Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/1990
10/31/1990EP0394936A2 Pigment-transfer sheets and method for decorating heat-resistant articles
10/31/1990EP0394924A2 Photosensitive lithographic printing plate requiring no wetting water
10/31/1990EP0394923A2 Photosensitive lithographic printing plate requiring no wetting water
10/31/1990EP0394875A1 Method for making electrically conductive patterns
10/31/1990EP0394874A2 Lithographic printing plate material improved in water retention characteristics
10/31/1990EP0394846A2 Organic photochromic compound
10/31/1990EP0394741A2 Deep UV etch resistant system
10/31/1990EP0394740A2 Dry development resist system
10/31/1990EP0394739A2 Process to dimensionally stable transfer of structures with a two layer resist
10/31/1990EP0394738A2 Multilayer photoresist system
10/31/1990EP0394597A1 Follow-up System for Monitoring the Etching Process in an RIE Equipment and its Application to Producing High-resolution and Reproducible Patterns
10/31/1990EP0394353A1 Aqueous developing solution and its use in developing positive-working photoresist composition
10/31/1990CN1046615A 固体成象系统 Solid imaging system
10/31/1990CN1046614A Additives imparting reduction of shrinkage to photohardenable compositions
10/31/1990CN1046613A Sold imaging method utilizing photohardenable compositions of self limiting thickness by phase separation
10/31/1990CN1010274B Raised relief circuit board with soldered connections having nomenclature applied thereto
10/30/1990US4967227 Color image recording apparatus with mask member registering mechanism
10/30/1990US4966923 Containing (meth)alkyl substituted bicyclo(2.2.1)hep-5-ene-2,3-dicarboxylic acid imide and acrylated ester
10/30/1990US4966832 Method of treating inner mold surface
10/30/1990US4966830 Sensitizer, initiator
10/30/1990US4966828 Photoinitiators
10/30/1990US4966827 Polymer printing
10/30/1990US4966664 Electrolysis in a basic bath where the substrate with resist functions as electrode
10/30/1990US4966440 Post-exposure dye treatment in the production of holograms
10/30/1990US4966428 Manufacture of integrated circuits using holographic techniques
10/30/1990CA1275741C Flowing gas seal enclosure for processing workpiece surface with controlled gasenvironment and intense laser irradiation
10/30/1990CA1275740C Method for making multilayer circuits using embedded catalyst receptors
10/27/1990CA2014554A1 Organic photochromic compound
10/25/1990DE3912188A1 Laser surface marking device e.g. for electric cables - uses concentration of laser beam after passing through aperture mask
10/24/1990EP0393994A2 A linear driving apparatus
10/24/1990EP0393921A1 Non-moiré shielded window
10/24/1990EP0393799A2 Vapor deposited photoresists of anionically polymerizable monomers
10/24/1990EP0393712A1 Method for making electrically conductive patterns
10/24/1990EP0393677A2 Solid imaging system
10/24/1990EP0393676A1 Solid imaging method using photohardenable compositions containing hollow spheres
10/24/1990EP0393675A1 Solid imaging method using photohardenable materials of self limiting thickness
10/24/1990EP0393674A1 Solid imaging method utilizing photohardenable compositions of self limiting thickness by phase separation
10/24/1990EP0393673A2 Solid imaging method using multiphasic photohardenable compositions
10/24/1990EP0393672A2 Additives imparting reduction of shrinkage to photohardenable compositions
10/24/1990EP0393348A2 Negative photoresist and use thereof
10/24/1990CN1046331A Photohardenable composition containing five member aromatic group with imine moiety
10/24/1990CA2015189A1 Photosensitive lithoraphic printing plate requiring no wetting water
10/24/1990CA2015187A1 Photosensitive lithographic printing plate requiring no wetting water
10/24/1990CA2013315A1 Layer thermally processable imaging element comprising an overcoat layer
10/23/1990US4965749 Method and apparatus providing skip line asynchronous imaging
10/23/1990US4965657 Resin encapsulated semiconductor device
10/23/1990US4965630 Projection exposure apparatus
10/23/1990US4965625 Image forming apparatus having image forming data inputting device
10/23/1990US4965623 Image recording apparatus and method
10/23/1990US4965622 Image forming apparatus
10/23/1990US4965592 Image processing apparatus for reproducing images on projector screen and photosensitive medium
10/23/1990US4965454 Method and apparatus for detecting foreign particle
