Patents for G03B 27 - Photographic printing apparatus (25,157)
10/2013
10/01/2013US8547526 Photolithography systems and associated methods of selective die exposure
10/01/2013US8547525 EUV radiation generation apparatus
10/01/2013US8547523 Fluid handling structure, lithographic apparatus and device manufacturing method
10/01/2013US8547522 Dedicated metrology stage for lithography applications
10/01/2013US8547521 Systems and methods that control liquid temperature in immersion lithography to maintain temperature gradient to reduce turbulence
10/01/2013US8547520 Exposing method, exposure apparatus, and device fabricating method
10/01/2013US8547519 Lithographic apparatus and device manufacturing method
10/01/2013US8547518 Stage base, stage apparatus, exposure apparatus, and device manufacturing method
09/2013
09/26/2013US20130252428 Photo-etching and Exposing System
09/26/2013US20130250260 Pellicles for use during euv photolithography processes
09/25/2013CN103329041A System and method for optical shearing
09/25/2013CN101813892B Immersion lithography apparatus and method for manufacturing microdevice using lithography device
09/24/2013US8542346 Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations
09/24/2013US8542345 Measurement apparatus, exposure apparatus, and device manufacturing method to measure numerical aperture of the optical system using interference fringe
09/24/2013US8542344 Lithographic apparatus and device manufacturing method
09/24/2013US8542343 Lithographic apparatus
09/24/2013US8542342 Method of manufacturing a miniaturized device
09/24/2013US8542341 Exposure apparatus
09/24/2013US8542340 Illumination optimization
09/19/2013WO2013136619A1 Light source device
09/19/2013US20130244140 Non-Planar Lithography Mask and System and Methods
09/19/2013US20130244139 Reflective Lithography Masks and Systems and Methods
09/18/2013CN203204296U A LED light source exposure apparatus
09/18/2013CN103309016A Image-forming lens, image reader, and image-forming device
09/17/2013US8538187 Defocus calibration module for light-sensing system and method thereof
09/17/2013US8538160 Electronic device and method for sorting pictures
09/17/2013US8537335 Illumination system for a microlithography projection exposure apparatus, microlithography projection exposure apparatus comprising such an illumination system, and fourier optical system
09/17/2013US8537334 Measuring apparatus and projection exposure apparatus having the same
09/17/2013US8537333 Optical imaging device with image defect determination
09/17/2013US8537332 Projection exposure tool for microlithography with a measuring apparatus and method for measuring an irradiation strength distribution
09/17/2013US8537331 Exposure apparatus and method for manufacturing device
09/17/2013US8537330 Lithographic apparatus, device manufacturing method and computer readable medium
09/17/2013US8536513 Space-saving flatbed scanner
09/17/2013US8534936 Coating and developing apparatus
09/11/2013CN203191678U Negative film scanning base used for supporting mobile phone
09/10/2013US8531747 Hologram, hologram data generation method, and exposure apparatus
09/10/2013US8531649 Exposure apparatus and device fabrication method
09/10/2013US8531648 Lithographic apparatus, programmable patterning device and lithographic method
09/10/2013US8531647 Exposure method and exposure apparatus for photosensitive film
09/10/2013US8528461 Force actuator
09/05/2013US20130229638 System and method for lithography patterning
09/05/2013DE202013103782U1 Kopierhilfe Copy Help
09/03/2013US8526802 Collapsible image capture system
09/03/2013US8525973 Method and apparatus for printing periodic patterns
09/03/2013US8525972 Optimization of focused spots for maskless lithography
09/03/2013US8525971 Lithographic apparatus with cleaning of substrate table
09/03/2013US8525134 Lithography system
08/2013
08/29/2013US20130222852 Image forming apparatus, image forming method and computer-readable storage medium
08/29/2013US20130222782 Substrate holding apparatus, pattern transfer apparatus, and pattern transfer method
08/29/2013US20130222777 Exposure apparatus, exposure control system, and exposure method
08/29/2013DE102012202850A1 Verfahren zum Optimieren eines Schutzlagensystems für ein optisches Element, optisches Element und optisches System für die EUV-Lithographie A method for optimizing a protective layer system for an optical element, optical element and optical system for EUV lithography
