Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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05/03/2011 | US7935266 Wet etching method using ultraviolet-light and method of manufacturing semiconductor device |
05/03/2011 | US7935217 Substrate processing apparatus for treating substrate with predetermined processing by supplying processing liquid to rim portion of rotating substrate |
05/03/2011 | US7935216 Differential pressure application apparatus for use in polishing layers of semiconductor device structures and methods |
05/03/2011 | US7935187 Film forming apparatus |
05/03/2011 | US7935186 Plasma processing apparatus |
05/03/2011 | US7934979 Retaining ring with tapered inner surface |
05/03/2011 | US7934513 Facility with multi-storied process chamber for cleaning substrates and method for cleaning substrates using the facility |
05/03/2011 | US7934468 Plasma processing apparatus and plasma processing method |
05/03/2011 | US7934391 Synthetic quartz glass body, process for producing the same, optical element, and optical apparatus |
05/03/2011 | CA2471693C Arrays of microparticles and methods of preparation thereof |
04/28/2011 | WO2011050207A2 Split gate semiconductor device with curved gate oxide profile |
04/28/2011 | WO2011050179A2 Optoelectronic semiconductor device and method of fabrication |
04/28/2011 | WO2011050171A2 Method for tunably repairing low-k dielectric damage |
04/28/2011 | WO2011050117A2 System and method for wafer carrier vibration reduction |
04/28/2011 | WO2011050116A2 Super-high density power trench mosfet |
04/28/2011 | WO2011050115A2 Split gate field effect transistor |
04/28/2011 | WO2011050073A1 Self-aligned barrier and capping layers for interconnects |
04/28/2011 | WO2011050062A2 Method for repairing low-k dielectric damage |
04/28/2011 | WO2011050048A2 Methods of making patterned structures of fluorine-containing polymeric materials and fluorine-containing polymers |
04/28/2011 | WO2011050043A2 Power transistor with improved high-side operating characteristics and reduced resistance and related apparatus and method |
04/28/2011 | WO2011049994A2 Current control in plasma processing systems |
04/28/2011 | WO2011049993A2 Rf isolation for power circuitry |
04/28/2011 | WO2011049950A1 Stepped masking for patterned implantation |
04/28/2011 | WO2011049938A2 Microelectronic processing component having a corrosion-resistant layer, microelectronic workpiece processing apparatus incorporating same, and method of forming an article having the corrosion-resistant layer |
04/28/2011 | WO2011049832A2 3d-trench electrode detectors |
04/28/2011 | WO2011049829A1 A memory cell that includes a carbon-based reversible resistance switching element compatible with a steering element, and methods of forming the same |
04/28/2011 | WO2011049811A2 Point-of-use silylamine generation |
04/28/2011 | WO2011049800A2 Stress management for tensile films |
04/28/2011 | WO2011049710A2 Stacked semiconductor device |
04/28/2011 | WO2011049699A2 Semiconductor wafer having scribe lane alignment marks for reducing crack propagation |
04/28/2011 | WO2011049671A1 Apparatus and methods for brush and pad conditioning |
04/28/2011 | WO2011049623A1 A novel bit line preparation method in mram fabrication |
04/28/2011 | WO2011049620A2 Heating plate with planar heater zones for semiconductor processing |
04/28/2011 | WO2011049567A1 High-throughput roll to roll sputtering assembly |
04/28/2011 | WO2011049552A1 Field-effect semiconductor diode and methods of making the same |
04/28/2011 | WO2011049427A1 Method of fabricating integrated reference electrode |
04/28/2011 | WO2011049318A2 Slurry composition for cmp, and polishing method |
04/28/2011 | WO2011049284A1 Method for fabricating highly conductive fine patterns using self-patterned conductors and plating |
04/28/2011 | WO2011049283A1 Method for fabricating fine conductive patterns using a surface-modified mask template |
04/28/2011 | WO2011049230A1 Voltage regulator circuit |
04/28/2011 | WO2011049216A1 Composition for polishing silicon carbide |
04/28/2011 | WO2011049133A1 Substrate supporting apparatus, substrate supporting member, substrate transfer apparatus, exposure apparatus, and device manufacturing method |
04/28/2011 | WO2011049128A1 Semiconductor device and method for manufacturing semiconductor device |
04/28/2011 | WO2011049097A1 Imprint mold, production method thereof, imprint device, and imprint method |
04/28/2011 | WO2011049092A1 Treatment solution for preventing pattern collapse in metal fine structure body, and process for production of metal fine structure body using same |
04/28/2011 | WO2011049091A1 Treatment solution for preventing pattern collapse in metal fine structure body, and process for production of metal fine structure body using same |
04/28/2011 | WO2011049078A1 Film-forming composition containing silicon compound |
