| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 03/19/1991 | CA1281728C CYCLIC ACETALS OR KETALS OF .beta.-KETO ESTERS OR AMIDES |
| 03/19/1991 | CA1281581C Process for producing an aqueous developable photographic element |
| 03/19/1991 | CA1281578C High contrast photoresist developer with enhanced sensitivity |
| 03/14/1991 | DE4028709A1 Brush for developing, esp. for printing plates made of fibres - which retain not below 60 per cent of their original flexural strength after immersion in developer |
| 03/14/1991 | DE3645042C2 Photosensitive copying sheet for heat or pressure transfer - contg. microcapsules contg. pigment or dyestuff, photocurable resin and photoinitiator |
| 03/13/1991 | EP0416873A2 Transparent dissolution rate modifiers for photoresists |
| 03/13/1991 | EP0416829A2 A positive type photosensitive resinous composition |
| 03/13/1991 | EP0416811A2 X-ray exposure method and apparatus |
| 03/13/1991 | EP0416651A2 Apochromatic lens system |
| 03/13/1991 | EP0416568A2 Method of designing three dimensional electrical circuits |
| 03/13/1991 | EP0416544A2 Radiation-sensitive positive resist composition |
| 03/13/1991 | EP0342207A4 Target positioning for minimum debris |
| 03/13/1991 | CA2022604A1 Lithographic printing plates |
| 03/12/1991 | US4999671 Reticle conveying device |
| 03/12/1991 | US4999669 Levelling device in an exposure apparatus |
| 03/12/1991 | US4999506 Positioning mechanism |
| 03/12/1991 | US4999331 Photosensitive Microcapsules |
| 03/12/1991 | US4999280 Resistance to reactive ion etching, polysilazanes |
| 03/12/1991 | US4999279 Photosensitive resin composition |
| 03/12/1991 | US4999277 Computer aided design, dichroic parabolic radio frequency reflector |
| 03/12/1991 | US4999274 Positive type photosensitive resinous composition with 1,2 quinone diazide sulfonyl unit |
| 03/12/1991 | US4999273 Presensitized plate |
| 03/12/1991 | US4999271 Printing plate precursors |
| 03/12/1991 | US4999143 Computer assisted design and manufacture |
| 03/12/1991 | US4998962 Printing method and printed product |
| 03/12/1991 | US4998821 Projection apparatus |
| 03/12/1991 | CA1281481C Diamino-9,10-dihydroanthracenes and polyamide acid (esters) and polyimides derived therefrom |
| 03/12/1991 | CA1281439C Plasma reactor and method for removing photoresist |
| 03/06/1991 | EP0415838A1 Microscopic method and "near-field" reflection microscope |
| 03/06/1991 | EP0415422A2 Method for forming images |
| 03/06/1991 | EP0415412A2 Resist pattern fabrication method |
| 03/06/1991 | EP0415392A2 Light-sensitive material processing apparatus |
| 03/06/1991 | EP0415390A2 Light-sensitive material processing apparatus |
| 03/06/1991 | EP0415302A2 Graft polymers with unsaturated side chains, light sensitive compositions containing them and coating composition with these polymers |
| 03/06/1991 | EP0415266A2 Radiation-sensitive positive resist composition |
| 03/06/1991 | EP0415230A2 Method for making edge faded holograms |
| 03/06/1991 | EP0415187A2 Water-soluble or(water)dispersible photopolymerizable mixture and its use in printing |
| 03/06/1991 | EP0415175A2 Urea- and carboxylic group containing reaction product, process for its preparation and radiation-sensitive mixture obtainable therefrom |
| 03/06/1991 | EP0414994A2 Overhead exposure unit |
| 03/06/1991 | EP0414754A1 Low toxicity liquid solvent |
| 03/06/1991 | EP0269717B1 Additive developer |
| 03/06/1991 | CA2024312A1 Radiation-sensitive positive resist composition |
| 03/06/1991 | CA2023423A1 Transparent dissolution rate modifiers for photoresists |
| 03/06/1991 | CA2021110A1 Laser shaping with an area patterning mask |
| 03/05/1991 | US4998260 Method for correcting the path of a gas laser beam |
| 03/05/1991 | US4998191 Illuminating optical device |
| 03/05/1991 | US4998134 Exposure apparatus |
| 03/05/1991 | US4998131 Method and apparatus for recording image data in multiplexed manner |
| 03/05/1991 | US4998130 Method of loading media sheet |
| 03/05/1991 | US4998021 Method of detecting an end point of surface treatment |
| 03/05/1991 | US4998020 Electron beam exposure evaluation method |
| 03/05/1991 | US4997899 Process for preparing organometallic high polymer |
| 03/05/1991 | US4997869 Production of electronic coatings by spin coating a partially fluorinated polyimide composition |
| 03/05/1991 | US4997748 High contrast, depth of focus |
| 03/05/1991 | US4997745 Photosensitive composition and photopolymerizable composition employing the same |
| 03/05/1991 | US4997742 Water soluble contrast enhancement composition with 1-oxy-2 diazonaphthalene sulfonamide salt and polyvinyl alcohol |