08/27/2013US8520190 Evaluation method, control method, exposure apparatus, and memory medium
08/27/2013US8520189 Method and apparatus for maintaining depth of focus
08/27/2013US8520188 Illumination apparatus for efficiently gathering illumination light
08/27/2013US8520187 Apparatus and method for providing fluid for immersion lithography
08/27/2013US8520186 Active spectral control of optical source
08/27/2013US8520184 Immersion exposure apparatus and device manufacturing method with measuring device
08/27/2013US8518633 Large area nanopatterning method and apparatus
08/22/2013US20130215405 Exposure apparatus and method of configuring exposure apparatus
08/21/2013EP2628295A2 Method and system of archiving video to film
08/21/2013EP2628294A1 Method and system for producing video archive on film
08/20/2013USRE44446 Dual stage lithographic apparatus and device manufacturing method
08/20/2013US8516405 System and method for lithography simulation
08/20/2013US8514374 Alignment method for semiconductor processing
08/20/2013US8514372 Method for setting an illumination geometry for an illumination optical unit for EUV projection lithography
08/20/2013US8514371 Imaging device in a projection exposure facility
08/20/2013US8514370 Substrate support structure, clamp preparation unit, and lithography system
08/20/2013US8514369 Lithographic apparatus and device manufacturing method
08/20/2013US8514368 Lithographic apparatus, method for levelling an object, and lithographic projection method
08/20/2013US8514367 Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
08/20/2013US8514366 Exposure method and apparatus, maintenance method and device manufacturing method
08/20/2013US8514365 Lithographic apparatus and device manufacturing method
08/20/2013US8513625 Track-based metrology method and apparatus
08/15/2013US20130210234 Lithography processes utilizing extreme ultraviolet rays and methods of manufacturing semiconductor devices using the same
08/15/2013US20130209939 Integrated Membrane Lamination and UV Exposure System and Method of Using the Same
08/15/2013US20130208252 Flare measuring method, reflective mask, and exposure apparatus
08/15/2013US20130208251 Large area nanopatterning method and apparatus
08/14/2013CN103246149A Base sheet scanning seat used for supporting mobile phone
08/13/2013US8508814 Image reading apparatus
08/13/2013US8508718 Wafer table having sensor for immersion lithography
08/13/2013US8508717 Illumination optical system, exposure apparatus, and device manufacturing method
08/13/2013US8508716 Homogenizer
08/13/2013US8508715 Lithographic apparatus and device manufacturing method utilizing data filtering
08/13/2013US8508714 Exposure apparatus, exposure method, and method for producing device
08/13/2013US8508713 Exposure apparatus, exposure method, and method for producing device
08/13/2013US8508712 Fluid handling structure, lithographic apparatus and device manufacturing method
08/13/2013US8508711 Lithographic apparatus and device manufacturing method
08/13/2013US8507882 Radiation source and lithographic apparatus
08/08/2013US20130201466 Lithographic Apparatus and Device Manufacturing Method
08/08/2013US20130201465 Positioning system
08/08/2013US20130201464 Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the same
08/08/2013US20130201463 System and method for lithography with leveling sensor
08/08/2013US20130201462 Method of determining overlay error and control system for dynamic control of reticle position
08/08/2013US20130201461 Method and apparatus to characterize photolithography lens quality
08/08/2013DE202013103289U1 Digitalkamera-Scanner Digital Camera Scanner
08/06/2013US8502962 Computer readable storage medium including effective light source calculation program, and exposure method
08/06/2013US8502961 Exposure method, exposure apparatus, and method of manufacturing device
08/06/2013US8502960 Heat transfer assembly, lithographic apparatus and manufacturing method
08/06/2013US8502959 Exposure apparatus and device fabrication method
08/06/2013US8502958 Positioning device, lithographic apparatus using same, and device manufacturing method
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