Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03B - Apparatus or arrangements for taking photographs or for projecting or viewing them; Apparatus or arrangements employing analogous techniques using waves other than optical waves; Accessories therefor › G03B 27 - Photographic printing apparatus
Patents for G03B 27 - Photographic printing apparatus (25,157)
11/2012
11/29/2012US20120300182 Lithographic Apparatus and Device Manufacturing Method
11/29/2012US20120300181 Immersion system, exposure apparatus, exposing method, and device fabricating method
11/28/2012CN101142806B Illumination device, illumination method, image read device, image read method, image-forming device, and image-forming method
11/27/2012US8320043 Illumination apparatus for microlithographyprojection system including polarization-modulating optical element
11/27/2012US8320002 Printing system, information processing apparatus, image forming apparatus, information processing method, and processing method capable of implementing 2-path printing
11/27/2012US8319967 Marker structure and method of forming the same
11/27/2012US8319948 Evaluation method and exposure apparatus
11/27/2012US8319947 Operating valve, exposure apparatus, and device manufacturing method
11/27/2012US8319946 Transfer device
11/27/2012US8319945 Illumination system of a microlithographic projection exposure apparatus
11/27/2012US8319944 Projection lens system of a microlithographic projection exposure installation
11/27/2012US8319943 Exposure apparatus, light source apparatus and method of manufacturing device
11/27/2012US8319942 Exposure apparatus and device fabrication method
11/27/2012US8319941 Exposure apparatus, and device manufacturing method
11/27/2012US8319940 Position measurement system and lithographic apparatus
11/27/2012US8319939 Immersion lithographic apparatus and device manufacturing method detecting residual liquid
11/27/2012US8319882 Image pickup device and image pickup element including plurality of types of pixel pairs
11/22/2012US20120295205 Radiation Source, Lithographic Apparatus and Device Manufacturing Method
11/22/2012US20120293788 Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method for continuous position measurement of moveable body before and after switching between sensor heads
11/22/2012US20120293787 Method for controlling the electronic beam exposure of wafers and masks using proximity correction
11/22/2012US20120293786 Illumination system of a microlithographic projection exposure apparatus
11/22/2012US20120293785 Optical element having a plurality of reflective facet elements
11/22/2012US20120293784 Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
11/22/2012US20120293783 Light source drive device, optical scanning device and image forming apparatus
11/22/2012US20120293782 Methods and Systems for Lithography Alignment
11/22/2012US20120293781 Exposure apparatus and method of manufacturing device
11/22/2012US20120293780 Charged particle lithography system with intermediate chamber
11/22/2012US20120293779 Reflective optical element and euv lithography appliance
11/22/2012US20120293763 Exposure apparatus, liquid crystal display device, and method for manufacturing liquid crystal display device
11/20/2012US8314980 Image reading apparatus
11/20/2012US8314922 Telecentricity corrector for microlithographic projection system
11/20/2012US8314920 Method of aligning an exposure apparatus, method of exposing a photoresist film using the same and exposure apparatus for performing the method of exposing a photoresist film
11/15/2012US20120288803 Manufacturing device of optical deflector and manufacturing method of the same
11/15/2012US20120287415 Pickup device and lithography apparatus using the same
11/15/2012US20120287414 Facet mirror for use in microlithography
11/15/2012US20120287413 Image-forming optical system, exposure apparatus, and device producing method
11/15/2012US20120287412 Exposure apparatus and device fabrication method
11/15/2012US20120287411 Lithography system for processing at least a part of a target
11/15/2012US20120287410 Data path for lithography apparatus
11/14/2012EP2523044A1 Device for producing stamp printing plates
11/13/2012US8310651 Lithographic apparatus, method and device manufacturing method
11/08/2012US20120282554 Large area nanopatterning method and apparatus
11/08/2012US20120281198 Filter device for the compensation of an asymmetric pupil illumination
11/08/2012US20120281197 Holographic Mask Inspection System with Spatial Filter
11/08/2012US20120281196 Projection objective of a microlithographic projection exposure apparatus
11/08/2012US20120281195 Multi-Method and Device with an Advanced Acousto-Optic Deflector (AOD) and a Dense Brush of Flying Spots
11/08/2012US20120281194 Positioning apparatus, exposure apparatus, and method of manufacturing device
11/08/2012US20120281193 Lithographic apparatus and method
