| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
|---|
| 02/02/2012 | US20120025354 Laminated semiconductor substrate, laminated chip package and method of manufacturing the same |
| 02/02/2012 | US20120025348 Semiconductor device comprising a passive component of capacitors and process for fabrication |
| 02/02/2012 | US20120025347 Method of forming a MIM capacitor |
| 02/02/2012 | US20120025346 Fabricating process of circuit substrate and circuit substrate structure |
| 02/02/2012 | US20120025345 Method, apparatus, and design structure for silicon-on-insulator high-bandwidth circuitry with reduced charge layer |
| 02/02/2012 | US20120025344 Traceable integrated circuits and production method thereof |
| 02/02/2012 | US20120025342 Integrated circuit combination of a target integrated circuit and a plurality of cells connected thereto using the top conductive layer |
| 02/02/2012 | US20120025341 Aligning a sensor with a faceplate |
| 02/02/2012 | US20120025337 Mems transducer device having stress mitigation structure and method of fabricating the same |
| 02/02/2012 | US20120025336 Converter module and method of manufacturing the same |
| 02/02/2012 | US20120025333 Mems element and method for manufacturing same |
| 02/02/2012 | US20120025332 Systems and methods for mounting inertial sensors |
| 02/02/2012 | US20120025331 Horizontal coplanar switches and methods of manufacture |
| 02/02/2012 | US20120025330 Fabrication method of carbon nanotube film and sensor based on carbon nanotube film |
| 02/02/2012 | US20120025328 Mosfet structure and method for fabricating the same |
| 02/02/2012 | US20120025327 Semiconductor device with metal gates and method for fabricating the same |
| 02/02/2012 | US20120025326 Semiconductor device and manufacturing method thereof |
| 02/02/2012 | US20120025323 Spacer structures of a semiconductor device |
| 02/02/2012 | US20120025321 Semiconductor device, and method of manufacturing the same |
| 02/02/2012 | US20120025320 Complementary metal oxide semiconductor transistor and fabricating method thereof |
| 02/02/2012 | US20120025319 Structure and method for making metal semiconductor field effect transistor (mosfet) with isolation last process |
| 02/02/2012 | US20120025318 Reduced Topography in Isolation Regions of a Semiconductor Device by Applying a Deposition/Etch Sequence Prior to Forming the Interlayer Dielectric |
| 02/02/2012 | US20120025317 Semiconductor device structure and method for fabricating the same |
| 02/02/2012 | US20120025316 Process for Forming FINS for a FinFET Device |
| 02/02/2012 | US20120025315 Transistor with Embedded Strain-Inducing Material and Dummy Gate Electrodes Positioned Adjacent to the Active Region |
| 02/02/2012 | US20120025314 Semiconductor device and method for manufacturing the same |
| 02/02/2012 | US20120025312 Strain Engineering in Three-Dimensional Transistors Based on a Strained Channel Semiconductor Material |
| 02/02/2012 | US20120025311 Radiation-hardened semiconductor structure, a semiconductor device including the radiation-hardened semicoductor structure, and methods of forming the radiation-hardened semiconductor structure and semiconductor device |
| 02/02/2012 | US20120025309 offset gate semiconductor device |
| 02/02/2012 | US20120025307 Method for manufacturing semiconductor device and semiconductor device |
| 02/02/2012 | US20120025304 Trench Semiconductor Device and Method of Manufacturing |
| 02/02/2012 | US20120025303 Semiconductor device and method for the production of a semiconductor device |
| 02/02/2012 | US20120025301 Inverted-trench grounded-source FET structure with trenched source body short electrode |
| 02/02/2012 | US20120025299 Method for fabricating semiconductor device with buried gates |
| 02/02/2012 | US20120025298 Wafer level chip scale package |
| 02/02/2012 | US20120025297 Nonvolatile semiconductor memory device and method for manufacturing the same |
| 02/02/2012 | US20120025296 Semiconductor device and method for manufacturing the same |
| 02/02/2012 | US20120025294 Semiconductor device, and method for manufacturing semiconductor device |
