H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
05/2011
05/04/2011	CN102044461A Detection method used for failure analysis of semiconductor device
05/04/2011	CN102044460A Standard mechanical interface for manufacturing semiconductor and laser assembling support thereof
05/04/2011	CN102044459A Method for detecting nitrogen content of nitrogen-doped oxidation silicon film
05/04/2011	CN102044458A Detection method of degree of damage of plasma
05/04/2011	CN102044457A Method for manufacturing metal bonding pad and corresponding metal bonding pad structure
05/04/2011	CN102044456A 半导体结构及其制造方法 The semiconductor structure and a method of manufacturing
05/04/2011	CN102044455A Salient point and forming method thereof
05/04/2011	CN102044454A Salient point and formation method thereof
05/04/2011	CN102044453A Chip ball-planting device
05/04/2011	CN102044452A Integrated circuit packaging system with package-on-package stacking and method of manufacture thereof
05/04/2011	CN102044451A Method of manufacturing semiconductor device and method of manufacturing electronic device
05/04/2011	CN102044450A Electronic component mounting apparatus and electronic component mounting method
05/04/2011	CN102044449A Semiconductor package and method of manufacturing the same
05/04/2011	CN102044448A Method for manufacturing LED (Light-Emitting Diode) device
05/04/2011	CN102044447A Packaging technology and packaging structure
05/04/2011	CN102044446A Manufacturing method for blind hole windowing contraposition target of packaging baseplate
05/04/2011	CN102044445A Method for manufacturing lead frame of quad flat no-lead package (QFN)
05/04/2011	CN102044444A Method for manufacturing package board
05/04/2011	CN102044443A Semiconductor device and method of manufacturing the same
05/04/2011	CN102044442A Method for improving interface feature of gate medium having high dielectric constant
05/04/2011	CN102044441A Manufacturing method of laterally diffused metal oxide semiconductor element
05/04/2011	CN102044440A Technology for using polycrystalline silicon etched polymer as removable flank
05/04/2011	CN102044439A Manufacture method of active area
05/04/2011	CN102044438A MOS (Metal Oxide Semiconductor) transistor and manufacturing method thereof
05/04/2011	CN102044437A Method for manufacturing semiconductor device
05/04/2011	CN102044436A Method for preparing semiconductor device
05/04/2011	CN102044435A MOS (Metal Oxide Semiconductor) transistor with common source structure and manufacturing method thereof
05/04/2011	CN102044434A Method for manufacturing MOS transistor
05/04/2011	CN102044433A Mixed source-drain electrode field effect transistor and manufacturing method thereof
05/04/2011	CN102044432A Method for preventing uneven surface of wafer and preventing defocus in exposure
05/04/2011	CN102044431A Etching method and system
05/04/2011	CN102044430A Method for polishing wafer
05/04/2011	CN102044429A Method for etching silicon wafer
05/04/2011	CN102044428A Method for thinning wafer
05/04/2011	CN102044427A Forming method of copper interconnecting wire and electroplating device
05/04/2011	CN102044426A Semiconductor device and manufacturing method thereof
05/04/2011	CN102044425A Deposition method of polysilicon gate
05/04/2011	CN102044424A Semiconductor device including metal silicide layer and method for manufacturing the same
05/04/2011	CN102044423A Method for fabricating a gate structure
05/04/2011	CN102044422A Method for forming self-aligned metallic silicide
05/04/2011	CN102044421A Method for manufacturing metal gate
05/04/2011	CN102044420A Polycrystalline silicon ion implantation technology
05/04/2011	CN102044419A Preparation method of Si-Ge film and manufacture method of semiconductor device
05/04/2011	CN102044418A Method for the removal of surface oxides by electron attachment
05/04/2011	CN102044417A Semiconductor device and method of forming pattern of insulating resin film on surface of substrate
05/04/2011	CN102044416A Front-end manufacturing process of semiconductor device
05/04/2011	CN102044415A Method for manufacturing semiconductor structure
05/04/2011	CN102044414A Semiconductor structure and manufacturing method thereof
05/04/2011	CN102044413A Substrate processing apparatus