10/23/1990US4965400 Acylation of 2,6-di-substituted phenol with acetic anhydride, esterifying, hydrogenation, and dehydrating
10/23/1990US4965316 Radiation sensitive polymers and use thereof
10/23/1990US4965294 Photoinitiator dispersions
10/23/1990US4965172 Humidity-resistant proofing toners with low molecular weight polystyrene
10/23/1990US4965171 Photopolymerizable composition
10/23/1990US4965168 Silver master plate recovery solution
10/23/1990US4965167 Positive-working photoresist employing a selected mixture of ethyl lactate and ethyl 3-ethoxy propionate as casting solvent
10/23/1990US4965165 Donor media shelf life stabilization by control of exposure to contacting oxygen and moisture
10/23/1990US4965152 Holographic notch filters
10/23/1990US4965073 Forming photoresist film, exposing, developing
10/23/1990US4964937 Thin film adhering method and thin film adhering apparatus
10/23/1990US4964726 Apparatus and method for optical dimension measurement using interference of scattered electromagnetic energy
10/23/1990US4964720 Exposure apparatus
10/23/1990US4964705 Unit magnification optical system
10/23/1990US4964698 System for selective laser assisted plating
10/21/1990CA2015095A1 Process for making electrically conductive patterns
10/21/1990CA2015094A1 Process for making electrically conductive patterns
10/21/1990CA2015093A1 Process for making electrically conductive patterns
10/21/1990CA2014810A1 Solid imaging system
10/21/1990CA2014809A1 Solid imaging method using compositions containing core-shell polymers
10/21/1990CA2014808A1 Additives imparting reduction of shrinkage to photohardenable compositions
10/21/1990CA2014807A1 Solid imaging method utilizing photohardenable compositions of self limiting thickness by phase separation
10/21/1990CA2014806A1 Solid imaging method using multiphasic photohardenable compositions
10/21/1990CA2014805A1 Solid imaging method using photohardenable compositions containing hollow spheres
10/21/1990CA2014804A1 Solid imaging method using photohardenable materials of self limiting thickness
10/18/1990WO1990012342A1 A near infrared laser absorbing coating and method for using same in color imaging and proofing
10/18/1990WO1990012051A1 Base-soluble polyimide release layers for use in microlithographic processing
10/18/1990WO1990011837A1 Process for coating a photoresist composition onto a substrate
10/18/1990DE3912223A1 Ultraviolet metal-halogen tube - with lead-contg. filling with increased energy efficiency
10/18/1990CA2014487A1 Light-sensitive bis-trichloromethyl-s-triazines, process for their preparation and light-sensitive composition containing said compounds
10/17/1990EP0392868A2 Method of producing light control plate which induces scattering of light at different angles
10/17/1990EP0392409A1 Photoresist composition
10/17/1990EP0392236A1 Process for forming a fine pattern
10/17/1990EP0391913A1 Radiation sensitive resist material
10/17/1990EP0391912A1 Process and device for pre-drying or through-hardening of photocoated printed circuit boards
10/16/1990US4964145 System for magnification correction of conductive X-ray lithography mask substrates
10/16/1990US4963924 Linewidth loss measurement
10/16/1990US4963921 Device for holding a mask
10/16/1990US4963918 Image forming apparatus for reproducing images on photosensitive medium by exposing the medium to radiation through image-bearing original
10/16/1990US4963473 Automatic development
10/16/1990US4963472 Developing method for printing plates for waterless offset printing with glycol diether containing developer
10/16/1990US4963471 Mixture of fluorinated binder, unsaturated liquid monomer plasticizer, photoinitiator
10/16/1990US4963470 Titanocenes and their use
10/16/1990US4963463 Photoresists suitable for dry development with plasma etching; resolution; accuracy
10/16/1990US4963462 Positive working, peel developable, color proofing system having two photosensitive layers
10/16/1990US4963461 Light-sensitive micropcapsule and light-sensitive material employing the same
10/16/1990US4963460 Light-sensitive material containing silver halide, reducing agent and polymerizable compound with silver halide outside and inside of microcapsules
10/16/1990US4963459 Forming detectable registration mark by exposure to actinic radiation
1 ... 1159 1160 1161 1162 1163 1164 1165 1166 1167 1168 1169 1170 1171 1172 1173 1174 1175 1176 1177 1178 1179 ... 1272