| Patents for G03C 1 - Photosensitive materials (26,817) |
|---|
| 02/13/2008 | CN201021999Y Multi-function MP3 learning pen and auxiliary digital fiche |
| 02/13/2008 | CN201021998Y Wireless separated multi-function learning pen and auxiliary digital fiche |
| 02/13/2008 | CN100368443C High molecular compound, photo anti-corrosion agent material and pattern forming method |
| 02/07/2008 | US20080033078 Polyoxyalkylene ammonium salts and their use as antistatic agents |
| 02/07/2008 | US20080032241 Resist Polymer, Process For Production Thereof, Resist Composition, And Process For Production Of Substrated With Patterns Thereon |
| 02/07/2008 | US20080032232 Novel resins and photoresist compositions comprising same |
| 02/07/2008 | US20080032230 Substrate used for immersion lithography process, method of manufacturing substrate used for immersion lithography process, and immersion lithography |
| 02/07/2008 | US20080032229 Bottom antireflective coatings |
| 02/07/2008 | US20080032228 Photoresists; for immersion lithography |
| 02/07/2008 | US20080032083 Manufacturing Process, Such as Three-Dimensional Printing, Including Solvent Vapor Filming and the Like |
| 02/05/2008 | US7326527 Silver salt photothermographic dry imaging material and image forming method by use thereof |
| 02/05/2008 | US7326526 Monolayer thick molecular film of self assembled molecules of a photochromic complex of a transition metal, lanthanide or lead; 4-(decyloxy)pyridine-2,6-dicarboxylic acid, 6-nitro-1',3',3'-trimethylspiro (2H-1-benzopyran-2,2'indoline), 2,2'-dipyridylethylene, and/or spirodihydroindolizine groups |
| 02/05/2008 | US7326523 Low refractive index polymers as underlayers for silicon-containing photoresists |
| 02/05/2008 | US7326519 Photosensitive resin, photoresist composition having the photosensitive resin and method of forming a photoresist pattern using the photoresist composition |
| 02/05/2008 | US7326518 Photoresist compositions |
| 02/05/2008 | US7326514 Polymer containing silicon and/or boron for (extreme) ultraviolet (EUV) lithography; isoprene and/or styrene polymers hydrosilated and/or hydroborated with organosilane, dimesitylborane, and or carboranecarboxylic acid; reactive ion etch resistance, transmission; doping substrates |
| 02/05/2008 | US7326509 Composition for forming anti-reflective coating for use in lithography |
| 02/05/2008 | US7326504 Polymeric based anti-copy film having a imageable substrate that is imageable on opposing surfaces, where the images are complementary to one another, the film being well suited for use with documents |
| 01/31/2008 | US20080026334 Topcoat layers for phosphor or scintillator screens or panels |
| 01/31/2008 | US20080026333 Comprising blue-sensitive layer, green-sensitive layer and red-sensitive layer on a transparent support; capable of recording digital image information without deterioration |
| 01/31/2008 | US20080026324 An aluminum support having a hydrophilic surface; photosensitive layer comprising a binder polymer comprising a pigment dispersed with a dispersant which is free from a carboxyl, phosphonate, or phosphate group; antisoilants, durability, discoloration inhibition |
| 01/31/2008 | US20080026323 Heat-sensitive transfer image-receiving sheet |
| 01/31/2008 | US20080026322 Hydrolytic condensation of organosilicon compound using acid and basic catalyst with Group 1a hydroxide, organic acid and solvent; efficiency patterning photoresist film |
| 01/31/2008 | US20080026321 Positive-working photoresist composition for thick film formation |
| 01/31/2008 | US20080026320 minimize the refractive indices difference by using a high refractive index organic component and a low refractive index inorganic component; nontoxic, inexpensive, thermal decomposition; high resolution, high compactness by exposure to light only once; butyl methacrylate-methy methacrylate copolymer |
| 01/31/2008 | US20080026319 Laser marking of coated articles and laser-markable coating composition |
| 01/31/2008 | US20080026318 depositing a metal layer into the opening to form a roughening metal bump with improved adhesion; first depositing a composite sacrificial material comprises photoresist material with a filler mixture, irradiating to form a opening, baking, developing; flip-chip packaging a microelectronic chip |
| 01/31/2008 | US20080026317 Method for using compositions containing fluorocarbinols in lithographic processes |
| 01/31/2008 | US20080026316 Photoresist composition with antibacterial agent |
| 01/31/2008 | US20080026315 Fluorinated half ester of maleic anhydride polymers for dry 193 nm top antireflective coating application |
| 01/31/2008 | US20080026302 Black matrix compositions and methods of forming the same |
| 01/29/2008 | US7323294 Photographic colour material containing a resorcinol derivative as black coupler |
| 01/29/2008 | US7323288 A radiation-sensitive medium having a thermally softenable hydrophobic polymer, a hydrophilic polymer, and a binder that binds to both layers; the medium is aqueous-ineluable when coated and dried, and becomes hydrophobic when heated; lithography; latent images |