05/04/2011	CN102044412A Substrate liquid processing apparatus and substrate liquid processing method
05/04/2011	CN102044411A Substrate cooling apparatus, substrate cooling method, and storage medium
05/04/2011	CN102044410A Plasma etch method to reduce micro-loading
05/04/2011	CN102044409A Method for carrying out chemically mechanical polishing (CMP) on insulating medium
05/04/2011	CN102044408A Method for dynamically adjusting chemically mechanical polishing (CMP) rate
05/04/2011	CN102044407A Cleaning method of chip
05/04/2011	CN102044406A Processing method of detecting samples
05/04/2011	CN102044405A Chip separation method in multi-chip pack
05/04/2011	CN102044404A System for separating cut semiconductor bare chip from bare chip adhesive tape
05/04/2011	CN102043353A Method for spraying developer solution on wafer
05/04/2011	CN102043340A Method for uniformly spraying photoresist
05/04/2011	CN102043338A Photoresist composition
05/04/2011	CN102043328A Method for correcting defect of photomask, apparatus for correcting defect of photomask, head for correcting defect of photomask, and apparatus for inspecting defect of photomask and method for manufacturing photomask
05/04/2011	CN102043301A Electrophoretic display deivce and method of fabrication thereof
05/04/2011	CN102043300A Methode of fabricating display device using flexible plastic substrate
05/04/2011	CN102043298A Display substrate, method of manufacturing the display substrate and display device having the display substrate
05/04/2011	CN102043296A Flat panel display device and method of manufacturing the same
05/04/2011	CN102043288A Substrate positioning apparatus and method for positioning substrate with the same
05/04/2011	CN102042997A Circuit structure and method for judging source of plasma damage
05/04/2011	CN102041539A GaN-based photonic crystal template and preparation method thereof
05/04/2011	CN102039638A Cutting method for cutting substrate by utilizing cutting line
05/04/2011	CN102039558A Method for controlling grinding process
05/04/2011	CN102039555A 研磨头装置 Grinding head unit
05/04/2011	CN102039290A Vacuum cleaner
05/04/2011	CN102039288A Washing method of wafer
05/04/2011	CN101783394B Method for carrying out Fermi energy level modification on top electrode
05/04/2011	CN101740335B manufacturing equipment of semiconductor and method for etching semiconductor structure
05/04/2011	CN101728347B Package structure and manufacture method thereof
05/04/2011	CN101702402B Glue overflow-preventing device and baseplate-laminating method using same
05/04/2011	CN101685794B Protecting sidewalls of semiconductor chips using insulation films
05/04/2011	CN101681863B Substrate transfer apparatus
05/04/2011	CN101681856B Electronic component mounting device and mounting method
05/04/2011	CN101667578B Novel integrated circuit resisting NMOS element total dose radiation
05/04/2011	CN101665189B Transporting system
05/04/2011	CN101661960B Structure of Schottky diode or bottom anode Schottky diode formed on the P type substrate
05/04/2011	CN101661202B Active array substrate
05/04/2011	CN101651096B Method for manufacturing gate layer
05/04/2011	CN101645414B Double-embedded structure forming method
05/04/2011	CN101640182B Method for forming shallow trench isolation structure and method for manufacturing semiconductor device
05/04/2011	CN101640180B Test chip for testing defects of production process of semiconductor and manufacturing method thereof
05/04/2011	CN101606239B Silicon wafer evaluation method
05/04/2011	CN101604633B Vacuum sintering method in two-direction silicon-controlled preparation
05/04/2011	CN101593772B Mos transistor and forming method thereof
05/04/2011	CN101593771B Semiconductor device and formation method thereof
05/04/2011	CN101593701B Stress NMOS device and manufacturing method of stress CMOS
05/04/2011	CN101593696B Method for manufacturing semiconductor devices
05/04/2011	CN101593692B Etching method
05/04/2011	CN101593685B Method for forming grid
05/04/2011	CN101590615B Tungsten chemical mechanical polishing method
05/04/2011	CN101587834B Manufacturing method for grate structure
05/04/2011	CN101584029B Process for manufacturing semiconductor device

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