Patents for G03B 27 - Photographic printing apparatus (25,157)
10/2011
10/18/2011US8040491 Exposure method, substrate stage, exposure apparatus, and device manufacturing method
10/18/2011US8040490 Liquid immersion exposure apparatus, exposure method, and method for producing device
10/18/2011US8040489 Substrate processing method, exposure apparatus, and method for producing device by immersing substrate in second liquid before immersion exposure through first liquid
10/18/2011US8040488 Substrate processing apparatus
10/13/2011US20110249250 Ablation-type lithographic imaging with enhanced debris removal
10/13/2011US20110249249 Digital stereo imaging photosensitive device for a grating and a photosensitive material and its method
10/13/2011US20110249248 Apparatus for moving stereo imaging lens and method for digital stereo projection
10/13/2011US20110249247 Inspection Method and Apparatus, Lithographic Apparatus, Lithographic Processing Cell and Device Manufacturing Method
10/13/2011US20110249246 Lithographic apparatus and device manufacturing method
10/13/2011US20110249245 Method of cooling an optical element, lithographic apparatus and method for manufacturing a device
10/13/2011US20110249244 Lithographic Focus and Dose Measurement Using A 2-D Target
10/13/2011US20110249243 Optical element for a lithographic apparatus, lithographic apparatus comprising such optical element and method for making the optical element
10/13/2011US20110247511 Apparatus and Method for Making Fiducials on a Substrate
10/12/2011CN102216849A An optical imaging writer system
10/12/2011CN102213909A Method for outputting high-resolution digital image to microfilm
10/12/2011CN102213908A Full-rotation exposure device for enlarge-printing of stereograph
10/11/2011US8035868 Light source unit and object reader
10/11/2011US8035805 Driving apparatus and exposure apparatus, and device fabrication method
10/11/2011US8035804 Exposure apparatus and device manufacturing method
10/11/2011US8035803 Subsystem of an illumination system of a microlithographic projection exposure apparatus
10/11/2011US8035802 Method and apparatus for lithographic imaging using asymmetric illumination
10/11/2011US8035801 Method for in-situ aberration measurement of optical imaging system in lithographic tools
10/11/2011US8035800 Exposure apparatus, maintenance method, exposure method, and method for producing device
10/11/2011US8035799 Exposure apparatus, exposure method, and device producing method
10/11/2011US8035798 Lithographic apparatus and device manufacturing method
10/11/2011US8035797 Projection exposure apparatus, cleaning and maintenance methods of a projection exposure apparatus, and device manufacturing method
10/11/2011US8035796 Immersion exposure apparatus and device manufacturing method
10/11/2011US8035795 Apparatus and method for maintaining immersion fluid in the gap under the protection lens during wafer exchange in an immersion lithography machine
10/11/2011US8033815 Chucking system for nano-manufacturing
10/11/2011US8033813 Chucking system comprising an array of fluid chambers
10/06/2011WO2011123433A2 Method of slimming radiation-sensitive material lines in lithographic applications
10/06/2011US20110245898 Laser apparatus, light therapy apparatus, exposure apparatus, device manufacturing method, and object inspection apparatus
10/06/2011US20110244402 Method of slimming radiation-sensitive material lines in lithographic applications
10/06/2011US20110244396 Exposure apparatus, exchange method of object, exposure method, and device manufacturing method
10/06/2011US20110244395 Apparatus and method for haze control in a semiconductor process
10/06/2011US20110244379 Method for forming convex pattern, exposure apparatus and photomask
10/06/2011US20110244376 Photomask using separated exposure technique, method of fabricating photomask, and apparatus for fabricating photomask by using the method
10/06/2011US20110242520 Optical properties measurement method, exposure method and device manufacturing method
10/06/2011US20110242519 Device for mounting a grating and a photosensitive material for stereoprojection imaging
10/06/2011US20110242518 Lithographic apparatus, device manufacturing method, and substrate exchanging method
10/06/2011US20110242517 Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a system
10/06/2011US20110242516 Lithographic Apparatus, a Radiation System, a Device Manufacturing Method and a Radiation Generating Method
10/06/2011US20110242515 EUV collector system with enhanced EUV radiation collection
10/06/2011US20110242514 1.5d slm for lithography
10/06/2011US20110242513 Substrate processing method, computer-readable storage medium and substrate processing system
10/06/2011US20110242512 Lithographic apparatus and device manufacturing method
10/06/2011US20110242511 Apparatus and methods for inhibiting immersion liquid from flowing below a sustrate
