Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
09/1990
09/19/1990EP0388343A2 Chemically amplified photoresist
09/19/1990EP0388039A2 Applicator for applying dry film solder mask on a board
09/19/1990EP0387982A2 Spray silylation of photoresist images
09/19/1990EP0387822A1 Photosensitive recording material and process for producing printed circuits
09/19/1990EP0387709A2 Semiconductor device manufacturing apparatus
09/19/1990EP0387623A2 Positive-working radiation-sensitive composition and radiation-sensitive recording material for use with high-energy radiation prepared therefrom
09/19/1990EP0387578A2 Method of manufacturing a relief printing plate with a non-tacky printing surface
09/18/1990WO1990011550A1 Photosensitive printing component with a printing layer and a covering layer of differing solubility and a process for developing it in one working cycle
09/18/1990WO1990011344A1 Fluid compound for cleaning off polymeric materials adhering to a surface
09/18/1990US4958233 Digital and analog image recording apparatus
09/18/1990US4958160 Projection exposure apparatus and method of correcting projection error
09/18/1990US4958082 Position measuring apparatus
09/18/1990US4957988 Process and polymers for the production of images
09/18/1990US4957946 Ferrocene type complexes, epoxy resins, vinyl ethers and vinyl esters
09/18/1990US4957852 Hot embossing plates crosslinkable by photopolymerization
09/18/1990US4957850 Wear resistance, relief images
09/18/1990US4957846 Photoresists, photolithography, printed circuits
09/18/1990US4957845 Protective layer with photofading material
09/18/1990US4957843 Multicolor photocopy system, wax or acrylated compound
09/18/1990US4957588 Treating a quinone diazide resin with a silicon compound
09/18/1990CA2047234A1 Photosensitive printing component with a printing and a covering layer of differing solubility and a process for developing it in one working cycle
09/17/1990WO1990010881A1 Method of production and duplication of filter, and method of production of photosensitive member provided with the filter
09/17/1990CA2012258A1 Image-forming material and process for forming images
09/13/1990DE4007576A1 Presensitised plate for prodn. of lithographic printing plates - has substrate, primer, light-sensitive layer contg. unsatd. monomer or oligomer, photo-initiator and di:azo-resin etc.
09/12/1990EP0387193A1 Substituted unsaturated bireactive bicyclic imides and their use
09/12/1990EP0387087A2 Photoinitiator compositions, photohardenable compositions and photosensitive microcapsules
09/12/1990EP0387086A2 Photoinitiator compositions, photohardenable compositions containing the same
09/12/1990EP0387038A2 Reflecting device and pattern transfer apparatus using the same
09/12/1990EP0387035A2 Sheet positioning device
09/12/1990EP0386780A2 Photosensitive composition
09/12/1990EP0386777A2 PS plate for use in making lithographic printing plate requiring no dampening water
09/12/1990EP0386650A2 Aqueous disperse systems of photoinitiators and their use
09/12/1990EP0386609A1 Method of removing a layer of organic matter
09/12/1990CN1009583B Photoetching method and fixture for angle square
09/11/1990US4956662 Apparatus for and method of recording color picture image
09/11/1990US4956649 Image recording apparatus forming photomasking pattern on photosensitive medium
09/11/1990US4956309 Microroughened developer sheet for forming high density images
09/11/1990US4956265 Radiation crosslinkable compositions
09/11/1990US4956264 Polymeric binder, polyunsaturated compound with free radical polymerizable derivative of (alk)acrylic acid, photoinitiator; for photoresists
09/11/1990US4956262 Photosensitive printing plate for waterless offset printing with photosensitive layer of diazonium salt polycondensation product and photopolymerizable composition and overlying silicone rubber layer
09/11/1990US4956261 Photosensitive diazo and photopolymerizable recording material with a photosensitive diazo intermediate layer
09/11/1990US4956260 Light-sensitive material containing silver halide, reducing agent and polymerizable compound, and image-forming method employing the same
09/11/1990US4956253 Receiver contains (poly)amine or sulfinate hardener; exposing light sensitive material, pressing to transfer unpolymerized p olymerizable material
09/11/1990US4956252 Aqueous processible photosensitive compositions containing core shell microgels
09/11/1990CA2011728A1 Positive radiation-sensitive mixture, and radiation-sensitive recording material produced therefrom for high-energy radiation
09/11/1990CA2011726A1 Radiation-curable mixture, and radiation-sensitive recording material produced therefrom for high-energy radiation
09/11/1990CA1273792A1 Recording medium of improved stability
