| Patents for G03C 1 - Photosensitive materials (26,817) |
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| 06/05/2008 | US20080131812 photosensitive layers comprising acrylic, acetal and phenol resins modified by cyclic ureido compounds, on aluminum supports, capable of forming an image upon exposure to a near-infrared laser and is superior in sensitivity, development latitude, wear and chemical resistance |
| 06/05/2008 | US20080131800 photographic and electrophotographic apparatus comprising charging, transport, photoconductive, radiant fusing and developing component containing toners comprising crystalline or amorphous polymers and colorants |
| 06/05/2008 | US20080131172 Non-magnetic monocomponent toner for use in electrophotographic image formation employing non-contact developing method, developing device, and image forming apparatus |
| 06/05/2008 | DE19739797B4 Stabilisatorkombination Stabilizer combination |
| 06/04/2008 | CN100392506C Film transistor array panel and its manufacturing method |
| 06/03/2008 | US7381520 Photothermographic material |
| 06/03/2008 | US7381518 Suppport coated with recording layer composed of a water-insoluble and alkali-soluble resin and an infrared absorbent, and with an organic polymer on the other side, which is coated using a solvent; total amount of solvent remaining in the polymer layer is 10 mg per gram of the polymer or less. |
| 06/03/2008 | US7381353 Black conductive thick film compositions, black electrodes, and methods of forming thereof |
| 05/29/2008 | WO2008043853A3 Photochromic film |
| 05/29/2008 | WO2008043848A3 Protective film |
| 05/29/2008 | US20080124664 Silver Halide Color Light-Sensitive Material |
| 05/29/2008 | US20080124653 Positive resist compositions and patterning process |
| 05/29/2008 | US20080124652 Positive resist composition and patterning process |
| 05/27/2008 | US7378456 Directly photodefinable polymer compositions and methods thereof |
| 05/27/2008 | US7378223 Photoresist resin composition |
| 05/27/2008 | US7378222 Antihalation compositions |
| 05/27/2008 | US7378217 Antireflective hardmask composition and methods for using same |
| 05/27/2008 | US7378216 Resist material and pattern formation method |
| 05/22/2008 | US20080118863 Resin comprising monomers of cyclopentyl- or cyclohexyl (meth)acrylate; hydroxyadamantyl (meth)acrylate; 3,8-epoxy-6-oxabicyclo[3.2.1]octyl (meth)acrylat;, and/or fluoroalkyl (meth)acrylate; ArF lithography; resolution contact hole pattern with mask fidelity, sphericity and rectangularity |
| 05/22/2008 | US20080118862 Sheeting with composite image that floats |
| 05/22/2008 | US20080118861 Immersion exposure processing by applying through a liquid; forming a photoresist film and edge film; computer-readable storage medium storing a control program; protective films; semiconductors |
| 05/22/2008 | US20080118859 Plastic support with hydrophilic layer comprising an emulsion containing polymer particles with silica; excellent on-press development property and printing durability |
| 05/22/2008 | US20080118853 Branched polyarylene ethers and processes for the preparation thereof |
| 05/22/2008 | US20080118666 Radiation curable resin composition for making colored three dimensional objects |
| 05/22/2008 | US20080117785 Method For Multiphoton-Ionizing Organic Molecule Supported By Solid Carrier |
| 05/22/2008 | US20080116426 Includes resin and laser-light-absorbent nanoparticles of tungsten oxide and/or nanoparticles of composite tungsten oxide; welding has thermal stability not found in conventional organic-based light-absorbing agent and imparts transparency and light-transmitting properties to plastic member after welding |
| 05/21/2008 | CN101185143A Photosensitive material, method of manufacturing conductive metal film, conductive metal film and light-transmitting film shielding electromagnetic wave for plasma display panel |
| 05/21/2008 | CN101185023A Printing element with an integral printing surface |
| 05/20/2008 | US7375150 Anti-static composition and method for production thereof |
| 05/20/2008 | US7374868 Uniform photoresist pattern; fine pattern for semiconductors ; photosensitive acid generator |
| 05/20/2008 | US7374858 resist includes at least one unsaturated, polymerizable monomer; has at least one silicon atom and at least one carbonyl group |
| 05/20/2008 | US7374857 Such as 5,5'-bis[2-nonafluorobutanesulfonyloxy-1H-isoindole-1,3(2H)-dione]; efficiency, solubility, stability, photosensitivity |
| 05/20/2008 | US7374799 Radiation sensitive composition, microlens, process for forming microlens and use of the microlens |
| 05/15/2008 | WO2008057495A2 Laminated identification document |
| 05/15/2008 | US20080113305 Color photographic films comprising support having color developable light sensitive silver halide emulsion layers and color dye-forming couplers, used for high speed print reproduction; storage stability |
