| Patents for G03C 1 - Photosensitive materials (26,817) |
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| 04/23/2008 | EP1914594A2 Silver halide color photographic light-sensitive material and color image-forming method |
| 04/23/2008 | CN101167016A Silver halide color photographic light-sensitive material |
| 04/23/2008 | CN100383666C Photoresist composition and method for forming photoresist pattern |
| 04/23/2008 | CN100383663C Silver halides emulsions, silver halides colour photographic sensitive material and imaging method |
| 04/22/2008 | US7361709 Colored composition, method of manufacturing color filter, and method of manufacturing black matrix substrate |
| 04/22/2008 | US7361455 Anti-reflective coatings |
| 04/22/2008 | US7361450 optical waveguide for use in photoelectronic substrates; cured products excellent in workability, transparency, developability, adhesiveness and solder heat resistance |
| 04/22/2008 | US7361448 resist pattern thickening material contains a resin and a polyhydric alcohol; water-soluble or alkali-soluble; using the thickened resist pattern as a mask, a high-quality, high-performance semiconductor device having an extremely fine pattern can be produced |
| 04/22/2008 | US7361447 Photoresist polymer and photoresist composition containing the same |
| 04/22/2008 | US7361446 Positive resist composition |
| 04/22/2008 | US7361288 Components for high-frequency technology |
| 04/17/2008 | WO2008043853A2 Photochromic film |
| 04/17/2008 | WO2008043848A2 Protective film |
| 04/17/2008 | WO2007147782A3 Oxime sulfonates and the use therof as latent acids |
| 04/17/2008 | US20080090187 latex image forming layer has a viscosity increasing agent which is made of cellulose, treated with sodium hydroxide, then etherifying with ethylene oxide or propylene oxide; use in medical diagnostic applications; uniform coatings in continuous process |
| 04/17/2008 | US20080090179 copolymer of styrene or a-methylstyrene with hydroxy groups or ether groups attached a polycyclic ring; monomer including indene or acenaphthylene; molecular weight of 1,000 to 500,000; exhibit high resolution, etching resistance, good in-plane dimension uniformity |
| 04/17/2008 | US20080090177 aromatic polyester copolymer is alkali-developable photosensitive or thermal curable; used to form pattern on filter which exhibit physical properties resist to heat and chemicals, improve developability, and adhesiveness, high resolution; use for Liquid crystal display devices |
| 04/17/2008 | US20080090176 layer contains a cyclic olefin resin having an epoxy group and a photoacid generator; low stress properties and adhesion; prevent breakage of the semiconductor wafer in a process for grinding the backside to make them thinner |
| 04/17/2008 | US20080090175 aluminum support, a lower light sensitive layer and an upper light sensitive layer, each contains carbon black pigment chemically combined with the development inhibitor polyoxyethylene glycol; development latitude, chemical resistance, and safelight property |
| 04/17/2008 | US20080090173 alkali-soluble acrylate copolymer for use in photoresists, having a weight average molecular weight of 1,000 to 500,000; prevents water penetration during immersion lithography; fluoropolymers; photolithography for the microfabrication of semiconductor devices |
| 04/17/2008 | US20080090172 Resist composition and patterning process |
| 04/17/2008 | US20080090170 nano-imprinting pattern having concave and convex portions; Dummy grooves are formed in the template to absorb the liquid overflow for suppress friction force; photolithography method for semiconductor devices |
| 04/17/2008 | US20080090169 Composite Film Suitable as a Donor Support in a Radiation-Induced Thermal Transfer Imaging Process |
| 04/17/2008 | US20080090168 positive type photoresist resin film includes a support film and a thermosetting positive type photoresist resin layer laminated over the support film. The positive type photoresist resin layer contains alkali soluble resin, a diazide based photosensitive compound and a sensitivity enhancer |
| 04/17/2008 | US20080088813 Pattern Forming Material, Pattern Forming Apparatus and Pattern Forming Process |
| 04/17/2008 | DE102006048638A1 New perylene dyes e.g. useful as pigments in inks, paints, lacquers and plastics |
| 04/16/2008 | EP1910895A1 Thermally developable materials with abrasion-resistant backside coatings |
| 04/16/2008 | EP1529240A4 Electrolytes for electrooptic devices comprising ionic liquids |
| 04/16/2008 | CN201046636Y Two-sided ink-jet stamping loose-leaf photopaper having binding hole |
| 04/16/2008 | CN101164013A Immersion topcoat materials with improved performance |
| 04/15/2008 | US7358302 Copolymer of a first ethylenically unsaturated monomer containing fluorine with a second ethylenically unsaturated monomer containing no fluorine and no hydrophilic group; and transparent polymer: polyfluorenes |
| 04/15/2008 | US7358038 Black and white photothermographic material and image forming method |
| 04/15/2008 | US7358034 Method of processing on-press developable lithographic printing plate |
