Patents for G03B 27 - Photographic printing apparatus (25,157)
06/2013
06/06/2013US20130141707 EUV Exposure Apparatus
06/06/2013US20130141705 Exposure apparatus and exposure method
06/04/2013US8456618 Stage apparatus, exposure apparatus, and method of manufacturing device
06/04/2013US8456617 Exposure method, exposure device, and micro device manufacturing method
06/04/2013US8456616 Optical system for microlithography
06/04/2013US8456615 Optical system having heat dissipation arrangement
06/04/2013US8456614 Optical element supporting device, exposure apparatus using same, and device manufacturing method
06/04/2013US8456613 Method and apparatus for quantification of illumination non-uniformity in the mask plane of a lithographic exposure system
06/04/2013US8456612 Exposure apparatus and method of manufacturing device
06/04/2013US8456611 System and method to increase surface tension and contact angle in immersion lithography
06/04/2013US8456610 Environmental system including vacuum scavenge for an immersion lithography apparatus
06/04/2013US8456609 Exposure apparatus and device manufacturing method
06/04/2013US8456608 Maintenance method, maintenance device, exposure apparatus, and device manufacturing method
05/2013
05/30/2013US20130137050 Method of calculating amount of fluctuation of imaging characteristic of projection optical system, exposure apparatus, and method of fabricating device
05/30/2013US20130135603 C-core actuator for moving a stage
05/30/2013US20130135601 Two-beam interference apparatus and two-beam interference exposure system
05/30/2013US20130135600 Inspection Method and Apparatus, and Corresponding Lithographic Apparatus
05/30/2013US20130135596 Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method
05/28/2013US8451510 Image processing apparatus and image processing method thereof
05/28/2013US8451472 Immediate verification of printed copy
05/28/2013US8451454 Stage system, lithographic apparatus including such stage system, and correction method
05/28/2013US8451431 Control systems and methods applying iterative feedback tuning for feed-forward and synchronization control of microlithography stages and the like
05/28/2013US8451430 Illumination optical system, exposure apparatus, and device manufacturing method
05/28/2013US8451429 Dichroic mirror, method for manufacturing a dichroic mirror, lithographic apparatus, semiconductor device and method of manufacturing therefor
05/28/2013US8451428 Computer generated hologram, exposure apparatus and device fabrication method
05/28/2013US8451427 Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
05/28/2013US8451426 Exposure method and exposure apparatus
05/28/2013US8451425 Exposure apparatus, exposure method, cleaning apparatus, and device manufacturing method
05/28/2013US8451424 Exposure apparatus, method for producing device, and method for controlling exposure apparatus
05/28/2013US8451423 Lithographic apparatus and method
05/28/2013US8451422 Re-flow and buffer system for immersion lithography
05/28/2013US8450046 Methods for enhancing photolithography patterning
05/23/2013US20130130182 Apparatus and method of direct writing with photons beyond the diffraction limit
05/23/2013US20130128255 Encoder device, method for measuring moving amount, optical apparatus, exposure apparatus, exposure method and method for producing device
05/23/2013US20130128247 Level Sensor, a Method for Determining a Height Map of a Substrate, and a Lithographic Apparatus
05/21/2013US8446570 System and method for using a two part cover and a box for protecting a reticle
05/21/2013US8446569 Exposure apparatus, exposure method and device manufacturing method
05/21/2013US8446568 Lithographic apparatus and device manufacturing method
05/21/2013US8446567 Stage system calibration method, stage system and lithographic apparatus comprising an encoder measurement system to measure position of stage system
05/21/2013US8446566 Method of loading a substrate on a substrate table and lithographic apparatus and device manufacturing method
05/21/2013US8446565 Methods of optical proximity correction in manufacturing semiconductor devices
05/21/2013US8446564 Lithographic apparatus and device manufacturing method
05/21/2013US8446563 Lithographic apparatus and device manufacturing method
05/21/2013US8446562 Actuator system using multiple piezoelectric actuators
05/21/2013US8446561 Lithographic apparatus and a method of measuring flow rate in a two phase flow
05/21/2013US8446560 Lithographic apparatus comprising a magnet, method for the protection of a magnet in a lithographic apparatus and device manufacturing method
05/21/2013US8445876 Extreme ultraviolet light source apparatus
05/21/2013US8443513 Substrate processing apparatus