| 05/15/2008 | US20080113294 Compound for Resist and Radiation-Sensitive Composition |
| 05/15/2008 | US20080113273 Photoresists adjust light; lightweight |
| 05/15/2008 | DE19753655B4 α-Aminoacetophenonverbindungen, Massen, die diese Verbindungen enthalten und deren Verwendung als Photostarter α-Aminoacetophenonverbindungen, compositions containing these compounds and their use as photoinitiators |
| 05/15/2008 | DE102006053070A1 New dyes, e.g. useful in molecular electronics, comprise three perylenetetracarboxydiimide groups bonded to a tetrahydrodibenzo(2,3:4,5)pentaleno(1,6-ab)indene group |
| 05/15/2008 | CA2667239A1 Method and formulation for reinforcing elastomers using soy protein and a silane coupling agent |
| 05/14/2008 | CN101180575A Photochromic materials with reactive substituents |
| 05/14/2008 | CN101178536A Silver halides colourful photographic paper |
| 05/13/2008 | US7371800 Derivatized novolak polyhydroxystyrene from hydroxyphenylmethylcarbinol |
| 05/13/2008 | US7371783 Ionizing radiation curable terpolymer comprising monomers of N-cyclohexylmaleimide, N-benzylmaleimide and/or a substituted N-benzylmaleimide; (meth)acrylic acid; and (meth)acrylic acid ester; blue pigment dispersion containing phthalocyanine; color filters; photopolymerization; discoloration inhibition |
| 05/13/2008 | US7371512 Silver bromochloroiodide grains having (111) faces and other specified crystal structure; storage stability, high sensitivity, and small processing dependence |
| 05/13/2008 | US7371505 Photosensitive composition and method for forming pattern using the same |
| 05/13/2008 | US7371454 Imageable element comprising sulfated polymers |
| 05/08/2008 | WO2008055137A2 Si-containing polymers for nano-pattern device fabrication |
| 05/08/2008 | WO2008054942A2 Photochromic materials demonstrating improved fade rates |
| 05/08/2008 | US20080107999 Exposure Method, Device Manufacturing Method, and Substrate |
| 05/08/2008 | US20080107996 Mixing rosin- or hydrocarbon-based resin with organic solvent and polyamine crosslinking agent and heating to produce covalently cross-linked vehicle which exhibits lower low shear viscosity and equal or greater high shear viscosity as compared to uncrosslinked vehicle; high speed printing |
| 05/08/2008 | US20080107994 Creating photoresist composition by applying to substrate surface coating of DNA polymers capable of self-assembling into photonic crystal, allowing DNA polymers to form crystalline structure, and applying coating of photoresist polymer and compound capable of generating an acid on exposure to radiation |
| 05/08/2008 | US20080107991 Toner for development of electrostatic image, method of producing the same, electrostatic image developer, toner cartridge, process cartridge, and image forming apparatus |
| 05/08/2008 | US20080106002 Laminated identification document |
| 05/08/2008 | US20080104861 Method for drying coating film, apparatus therefor, and optical film using the same |
| 05/07/2008 | EP1917299A1 Dual-wavelength positive-working radiation-sensitive elements |
| 05/07/2008 | EP1280807B1 Photochromatic pyrano-1,3-oxazinonaphthalene derivatives |
| 05/07/2008 | CN101176038A Method of forming a photoresist element |
| 05/07/2008 | CN101176037A Photochromic materials having extended pi-conjugated systems and compositions and articles including the same |
| 05/07/2008 | CN101172640A Method for rapid and high-efficiency production of nano-silver halide |
| 05/07/2008 | CN100386691C Electrooptic device containing ion liquid, electrooptic vehicle mirror, and electrolytes therefor |
| 05/06/2008 | US7369152 Laser marking method |
| 05/06/2008 | US7368230 Silver halide photographic material and image-forming method using the same |
| 05/06/2008 | US7368224 Photopolymerizable composition |
| 05/06/2008 | US7368220 Positive resist composition and pattern forming method using the same |
| 05/06/2008 | US7368219 Epoxy resin containing benzil monoxime pendant group; coating layer between an etching layer and a photoresist layer to absorb an exposure light in a photolithography |
| 05/06/2008 | US7368218 Containing a polymer having exo-form ester units from a norbornanyl (meth)acrylate derivative and units from an ester having two hexafluoroisopropanol groups; minimized in line edge roughness by swelling during development and residue after development, and improved in adhesion |
| 05/06/2008 | US7368217 Multilayer image, particularly a multicolor image |
| 05/02/2008 | WO2008024537A3 Marking multilayered structures using electromagnetic radiation |
| 05/01/2008 | US20080102407 Triphenylsulfonium 1,1,3,3,3-pentafluoro-2-methacryloyl-oxypropane-1-sulfonate type (co)monomers; generates strong sulfonic acid upon exposure to high energy radiation and facilitates effective scission of acid labile groups in chemically amplified resist compositions; photosensitivity, resolution |
