Patents for G03B 27 - Photographic printing apparatus (25,157)
12/2011
12/13/2011US8077289 Device and method for influencing the polarization distribution in an optical system
12/13/2011US8077288 Exposure apparatus
12/13/2011US8077287 Method of preparing components, prepared component, lithographic apparatus and device manufacturing method
12/08/2011US20110300490 High-resolution microscopy and photolithography devices using focusing micromirrors
12/08/2011US20110299058 Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
12/08/2011US20110299057 Stage apparatus and lithographic apparatus comprising such stage apparatus
12/08/2011US20110299056 System and Method Configured to Provide Predetermined Depth Of Focus and to Control Irradiance Distribution
12/08/2011US20110299055 Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method with two optical elements having different thicknesses
12/08/2011US20110299054 Displacement device, lithographic apparatus and positioning method
12/08/2011US20110299053 Optical device having a deformable optical element
12/08/2011US20110299052 Measuring apparatus and method, processing apparatus and method, pattern forming apparatus and method, exposure apparatus and method, and device manufacturing method
12/08/2011US20110299051 Fluid supply system, a lithographic apparatus, a method of varying fluid flow rate and a device manufacturing method
12/08/2011US20110299050 Lithographic System, Lithographic Method And Device Manufacturing Method
12/08/2011US20110298730 Thin Sheet Glass Processing
12/07/2011CN1637594B 曝光掩模和使用该曝光掩模的曝光方法 Exposure mask and using the exposure mask exposure method
12/06/2011US8072661 Computer generated hologram, exposure apparatus, and device fabrication method
12/06/2011US8072580 Maskless exposure apparatus and method of manufacturing substrate for display using the same
12/06/2011US8072579 Measuring method, adjustment method for stage movement characteristics, exposure method, and device manufacturing method
12/06/2011US8072578 Position measurement method, position control method, measurement method, loading method, exposure method and exposure apparatus, and device manufacturing method
12/06/2011US8072577 Lithography systems and processes
12/06/2011US8072576 Exposure apparatus and method for producing device
12/06/2011US8072575 Lithographic apparatus with temperature sensor and device manufacturing method
12/01/2011US20110292369 Substrate table, a lithographic apparatus, a method of flattening an edge of a substrate and a device manufacturing method
12/01/2011US20110292368 Exposure apparatus
12/01/2011US20110292367 Imaging optical system
12/01/2011US20110292366 Multilayer mirror and lithographic apparatus
12/01/2011US20110292365 Calibration Method, Inspection Method and Apparatus, Lithographic Apparatus, and Lithographic Processing Cell
12/01/2011US20110292364 Imaging apparatus and method of controlling the apparatus
12/01/2011US20110292363 Exposure apparatus and methods
12/01/2011US20110292362 Exposure apparatus
12/01/2011US20110292361 Exposure apparatus
12/01/2011US20110292360 Patterning non-planar surfaces
12/01/2011US20110292359 Cleaning device and a lithographic apparatus cleaning method
12/01/2011US20110292358 Lithographic apparatus and device manufacturing method
12/01/2011US20110292357 Fluid handling structure, a lithographic apparatus and a device manufacturing method
12/01/2011US20110292356 Substrate processing system and substrate processing method
11/2011
11/29/2011US8068286 Variable focal lens and imaging apparatus
11/29/2011US8068238 Image processing apparatus, image processing method, and image processing program supporting embedded finishing manager
11/29/2011US8068213 Photomask, method of lithography, and method for manufacturing the photomask
11/29/2011US8068212 Lithographic apparatus configured to compensate for variations in a critical dimension of projected features due to heating of optical elements
11/29/2011US8068211 Exposure apparatus and method for manufacturing device
11/29/2011US8068210 Lithographic apparatus, device manufacturing method and computer program product
11/29/2011US8068209 Nozzle to help reduce the escape of immersion liquid from an immersion lithography tool
11/29/2011US8068208 System and method for improving immersion scanner overlay performance
11/29/2011US8068170 Modular digital camera
11/24/2011WO2011145402A1 Portable image processing device
11/24/2011US20110287371 Component of an immersion system, an immersion lithographic apparatus and a device manufacturing method
11/24/2011US20110285979 Projection objective with diaphragms
11/24/2011US20110285978 Illumination system for a microlithographic projection exposure apparatus
11/24/2011US20110285977 Lithographic apparatus and device manufacturing method
11/24/2011US20110285976 Lithographic apparatus, fluid handling structure for use in a lithographic apparatus and device manufacturing method