| 04/15/2008 | US7358030 Allowing a compound having a hydroxyl group to react with an alkenyl ether compound in presence of an acid catalyst; forming a protected hydroxy compound; chemical amplification type resist |
| 04/15/2008 | US7358028 Slightly alkali-soluble or alkali-insoluble novolak or polyhydroxystyrenic resin ; bisvinyloxyalkylene or polyvinyl ether curing agent; photoacid generator; organic solvent; high sensitivity, heat resistance and resolution; undulation suppression |
| 04/15/2008 | CA2343310C Polymerizable polyalkoxylated naphthopyrans |
| 04/10/2008 | WO2008040701A1 Non-transparent microvoided biaxially stretched film, production process therefor and process for obtaining a transparent pattern therewith |
| 04/10/2008 | WO2008040699A1 Process for producing a non-transparent microvoided self-supporting film |
| 04/10/2008 | WO2008040670A1 Non-transparent microvoided axially stretched film, production process therefor and process for obtaining a transparent pattern therewith. |
| 04/10/2008 | US20080085482 amphiphilic block copolymer capable of dispersing hydrophilic protective colloid particles in a hydrophobic solvent; maximum image density and reduced fog density; polyoxyethylene-initiated acrylamide or acrylate polymers |
| 04/10/2008 | US20080085478 Structure for pattern formation, method for pattern formation, and application thereof |
| 04/10/2008 | US20080085469 Novel photoacid generators, resist compositions, and patterning process |
| 04/10/2008 | US20080085468 Resist composition and pattern forming method using the same |
| 04/10/2008 | US20080085466 Polymer, resist protective coating material, and patterning process |
| 04/10/2008 | US20080085465 initiator that consumes oxygen that inhibits polymerization and that generates additional free radicals; oxygen scavenger is 2-methyl-1[4-(methylthio)phenyl]-2-morpholinopropan-1-one; imprint microlithography mold assembly; fluid layer on a substrate while minimizing the trapping of gases therein |
| 04/10/2008 | US20080085464 polymer compound having an acid-decomposable structure on a terminal of the polymer compound; and a compound capable of generating an acid upon irradiation; Chemical amplification photoresist; acrylic ester polymer with pendant alklyoxycarbonylalkylthio groups |
| 04/10/2008 | US20080085463 in photoresist compositions in microlithography, and especially for imaging negative and positive patterns in the production of semiconductors; High resolution, chemically amplified, deep ultraviolet; triphenylsulfonium 1-carba-closo-dodecarborane; bis(4-t-butylphenyl)iodonium 1-carba-closo-dodecarborane |
| 04/10/2008 | US20080084549 High refractive index media for immersion lithography and method of immersion lithography using same |
| 04/09/2008 | EP1909139A1 Copolymer and photothermographic material containing the same |
| 04/09/2008 | EP1323003B1 Photothermographic and photographic elements having a transparent support having antihalation properties and properties for reducing woodgrain |
| 04/09/2008 | CN101158803A Copolymer and photothermographic material containing the same |
| 04/09/2008 | CN100379566C Device and method for laser marking |
| 04/08/2008 | US7354965 Azo compound, colorant-containing curable composition, and color filter and method of producing the same |
| 04/08/2008 | US7354701 Photographic element with speed-enhancing compound |
| 04/03/2008 | US20080081300 Silver halide photosensitive material and image forming method using the same |
| 04/03/2008 | US20080081293 Gives patterns having high resolution, high sensitivity and good exposure margin; fine processing of semiconductors |
| 04/03/2008 | US20080081292 Resist composition and pattern forming method using the same |
| 04/03/2008 | US20080081291 Includes a hydrophilic support, at least one photopolymerizable photosensitive layer, and a protective layer; uniformity of halftone dot |
| 04/03/2008 | US20080081290 Resist composition, resin for use in the resist composition, compound for use in the synthesis of the resin, and pattern-forming method using the resist composition |
| 04/03/2008 | US20080081289 crosslinkable polymer containing a secondary benzyl acid-decomposable group with an acid-decomposable crosslinking group; acid generator; high sensitivity, line width roughness, reduction of Iso Dense Bias in a hyperfine region; KrF excimer laser beam |
| 04/03/2008 | US20080081288 Photosensitive composition, compound for use in the photosensitive composition, and pattern-forming method using the photosensitive composition |
| 04/03/2008 | US20080081287 Includes fumaric acid substituted by a first acid labile group released by an acid; a polymer in which an alkali-soluble polymer soluble in an alkaline solution is substituted by a second acid labile group; and a photo-acid generator for generating an acid through irradiation with light |
| 04/03/2008 | US20080081286 Good solubility, recording/reproducing properties, high light fastness; thermal stability and reproduction durability |
