Patents for G03B 27 - Photographic printing apparatus (25,157)
11/2013
11/26/2013US8594825 Method and apparatus for alignment optimization with respect to plurality of layers for writing different layers with different machine configurations
11/26/2013US8593618 Optical system of a microlithographic projection exposure apparatus and microlithographic exposure method
11/26/2013US8593617 Lithographic apparatus, plasma source, and reflecting method
11/26/2013US8593616 Actuator, stage device, and exposure apparatus
11/26/2013US8593615 Height measurement apparatus, exposure apparatus, and device fabrication method
11/26/2013US8592106 Methods of manufacturing a mask blank substrate, a mask blank, a photomask, and a semiconductor device
11/21/2013US20130308107 Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
11/19/2013US8587769 Stage apparatus and lithographic apparatus comprising such stage apparatus
11/19/2013US8587768 EUV collector system with enhanced EUV radiation collection
11/19/2013US8587767 Illumination optics for EUV microlithography and related system and apparatus
11/19/2013US8587766 Lithographic apparatus and device manufacturing method
11/19/2013US8587765 Optical imaging device with determination of imaging errors
11/19/2013US8587764 Optical integrator system, illumination optical apparatus, exposure apparatus, and device manufacturing method
11/19/2013US8587763 Substrate processing method, substrate processing system, and computer-readable recording medium recording program thereon
11/19/2013US8587762 Methods relating to immersion lithography and an immersion lithographic apparatus
11/19/2013US8586949 Charged particle lithography system with intermediate chamber
11/14/2013US20130301022 Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
11/14/2013US20130301021 Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
11/14/2013US20130301020 Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
11/14/2013US20130301018 Wafer table having sensor for immersion lithography
11/14/2013US20130301016 Wafer table having sensor for immersion lithography
11/14/2013US20130301015 Apparatus and method for providing fluid for immersion lithography
11/13/2013CN103391389A Document reading apparatus and method of controlling the same
11/12/2013US8582084 Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, position control method and position control system, and device manufacturing method
11/12/2013US8582083 Effective light source shape database generation method, optical image calculation method, recording medium, exposure method, and device fabrication method
11/12/2013US8582082 Method and lithographic apparatus for measuring and acquiring height data relating to a substrate surface
11/12/2013US8582081 Device for the low-deformation replaceable mounting of an optical element
11/12/2013US8582080 Stage assembly with measurement system initialization, vibration compensation, low transmissibility, and lightweight fine stage
11/12/2013US8582079 Using phase difference of interference lithography for resolution enhancement
11/12/2013US8582078 Test method for determining reticle transmission stability
11/12/2013US8582077 Pellicle, mounting method therefor, pellicle-equipped mask, and mask
11/12/2013DE202008018442U1 Entwicklungsvorrichtung, deren Speichereinheit und Bilderzeugungseinrichtung Developing device whose memory unit and image forming apparatus
11/07/2013US20130293858 Anisotropic phase shifting mask
11/07/2013US20130293857 Lithography apparatus having dual reticle edge masking assemblies and method of use
11/05/2013US8576379 Position measurement method, position control method, measurement method, loading method, exposure method and exposure apparatus, and device manufacturing method
11/05/2013US8576378 Illumination optical system, exposure apparatus, and device manufacturing method
11/05/2013US8576377 Lithographic apparatus and device manufacturing method
11/05/2013US8576376 Imaging optical system and projection exposure system for microlithography
11/05/2013US8576375 Optical member-holding apparatus, method for adjusting position of optical member, and exposure apparatus
11/05/2013US8576374 Lithographic apparatus and method
11/05/2013US8576373 Lithographic apparatus and method
11/05/2013US8576205 Communication between image supply device and image display device
10/2013
10/31/2013WO2013161115A1 Illuminating apparatus, image sensor, and methods for manufacturing illuminating apparatus and image sensor
10/31/2013US20130286372 Exposure Device, Exposure Method and Method of Manufacturing Semiconductor Device
10/31/2013US20130286369 Using Customized Lens Pupil Optimization to Enhance Lithographic Imaging in a Source-Mask Optimization Scheme
10/31/2013US20130286368 Imager array apparatus and systems
10/29/2013US8570492 Lithographic apparatus
10/29/2013US8570491 System for patterning flexible foils
