Patents for G03B 27 - Photographic printing apparatus (25,157)
01/2014
01/28/2014US8638420 Optical integrator, illuminating optical device, exposure apparatus and device manufacturing method
01/28/2014US8638419 Lithographic apparatus and device manufacturing method
01/28/2014US8638418 Lithographic apparatus
01/28/2014US8638417 Fluid handling structure, lithographic apparatus and a device manufacturing method
01/28/2014US8638416 Device manufacturing apparatus, including coolant temperature control, and method of manufacturing device
01/28/2014US8638415 Active drying station and method to remove immersion liquid using gas flow supply with gas outlet between two gas inlets
01/28/2014US8636386 Filter device for the compensation of an asymmetric pupil illumination
01/23/2014WO2014012513A1 Multi-prism mechanism for three-dimensional image laser exposure system and method
01/23/2014WO2014012512A1 Movable pressing and light-shielding mechanism for digital stereo image printing and method therefor
01/22/2014CN103529635A LED (light emitting diode) plane light source for engine sheet clamp of digital color film processing machine
01/21/2014US8634731 Method for automatically controlling the sequence of processing orders for processing material containers
01/21/2014US8634064 Optical system for increasing illumination efficiency of a patterning device by producing a plurality of beams
01/21/2014US8634063 Wafer with design printed outside active region and spaced by design tolerance of reticle blind
01/21/2014US8634062 Actuator system, lithographic apparatus, method of controlling the position of a component and device manufacturing method
01/21/2014US8634061 Exposure apparatus and device manufacturing method
01/21/2014US8634060 Method for a multiple exposure, microlithography projection exposure installation and a projection system
01/21/2014US8634059 Lithographic apparatus and device manufacturing method
01/21/2014US8634057 Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
01/21/2014US8634056 Lithographic apparatus and device manufacturing method
01/21/2014US8634055 Apparatus and method to control vacuum at porous material using multiple porous materials
01/21/2014US8634054 Particle detection on an object surface
01/21/2014US8634053 Lithographic apparatus and device manufacturing method
01/21/2014US8634052 Lithographic apparatus and method involving a ring to cover a gap between a substrate and a substrate table
01/21/2014US8632195 Catoptric objectives and systems using catoptric objectives
01/16/2014US20140016112 Electrophotographic Patterning of an Image Definition Material
01/15/2014EP2684096A2 Alignment system for various materials and material flows
01/15/2014CN203397076U Moving pressing shading mechanism for digital stereoscopic image printing
01/14/2014US8629974 Optical component for maskless exposure apparatus
01/14/2014US8629973 Lithographic apparatus and method for illumination uniformity correction and uniformity drift compensation
01/14/2014US8629972 Projection objective for microlithography
01/14/2014US8629971 Lithographic apparatus and device manufacturing method
01/14/2014US8629970 Immersion lithographic apparatus with immersion fluid re-circulating system
01/07/2014US8625109 Method of determining an overlap distance of an optical head and digital exposure device using the method
01/07/2014US8625096 Method and system for increasing alignment target contrast
01/07/2014US8625078 Illumination design for lens heating mitigation
01/07/2014US8625077 Positioning apparatus, exposure apparatus, and device manufacturing method
01/07/2014US8625076 Wafer edge exposure module
01/07/2014US8625075 System and methods related to generating electromagnetic radiation interference patterns
01/07/2014US8625074 Exposure apparatus and device fabrication method
01/07/2014US8625073 Exposure apparatus and device manufacturing method
01/07/2014US8625072 Exposure apparatus, exposure method, and method of manufacturing device
01/07/2014US8625071 Optical system and method for characterising an optical system
01/07/2014US8625070 Lithographic apparatus, projection system and damper for use in a lithographic apparatus and device manufacturing method
01/07/2014US8625069 Exposure apparatus and method of manufacturing device
01/07/2014US8625068 Lithographic apparatus configured to suppress contamination from passing into the projection system and method
01/07/2014US8623588 Scanning EUV interference imaging for extremely high resolution patterning
01/02/2014DE102012211076A1 Device for acquiring document, has inserting portion which is moved, such that specific portion of support surface of inserting portion is moved by specific portion of detection area
01/01/2014CN101980086B Immersion exposure apparatus and method
12/2013
12/31/2013US8619311 Image reading apparatus and a method for controlling the same to perform print processing based on the stored image data