11/24/2011US20110285975 Method of managing euv exposure mask and exposure method
11/23/2011EP2388986A1 Booklet reading device
11/23/2011CN102257803A Image reader device and method for driving same
11/23/2011CN102257429A Apparatus and method to control vacuum at porous material using multiple porous materials
11/22/2011US8065103 Calibration of a position measuring device of an optical device
11/22/2011US8064122 Apertured window for enabling flexible illumination overfill of patterning devices
11/22/2011US8064111 Image sensor, image sensor unit, and image reader
11/22/2011US8064067 Exposure apparatus and exposure method
11/22/2011US8064045 Method of transferring a substrate, transfer system and lithographic projection apparatus
11/22/2011US8064044 Exposure apparatus, exposure method, and device producing method
11/22/2011US8064043 Shutter blade apparatus, shutter unit, image pickup apparatus, exposure apparatus, and method of manufacturing device
11/22/2011US8064042 Exposure apparatus and device fabrication method
11/22/2011US8064041 Projection objective for a microlithographic projection exposure apparatus
11/22/2011US8064040 Projection objective, projection exposure apparatus and reflective reticle for microlithography
11/22/2011US8064039 Exposure method, exposure apparatus, and device manufacturing method
11/22/2011US8064038 Inspection apparatus, lithographic system provided with the inspection apparatus and a method for inspecting a sample
11/22/2011US8064037 Immersion exposure apparatus and device manufacturing method with no liquid recovery during exposure
11/17/2011US20110281206 Exposure apparatus, mask plate and exposing method
11/17/2011US20110280703 Apparatus and method for contactless handling of an object
11/17/2011US20110279807 Movable body drive method and system, pattern formation method and apparatus, exposure method and apparatus for driving movable body based on measurement value of encoder and information on flatness of scale, and device manufacturing method
11/17/2011US20110279806 Lithographic apparatus and device manufacturing method
11/17/2011US20110279805 Optical system, inspection system and manufacturing method
11/17/2011US20110279804 Lithographic apparatus and device manufacturing method
11/17/2011US20110279803 Method for correcting a lithography projection objective, and such a projection objective
11/17/2011US20110279802 Device for an optical arrangement and method for positioning an optical element of an optical arrangement
11/17/2011US20110279801 Apparatus and a method for illuminating a light-sensitive medium
11/17/2011US20110279800 Lithographic apparatus and device manufacturing method
11/17/2011US20110279799 EUV Lithography Device and Method For Processing An Optical Element
11/17/2011US20110279798 Method of exposing a semiconductor wafer and exposure apparatus
11/17/2011US20110279797 Apparatus and method for calibrating lithography process
11/17/2011US20110279796 Lithographic apparatus and device manufacturing method
11/17/2011US20110279795 Lithographic apparatus and device manufacturing method
11/17/2011US20110279794 Exposure apparatus and device manufacturing method
11/17/2011US20110279793 Method for manufacturing optical disc master and method for manufacturing optical disc
11/15/2011US8060942 Film fingerprinting
11/15/2011US8059266 Radiometric Kirk test
11/15/2011US8059262 Calculation program, and exposure method for calculating light intensity distribution formed on image plane
11/15/2011US8059261 Masking device, lithographic apparatus, and device manufacturing method
11/15/2011US8059260 Position measurement method, position control method, measurement method, loading method, exposure method and exposure apparatus, and device manufacturing method
11/15/2011US8059259 Damping arrangement, active damping system, lithographic apparatus, and projection assembly
11/15/2011US8059258 Liquid jet and recovery system for immersion lithography
11/15/2011US8059257 Exposure apparatus and device manufacturing method
11/15/2011US8059171 Pen-shaped modular camera assembly having an effects module
11/15/2011US8058628 Substrate processing apparatus and method
11/15/2011US8057963 Maskless vortex phase shift optical direct write lithography
11/10/2011US20110276125 Medical Devices, Methods of Producing Medical Devices, and Projection Photolithography Apparatus for Producing Medical Devices
11/10/2011US20110273698 Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method with two optical elements having different thicknesses
11/10/2011US20110273697 Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
11/10/2011US20110273696 Method for manufacturing optical disc master and method for manufacturing optical disc
1 ... 17 18 19 20 21 22 23 24 25 26 27 28 29 30 31 32 33 34 35 36 37 ... 252