2011WO2011008893A1 Semiconductor-on-insulator with backside heat dissipation
01/20/2011WO2011008805A2 Processing chamber with translating wear plate for lift pin
01/20/2011WO2011008762A2 Storage device testing system cooling
01/20/2011WO2011008759A1 Interconnect assemblies and methods of making and using same
01/20/2011WO2011008753A1 Chimerized wafer boats for use in semiconductor chip processing and related methods
01/20/2011WO2011008717A2 Integrated power supplies and combined high-side plus low-side switches
01/20/2011WO2011008703A2 Plasma processing chamber with enhanced gas delivery
01/20/2011WO2011008688A2 Scanner performance comparison and matching using design and defect data
01/20/2011WO2011008531A2 Enhancement mode hemt for digital and analog applications
01/20/2011WO2011008499A2 Leak proof pad for cmp endpoint detection
01/20/2011WO2011008478A2 System and method for performing photothermal measurements and relaxation compensation
01/20/2011WO2011008456A2 Methods of forming oxide layers on substrates
01/20/2011WO2011008401A1 Uniform high-k metal gate stacks by adjusting threshold voltage for sophisticated transistors by diffusing a metal species prior to gate patterning
01/20/2011WO2011008376A2 Determining plasma processing system readiness without generating plasma
01/20/2011WO2011008359A2 Scaling of bipolar transistors
01/20/2011WO2011008212A1 Electroless deposition solutions and process control
01/20/2011WO2011008070A1 Cantilever microvalve structure and method of fabricating same
01/20/2011WO2011008015A2 Wafer-dicing method
01/20/2011WO2011007967A2 Apparatus for manufacturing semiconductors
01/20/2011WO2011007898A1 Semiconductor device and data transfer method in semiconductor device
01/20/2011WO2011007834A1 Film-forming apparatus and film-forming method
01/20/2011WO2011007832A1 Film-forming apparatus
01/20/2011WO2011007831A1 Film-forming apparatus
01/20/2011WO2011007830A1 Film-forming apparatus
01/20/2011WO2011007800A1 Mask blank and transfer mask
01/20/2011WO2011007780A1 Radiation-sensitive resin composition and compound
01/20/2011WO2011007777A1 Group iii nitride semiconductor optical element and epitaxial substrate
01/20/2011WO2011007776A1 Group-iii nitride semiconductor element, epitaxial substrate, and method for fabricating a group-iii nitride semiconductor element
01/20/2011WO2011007754A1 Vapor phase growth device
01/20/2011WO2011007753A1 Substrate processing device
01/20/2011WO2011007745A1 Microwave plasma processing device and microwave plasma processing method
01/20/2011WO2011007732A1 Adhesive sheet and method for manufacturing adhesive sheets
01/20/2011WO2011007711A1 Thin-film transistor, display device, and manufacturing method for thin-film transistors
01/20/2011WO2011007709A1 Film-forming method
01/20/2011WO2011007699A1 Semiconductor device manufacturing method and semiconductor integrated circuit device
01/20/2011WO2011007682A1 Method of manufacturing semiconductor device
01/20/2011WO2011007678A1 Epitaxial silicon wafer and method for manufacturing same
01/20/2011WO2011007677A1 Semiconductor device and method for manufacturing the same
01/20/2011WO2011007675A1 Semiconductor device and manufacturing method thereof
01/20/2011WO2011007663A1 Irradiation device
01/20/2011WO2011007621A1 Light emitting device
01/20/2011WO2011007616A1 Support device and drying device provided with said support device
01/20/2011WO2011007588A1 Cmp fluid and method for polishing palladium
01/20/2011WO2011007580A1 Substrate processing method
01/20/2011WO2011007555A1 Epitaxial substrate for electronic device using transverse direction as direction of current conduction and manufacturing method therefor
01/20/2011WO2011007546A1 Ion-beam generating device, substrate processing device, and manufacturing method of electronic device
01/20/2011WO2011007531A1 Method for manufacturing electronic component and electronic component
