| Patents for G03B 27 - Photographic printing apparatus (25,157) |
|---|
| 06/19/2012 | US8203693 Liquid immersion lithography system comprising a tilted showerhead relative to a substrate |
| 06/19/2012 | US8203692 Sub-segmented alignment mark arrangement |
| 06/14/2012 | US20120147355 Positioning System, Lithographic Apparatus and Device Manufacturing Method |
| 06/14/2012 | US20120147354 Lithographic apparatus having a lorentz actuator with a composite carrier |
| 06/14/2012 | US20120147353 Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder |
| 06/14/2012 | US20120147352 Stage apparatus, exposure apparatus and device fabrication method |
| 06/14/2012 | US20120147351 Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter |
| 06/14/2012 | US20120147350 Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter |
| 06/14/2012 | US20120147349 Euv radiation system and lithographic apparatus |
| 06/14/2012 | US20120147348 Lithographic apparatus and device manufacturing method |
| 06/14/2012 | US20120147347 Imaging optical system and illumination optical system |
| 06/14/2012 | US20120147346 Lithographic Apparatus and Method |
| 06/14/2012 | US20120147345 Optical apparatus, and method of orienting a reflective element |
| 06/14/2012 | US20120147344 Actuators and microlithography projection exposure systems and methods using the same |
| 06/14/2012 | US20120147343 Alignment method, alignment apparatus, and exposure apparatus |
| 06/13/2012 | EP1490730B1 Real time answerprint timing system and method |
| 06/13/2012 | CN202275260U 基于mems的激光数码彩扩机成像装置 Digital Minilab laser-based imaging device mems |
| 06/13/2012 | CN202275259U 一种胶片印字机 One kind of film printing machine |
| 06/13/2012 | CN102498437A Limiting plate shifting within a plate pallet |
| 06/12/2012 | US8200731 Device for determining a coherence measurement for a digital signal that does not require spectral estimation |
| 06/12/2012 | US8199315 Projection objective for semiconductor lithography |
| 06/12/2012 | US8199314 System and method for improving immersion scanner overlay performance |
| 06/12/2012 | US8199313 Temperature regulating apparatus, exposure apparatus, and device manufacturing method |
| 06/12/2012 | US8198602 Electrostatic lens structure |
| 06/12/2012 | US8198005 Method of forming resist pattern |
| 06/07/2012 | WO2012072914A2 Machine for exposing panels |
| 06/07/2012 | US20120141928 Methos and device for keeping mask dimensions constant |
| 06/07/2012 | US20120140200 Immersion photolithography system and method using microchannel nozzles |
| 06/07/2012 | US20120140199 Mechanical fixture of pellicle to lithographic photomask |
| 06/07/2012 | US20120140198 Patterning Device Support |
| 06/07/2012 | US20120140197 Optical element and lithographic apparatus |
| 06/07/2012 | US20120140196 Ex-situ removal of deposition on an optical element |
| 06/07/2012 | US20120140195 Actuation System and Lithographic Apparatus |
| 06/07/2012 | US20120140194 Maskless Exposure Apparatus |
| 06/07/2012 | US20120140193 Dynamic wafer alignment method in exposure scanner system |
| 06/07/2012 | US20120140192 Lithographic apparatus and device manufacturing method |
| 06/07/2012 | US20120140191 Coating and developing apparatus, coating and developing method, and storage medium |
| 06/06/2012 | CN101355618B Image forming system, camera and receiving apparatus |
| 06/05/2012 | US8194242 Substrate distortion measurement |
| 06/05/2012 | US8194232 Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, position control method and position control system, and device manufacturing method |
| 06/05/2012 | US8194231 Lithographic apparatus and method |
| 06/05/2012 | US8194230 Projection objectives having mirror elements with reflective coatings |
| 06/05/2012 | US8194229 Dynamic fluid control system for immersion lithography |
| 06/05/2012 | US8192920 Lithography method |
| 06/05/2012 | US8192901 Glass substrate-holding tool |
| 05/31/2012 | US20120133916 Wafer level optical elements and applications thereof |
| 05/31/2012 | US20120133915 Light source optimizing method, exposure method, device manufacturing method, program, exposure apparatus, lithography system, light source evaluation method, and light source modulation method |
| 05/31/2012 | US20120133914 Method of operating a patterning device, lithographic apparatus and device manufacturing method |
| 05/31/2012 | US20120133913 Adjustment method, substrate processing method, substrate processing apparatus, exposure apparatus, inspection apparatus, measurement and/or inspection system, processing apparatus, computer system, program and information recording medium |
| 05/31/2012 | US20120133912 Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method |
| 05/31/2012 | DE19809402B4 Verfahren und Vorrichtung zur Herstellung einer Kontaktkopie eines Hologramms Method and apparatus for manufacturing a contact copy of a hologram |