| 01/29/2008 | US7323285 Polyester and a slip agent, does not contain silica particles; dimensional stability, lubrication to facilitate transport of the donor through printing mechanism; transfer efficiency, performance equivalent to slip and heat-resistant layers, preventing sticking of dye-doner to print head |
| 01/24/2008 | US20080020332 Device, System And Method For Operating A Digital Radiograph |
| 01/24/2008 | US20080020323 Light sensitive planographic printing plate material |
| 01/24/2008 | US20080020322 Photosensitive organic semiconductor compositions |
| 01/24/2008 | US20080020320 Color forming composition containing optional sensitizer |
| 01/24/2008 | US20080020319 Graded ARC for high na and immersion lithography |
| 01/24/2008 | US20080020317 Novel metal nanoparticle and formation of conductive pattern using the same |
| 01/24/2008 | US20080020299 Mask and manufacturing method of microlens using thereof |
| 01/24/2008 | US20080020288 Resist Composition and Process for Formation of Resist Patterns |
| 01/24/2008 | US20080018725 Actinic radiation curable ink, image forming method and ink-jet recorder, utilizing the same |
| 01/23/2008 | EP1880248A2 Method of forming a photoresist element |
| 01/23/2008 | EP1560068B1 Barrier rib and its method of preparation |
| 01/23/2008 | CN101111372A Support for image recording material and image recording material |
| 01/22/2008 | US7321377 Device and method for laser marking |
| 01/22/2008 | US7320855 Depositing a photoresist substrate to form a photoresist layer on the material layer; applying a top antireflective coating and barrier layer, thereby forming a coated substrate, patternwise exposing the coated substrate to imaging radiation; removing, transferring the photoresist layer pattern |
| 01/22/2008 | US7320828 Composition for forming insulating film and process for producing insulating film |
| 01/17/2008 | WO2008007582A1 Polyfunctional compound, optical recording material, optical recording medium, optical recording/reproducing apparatus, optical waveguide material, and photo-alignment film material |
| 01/17/2008 | WO2007001495A8 Thermal development system and method of using the same |
| 01/17/2008 | US20080014529 polymer comprising one or more functional groups capable of interactions selected from covalent, ionic, and hydrogen bonding, and thermal acid generator which upon heating disassociates into constituent parts capable of interactions selected from covalent, ionic, and hydrogen bonding; reduced outgassing |
| 01/17/2008 | US20080014357 Enhanced Scratch Resistance of Articles Containing a Combination of Nano-Crystalline Metal Oxide Particles, Polymeric Dispersing Agents, and Surface Active Materials |
| 01/17/2008 | US20080014343 Enhanced Scratch Resistance of Articles Containing a Combination of Nano-Crystalline Metal Oxide Particles, Polymeric Dispersing Agents, and Surface Active Materials |
| 01/17/2008 | US20080011416 Method for bonding and debonding a workpiece to a manufacturing fixture |
| 01/16/2008 | EP1877862A1 Multi-layer recording support |
| 01/16/2008 | EP1877861A1 Silver halide color photographic light-sensitive material |
| 01/16/2008 | CN101107564A Heat-development recording apparatus and heat-development recording method |
| 01/16/2008 | CN100362428C Improved thermosetting anti-reflective coatings at deep ultraviolet |
| 01/15/2008 | US7320110 Multiple language user interface for thermal comfort controller |
| 01/15/2008 | US7318992 Polysilsesquioxanes containing hydroxyphenylalkyltrioxy units and phenylsilanetrioxy units some of which are substituted with an acid dissociable dissolution inhibiting group connected by an ether oxygen to the phenyl ring (1-ethoxyethyl); acid generator |
| 01/15/2008 | US7318991 Diphenylsulfonium compounds in which the S atom is additionally attached to a xanthene-9-onyl-2-yl- or coumarin-7-yl- ring; acid generator for a chemically amplified resist; photopolymerization initiator for polymerizing an epoxide or a vinyl ether |
| 01/15/2008 | US7318946 Antistatic film manufacturing method |
| 01/15/2008 | CA2382995C Transmission cable optical fiber protector and method |
| 01/10/2008 | WO2006104803A3 Novel photosensitive resin compositions |
| 01/10/2008 | US20080008965 Ester compounds and their preparation, polymers, resist compositions and patterning process |
| 01/10/2008 | US20080008963 Reversible heat-sensitive recording medium and method of recording an image using the heat-sensitive recording medium |
| 01/10/2008 | US20080008962 photoresists; heat treatment; improved sensitivity and resolution, for micropatterning lithography |
| 01/10/2008 | US20080008961 Comprising resin component and compound which generates an acid in response to actinic light or radiation; suitable for microfabrication lithography with advantages of resolution, pattern density dependence and mask fidelity |
| 01/10/2008 | US20080008960 Mixture of an adamantane acrylic ester resin which becomes soluble in alkaline developer under action of an acid and sulfonium salt acid generator; microlithography with advantages of resolution, pattern density dependence and mask fidelity; use in precise microfabrication |