| 05/01/2008 | US20080102406 Light sensitive layer containing spectral sensitizer, polymerization initiator, polymerizable monomer and polymeric binder; nonionic surfactant of polyoxyalkylene glycol monoalkyl ether or polyoxyalkylene glycol alkylamine; storage stability |
| 05/01/2008 | US20080102405 Nitrogen-containing organic compound, resist composition and patterning process |
| 05/01/2008 | US20080102404 Aluminum alloy plate and support for lithographic printing plate |
| 05/01/2008 | US20080102403 (Meth)acrylate copolymer comprising comonomer with blocking group comprising an alkyl-, alkoxyl-, or hydroxyl-substituted adamantane or an alkyl-, alkoxyl-, or hydroxyl-substituted tricycloalkane such as 4,7-methanoindene; photoacid generator, solvent; semiconductors; flow baking |
| 05/01/2008 | US20080102402 Monomer having sulfonyl group, polymer thereof and photoresist composition including the same |
| 05/01/2008 | US20080102401 Si-CONTAINING POLYMERS FOR NANO-PATTERN DEVICE FABRICATION |
| 05/01/2008 | US20080102400 Negative tone silicon-containing resist for e-beam lithography |
| 05/01/2008 | US20080102386 Compositions including polymers aligned via interchain interactions |
| 05/01/2008 | US20080102378 mixing binders, monomers and photoinitiators to form a mixture, then heating to form homogeneous liquid and cooling the liquid to form solids, that form homopolymer or copolymer when exposed to a light source; solids capable of recording spatial light distribution via refractive index change |
| 04/30/2008 | EP1877861A4 Silver halide color photographic light-sensitive material |
| 04/30/2008 | EP1802726A4 Photochromic compounds comprising polymeric substituents and methods for preparation and use thereof |
| 04/30/2008 | CN101171543A System, apparatus, and method for increasing media storage capacity |
| 04/29/2008 | US7365199 Dye-forming coupler, silver halide photographic light-sensitive material, and azomethine dye compound |
| 04/29/2008 | US7364841 Comprising support having thereon light-insensitive organic silver salt grains, photosensitive silver halide grains, a reducing agent for silver ions and a binder; improved storage stability, image lasting quality; use in medical diagnosis and graphic arts |
| 04/29/2008 | US7364834 Functional polymer |
| 04/29/2008 | US7364833 coating uniformity on large-scale substrate; acrylic ester polymer; mixed solvent of ethylene diglycol methylethyl ether (EDM) and a solvent having a vapor pressure lower than the EDM; photosensitizer |
| 04/29/2008 | US7364832 An extremely thin photoresist layer is coated on top of a photosensitive and anti-reflective protective layer of organometallic polymer; stack of the films is selectively exposed to actinic radiation and the latent images on the layers are developed with a common alkaline developer |
| 04/29/2008 | US7364829 a resin; a crosslinking agent; and a nitrogen-containing compound; manufacturing a semiconductor |
| 04/24/2008 | WO2008048498A1 Photothermographic materials containing print stabilizers |
| 04/24/2008 | US20080096144 Silver halide photographic light-sensitive material for movie subtitles |
| 04/24/2008 | US20080096143 Non-transparent microvoided biaxially stretched film, production process therefor and process for obtaining a transparent pattern therewith |
| 04/24/2008 | US20080096134 Positive resist composition and pattern forming method using the same |
| 04/24/2008 | US20080096133 An acrylic polymer, 2-(Acetyloxyiminomethyl) thioxanthen-9-one, 2-Methyl-1-[4-(methylthio)phenyl]-2-morpholino-aminopropanone-1 and/or or the phosphine oxide-based photopolymerization initiator, a compound having at least two ethylenically unsaturated groups, filler, thermosetting polyfunctional oxetane |
| 04/24/2008 | US20080096132 mixing a polymerizable monomer in which acrylonitrile accounts for 70% by weight or more of a total of the polymerizable monomer, water and an alkali metal persulfate polymerization initiator to conduct emulsion polymerization; distilling off unpolymerized monomers; chemical resistance film, gas barrier |
| 04/24/2008 | US20080096131 Resist composition and patterning process |
| 04/24/2008 | US20080096130 Positive resist composition |
| 04/24/2008 | US20080096129 Process for production of electroluminescent element and electroluminescent element |
| 04/24/2008 | US20080096128 Base resin is a polyvinylphenol derivative having an alkoxyisobutoxy as a reactive group which is decomposable under the action of an acid to increase solubility in alkali; a sulfonium phtoacid generator, tris(2-(methoxymethoxy)ethyl)amine oxide, a solvent; photoresist; high resolution |
| 04/24/2008 | US20080096125 sulfonium , iodonium, benzenesulfonate and tosylsulfonate thermal acid generators, crosslinkabel polymer containing substituted or unsubstituted styrenic monomer, a crossliker polymer containing unsaturated compound with two ether groups; coating, imagewise exposing, deveopment |
| 04/24/2008 | US20080092340 Method For The Preparation Of Precipitates |