10/29/2013US8570490 Lithographic apparatus and control method
10/29/2013US8570489 Lithographic projection apparatus and method of compensating perturbation factors
10/29/2013US8570488 Transmitting optical element and objective for a microlithographic projection exposure apparatus
10/29/2013US8570487 Lithographic apparatus, device manufacturing method, and method of applying a pattern to a substrate
10/29/2013US8570486 Lithographic apparatus and device manufacturing method
10/29/2013US8570485 Lens heating compensation systems and methods
10/29/2013US8570484 Immersion exposure apparatus, device manufacturing method, cleaning method, and cleaning member to remove foreign substance using liquid
10/24/2013US20130278914 Non-harmonic cyclic error compensation in interferometric encoder systems
10/23/2013EP2653924A2 Liquid recovery system, immersion exposure apparatus, immersion exposure method, and device fabricating method
10/23/2013CN101944338B Image displaying device and image displaying system
10/22/2013US8566756 Processing condition determining method and apparatus, display method and apparatus, processing apparatus, measurement apparatus and exposure apparatus, substrate processing system, and program and information recording medium
10/22/2013US8565552 Assembling multiple medical images into a single film image
10/22/2013US8564850 Optical reading device, control method for an optical reading device, and storage medium
10/22/2013US8564763 Lithographic apparatus and method
10/22/2013US8564762 Photolithography exposure apparatus having blinding plates and method of driving the same
10/22/2013US8564761 Surface shape measuring apparatus, exposure apparatus, and device manufacturing method
10/22/2013US8564760 Lithographic apparatus, device manufacturing method and a control system
10/22/2013US8564759 Apparatus and method for immersion lithography
10/22/2013US8564758 Exposure apparatus and method of decreasing fluctuations in optical characteristics of projection system
10/22/2013US8564757 Lithographic apparatus and a method of operating the apparatus
10/22/2013US8563952 Charged particle beam writing apparatus
10/22/2013US8562152 Collimator lens unit with aspheric surfaces for imparting a luminous flux density distribution
10/18/2013DE202013005144U1 Tablet PC Kopierer Tablet PC copier
10/17/2013WO2013155232A1 Arrangement of reticle positioning device for actinic inspection of euv reticles
10/17/2013US20130271743 Driving apparatus, exposure apparatus, and method of manufacturing article
10/16/2013CN203241691U Developing and printing equipment mechanism
10/15/2013US8558991 Imaging optical system and related installation and method
10/15/2013US8558990 Method of exposing a semiconductor wafer and exposure apparatus
10/15/2013US8558989 Lithographic apparatus and device manufacturing method
10/15/2013US8558988 Thin film continuous spatially modulated grey attenuators and filters
10/15/2013US8558987 Exposure apparatus and device fabrication method
10/15/2013US8558986 Exposure apparatus and device manufacturing method
10/15/2013US8558196 Charged particle lithography system with aperture array cooling
10/09/2013CN101819386B Exposure apparatus and device manufacturing method
10/08/2013US8555208 Systems and methods for implementing and manufacturing reticles for use in photolithography tools
10/08/2013US8553207 Optically compensated unidirectional reticle bender
10/08/2013US8553206 Lithographic apparatus, coverplate and device manufacturing method
10/08/2013US8553205 Method for controlling the position of a movable object, a control system for controlling a positioning device, and a lithographic apparatus
10/08/2013US8553204 Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method
10/08/2013US8553203 Stage drive method and stage unit, exposure apparatus, and device manufacturing method
10/08/2013US8553202 Projection objective for microlithography
10/08/2013US8553201 Lithographic apparatus and device manufacturing method
10/08/2013US8553200 Optical element with at least one electrically conductive region, and illumination system with the optical element
10/08/2013US8553199 Lithographic apparatus and device manufacturing method
10/08/2013US8553198 Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposure
10/03/2013WO2013146873A1 Rod lens array and image sensor head that uses same
10/03/2013US20130258309 Substrate holding device, lithography apparatus using same, and device manufacturing method
10/03/2013US20130258304 Enhanced euv lithography system
10/02/2013CN203224716U Processing equipment paper box
10/02/2013CN103339917A Illumination device
10/01/2013US8547528 Stage drive method and stage unit, exposure apparatus, and device manufacturing method
10/01/2013US8547527 Movable body drive method and movable body drive system, pattern formation method and pattern formation apparatus, and device manufacturing method
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