11/08/2012US20120281192 Lithographic apparatus and method
11/08/2012US20120281191 Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes
11/08/2012US20120281190 Lithographic apparatus and in-line cleaning apparatus
11/08/2012US20120281189 Evaporative thermal management of grazing incidence collectors for EUV lithography
11/06/2012US8305659 Sheet-fed double-sided document scanner capable of changing scanning modes dependent on power input
11/06/2012US8305560 Exposure apparatus, device manufacturing method, and aperture stop manufacturing method
11/06/2012US8305559 Exposure apparatus that utilizes multiple masks
11/06/2012US8305558 Illumination system for a microlithography projection exposure apparatus
11/06/2012US8305557 System for calculating transmission utility factor value of photo energy for exposure and method for calculating transmission utility factor value of photo energy utilizing the calculation system
11/06/2012US8305556 Projection optical system, exposure apparatus, exposure method, display manufacturing method, mask, and mask manufacturing method
11/06/2012US8305555 Exposure apparatus, exposure method, and device manufacturing method
11/06/2012US8305554 Roll-to-roll type apparatus for forming thin film pattern
11/06/2012US8305553 Exposure apparatus and device manufacturing method
11/06/2012US8305552 Exposure apparatus, exposure method, and method for producing device
11/01/2012US20120276753 Coating treatment apparatus, coating and developing treatment system, coating treatment method, and non-transitory recording medium having program recorded thereon for executing coating treatment method
11/01/2012US20120274920 Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder
11/01/2012US20120274919 Catadioptric projection objective
11/01/2012US20120274918 Catadioptric projection objective
11/01/2012US20120274917 Imaging optics
11/01/2012US20120274916 Exposure apparatus and device manufacturing method
11/01/2012US20120274915 Exposure method, exposure apparatus, and device manufacturing method
11/01/2012US20120274914 Variable Data Lithography System for Applying Multi-Component Images and Systems Therefor
11/01/2012US20120274913 Enhanced contrast pin mirror for lithography tools
11/01/2012US20120274912 Lithographic apparatus and device manufacturing method
11/01/2012US20120274911 Lithographic apparatus and device manufacturing method
10/2012
10/30/2012US8300278 Original reader, optical module, and optical reading method
10/30/2012US8300214 System and method for an adjusting optical proximity effect for an exposure apparatus
10/30/2012US8300213 Illumination optics apparatus, exposure method, exposure apparatus, and method of manufacturing electronic device
10/30/2012US8300212 Device manufacturing method and lithographic apparatus
10/30/2012US8300211 Catadioptric projection objective
10/30/2012US8300210 Optical projection system
10/30/2012US8300209 Exposure method, exposure apparatus, and device manufacturing method
10/30/2012US8300208 Lithographic apparatus and a method to compensate for the effect of disturbances on the projection system of a lithographic apparatus
10/30/2012US8300207 Exposure apparatus, immersion system, exposing method, and device fabricating method
10/30/2012US8299446 Sub-field enhanced global alignment
10/30/2012US8297991 Exposure device, exposure method and method of manufacturing semiconductor device
10/25/2012US20120270150 Substrate distortion measurement
10/25/2012US20120269421 System and Method for Lithography Simulation
10/25/2012US20120268726 Lyophobic Run-Off Path to Collect Liquid for an Immersion Lithography Apparatus
10/25/2012US20120268725 Lithography system for processing a target, such as a wafer, and a method for operating a lithography system for processing a target, such as a wafer
10/25/2012US20120268724 Lithography system for processing a target, such as a wafer, a method for operating a lithography system for processing a target, such as a wafer and a substrate for use in such a lithography system
10/25/2012US20120268723 Exposure apparatus and image forming apparatus
10/25/2012US20120268722 Radiation Detector, Method of Manufacturing a Radiation Detector, and Lithographic Apparatus Comprising a Radiation Detector
10/25/2012US20120268721 Apparatus for and method of wafer edge exposure
10/24/2012CN102749811A Multi-focus scanning with a tilted mask or wafer
10/23/2012US8294878 Exposure apparatus and device manufacturing method
10/23/2012US8294877 Illumination optical unit for projection lithography
10/23/2012US8294876 Exposure apparatus and device manufacturing method
10/23/2012US8294875 Exposure apparatus and device fabrication method
10/23/2012US8294874 Exposure apparatus
10/23/2012US8294873 Exposure method, device manufacturing method, and substrate
10/23/2012US8294128 Apparatus with plasma radiation source and method of forming a beam of radiation
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