| 05/29/2012 | US8189174 Lithographic apparatus provided with a swap bridge |
| 05/29/2012 | US8189173 Polarization control apparatus and method |
| 05/29/2012 | US8189172 Lithographic apparatus and method |
| 05/29/2012 | US8189171 Plotting state adjusting method and device |
| 05/29/2012 | US8189170 Optical element and exposure apparatus |
| 05/29/2012 | US8189169 Cooling apparatus and substrate treating apparatus |
| 05/29/2012 | US8189168 Exposure apparatus, device production method, cleaning apparatus, cleaning method, and exposure method |
| 05/24/2012 | US20120129083 Method for manufacturing reflective mask and apparatus for manufacturing reflective mask |
| 05/24/2012 | US20120127454 Pattern forming method |
| 05/24/2012 | US20120127453 Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and calibration method |
| 05/24/2012 | US20120127452 Method for coarse wafer alignment in a lithographic apparatus |
| 05/24/2012 | US20120127451 Positioning system, a lithographic apparatus and a method for positional control |
| 05/24/2012 | US20120127450 Movable body drive method and movable body drive system, and pattern formation method and pattern formation apparatus |
| 05/24/2012 | US20120127449 Controller, Lithographic Apparatus, Method of Controlling the Position of an Object and Device Manufacturing Method |
| 05/24/2012 | US20120127448 Dual wafer stage exchanging system for lithographic device |
| 05/24/2012 | US20120127447 Method for determing a commutation offset and for determining a compensation map for a stage |
| 05/24/2012 | US20120127446 Light exposure method, and light exposure apparatus |
| 05/24/2012 | US20120127445 Isolation system for an optical element of an exposure apparatus |
| 05/24/2012 | US20120127444 Reflection Mask For EUV Lithography, System For EUV Lithography, And Method Of Fixing The Reflection Mask For EUV Lithography |
| 05/24/2012 | US20120127443 Method of producing a relief image for printing |
| 05/24/2012 | US20120127442 Determining lithographic set point using optical proximity correction verification simulation |
| 05/24/2012 | US20120127441 Lithographic apparatus and device manufacturing method |
| 05/24/2012 | US20120127440 Optical assembly for projection lithography |
| 05/23/2012 | CN202230295U Printing-down machine for printing |
| 05/23/2012 | CN102474631A 三维(3d)投影的差分失真校正方法和系统 A three-dimensional (3d) differential projection distortion correction method and system for |
| 05/23/2012 | CN102096298B Exposure lighting set and exposure machine |
| 05/23/2012 | CN101581873B Single-roller bidirectional flat belt tangential exposure paper feeding device |
| 05/22/2012 | US8184320 Printing control apparatus to control printing operation, printing control system, and methods thereof |
| 05/22/2012 | US8184266 Lithographic apparatus and device manufacturing method |
| 05/22/2012 | US8184265 Correction method for non-uniform reticle heating in a lithographic apparatus |
| 05/22/2012 | US8184264 Calibration methods and devices useful in semiconductor photolithography |
| 05/22/2012 | US8184263 Measurement apparatus and exposure apparatus |
| 05/22/2012 | US8184262 Pulse to pulse energy equalization of light beam intensity |
| 05/22/2012 | US8184261 Exposure apparatus |
| 05/22/2012 | US8182982 Method and device for patterning a disk |
| 05/17/2012 | US20120122252 Method for inspecting substrate, substrate inspection apparatus, exposure system, and method for producing semiconductor device |
| 05/17/2012 | US20120122030 Compositions comprising base-reactive component and processes for photolithography |
| 05/17/2012 | US20120122021 Method of forming hologram image, electrostatic image developing toner and hologram image forming apparatus |
| 05/17/2012 | US20120120381 Exposure apparatus, exposure method, and method for producing device |
| 05/17/2012 | US20120120380 Low and high pressure proximity sensors |
| 05/17/2012 | US20120120379 System and method for controlling the distortion of a reticle |
| 05/17/2012 | US20120120378 Component of an euv or uv lithography apparatus and method for producing it |
| 05/17/2012 | US20120120377 Lithographic apparatus and device manufacturing method |
| 05/17/2012 | US20120120376 Fluid handling structure, a lithographic apparatus and a device manufacturing method |
| 05/16/2012 | CN101876784B Exposing machine and exposing method thereof |
| 05/15/2012 | US8179559 Image forming apparatus with a substitute recording medium for an unavailable recording medium and method thereof |
| 05/15/2012 | US8179520 Optical element, projection optical system, exposure apparatus, and device fabrication method |
| 05/15/2012 | US8179519 Adjusting device with a laser light source and a reflector for aligning a microlithography projection exposure installation |
| 05/15/2012 | US8179518 Exposure apparatus to correct position between reticle and substrate according to propagation time and shifting rate |