| 02/02/2012 | US20120025293 Semiconductor memory device having a floating gate and a control gate and method of manufacturing the same |
| 02/02/2012 | US20120025292 Nonvolatile semiconductor memory transistor and method for manufacturing nonvolatile semiconductor memory |
| 02/02/2012 | US20120025291 Nonvolatile semiconductor memory transistor and method for manufacturing nonvolatile semiconductor memory |
| 02/02/2012 | US20120025290 Semiconductor device and method of manufacturing semiconductor device |
| 02/02/2012 | US20120025289 Metal control gate formation in non-volatile storage |
| 02/02/2012 | US20120025288 SOI Trench DRAM Structure With Backside Strap |
| 02/02/2012 | US20120025287 Memory Cell, An Array, And A Method for Manufacturing A Memory Cell |
| 02/02/2012 | US20120025285 System with logic and embedded mim capacitor |
| 02/02/2012 | US20120025282 Raised Source/Drain Field Effect Transistor |
| 02/02/2012 | US20120025279 Low schottky barrier semiconductor structure and method for forming the same |
| 02/02/2012 | US20120025276 Temperature monitoring in a semiconductor device by using a pn junction based on silicon/germanium materials |
| 02/02/2012 | US20120025271 Semiconductor wafer, method of producing semiconductor wafer, method of judging quality of semiconductor wafer, and electronic device |
| 02/02/2012 | US20120025270 Enhancement-mode high-electron-mobility transistor and the manufacturing method thereof |
| 02/02/2012 | US20120025268 Semiconductor wafer, method of producing semiconductor wafer, and electronic device |
| 02/02/2012 | US20120025267 Mos device for eliminating floating body effects and self-heating effects |
| 02/02/2012 | US20120025266 Transistors Comprising High-K Metal Gate Electrode Structures and Embedded Strain-Inducing Semiconductor Alloys Formed in a Late Stage |
| 02/02/2012 | US20120025262 MOS Type Semiconductor Device and Method of Manufacturing Same |
| 02/02/2012 | US20120025261 Method of minimizing field stop insulated gate bipolar transistor (IGBT) buffer and emitter charge variation |
| 02/02/2012 | US20120025236 Light emitting diode substrate, method of making same and light employing same |
| 02/02/2012 | US20120025210 Optical module enclosing lead frame and semiconductor optical device mounted on the lead frame with transparaent mold resin |
| 02/02/2012 | US20120025209 Optical connection through single assembly overhang flip chip optics die with micro structure alignment |
| 02/02/2012 | US20120025208 Method for manufacturing silicon carbide substrate and silicon carbide substrate |
| 02/02/2012 | US20120025207 Process for dividing wafer into individual chips and semiconductor chips |
| 02/02/2012 | US20120025204 SEMICONDUCTOR DEVICE HAVING Si-SUBSTRATE AND PROCESS TO FORM THE SAME |
| 02/02/2012 | US20120025202 Semiconductor device and method for fabricating the same |
| 02/02/2012 | US20120025201 Inverted Trapezoidal Recess for Epitaxial Growth |
| 02/02/2012 | US20120025200 Semiconductor device and method for manufacturing the same |
| 02/02/2012 | US20120025195 Confined Lateral Growth of Crystalline Material |
| 02/02/2012 | US20120025194 Thin-film transistor sensor and method of manufacturing the tft sensor |
| 02/02/2012 | US20120025191 Semiconductor Device and Manufacturing Method Thereof |
| 02/02/2012 | US20120025187 Transistors, methods of manufacturing transistors, and electronic devices including transistors |
| 02/02/2012 | US20120025170 P-type semiconductor devices |
| 02/02/2012 | US20120025169 Nanostructure array transistor |
| 02/02/2012 | US20120025168 Strain control in semiconductor devices |
| 02/02/2012 | US20120025162 Phase change random access memory and method for fabricating the same |
| 02/02/2012 | US20120025148 Sputtering target of oxide semiconductors and the manufacturing methods of oxide semiconductor layers |
| 02/02/2012 | US20120025082 Low-noise semiconductor photodetectors |
| 02/02/2012 | US20120025054 Holding apparatus, conveying apparatus, and rotation-transmitting apparatus |
| 02/02/2012 | US20120024963 Semiconductor device and method for manufacturing the same |