05/21/2013CA2695136C Reusable paper media with compatibility markings and printer with incompatible media sensor
05/16/2013US20130122428 Exposure system, method of forming pattern using the same and method of manufacturing display substrate using the same
05/16/2013US20130120733 Position measurement apparatus and exposure apparatus which measure position of object using reference mark, and method of manufacturing device
05/16/2013US20130120724 Method for splitting a pattern for use in a multi-beamlet lithography apparatus
05/16/2013US20130120722 Method and system for forming alignment film region through uv light exposure
05/15/2013CN102213908B Full-rotation exposure device for enlarge-printing of stereograph
05/14/2013US8443307 Methods and system for model-based generic matching and tuning
05/14/2013US8441747 Optical module with minimized overrun of the optical element
05/14/2013US8441694 Method and an apparatus for adjusting a scanning target area of an image reproduction device
05/14/2013US8441618 Substrate transfer method and apparatus
05/14/2013US8441617 Substrate placement in immersion lithography
05/14/2013US8441616 Lithographic apparatus and device manufacturing method
05/14/2013US8441615 System for isolating an exposure apparatus
05/14/2013US8441614 Processing apparatus and device manufacturing method
05/14/2013US8441613 Projection objective and projection exposure apparatus for microlithography
05/14/2013US8441612 LED light source, its manufacturing method, and LED-based photolithography apparatus and method
05/14/2013US8441611 Lithographic apparatus and method
05/14/2013US8441610 Assembly comprising a conditioning system and at least one object, a conditioning system, a lithographic apparatus and methods
05/14/2013US8441609 Lithographic apparatus and a method of operating the lithographic apparatus
05/09/2013US20130115723 Method of manufacturing semiconductor device and semiconductor manufacturing system
05/09/2013US20130114062 Compact encoder head for interferometric encoder system
05/09/2013US20130114061 Double pass interferometric encoder system
05/09/2013US20130114055 Mask and optical filter manufacturing apparatus including the same
05/08/2013CN202929347U 3-D image print film and display apparatus applying the 3-D image print film
05/08/2013CN102192444B Light source apparatus
05/08/2013CN101939686B Device and method for exposing a photo material
05/07/2013US8436985 Combination stop for catoptric projection arrangement
05/07/2013US8436984 Lithographic apparatus and method of irradiating at least two target portions
05/07/2013US8436983 Optical system, exposure system, and exposure method
05/07/2013US8436982 Projection objective for microlithography
05/07/2013US8436981 Exposing method, exposure apparatus, and device fabricating method
05/07/2013US8436980 Illumination optical apparatus, relay optical system, exposure apparatus, and device manufacturing method
05/07/2013US8436979 Exposure apparatus, and device manufacturing method
05/07/2013US8436978 Exposure apparatus, and device manufacturing method
05/07/2013US8436977 Lithographic method to apply a pattern to a substrate and lithographic apparatus
05/02/2013WO2013062010A1 Lighting unit and image scanner using same
05/02/2013WO2013062009A1 Lighting unit and image scanner using same
05/02/2013US20130108969 Method and an apparatus having a compressible collar for thermally treating a photosensitive precursor
05/02/2013US20130107241 Lithographic apparatus and substrate handling method
05/02/2013US20130107240 Maskless Vortex Phase Shift Optical Direct Write Lithography
05/02/2013US20130107239 Optical arrangement for euv lithography and method for configuring such an optical arrangement
05/02/2013US20130107236 Lithographic apparatus and device manufacturing method
05/02/2013US20130107235 Pattern-forming method
05/01/2013CN202916581U Lithographic-paper blueprinting device of blue-print machine
04/2013
04/30/2013US8432534 Holding apparatus, position detection apparatus and exposure apparatus, moving method, position detection method, exposure method, adjustment method of detection system and device manufacturing method
04/30/2013US8432533 Method and system for photolithographic fabrication with resolution far below the diffraction limit
04/30/2013US8432532 Projection optical system with rarefaction compensation
04/30/2013US8432531 Lithographic apparatus and a method of operating the apparatus
04/30/2013US8432530 Device, method, and system for measuring image profiles produced by an optical lithography system
04/30/2013US8432529 Lithographic apparatus and monitoring method
04/30/2013US8432072 Three axis linear actuator
04/25/2013US20130100427 Metrology Method and Apparatus, and Device Manufacturing Method
1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18 19 20 21 ... 252