| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 06/08/2011 | CN102089867A Plasma processing apparatus |
| 06/08/2011 | CN102089866A 研磨组合物 Polishing composition |
| 06/08/2011 | CN102089865A Method of polishing nickel-phosphorous |
| 06/08/2011 | CN102089864A Photoelectrochemical etching of P-type semiconductor heterostructures |
| 06/08/2011 | CN102089863A Chamber components for CVD applications |
| 06/08/2011 | CN102089862A Motherboard, motherboard manufacturing method and device board |
| 06/08/2011 | CN102089861A Vapor phase repair and pore sealing of low-k dielectric materials |
| 06/08/2011 | CN102089860A Reflective mask blank for EUV lithography and reflective mask for EUV lithography |
| 06/08/2011 | CN102089859A Within-sequence metrology based process tuning for adaptive self-aligned double patterning |
| 06/08/2011 | CN102089858A Method for manufacturing flexible semiconductor substrate |
| 06/08/2011 | CN102089857A Methods and apparatus for abating electronic device manufacturing process effluent |
| 06/08/2011 | CN102089856A Solar cells and method of making solar cells |
| 06/08/2011 | CN102089855A Apparatus for loading and unloading semiconductor wafers |
| 06/08/2011 | CN102089833A Microstructure, and method for production thereof |
| 06/08/2011 | CN102089819A Magnetic device manufacturing method |
| 06/08/2011 | CN102089715A Method of resist treatment |
| 06/08/2011 | CN102089709A Radiation-sensitive resin composition |
| 06/08/2011 | CN102089228A Method and device for producing photovoltaic modules |
| 06/08/2011 | CN102089122A Polishing pad with endpoint window and systems and method using the same |
| 06/08/2011 | CN102089121A Wafer polishing method and double side polishing apparatus |
| 06/08/2011 | CN102089115A Laser working apparatus, and laser working method |
| 06/08/2011 | CN102088822A PCB (printed circuit board) substrate with welding spot self-protection function and manufacturing process of pad of PCB substrate |
| 06/08/2011 | CN102088241A Stacked inductor-electronic package assembly and technique for manufacturing the same |
| 06/08/2011 | CN102088059A Method for manufacturing a small pin on integrated circuits or other devices |
| 06/08/2011 | CN102088046A Technology for manufacturing selective emitter electrode of crystalline silicon solar cell through single-step diffusion |
| 06/08/2011 | CN102088038A Novel GaAs Schottky diode and manufacturing method thereof |
| 06/08/2011 | CN102088037A 齐纳二极管及其制造方法 Zener diode and its manufacturing method |
| 06/08/2011 | CN102088036A 集成电路结构 Integrated circuit structure |
| 06/08/2011 | CN102088035A Trench MOSFET (Metal-Oxide-Semiconductor Field-Effect Transistor) and manufacturing method thereof |
| 06/08/2011 | CN102088033A Closed groove type power metal oxide semiconductor field effect transistor structure and manufacturing method thereof |
| 06/08/2011 | CN102088032A Small line width groove-type metal oxide semiconductor (MOS) transistor and manufacturing method thereof |
| 06/08/2011 | CN102088031A N-type laterally diffused metal oxide semiconductor (NLDMOS) device and manufacturing method thereof |
| 06/08/2011 | CN102088030A Laterally diffused metal oxide semiconductor field effect transistor and manufacturing method thereof |
| 06/08/2011 | CN102088029A PNP bipolar transistor in SiGe BiCMOS technology |
| 06/08/2011 | CN102088028A Flash memory cell on SeOI having second control gate buried under insulating layer |
| 06/08/2011 | CN102088027A Circuit of uniform transistors on SeOI with buried back control gate beneath the insulating film |
| 06/08/2011 | CN102088025A Thin film transistor substrate and method of manufacturing the same |
| 06/08/2011 | CN102088024A Semiconductor memory device |
| 06/08/2011 | CN102088022A Laterally diffused metal oxide semiconductor (LDMOS) and manufacturing method thereof |
| 06/08/2011 | CN102088021A Trench MOS device with schottky diode and method for manufacturing same |
| 06/08/2011 | CN102088020A Device with schottky diode integrated in power metal oxide semiconductor (MOS) transistor and manufacturing method thereof |
| 06/08/2011 | CN102088019A Three-dimensional laminated element with an interconnect structure and manufacturing method thereof |
| 06/08/2011 | CN102088015A Semiconductor packaging piece and manufacture method thereof |
| 06/08/2011 | CN102088014A 3D (Three Dimensional) integrated circuit structure, semiconductor device and forming methods thereof |
| 06/08/2011 | CN102088013A Substrate structure with die embedded inside and dual build-up layers over both side surfaces and method of the same |
| 06/08/2011 | CN102088012A Electronic component package body and manufacturing method thereof |
| 06/08/2011 | CN102088011A Interface structure for copper-copper peeling integrity |