| 02/02/2012 | US20120024959 Rfid inlet and rfid tag, and method for manufacturing rfid inlet and rfid tag |
| 02/02/2012 | US20120024713 Process for electrodeposition of copper chip to chip, chip to wafer and wafer to wafer interconnects in through-silicon vias (tsv) with heated substrate and cooled electrolyte |
| 02/02/2012 | US20120024700 Sensor device and manufacturing method |
| 02/02/2012 | US20120024479 Apparatus for controlling the flow of a gas in a process chamber |
| 02/02/2012 | US20120024478 Showerhead |
| 02/02/2012 | US20120024469 Film for semiconductor device production, method for producing film for semiconductor device production, and method for semiconductor device production |
| 02/02/2012 | US20120024449 Parasitic plasma prevention in plasma processing chambers |
| 02/02/2012 | US20120024335 Multi-layered thermoelectric device and method of manufacturing the same |
| 02/02/2012 | US20120024317 Cleaning apparatus and cleaning method |
| 02/02/2012 | US20120024315 Method for megasonic processing of an article |
| 02/02/2012 | US20120024230 Apparatuses and systems for fabricating three dimensional integrated circuits |
| 02/02/2012 | DE19802848B4 Verfahren und Vorrichtung zum Testen eines Substrats Method and apparatus for testing a substrate |
| 02/02/2012 | DE112007003116B4 Verfahren zur Herstellung eines verspannten Transistors und Transistor A method for producing a strained transistor and transistor |
| 02/02/2012 | DE112006000811B4 Ätzprozess für CD-Reduzierung eines ARC-Materials Etching process for CD reduction of ARC material |
| 02/02/2012 | DE10342295B4 Anordnung eines elektrischen Bauelements mit einer elektrischen Isolationsfolie auf einem Substrat und Verfahren zum Herstellen der Anordnung Arrangement of an electrical component with an electrical insulation film on a substrate and method of manufacturing the arrangement |
| 02/02/2012 | DE102011017543A9 Elektronische Vorrichtung, Verdrahtungsplatine und Verfahren zur Fertigung der elektrischen Vorrichtung An electronic apparatus wiring board and method for manufacturing the electric device |
| 02/02/2012 | DE102011011718B3 Method for producing heat dissipation mass of semiconductor device, involves covering surface of provisional substrate by form of electrical conducting layer |
| 02/02/2012 | DE102010038746A1 Reduzierte Topographie in Isolationsgebieten eines Halbleiterbauelements durch Anwenden einer Abscheide/Ätzsequenz vor der Herstellung des Zwischenschichtdielektrikums Reduced topography in insulation regions of a semiconductor device by applying a deposition / etch sequence before making the interlayer dielectric |
| 02/02/2012 | DE102010038745A1 Teststruktur für Prüfung von Zwischenschichtdielektrikumshohlräumen und Kontaktwiderstandsmessungen in einem Halbleiterbauelement Test structure for testing of Zwischenschichtdielektrikumshohlräumen and contact resistance measurements in a semiconductor device |
| 02/02/2012 | DE102010038744A1 Erhöhung der Robustheit in einem Doppelverspannungsschichtenverfahren in einem Halbleiterbauelement durch Anwenden einer Nasschemie Increase the robustness in a double stress layers method in a semiconductor device by applying a wet chemistry |
| 02/02/2012 | DE102010038742A1 Verformungstechnologie in dreidimensionalen Transistoren auf der Grundlage eines verformten Kanalhalbleitermaterials Technology in three-dimensional deformation transistors on the basis of a strained semiconductor channel material |
| 02/02/2012 | DE102010038740A1 Verfahren zum Steuern kritischer Abmessungen von Kontaktdurchführungen in einem Metallisierungssystem eines Halbleiterbauelements während der Ätzung einer Si-Antireflektierungsschicht A method for controlling critical dimensions of vias in a metallization system of a semiconductor device during the etching of Si Antireflektierungsschicht |
| 02/02/2012 | DE102010038739A1 Erhöhte Stabilität eines komplexen Materialstapels in einem Halbleiterbauelement durch Vorsehen von fluorangereicherten Grenzflächen Increased stability of a complex material stack in a semiconductor device by providing fluorine-enriched boundary surfaces |