Patents for G03B 27 - Photographic printing apparatus (25,157)
03/2013
03/19/2013US8400613 Optical element driving apparatus, projection optical system, exposure apparatus and device manufacturing method
03/19/2013US8400612 Wavefront aberration measurement apparatus, exposure apparatus, and method of manufacturing device
03/19/2013US8400611 Scanning exposure apparatus and device manufacturing method
03/19/2013US8400610 Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine
03/19/2013US8399861 Lithography apparatus using extreme UV radiation and having a volatile organic compounds sorbing member comprising a getter material
03/14/2013US20130065328 Focus control method for photolithography
03/14/2013US20130065160 Removable transparent membrane for a pellicle
03/14/2013US20130063712 Support structure for wafer table
03/14/2013US20130063711 Linear Motor and Lithography Arrangement Including Linear Motor
03/14/2013US20130063710 Catoptric objectives and systems using catoptric objectives
03/14/2013US20130063709 Lcd exposure stage device and exposure system
03/14/2013US20130063708 Drawing apparatus, and method of manufacturing article
03/14/2013US20130063707 Pattern generating method, pattern forming method, and pattern generating program
03/12/2013US8395758 Exposure apparatus and device manufacturing method
03/12/2013US8395757 Optimized polarization illumination
03/12/2013US8395756 Illumination system for a microlithographic projection exposure apparatus
03/12/2013US8395755 Lithographic apparatus and device manufacturing method
03/12/2013US8395754 Illumination optical unit for EUV microlithography
03/12/2013US8395753 Microlithographic projection exposure apparatus
03/12/2013US8395752 Optical imaging writer system
03/07/2013US20130059253 Exposure apparatus, liquid holding method, and device manufacturing method
03/07/2013US20130059241 Development processing method and development processing apparatus
03/07/2013US20130059240 Substrate and Patterning Device for Use in Metrology, Metrology Method and Device Manufacturing Method
03/07/2013US20130057844 Illumination system of a microlithographic projection exposure apparatus
03/07/2013US20130057843 Maskless exposure apparatus including spatial filter having phase shifter pattern and exposure method
03/07/2013US20130057842 Solution to optical constraint on microtruss processing
03/07/2013US20130057841 Lithographic projection apparatus and device manufacturing method
03/07/2013US20130057840 Multilayer Mirror
03/07/2013US20130057839 Lithography system and manufacturing method of commodities
03/07/2013US20130057838 Exposure apparatus, exposure method, method of manufacturing device, program, and storage medium
03/07/2013US20130057837 Exposure apparatus, exposure method, device-manufacturing method, program, and recording medium
03/07/2013US20130057836 Substrate treatment apparatus, substrate treatment method and non-transitory storage medium
03/05/2013US8390790 Method and apparatus for reproducing a programmable mask on a substrate
03/05/2013US8390789 Z-stage with dynamically driven stage mirror and chuck assembly
03/05/2013US8390788 Spectral purity filters for use in a lithographic apparatus
03/05/2013US8390787 Lithographic apparatus and device manufacturing method
03/05/2013US8390786 Optical imaging writer system
03/05/2013US8390785 Collector optical system
03/05/2013US8390784 Catadioptric projection objective with pupil mirror, projection exposure apparatus and projection exposure method
03/05/2013US8390783 Method of measuring the position of a mask surface along the height direction, exposure device, and exposure method
03/05/2013US8390782 Multi nozzle proximity sensor employing common sensing and nozzle shaping
03/05/2013US8390781 Optical imaging writer system
03/05/2013US8390780 Movable-body apparatus, exposure apparatus, exposure method, and device manufacturing method
03/05/2013US8390779 Exposure apparatus, exposure method, and method for producing device
03/05/2013US8390778 Lithographic apparatus, device manufacturing method, seal structure, method of removing an object and a method of sealing
02/2013
02/28/2013WO2013026361A1 Step photolithography device and photolithography exposure method
02/28/2013US20130052591 Cleaning nozzle for advanced lithography process
02/28/2013US20130052569 Exposure apparatus for forming a reticle and method of forming a reticle using the same
02/28/2013US20130050675 Lithographic Apparatus, Device Manufacturing Method, and Method of Calibrating a Displacement Measuring System
02/28/2013US20130050674 Lithographic apparatus, substrate table and device manufacturing method
02/28/2013US20130050673 Optical system of a microlithographic projection exposure apparatus