| 06/08/2011 | CN102088003A Nonlinear left-handed transmission-line frequency multiplier based on planar technology and preparation method thereof |
| 06/08/2011 | CN102088002A Method for manufacturing memory device |
| 06/08/2011 | CN102088001A Flash memory and manufacturing method thereof |
| 06/08/2011 | CN102088000A Memory unit of electrically erasable programmable read-only memory (EEPROM) and manufacturing method thereof |
| 06/08/2011 | CN102087999A Methods for integrating replacement metal gate structures |
| 06/08/2011 | CN102087998A Dual polycrystalline structure device and manufacturing method thereof |
| 06/08/2011 | CN102087997A Processing device |
| 06/08/2011 | CN102087996A Method for manufacturing integrated circuit with thickened top and sub-top metals, and laminated inductor |
| 06/08/2011 | CN102087995A Integrated circuit inductor and manufacturing method thereof |
| 06/08/2011 | CN102087994A Contact hole filling method |
| 06/08/2011 | CN102087993A Groove forming method |
| 06/08/2011 | CN102087992A Method for forming contact holes |
| 06/08/2011 | CN102087991A Methods for manufacturing bit line and nonvolatile memory |
| 06/08/2011 | CN102087990A Shallow trench isolation method |
| 06/08/2011 | CN102087989A Method for manufacturing shallow groove isolation structure |
| 06/08/2011 | CN102087988A Preparation method of shallow trench isolation structure |
| 06/08/2011 | CN102087987A Positioning device and positioning control method for vertical lifting plate bank |
| 06/08/2011 | CN102087986A Wafer delivery device |
| 06/08/2011 | CN102087985A Wafer defect detecting method |
| 06/08/2011 | CN102087984A Molybdenum electrode lead structure of micro-diode and welding method |
| 06/08/2011 | CN102087983A Packaging and laminating method, packaging and laminating structure and circuit board system thereof |
| 06/08/2011 | CN102087982A System in package (SIP) chip mounting method |
| 06/08/2011 | CN102087981A Manufacture method for MOS (metal oxide semiconductor) transistor |
| 06/08/2011 | CN102087980A High-performance semiconductor device and forming method thereof |
| 06/08/2011 | CN102087979A High-performance semiconductor device and method for forming same |
| 06/08/2011 | CN102087978A Injection method for DMOS back gate channel region in self-alignment BCD process |
| 06/08/2011 | CN102087977A Vertical negative-positive-negative (NPN) transistor and manufacturing method thereof |
| 06/08/2011 | CN102087976A Fast recovery diode (FRD) chip and production process thereof |
| 06/08/2011 | CN102087975A Semiconductor device and manufacturing method thereof |
| 06/08/2011 | CN102087974A Deep trench liner removal process |
| 06/08/2011 | CN102087973A Method for reducing gate oxide film pinholes |
| 06/08/2011 | CN102087972A Flash memory device having a curved upper surface |
| 06/08/2011 | CN102087971A Method for forming grid and MOS transistor |
| 06/08/2011 | CN102087970A Process for etching polycrystalline silicon layer and method for forming metal oxide semiconductor (MOS) transistor |
| 06/08/2011 | CN102087969A Method for preparing fully silicified metal gate |
| 06/08/2011 | CN102087968A Method for manufacturing grid structure of semiconductor device |
| 06/08/2011 | CN102087967A Method for effectively modulating TiNx metal gate work function |
| 06/08/2011 | CN102087966A Method for re-oxidizing grid and method for manufacturing semiconductor structure |
| 06/08/2011 | CN102087965A Method for forming grid-structured side wall |
| 06/08/2011 | CN102087964A Silicon oxide nitride oxide semiconductor (SONOS) structure and method for forming same |
| 06/08/2011 | CN102087963A Method for etching polycrystalline silicon layer |
| 06/08/2011 | CN102087962A Method for diffusing ions and method for forming semiconductor device |
| 06/08/2011 | CN102087961A P type doping ultra shallow junction and method for making P-channel metal oxide semiconductor (PMOS) transistor |
| 06/08/2011 | CN102087960A Method for forming active area |
| 06/08/2011 | CN102087959A Dynamic random access memory and manufacturing method for capacitor thereof |
| 06/08/2011 | CN102087958A Method for processing by-product in reaction chamber |
| 06/08/2011 | CN102087957A Method for controlling air inlet way in plasma processing technology |
| 06/08/2011 | CN102087956A Method for back implanting to substrate in ion implantation technology |
| 06/08/2011 | CN102087955A Method for improving condition of particles in reaction chamber in plasma process |
| 06/08/2011 | CN102087954A Wafer cleaning method |
| 06/08/2011 | CN102087953A Method for measuring temperature of cavity of epitaxial equipment |
| 06/08/2011 | CN102087488A Apparatus including an overlay mark and method of producing semiconductor assembly |
| 06/08/2011 | CN102087486A Heating apparatus, coating, developing device and heating method |