Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
01/1991
01/09/1991EP0407081A2 Lithoplate production
01/09/1991EP0406683A2 Radiation polymerizable composition and recording material comprising said composition
01/09/1991EP0406669A2 Thin film making method on semiconductor substrate and temperature controlling systems therefor
01/09/1991EP0406600A1 Photocurable composition and photocurable recording material made therefrom
01/09/1991EP0406599A1 Photopolymerisable composition and recording material produced therefrom
01/09/1991EP0406427A1 Production method of color filter
01/09/1991CN1048458A Improved holographic optical combiners for head-up displays
01/08/1991US4984259 X-ray exposure apparatus
01/08/1991US4984016 Cassette for photo-sensitive recording medium
01/08/1991US4984015 Exposure method and apparatus
01/08/1991US4984012 Color image copying apparatus
01/08/1991US4984011 Image recording apparatus
01/08/1991US4984009 Imaging device having means to accurately superpose sheets in the developing process
01/08/1991US4983842 Image reading apparatus
01/08/1991US4983670 Cellulose acetate bound photosensitizer for producing singlet oxygen
01/08/1991US4983501 Water-insoluble binder, compound forming strong acid on irradiation, acetal, relief image formation
01/08/1991US4983500 Resolution, contrast
01/08/1991US4983498 Photopolymerizable mixture and recording material produced therefrom
01/08/1991US4983495 Positive resist patterns
01/08/1991US4983493 Dyes for heat sensitive transfer recording
01/08/1991US4983492 Positive dye photoresist compositions with 2,4-bis(phenylazo)resorcinol
01/08/1991US4983491 Lithographic printing plates
01/08/1991US4983490 Removing, stripping, cleaning
01/08/1991US4983489 Heat developing light sensitive material after or with light exposure
01/08/1991US4983479 Method of manufacturing a laminated element and the element thus obtained
01/08/1991US4983478 Water-soluble addition polymer or copolymer containing sulfonic acid or sulfonate groups
01/08/1991US4983419 Method for generating thin layers on a silicone base
01/08/1991US4983254 Processing for stripping organic material
01/08/1991US4983252 Process for producing printed circuit board
01/08/1991US4983248 Thin-film coating method and apparatus therefor
01/08/1991US4983246 Hot stamping decal resist
01/08/1991US4983039 Spectrometer
01/08/1991CA2020662A1 Radiation-polymerizable mixture and recording material containing it
01/08/1991CA1278663C Process for preparing photopolymer flexographic element with melt extrusioncoated elastomeric surface layer
01/07/1991CA2019693A1 Acid-hardening photoresists of improved sensitivity
01/03/1991DE3921459A1 Strahlungshaertbare bindemittelsysteme mit (alpha)-substituierten sulfonylverbindungen als fotoaktivatoren Radiation-curable binder systems sulfonyl compounds as activators with photo (alpha) -substituted
01/03/1991DE3920420A1 Optical components prodn. - by irradiating dye mols. in a polymer matrix with linearly polarised light to produce a structured variation in optical properties
01/02/1991EP0405986A2 method of processing presensitized lithographic printing plate
01/02/1991EP0405957A1 Deep U.V. photoresist compositions containing polycyclic cyclopentane -2- diazo-1,3-dione
01/02/1991EP0405585A2 A method of manufacturing a semiconductor device
01/02/1991EP0405563A2 Illumination system
01/02/1991EP0405464A2 Polyether acrylamide derivatives and active energy ray curable resin composition
01/02/1991EP0405246A1 Light-sensitive mixture and registration material prepared thereof
01/02/1991CN1011091B Quick nondestructive regeneration of precoated photosensitive positive plate
01/02/1991CA1278635C Organosilicon polymer composition and use thereof for photolithography
01/02/1991CA1278625C Additive method for manufacturing printed circuit boards using aqueous alkaline developable and strippable photoresists
01/02/1991CA1278608C Intense laser irradiation using reflective optics
01/01/1991US4982229 Vacuum contact printing method and apparatus having a friction-reducing sheet
01/01/1991US4982227 Photolithographic exposure apparatus with multiple alignment modes
01/01/1991US4982226 Exposure device
01/01/1991US4982225 Image forming apparatus for controlling the humidity and operating parameters associated with an image forming process
01/01/1991US4982224 Photosensitive medium carrying information associated with image forming conditions, and image forming apparatus using the photosensitive medium