01/20/2011WO2011007519A1 Module component and mehtod for manufacturing same
01/20/2011WO2011007517A1 Specimen potential measuring method, and charged particle beam device
01/20/2011WO2011007516A1 Scanning electron microscope device and pattern dimension measuring method using same
01/20/2011WO2011007494A1 Method for manufacturing semiconductor epitaxial wafer, and semiconductor epitaxial wafer
01/20/2011WO2011007483A1 Vertical transistor, manufacturing method therefor, and semiconductor device
01/20/2011WO2011007472A1 Manufacturing method for semiconductor device
01/20/2011WO2011007470A1 Semiconductor device and method for manufacturing same
01/20/2011WO2011007469A1 Semiconductor device and method for producing the same
01/20/2011WO2011007398A1 Pickup apparatus
01/20/2011WO2011007397A1 Re-sticking apparatus and sorting re-sticking method
01/20/2011WO2011007387A1 Power semiconductor device and method for manufacturing the power semiconductor device
01/20/2011WO2011007287A2 Method for drying a semiconductor wafer
01/20/2011WO2011006975A1 Method for calibrating an annealing furnace and germanium recrystallization using such a method
01/20/2011WO2011006687A1 Inspection system
01/20/2011WO2011006662A1 Carrierless handling system
01/20/2011WO2011006349A1 Cleaning solution for plasma etching residues
01/20/2011WO2011006348A1 Chemical mechanical polishing liquid
01/20/2011WO2011006347A1 Chemical mechanical polishing liquid
01/20/2011WO2010135168A3 Method for providing electrical connections to spaced conductive lines
01/20/2011WO2010134691A3 Method for manufacturing polycrystalline silicon thin film
01/20/2011WO2010134645A3 Exposure apparatus, exposure method, and device manufacturing method
01/20/2011WO2010129134A3 Method and apparatus for an improved filled via
01/20/2011WO2010126254A3 Source supplying unit, thin film depositing apparatus, and method for depositing thin film
01/20/2011WO2010124213A3 A method for processing a substrate having a non-planar substrate surface
01/20/2011WO2010124179A3 Dicing before grinding process for preparation of semiconductor
01/20/2011WO2010124174A3 Ampoule with integrated hybrid valve
01/20/2011WO2010123877A3 Cvd apparatus for improved film thickness non-uniformity and particle performance
01/20/2011WO2010123765A3 Thin bond line semiconductor packages
01/20/2011WO2010123711A3 Substrate cool down control
01/20/2011WO2010121029A3 Cyclic self-limiting cmp removal and associated processing tool
01/20/2011WO2010120664A3 Ldmos with self aligned vertical ldd and backside drain
01/20/2011WO2010120145A3 Solar cell ac electroluminescence image inspecting apparatus
01/20/2011WO2010118295A3 Hvpe precursor source hardware
01/20/2011WO2010118293A3 Hvpe chamber hardware
01/20/2011WO2010118234A3 Techniques for processing a substrate
01/20/2011WO2010118231A3 Techniques for processing a substrate
01/20/2011WO2010118219A3 Methods and apparatus for treating effluent
01/20/2011WO2010111601A3 Methods of forming printable integrated circuit devices and devices formed thereby
01/20/2011WO2010111291A3 Point of use recycling system for cmp slurry
01/20/2011WO2010111084A3 Poly(ethylene glycol) and poly(ethylene oxide) by initiated chemical vapor deposition
01/20/2011WO2010111083A3 Structure and method for forming a salicide on the gate electrode of a trench-gate fet
01/20/2011WO2010111072A3 Methods, devices, and systems relating to a memory cell having a floating body
01/20/2011WO2010107878A3 Method and composition for depositing ruthenium with assistive metal species
01/20/2011WO2010096711A3 Probe head for a microelectronic contactor assembly, and methods of making same
01/20/2011WO2010034650A3 Contact arrangement for establishing a spaced, electrically conducting connection between microstructured components
01/20/2011US20110015108 Aqueous Buffered Fluoride-Containing Etch Residue Removers and Cleaners
01/20/2011US20110014799 Projection illumination system for euv microlithography