Patents for G03B 27 - Photographic printing apparatus (25,157) |
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03/01/2012 | US20120052419 Photomask, manufacturing apparatus and method of semiconductor device using the same, and photomask feature layout method |
03/01/2012 | US20120050711 Chuck assembly back side reticle cleaner |
03/01/2012 | US20120050710 Method of measuring mark position and measuring apparatus |
03/01/2012 | US20120050709 Stage apparatus, lithographic apparatus and method of positioning an object table |
03/01/2012 | US20120050708 Source-collector module with GIC mirror and tin rod EUV LPP target system |
03/01/2012 | US20120050707 Source-collector module with GIC mirror and tin wire EUV LPP target system |
03/01/2012 | US20120050706 Source-collector module with GIC mirror and xenon ice EUV LPP target system |
03/01/2012 | US20120050705 Photolithography system |
03/01/2012 | US20120050704 Source-collector module with GIC mirror and xenon liquid EUV LPP target system |
03/01/2012 | US20120050703 Euv collector |
03/01/2012 | US20120050702 Mask-less method and structure for patterning photosensitive material using optical fibers |
02/29/2012 | CN101276156B Exposure device |
02/28/2012 | US8125617 Apparatus and method for manufacturing semiconductor device |
02/28/2012 | US8125616 Lithographic apparatus with pre-formed flexible transportation line |
02/28/2012 | US8125615 Optical focus sensor, an inspection apparatus and a lithographic apparatus |
02/28/2012 | US8125614 Exposure apparatus and device manufacturing method |
02/28/2012 | US8125613 Exposure apparatus, exposure method, and device manufacturing method |
02/28/2012 | US8125612 Exposure apparatus and method for producing device |
02/28/2012 | US8125611 Apparatus and method for immersion lithography |
02/28/2012 | US8125610 Method for preventing or reducing contamination of an immersion type projection apparatus and an immersion type lithographic apparatus |
02/23/2012 | WO2012022588A1 Lens for a film or photographic camera comprising a sealing system |
02/23/2012 | US20120045723 Vibration isolation device, exposure apparatus, and device manufacturing method using same |
02/23/2012 | US20120044474 Optical module for guiding a radiation beam |
02/23/2012 | US20120044473 Optical element for uv or euv lithography |
02/23/2012 | US20120044472 Inspection Method for Lithography |
02/23/2012 | US20120044471 Lithographic Apparatus and Method |
02/23/2012 | US20120044470 Substrate for Use in Metrology, Metrology Method and Device Manufacturing Method |
02/23/2012 | US20120044469 Exposure method, exposure apparatus, and device manufacturing method |
02/23/2012 | US20120044468 Lithographic apparatus and device manufacturing method |
02/23/2012 | US20120043751 Synthesis of authenticable luminescent color halftone images |
02/21/2012 | US8120763 Device and method for the optical measurement of an optical system by using an immersion fluid |
02/21/2012 | US8120753 Method, program product and apparatus for generating a calibrated pupil kernel and method of using the same in a lithography simulation process |
02/21/2012 | US8120752 Lithographic apparatus |
02/21/2012 | US8120751 Coupling apparatus, exposure apparatus, and device fabricating method |
02/21/2012 | US8120750 Exposure apparatus and method of manufacturing device |
02/21/2012 | US8120749 Lithographic apparatus and device manufacturing method |
02/21/2012 | US8120748 Lithographic processing optimization based on hypersampled correlations |
02/16/2012 | US20120040292 Transfer method, transfer apparatus, and method of manufacturing organic light emitting element |
02/16/2012 | US20120040280 Simultaneous Optical Proximity Correction and Decomposition for Double Exposure Lithography |
02/16/2012 | US20120038899 Exposure apparatus and alignment error compensation method using the same |
02/16/2012 | US20120038898 Lithographic Apparatus and Alignment Method |
02/16/2012 | US20120038897 Optical Element With An Antireflection Coating, Projection Objective, And Exposure Apparatus Comprising Such An Element |
02/16/2012 | US20120038896 Maskless Vortex Phase Shift Optical Direct Write Lithography |
02/16/2012 | US20120038895 Lens heating compensation in photolithography |
02/16/2012 | US20120038894 Lens Cleaning Module |
02/14/2012 | US8115907 Container and exposure apparatus having the same |
02/14/2012 | US8115906 Movable body system, pattern formation apparatus, exposure apparatus and measurement device, and device manufacturing method |
02/14/2012 | US8115905 Lithographic apparatus and device manufacturing method |
02/14/2012 | US8115904 Illumination system for sizing focused spots of a patterning system for maskless lithography |
02/14/2012 | US8115903 Lithographic apparatus and device manufacturing method |
02/14/2012 | US8115902 Exposure apparatus, device manufacturing method, maintenance method, and exposure method |