01/01/1991US4982215 Method and apparatus for creation of resist patterns by chemical development
01/01/1991US4981909 Photoresists
01/01/1991US4981778 Polysiloxane, resist for ion beam and electron beam lithography
01/01/1991US4981771 Lithography, x-ray mask
01/01/1991US4981770 Photolithography masks
01/01/1991US4981433 Sheet heating device
12/1990
12/31/1990WO1991000312A1 Radiation-curable binding agent systems with alpha-substituted sulphonyl compounds as photo-activators
12/31/1990CA2035460A1 Radiation-curable binder systems containing .alpha.-substituted sulfonyl compounds as photoactivators
12/29/1990CA2019632A1 Method of processing presensitized lithographic printing plate
12/29/1990CA2019555A1 Deep u.v. photoresist compositions containing polycyclic cyclopentane-2-diazo-1, 3-dione
12/28/1990CA2019824A1 Polyether acrylamide derivatives and active energy ray curable resin composition
12/27/1990WO1990015714A1 A method and a scanning device for preparation of large working surfaces, particularly printing patterns on serigraphic printing frames
12/27/1990EP0404742A2 Method of making and using a high resolution lithographic mask
12/27/1990EP0404522A2 Multilayer imaging article for transfer color proofing
12/27/1990EP0404507A2 Positive or negative working overlay color proofing system having photoresistive layer
12/27/1990EP0404499A2 Photosensitive compositions comprising selected photoactive materials and their use in producing high resolution, photoresist images with near ultraviolet radiation
12/27/1990EP0404446A2 A method of forming photoresists by polymerisation of di-unsaturated monomers
12/27/1990EP0404406A2 Light source unit for using exposure
12/27/1990EP0404340A2 Lithographic technique using laser scanning for fabrication of electronic components and the like
12/27/1990EP0404206A2 Resist compositions
12/27/1990EP0404192A2 Light-sensitive material containing silver halide, reducing agent, polymerizable compound and base precursor
12/27/1990EP0404099A2 Improved holographic optical combiners for head-up displays
12/27/1990EP0404098A2 Holographic optical elements having a reflection hologram formed in a photopolymer
12/27/1990EP0403758A2 Solid imaging method using compositions containing core-shell polymers
12/27/1990EP0403580A1 Light-sensitive novolac resins.
12/27/1990EP0403561A1 Optical devices and methods of fabrication thereof.
12/27/1990EP0396538A4 Method of making a thin lens
12/26/1990CN1010987B Photo hardening electro static printing mould containing electron donor and donee
12/26/1990CN1010986B Photo-hardening electro static printing mould with improved umkehr effect and electricity erasing ability
12/25/1990US4980896 Laser beam
12/25/1990US4980722 Apparatus for transporting a photosensitive sheet at different speeds in accordance with the operation being performed by the machine
12/25/1990US4980718 Registration method in photolithography and equipment for carrying out this method
12/25/1990US4980563 For performing deep UV projection lithography
12/25/1990US4980536 Removal of particles from solid-state surfaces by laser bombardment
12/25/1990US4980271 Developer compositions for lithographic printing plates with benzyl alcohol, potassium toluene sulfonate and sodium (xylene or cumene) sulfonate
12/25/1990US4980269 Photosensitive elastomeric composition
12/25/1990US4980268 Negative photoresists of the polyimide type containing 1,2-disulfones
12/25/1990US4980266 Photosensitive resin composition
12/25/1990US4980264 Photoresist compositions of controlled dissolution rate in alkaline developers
12/25/1990US4980263 Light-sensitive diazo resin composition with polyurethane and compound having ureido, thioureido, urethane, or thiourethane unit
12/25/1990US4980261 Simultaneous development and polymerization
12/25/1990US4980260 Multi-color image-forming method with microcapsule positive diazotype color image formation and positive light-solubilizing color image formation
12/25/1990US4980022 Method of removing a layer of organic matter
12/25/1990US4979464 Apparatus for treating wafers in the manufacture of semiconductor elements
12/23/1990CA2019666A1 Photoresists formed by polymerization of di-unsaturated monomers
12/22/1990CA2017870A1 Holographic optical elements having a reflection hologram formed in a photopolymer
12/22/1990CA2017869A1 Holographic optical combiners for head-up displays
12/21/1990CA2019366A1 Photopolymerizable mixture and recording material produced therefrom