09/09/1990CA2009653A1 Photoinitiator compositions containing o-acylthiohydroxamate or an n-alkoxypyridinethione and photohardenable compositions containing the same
09/09/1990CA2009652A1 Photoinitiator compositions containing disulfides and photohardenable compositions containing the same
09/08/1990WO1990010660A1 Free-radical curable compositions
09/08/1990CA2047669A1 Free-radical curable compositions
09/07/1990WO1990010254A1 Production of three dimensional bodies by photopolymerization
09/07/1990WO1990010247A1 Partially coherent optical system with scattering type object
09/07/1990WO1990010047A1 Fabrication of printed wiring boards by projection imaging
09/07/1990CA2011555A1 Aqueous disperse systems of photoinitiators and their use
09/07/1990CA2011451A1 Substituted, unsaturated, bireactive bicyclic imides and the use thereof
09/05/1990EP0385466A2 Photosensitive reproduction element containing a photorelease layer
09/05/1990EP0385447A2 Process for preparing of semiconductor device and pattern-forming coating solution used for this process
09/05/1990EP0385442A1 Positive-working photoresist composition
09/05/1990EP0385302A1 Coatings of intermediate molecular weight polyimides
09/05/1990EP0385122A1 Improved composition for photo imaging
09/05/1990EP0385015A1 Terpene-based solvents for washout of photopolymer printing plates
09/05/1990EP0385013A1 Production of precision patterns on curved surfaces
09/05/1990EP0294379A4 Purge air system for a combustion instrument
09/04/1990US4954862 Exposure apparatus for color imaging system
09/04/1990US4954717 Pattern on transparent sustrate
09/04/1990US4954543 Coating for increasing sensitivity of a radiation imageable polyacetylenic film
09/04/1990US4954534 Photodecomposing organosilicon compounds and photopolymerizable epoxy resin compositions containing the organosilicon compounds
09/04/1990US4954428 Coating for increasing sensitivity of a radiation imageable polyacetylenic film
09/04/1990US4954424 Dry etching resistance, photoresists
09/04/1990US4954421 Photoflashing a liquid polymer layer on a phototool surface exposed to air
09/04/1990US4954418 Formation method and photoresist composition for phosphor screens of color picture tubes
09/04/1990US4954417 Light-sensitive microcapsule containing polymerizable compound and silver halide, and light-sensitive material employing the same
09/04/1990US4954416 Photosensitized coordination compounds; synergistic; photoresists; protective coatings; printing plates; graphic arts
09/04/1990US4954415 Photoinitiator compositions containing O-acylthiohydroxamate or an N-alkoxypyridinethione and photohardenable compositions containing the same
09/04/1990US4954414 Photosensitive composition containing a transition metal coordination complex cation and a borate anion and photosensitive materials employing the same
09/04/1990US4954297 Endless belt casting surface
09/04/1990US4953982 Method and apparatus for endpoint detection in a semiconductor wafer etching system
09/04/1990US4953960 Optical reduction system
09/04/1990CA1273736A1 Liquid photopolymers curable to fire-retardant, hydrolysis-resistant compositions
09/04/1990CA1273599A1 Screen material for printing materials
09/04/1990CA1273522A1 Positive photoresist compositions
09/04/1990CA1273521A1 Radiation-sensitive composition and recording material based on compounds which can be split by acid
09/03/1990CA2010619A1 Photosensitive reproduction element containing a photorelease layer
08/1990
08/30/1990DE3910048A1 Method for producing or inspecting microstructures on large-area substrates
08/30/1990DE3906335A1 Support for a recording material, and a process for the production thereof
08/30/1990DE3906179A1 Vorrichtung zum belichten von photopolymeren druckplatten Apparatus for exposing photopolymer printing plates
08/29/1990WO1990010255A1 Device for exposing photopolymer printing plates
08/29/1990EP0384892A1 Photoresistant compositions
08/29/1990EP0384616A2 Method for making electronic components using a masking material and a masking material therefor
08/29/1990EP0384481A1 Positive photoresist composition and method for formation of resist pattern
08/29/1990EP0384366A2 Photosensitive recording element
08/29/1990EP0384328A2 Multi-layer resist
08/29/1990EP0384145A1 Multilevel resist plated transfer layer process for fine line lithography
08/29/1990CN1044995A Process for the vapor deposition of polysilanes
08/29/1990CA2046862A1 Device for exposing photopolymer printing plates
08/28/1990US4952970 Autofocusing system for a projecting exposure apparatus
08/28/1990US4952968 Apparatus for the formation of images
08/28/1990US4952961 Apparatus for processing a printing plate with a liquid
08/28/1990US4952958 Photo-sensitive printing plate automatic developing apparatus