02/14/2012 | US8115901 Exposure apparatus |
02/14/2012 | US8115900 Lithographic apparatus and device manufacturing method |
02/14/2012 | US8115899 Lithographic apparatus and device manufacturing method |
02/09/2012 | US20120034369 Vaporizing apparatus, substrate processing apparatus, coating and developing apparatus, and substrate processing method |
02/09/2012 | US20120033194 Decision method and storage medium |
02/09/2012 | US20120033193 Inspection Apparatus and Method, Lithographic Apparatus and Lithographic Processing Cell |
02/09/2012 | US20120033192 Exposure apparatus, exposure method, and device producing method |
02/09/2012 | US20120033191 Developer spraying device for reducing usage quantity of developer |
02/07/2012 | US8111420 Printer control apparatus and method of controlling the same, printer and method of controlling the same, reader and method of controlling the same, and image forming system |
02/07/2012 | US8111381 Positioning apparatus, exposure apparatus and device manufacturing method |
02/07/2012 | US8111380 Write-pattern determination for maskless lithography |
02/07/2012 | US8111379 Automated determination of height and tilt of a substrate surface within a lithography system |
02/07/2012 | US8111378 Exposure method and apparatus, and device production method |
02/07/2012 | US8111377 Lithographic apparatus with an encoder arranged for defining a zero level |
02/07/2012 | US8111376 Feedforward/feedback litho process control of stress and overlay |
02/07/2012 | US8111375 Exposure apparatus and method for manufacturing device |
02/07/2012 | US8111374 Analysis method, exposure method, and device manufacturing method |
02/07/2012 | US8111373 Exposure apparatus and device fabrication method |
02/02/2012 | US20120028197 Transmission optical system, illumination optical system, exposure apparatus, and device manufacturing method |
02/02/2012 | US20120028192 Control method and control system for exposure apparatus |
02/02/2012 | US20120026480 Image-Compensating Addressable Electrostatic Chuck System |
02/02/2012 | US20120026479 Optical imaging device and method for reducing dynamic fluctuations in pressure difference |
02/02/2012 | US20120026478 System and Method for Manufacturing Three Dimensional Integrated Circuits |
02/02/2012 | US20120026477 Lithographic Apparatus, Aberration Detector and Device Manufacturing Method |
02/02/2012 | US20120026476 Device for controlling temperature of an optical element |
02/02/2012 | US20120026475 Exposure apparatus, exposure method, and device producing method |
02/02/2012 | US20120026474 Reticle Cooling in a Lithographic Apparatus |
02/02/2012 | US20120026473 Highly reflective, hardened silica titania article and method of making |
01/31/2012 | US8107133 Image production apparatus |
01/31/2012 | US8107055 Substrate conveyance device and substrate conveyance method, exposure apparatus and exposure method, device manufacturing method |
01/31/2012 | US8107054 Microlithographic projection exposure apparatus |
01/31/2012 | US8107053 Lithographic apparatus, device manufacturing method and apparatus for de-gassing a liquid |
01/31/2012 | US8107052 Exposure apparatus and device manufacturing method |
01/31/2012 | US8107051 Exposure apparatus with improved alignment mark position measurement condition setting feature, and device manufacturing method using the same |
01/26/2012 | US20120019805 Calculation method, generation method, program, exposure method, and mask fabrication method |
01/26/2012 | US20120019804 Cleaning method, cleaning apparatus, device fabricating method, program, and storage medium |
01/26/2012 | US20120019803 Cleaning method, liquid immersion member, immersion exposure apparatus, device fabricating method, program, and storage medium |
01/26/2012 | US20120019802 Cleaning method, immersion exposure apparatus, device fabricating method, program, and storage medium |
01/26/2012 | US20120019801 Position control system, lithographic apparatus, and method to control a position of a movable object |
01/26/2012 | US20120019800 Lithography projection objective, and a method for correcting image defects of the same |
01/26/2012 | US20120019799 Optical assembly |
01/26/2012 | US20120019798 Positioning unit and alignment device for an optical element |
01/26/2012 | US20120019797 Reflective optical element for euv lithography |
01/26/2012 | US20120019796 Illumination system for microlithography |
01/26/2012 | US20120019795 Lithographic apparatus, computer program product and device manufacturing method |
01/26/2012 | US20120019794 Variable Reluctance Device, Stage Apparatus, Lithographic Apparatus and Device Manufacturing Method |
01/26/2012 | US20120019793 Exposure apparatus including the exposure head and control method thereof |
01/26/2012 | US20120019792 Liquid jet and recovery system for immersion lithography |
01/25/2012 | CN102331679A Cold light tube mounting component of blueprinting machine |