10/06/2011US20110242510 Substrate processing system, substrate surface processing apparatus, substrate surface inspecting apparatus, substrate surface inspecting method, and storage medium storing program for implementing the method
10/06/2011US20110242509 Position detecting method
10/06/2011US20110242508 Interface system
10/05/2011CN102207672A Device for carrying out liquid crystal display (LCD) monochrome image mosaic by prism
10/04/2011US8031330 Mixed polarization state monitoring
10/04/2011US8031329 Overlay mark, and fabrication and application of the same
10/04/2011US8031328 Positioning apparatus
10/04/2011US8031327 Illumination system of a microlithographic projection exposure apparatus
10/04/2011US8031326 Illumination system or projection lens of a microlithographic exposure system
10/04/2011US8031325 Lithographic apparatus and device manufacturing method
10/04/2011US8031324 Substrate processing apparatus with integrated cleaning unit
10/04/2011US8029852 Contact printing oxide-based electrically active micro-features
09/2011
09/29/2011US20110236809 Method for examining a wafer with regard to a contamination limit and euv projection exposure system
09/29/2011US20110235016 Pellicle, mounting method therefor, pellicle-equipped mask, and mask
09/29/2011US20110235015 Illumination optics for euv microlithography
09/29/2011US20110235014 Optical element holding apparatus, barrel, exposure apparatus, and manufacturing method for device
09/29/2011US20110235013 Projection objective of a microlithographic projection exposure apparatus
09/29/2011US20110235012 Projection exposure apparatus for microlithography for the production of semiconductor components
09/29/2011US20110235011 Exposure device, signal transmission mechanism for the exposure device, and image forming apparatus
09/29/2011US20110235010 Exposure apparatus and image forming apparatus
09/29/2011US20110235009 Sub-resolution assist devices and methods
09/29/2011US20110235008 Lithographic apparatus and device manufacturing method
09/29/2011US20110235007 Environmental system including a transport region for an immersion lithography apparatus
09/29/2011US20110235006 Exposure apparatus, exposure method, method for manufacturing device
09/27/2011USRE42741 Lithographic apparatus and device manufacturing method
09/27/2011US8027529 System for improving critical dimension uniformity
09/27/2011US8027028 Precise positioning system for dual stage switching exposure
09/27/2011US8027027 Exposure apparatus, and device manufacturing method
09/27/2011US8027026 Lithographic apparatus and device manufacturing method
09/27/2011US8027025 Exposure apparatus and device manufacturing method
09/27/2011US8027024 Replacement device for an optical element
09/27/2011US8027023 Optical imaging device and method for reducing dynamic fluctuations in pressure difference
09/27/2011US8027022 Projection objective
09/27/2011US8027021 Measuring apparatus and method, processing apparatus and method, pattern forming apparatus and method, exposure apparatus and method, and device manufacturing method
09/27/2011US8027020 Exposure apparatus, exposure method, and method for producing device
09/27/2011US8027019 Lithographic apparatus and device manufacturing method
09/27/2011US8027018 Method and device for producing exposed structures
09/27/2011US8027017 Substrate treating apparatus and exposing apparatus for cleaning a chuck cleaning tool with treating bath
09/27/2011US8025427 Filter device for the compensation of an asymmetric pupil illumination
09/22/2011WO2011116077A1 A document camera based multifunction scanner-copier-printer-fax with an automatic paper feeder
09/22/2011WO2011115233A1 Extreme ultraviolet light generation system
09/22/2011US20110231167 Inspection Apparatus and Associated Method and Monitoring and Control System
09/22/2011US20110229830 Inspection Method For Lithography
09/22/2011US20110229827 Method and Lithography Device with a Mask Reflecting Light
09/22/2011US20110229804 Microlithography masks including image reversal assist features, microlithography systems including such masks, and methods of forming such masks
09/22/2011US20110228248 Cover for a substrate table, substrate table for a lithographic apparatus, lithographic apparatus, and device manufacturing method
09/22/2011US20110228247 Illumination system and lithographic apparatus
09/22/2011US20110228246 Projection objective for a microlithographic projection exposure apparatus
09/22/2011US20110228245 Reflective optical element, projection system, and projection exposure apparatus
09/22/2011US20110228244 Illumination optical system for projection lithography
09/22/2011US20110228243 Mirror, Lithographic Apparatus and Device Manufacturing Method
09/22/2011US20110228242 Method and apparatus for performing alignment using reference board
09/22/2011US20110228241 Lithographic apparatus and device manufacturing method
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