| 01/10/2008 | US20080008959 Resin comprising monomers of cyclopentyl- or cyclohexyl (meth)acrylate; hydroxyadamantyl (meth)acrylate; 3,8-epoxy-6-oxabicyclo[3.2.1]octyl (meth)acrylat;, and/or fluoroalkyl (meth)acrylate; ArF lithography; resolution; forms a pattern with high rectangularity |
| 01/10/2008 | US20080008958 background including decorative printing forming security feature, wherein decorative printing fluoresces when viewed under UV light; decorative printing arranged between background layers; printing including lacquer which contains high-viscosity binding agent and pigments which fluoresce under uv light |
| 01/10/2008 | US20080008957 Negative-working radiation-sensitive compositions and imageable elements |
| 01/10/2008 | US20080008956 Positive-working imageable members with branched hydroxystyrene polymers |
| 01/10/2008 | US20080008955 Producing composite single layer under photoresist comprised of polymer components having chromophore and transparent moieties |
| 01/10/2008 | US20080008954 High silicon-content thin film thermosets |
| 01/10/2008 | US20080008943 Ink composition, inkjet recording method, printed material, method of producing planographic printing plate, and planographic printing plate |
| 01/10/2008 | US20080008939 Deposition of Photosensitive Media For Digital Hologram Recording |
| 01/10/2008 | DE102004004865B4 Antireflexschicht, die mit einem Photoresist beschichtet ist, enthaltend Polymere auf der Basis von Zimtsäure für die 157 nm Photolithographie Anti-reflective coating that is coated with a photoresist, comprising polymers based on cinnamic acid for 157 nm photolithography |
| 01/09/2008 | EP1597627A4 Dissolution rate modifiers for photoresist compositions |
| 01/09/2008 | CN101103155A Apparatus for regulating the application width of a slide-fed curtain coater |
| 01/09/2008 | CN101101966A Phase change film material of silicon-adulterated sulfur series for phase change memory |
| 01/09/2008 | CN101101965A Phase change film material of silicon-adulterated sulfur series for phase change memory |
| 01/08/2008 | US7316895 Mixing the dispersion with an organic polymer to separate the silver halide particles from the dispersion; low fogging, high image density, high sensitivity and superior storage stability |
| 01/08/2008 | US7316887 Maximum sensitivity in 390 to 430 nm light region; laser responsive; computer direct drawing; image-exposing the photosensitive lithographic printing plate by means of a laser light; development of the image by an aqueous developer |
| 01/08/2008 | US7316886 For forming on resist film a protective film soluble in an alkali developing solution, capable of peeling off by an alkali developing solution used in a development while protecting the resist film from an immersion liquid in pattern formation by immersion exposure, and forming a good pattern |
| 01/08/2008 | US7316884 5-methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process |
| 01/08/2008 | US7316875 Photochromic paper with improved bistability |
| 01/03/2008 | WO2008000352A1 Material intended for forming or printing images and its manufacturing method |
| 01/03/2008 | US20080003523 substrate has a first layer having a first surface energy and having a planar measurement portion, a liquid containment pattern is over the measurement portion of the first layer, liquid containment pattern has a second surface energy that is different from the first surface energy |
| 01/03/2008 | US20080003522 Photoresist with metal oxide nanoparticles |
| 01/03/2008 | US20080003521 Process and a device for creating a pattern in a photoresist layer |
| 01/02/2008 | EP1872173A1 Photochromic materials having extended pi-conjugated systems and compositions and articles including the same |
| 01/02/2008 | EP1872172A2 Method and apparatus for analyzing an imaging material |
| 01/02/2008 | EP1709488A4 Photosensitive printing sleeves and method of forming the same |
| 01/02/2008 | EP1282605B1 Thioimidazolidine derivatives as light stabilisers for polymers |
| 01/01/2008 | US7314707 Silver halide photographic emulsion |
| 01/01/2008 | US7314706 Photosensitive coating on one side of a support; on the other side several nonphotosensitive layers some of which contain a water soluble phthalocyanine dye and a polymer of a vinyl tert-amine or vinyl N-heteroaryl monomer or quaternary ammonium salt of the polymer as a dye-fixing agent |
| 01/01/2008 | US7314705 Solvent; phthalocyanine or naphthalocyanine chromophore (silicon 2,3 naphthalocyanine bis(trihexylsilyloxide); color initiator; dye that changes color when mixed with initiator; one of the dye and initiator is soluble in the solvent under ambient conditions and the other is not. |
| 01/01/2008 | US7314704 Matrix mixture of an activator and color former (leuko dye) are adapted to form a mark, and fixer that retards fading of the dark mark when exposed to an oil; labeling of optical storage media and is a calcium salt of a monoalkyl phthalate |