| 04/03/2008 | US20080081282 High resolution, reduced pattern falling, and good sensitivity and good dissolution contrast achieved even in EUV (extreme ultra violet) exposure, reduction in the line edge roughness |
| 04/03/2008 | US20080081281 Negative-tone photoresist material well suited to the EB lithography or the EUV (extreme ultraviolet light) lithography; high sensitivity, high resolution, and low line edge roughness |
| 04/03/2008 | US20080081280 Use of Pyrimido[5,4-G] Pteridines as Shading Component in Color Filter Colorant Compositions |
| 04/02/2008 | EP1906235A1 Method for image formation |
| 04/01/2008 | US7351773 Polymerizable composition |
| 04/01/2008 | US7351748 Fluorine-containing water-soluble nonionic surface-active compounds, use thereof and process for preparation of the compounds |
| 04/01/2008 | US7351523 Photographic materials having improved keeping properties |
| 04/01/2008 | US7351522 Iron III ammonium ethylenediaminetetraacetate, organic sulfinic acid or salt, ammonium bromide, ammonium thiosulfate and ammonium sulfite; for bleach replenishment having fixing ability |
| 04/01/2008 | US7351515 mixture of a resin capable of increasing solubility alkali developers, acid generators and hydroxyl amines, for use in the manufacturing of semiconductors, integrated circuit substrates, liquid crystals and print heads; excellent resolution |
| 04/01/2008 | US7351362 Photochromic material |
| 03/27/2008 | WO2007149326A3 Thermally developable materials stabilized with crown ethers |
| 03/27/2008 | WO2007121456A3 Wet developable bottom antireflective coating composition and method for use thereof |
| 03/27/2008 | US20080076252 Resist composition, resist pattern forming process, and method for manufacturing semiconductor device |
| 03/27/2008 | US20080076078 Low fog, high image density, excellent image tone, and excellent raw stock storability; including a phenol derivatives reducing agent for silver, a hydroxy naphthalene derivatives, color developing agent sulfamoylphenol derivatives; storage stability |
| 03/27/2008 | US20080076066 Photopolymerization type photosensitive lithographic printing plate precursor |
| 03/27/2008 | US20080076065 Laser-markable film |
| 03/27/2008 | US20080076064 Method of creating photolithographic structures with developer-trimmed hard mask |
| 03/27/2008 | US20080076063 Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same |
| 03/27/2008 | US20080076062 Resist composition and pattern-forming method using the same |
| 03/27/2008 | US20080076061 Novel Material for Infrared Laser Ablated Engraved Flexographic Printing Plates |
| 03/27/2008 | US20080076060 Photolithography using short wavelength actinic radiation (< 200 nm, such as 193 nm or 157 nm) for contrast enhancing layers (CEL) that include an organosilicon polymers, e.g., polysilanes, polysilynes; improved line resolution; increased process window; good Dill values; microstructure; semiconductors |
| 03/27/2008 | US20080076059 Antireflective coating compositions |
| 03/27/2008 | US20080076056 Method to prepare toner composition |
| 03/27/2008 | US20080076044 Compound or its tautomer, metal complex compound, colored photosensitive curing composition, color filter, and production |
| 03/27/2008 | US20080076038 Surface switchable photoresist |
| 03/27/2008 | US20080076033 Silicon/titanium oxide matrix and photopolymerization initiator; high refractive index change, flexibility, high sensitivity, low scattering, environment resistance, durability, low dimensional change (low shrinkage) and high multiplicity; blue and green lasers |
| 03/26/2008 | EP1730592A4 Permanent resist composition, cured product thereof, and use thereof |
| 03/26/2008 | EP1690133A4 Fluorinated photoresists prepared, deposited, developed and removed in carbon dioxide |
| 03/26/2008 | CN101151559A Transfer material, and process for producing liquid crystal cell substrate and liquid crystal display device using the same |
| 03/26/2008 | CN101151148A Use of polypeptides in the form of adhesive agents |
| 03/25/2008 | US7348296 Binders for use in the thermosensitive elements of substantially light-insensitive thermographic recording materials |
| 03/25/2008 | US7348132 Exposing oleophilic photosensitive layer comprising polymeric binder, urethane (meth)acrylate monomer, nonurethane (meth)acrylate monomer, free radical initiator, and sensitizing dye, and water soluble or dispersible overcoat; hardening; removing non-exposed areas with aqueous developer or ink |
| 03/25/2008 | US7348128 Storage stability, affinity, miscibility; acetalized high cure-related sensitivity; flexibility, uniformity; photocurable hydrogel or pattern formation by use of an aqueous developer |
| 03/25/2008 | US7348126 Negative working, heat-sensitive lithographic printing plate precursor |
| 03/25/2008 | US7348110 Thermally developable imaging material |
| 03/20/2008 | US20080070161 Organobis(4-vinylbenzenesulfonyloxime) derivative monomers; resolution, photolithography; improved focus depth margin and the line edge roughness of photoresist patterns; fineness |
| 03/20/2008 | US20080070160 Negative-working photosensitive resin composition and photosensitive resin plate using the same |