02/28/2013US20130050672 Apparatus for microlithographic projection exposure and apparatus for inspecting a surface of a substrate
02/28/2013US20130050671 Imaging opticsiimaging optics, microlithography projection exposure apparatus having same and related methods
02/28/2013US20130050670 Position measurement system, lithographic apparatus and device manufacturing method
02/28/2013US20130050669 Single-Pass Imaging System With Anamorphic Optical System
02/28/2013US20130050668 Method of Determining Focus Corrections, Lithographic Processing Cell and Device Manufacturing Method
02/28/2013US20130050666 Exposure apparatus, liquid holding method, and device manufacturing method
02/28/2013US20130050665 Fluid handling structure, a lithographic apparatus and a device manufacturing method
02/28/2013US20130050501 Metrology Method and Apparatus, and Device Manufacturing Method
02/27/2013CN101385326B Linear illuminating apparatus and image reader using it
02/26/2013US8384900 Exposure apparatus
02/26/2013US8384882 Calibration method and lithographic apparatus for calibrating an optimum take over height of a substrate
02/26/2013US8384881 Lithographic apparatus, stage apparatus and device manufacturing method
02/26/2013US8384880 Exposure method, substrate stage, exposure apparatus, and device manufacturing method
02/26/2013US8384879 Optical position sensor, a position sensitive detector, a lithographic apparatus and a method for determining an absolute position of a movable object to be used in a relative position measurement system
02/26/2013US8384878 Exposure apparatus and device manufacturing method
02/26/2013US8384877 Exposure apparatus and method for producing device
02/26/2013US8384876 Method of detecting reticle errors
02/26/2013US8384875 Exposure apparatus, exposure method, and method for producing device
02/26/2013US8384874 Immersion exposure apparatus and device manufacturing method to detect if liquid on base member
02/21/2013US20130045607 Pattern generating apparatus, pattern generating program, and method for fabricating semiconductor device
02/21/2013US20130045448 Positioning apparatus, exposure apparatus and method of manufacturing device
02/21/2013US20130044308 System and method for an adjusting optical proximity effect for an exposure apparatus
02/21/2013US20130044307 Movable Body Apparatus, Movable Body Drive Method, Exposure Apparatus, Exposure Method, and Device Manufacturing Method
02/21/2013US20130044306 Exposure apparatus and method of manufacturing device
02/21/2013US20130044305 Apparatus for transferring a substrate in a lithography system
02/21/2013US20130044304 Optical projection system
02/21/2013US20130044303 Method for stress-adjusted operation of a projection exposure system and corresponding projection exposure system
02/21/2013US20130044302 Lithographic Apparatus and Method
02/21/2013US20130044301 Programmable illuminator for a photolithography system
02/21/2013US20130044300 Double-Sided Maskless Exposure System and Method
02/21/2013US20130044299 Projection-type photolithography system using composite photon sieve
02/21/2013US20130043480 Exposure Device, Exposure Method and Method of Manufacturing Semiconductor Device
02/19/2013US8379189 Stage device, exposure apparatus, exposure method and device manufacturing method
02/19/2013US8379188 Optical system
02/19/2013US8379187 Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
02/19/2013US8379186 Pattern formation apparatus, pattern formation method, and device manufacturing method
02/19/2013US8379121 Image-capturing device and imaging apparatus
02/19/2013US8377633 Maskless vortex phase shift optical direct write lithography
02/14/2013WO2013022892A1 Intermittent temperature control of movable optical elements
02/14/2013WO2013022060A1 Image sensor unit and image reading device utilizing same
02/14/2013US20130040463 Method and apparatus for manufacturing semiconductor device
02/14/2013US20130040247 Liquid immersion member, method for manufacturing liquid immersion member, exposure apparatus, and device manufacturing method
02/14/2013US20130038855 Lithography apparatus and manufacturing method of commodities
02/14/2013US20130038854 Substrate table assembly, an immersion lithographic apparatus and a device manufacturing method
02/14/2013US20130038853 Nanometer-precision six-degree-of-freedom magnetic suspension micro-motion table and application thereof
02/14/2013US20130038852 Reticle removing apparatus and reticle removing method using the same
02/14/2013US20130038851 Discharge lamp, connecting cable, light source apparatus, and exposure apparatus
02/14/2013US20130038850 Illumination system and projection objective of a mask inspection apparatus
02/14/2013US20130038849 Optical component comprising radiation protective layer
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