04/28/2011 | WO2011049054A1 Insulated gate bipolar transistor and method for designing same |
04/28/2011 | WO2011049017A1 Film formation and vacuum processing method for performing cleaning |
04/28/2011 | WO2011049011A1 Photosensitive adhesive composition, photosensitive adhesive sheet, and semiconductor devices using same |
04/28/2011 | WO2011049004A1 Spatial light modulator, optical apparatus, and exposure apparatus |
04/28/2011 | WO2011048968A1 Semiconductor device |
04/28/2011 | WO2011048961A1 Vacuum treatment apparatus and graph presentation method |
04/28/2011 | WO2011048959A1 Semiconductor device and method for manufacturing the same |
04/28/2011 | WO2011048929A1 Semiconductor device |
04/28/2011 | WO2011048925A1 Method for manufacturing semiconductor device |
04/28/2011 | WO2011048919A1 Radiation-sensitive resin composition and novel compound |
04/28/2011 | WO2011048917A1 Sample table and microwave plasma processing apparatus |
04/28/2011 | WO2011048889A1 Polishing agent, concentrated one-pack type polishing agent, two-pack type polishing agent and method for polishing substrate |
04/28/2011 | WO2011048877A1 Laser exposure device |
04/28/2011 | WO2011048866A1 Oligomethyl germane compound for amorphous semiconductor film, and film formation gas using same |
04/28/2011 | WO2011048834A1 Test carrier |
04/28/2011 | WO2011048809A1 Solar cell and method for manufacturing the same |
04/28/2011 | WO2011048804A1 Semiconductor device and process for production thereof |
04/28/2011 | WO2011048800A1 Semiconductor device and process for production thereof |
04/28/2011 | WO2011048774A1 Process for production of electronic device, electronic device, and device for production of electronic device |
04/28/2011 | WO2011048737A1 Semiconductor device |
04/28/2011 | WO2011048714A1 Semiconductor device and process for production thereof |
04/28/2011 | WO2011048567A1 Integrated circuit |
04/28/2011 | WO2011048345A1 Apparatus for processing continuous lengths of flexible foil |
04/28/2011 | WO2011048308A1 Method for producing a multilayer film including at least one ultrathin layer of crystalline silicon, and devices obtained by means of said method |
04/28/2011 | WO2011048130A1 Suction-type gripper device for flat substrates |
04/28/2011 | WO2011048069A2 Method and installation for producing an anti-reflection and/or passivation coating for semiconductor devices |
04/28/2011 | WO2011048063A1 Improvements in or relating to opto-electrical assemblies and associated apparatus and methods |
04/28/2011 | WO2011047997A1 Bernoulli nozzle, gripper device comprising a bernoulli nozzle, and production method |
04/28/2011 | WO2011047894A1 Method and device for treating a substrate surface of a substrate |
04/28/2011 | WO2011047792A1 Method for producing vias |
04/28/2011 | WO2011047455A1 Controlled low temperature growth of epitaxial silicon films for photovoltaic applications |
04/28/2011 | WO2011028349A3 Remote hydrogen plasma source of silicon containing film deposition |
04/28/2011 | WO2011028343A3 Semiconductor memory device with hierarchical bitlines |
04/28/2011 | WO2011027972A3 Laser-reflective mask and method for manufacturing same |
04/28/2011 | WO2011017222A3 Method and apparatus for dry cleaning a cooled showerhead |
04/28/2011 | WO2011017154A3 Silicon wafer sawing fluid and process for the use thereof |
04/28/2011 | WO2011016643A3 Pipe-heating device |
04/28/2011 | WO2011014434A3 Bond and probe pad distribution and package architecture |
04/28/2011 | WO2011013936A3 Roll-to-roll sputter system comprising a plurality of chambers, and method for using same |
04/28/2011 | WO2011011532A3 Hollow cathode showerhead |
04/28/2011 | WO2011011448A3 Shield contacts in a shielded gate mosfet |
04/28/2011 | WO2011009093A3 A method of forming a group iii-nitride crystalline film on a patterned substrate by hydride vapor phase epitaxy (hvpe) |
04/28/2011 | WO2011008918A3 Grooved cmp polishing pad |
04/28/2011 | WO2011008762A3 Storage device testing system cooling |
04/28/2011 | WO2011008703A3 Plasma processing chamber with enhanced gas delivery |
04/28/2011 | WO2011003117A3 Arrangement for identifying uncontrolled events at the process module level and methods thereof |
04/28/2011 | WO2011002242A3 Square cutting device for solar cell ingots |
04/28/2011 | WO2011002149A9 Cmp polishing pad with pores formed therein, and method for forming pores |
04/28/2011 | WO2010148398A3 A thin-film device and method of fabricating the same |
04/28/2011 | WO2010147437A3 Apparatus for conveying substrate in a system for processing large-sized substrate |
04/28/2011 | WO2010099998A3 Method for producing semiconductor components using doping techniques |
04/28/2011 | US20110098937 Integrated mos wireless sensor |
04/28/2011 | US20110098201 Arrays of microparticles and methods of preparation thereof |