| 03/05/1991 | US4997741 Color image forming method using leuco dyes and recording material containing leuco dyes |
| 03/05/1991 | US4997735 Vacuum contacting process for photographic elements |
| 03/05/1991 | US4997734 Method of forming a thermally stable mixed aldehyde novolak resin containing resist pattern and that pattern on a substrate |
| 03/05/1991 | CA1281146C Photostructurable polyimide mixtures |
| 03/02/1991 | CA2024482A1 Positive type photosensitive resinous composition |
| 03/01/1991 | CA2065263A1 Microscopy method and reflexion near field microscope |
| 03/01/1991 | CA2024361A1 Graft polymer with unsaturated lateral chains, photosensitive mixture containing said graft polymer and recording material produced therefrom |
| 02/28/1991 | DE4026544A1 Light sensitive compsn. contg. -imino-diazo-quinone n-sulphonyl cpd. - and alkali-soluble polymer of positive type useful as resist |
| 02/28/1991 | DE4024457A1 Dry lithographic printing plate with polyurea-urethane binder - and silicone rubber coating giving tack-free photosensitive layer with good scratch resistance |
| 02/27/1991 | EP0414215A2 Solid imaging method utilizing compositions comprising thermally coalescible materials |
| 02/27/1991 | EP0414169A2 Photosensitive semi-aqueous developable gold conductor composition |
| 02/27/1991 | EP0414168A2 Photosensitive semi-aqueous developable copper conductor composition |
| 02/27/1991 | EP0414167A2 Photosensitive aqueous developable copper conductor composition |
| 02/27/1991 | EP0414166A2 Photosensitive aqueous developable gold conductor composition |
| 02/27/1991 | EP0414104A2 Photosensitive mixture |
| 02/27/1991 | EP0414100A2 Photosensitive positive working mixture |
| 02/27/1991 | EP0414099A2 Reaction product, process for its preparation and the radiation sensitive material obtained in this way |
| 02/27/1991 | EP0413863A1 Image-forming process and image-forming material |
| 02/27/1991 | EP0305402B1 Spin drying apparatus |
| 02/27/1991 | CN1049564A Improved holographic notch filters |
| 02/27/1991 | CA2023251A1 Water-soluble or water-dispersible photopolymerizable mixture and its use for printing purposes |
| 02/26/1991 | US4996700 Irradiation equipment for applying synchrotron radiation |
| 02/26/1991 | US4996554 Pressure developing device |
| 02/26/1991 | US4996553 Method for producing gloss image on image recording medium and apparatus for making the gloss image on the medium |
| 02/26/1991 | US4996552 Image exposure device for exposing photosensitive recording medium to color image lights |
| 02/26/1991 | US4996301 Polyfunctional α-diazo-β-keto esters and their use in light-sensitive compositions |
| 02/26/1991 | US4996282 Cationically curable polyurethane compositions having vinyl ether functionality |
| 02/26/1991 | US4996136 Polymer composition and acid generator |
| 02/26/1991 | US4996134 Conjugated diene copolymer, a process for producing the copolymer, and a photosensitive composition comprising the copolymer |
| 02/26/1991 | US4996132 Heat curable blend of addition terpolymer, acrylated epoxidized novolak, photopolymerizable monomer, initiator in resist layer; printed circuits |
| 02/26/1991 | US4996123 Optically oriented photoresist pattern forming method using organic crystal in photoresist layer with specified refracting indices formula |
| 02/26/1991 | US4996122 Photosensitizer containing mono-, di- and triesters of 2,3,4-trihydroxybenzophenone-1,2-naphthoquinone-2-diazo-4-sulfonic acid with phenolic resin binder |
| 02/26/1991 | US4996120 Holographic photopolymer compositions and elements containing a ring-opening monomer |
| 02/26/1991 | US4996080 Atomized spray droplets; uniform thickness |
| 02/26/1991 | US4996075 Method for producing ultrathin metal film and ultrathin-thin metal pattern |
| 02/25/1991 | CA2023791A1 Radiation-sensitive positive resist composition |
| 02/25/1991 | CA2023764A1 Solid imaging method utilizing compositions comprising thermally coalescible materials |
| 02/23/1991 | CA2023668A1 Radiation-sensitive mixture |
| 02/23/1991 | CA2023662A1 Reaction product, preparation thereof and radiation-sensitive material obtained therewith |
| 02/23/1991 | CA2023661A1 Reaction product, preparation thereof and radiation-sensitive mixture preparable therewith |
| 02/23/1991 | CA2023660A1 Radiation-sensitive positive-working mixture |
| 02/22/1991 | CA2023629A1 Photosensitive aqueous developable gold conductor composition |
| 02/22/1991 | CA2023628A1 Photosensitive aqueous developable copper conductor composition |
| 02/22/1991 | CA2023602A1 Photosensitive semi-aqueous developable gold conductor composition |