12/31/2013US8619236 Determining lithographic set point using optical proximity correction verification simulation
12/31/2013US8619235 Lithographic apparatus and device manufacturing method
12/31/2013US8619234 Utilities transfer system in a lithography system
12/31/2013US8619233 Maskless exposure apparatus and pattern compensation method using the same
12/31/2013US8619232 Method for damping an object, an active damping system, and a lithographic apparatus
12/31/2013US8619231 Cleaning method, exposure method, and device manufacturing method
12/31/2013US8618496 Charged particle system comprising a manipulator device for manipulation of one or more charged particle beams
12/31/2013US8616709 Projection display apparatus
12/24/2013US8614786 Robot for in-vacuum use
12/24/2013US8614785 Microlithography projection system with an accessible diaphragm or aperture stop
12/24/2013US8614784 Fluid handling structure, lithographic apparatus and device manufacturing method, involving gas supply
12/24/2013US8614783 Encoder-type measurement system, lithographic apparatus and method to detect an error on or in a grid or grating of an encoder-type measurement system
12/19/2013US20130337386 Processing apparatus for processing a flexographic plate, a method and a computer program product
12/17/2013US8612045 Optimization method and a lithographic cell
12/17/2013US8610878 Lithographic apparatus and method
12/17/2013US8610877 Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type
12/17/2013US8610876 Reflective optical element, projection system, and projection exposure apparatus
12/17/2013US8610875 Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
12/17/2013US8610874 Pulse stretcher with reduced energy density on optical components
12/17/2013US8610873 Immersion lithography apparatus and method having movable liquid diverter between immersion liquid confinement member and substrate
12/17/2013US8609301 Mask, exposure apparatus and device manufacturing method
12/17/2013US8608035 Purge ring with split baffles for photonic thermal processing systems
12/12/2013WO2013184700A1 An optical projection array exposure system
12/12/2013US20130332894 System and method for lithography simulation
12/11/2013EP2672690A1 Illumination device
12/11/2013CN103439863A Exposure device and exposure method, maintenance method, and device manufacturing method
12/10/2013US8605257 Projection system with compensation of intensity variations and compensation element therefor
12/10/2013US8605256 Multi-photon exposure system
12/10/2013US8605255 Imaging optical system and projection exposure system including the same
12/10/2013US8605254 Constrained optimization of lithographic source intensities under contingent requirements
12/10/2013US8605253 Lithographic projection objective
12/10/2013US8605252 Exposure apparatus, exposure method, and method for producing device
12/10/2013US8605251 Linear motor, and stage apparatus, exposure apparatus, and method for manufacturing device using the same
12/10/2013US8605250 Method and system for detecting particle contamination in an immersion lithography tool
12/10/2013US8605249 Exposure apparatus, exposure method, and device manufacturing method
12/10/2013US8605248 Exposure method and lithography system
12/05/2013US20130321786 Optical Projection Array Exposure System
12/03/2013US8600151 Producing stereoscopic image
12/03/2013US8599361 Nanometer-precision six-degree-of-freedom magnetic suspension micro-motion table and application thereof
12/03/2013US8599360 Reflective reticle chuck, reflective illumination system including the same, method of controlling flatness of reflective reticle using the chuck, and method of manufacturing semiconductor device using the chuck
12/03/2013US8599359 Exposure apparatus, exposure method, device manufacturing method, and carrier method
12/03/2013US8599358 Maskless exposure apparatuses and frame data processing methods thereof
12/03/2013US8599357 Photolithography system
12/03/2013US8599356 Shutter member, a lithographic apparatus and device manufacturing method
11/2013
11/28/2013WO2013175232A2 Media exposure device
11/28/2013US20130314687 Transverse electric-field type liquid crystal display device, process of manufacturing the same, and scan-exposing device
11/28/2013US20130314682 Exposure apparatus and device manufacturing method
11/28/2013US20130314679 Projection optical system, exposure apparatus, and exposure method
11/27/2013EP2667253A1 Environmental system including vacuum scavenge for an immersion lithography apparatus
11/27/2013EP2667252A1 Environmental system including vacuum scavenge for an immersion lithography apparatus
11/27/2013CN203311157U Digital microfilm camera exposure device using high-definition digital liquid crystal screen to carry out imaging
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