Patents for C30B 19 - Liquid-phase epitaxial-layer growth (1,562)
10/2006
10/26/2006US20060236917 Method of forming conductive film and method of manufacturing electronic apparatus
10/24/2006US7125801 Method of manufacturing Group III nitride crystal substrate, etchant used in the method, Group III nitride crystal substrate, and semiconductor device including the same
10/24/2006US7125451 Crystal-structure-processed mechanical devices and methods and systems for making
10/10/2006US7119400 Isotopically pure silicon-on-insulator wafers and method of making same
10/10/2006US7118625 Liquid phase growth method for silicon crystal, manufacturing method for solar cell and liquid phase growth apparatus for silicon crystal
10/05/2006DE19904378B4 Verfahren zur Herstellung von Nitrid-Einkristallen A process for producing nitride crystals
10/04/2006EP1706903A1 Isotopically pure silicon-on-insulator wafers and method of making same
09/2006
09/06/2006CN1828508A High-energy electron-diffraction diagram processing system and method
08/2006
08/23/2006EP1049813B1 Cvd reactor and process
08/16/2006EP1690284A2 Method of production of silicon carbide single crystal
07/2006
07/20/2006US20060160336 Silicon layer production method and solar cell production method
07/18/2006US7077901 Process for producing single crystal silicon wafers
06/2006
06/29/2006US20060137602 Preparation of iodixanol
06/07/2006CN1783434A Liquid phase epitaxial growth method for growing indium-arsenic-antimony thin film on gallium-arenic substrate
06/01/2006US20060112873 Magnetic garnet single crystal film formation substrate, optical element and production method of the same
05/2006
05/30/2006CA2423146C A method of welding single crystals
05/26/2006WO2006054628A1 Magnetic garnet single crystal, optical device using same and method for producing single crystal
05/23/2006US7048797 Liquid-phase growth process and liquid-phase growth apparatus
05/17/2006CN1772973A Heat balance growing method for magnetic semiconductor gallium, manganese and antimony single crystal
05/10/2006EP1654405A1 Device and method for treating a crystal by applying microdrops thereto
05/04/2006US20060091393 Isotopically pure silicon-on-insulator wafers and methods of making same
05/03/2006CN1768167A Substrate for forming magnetic garnet single-crystal film, process for producing the same, optical device and process for producing the same
05/03/2006CN1768166A Magnetic garnet single crystal film formation substrate, optical element and production method of the same
04/2006
04/27/2006US20060088713 Surface modification of nanocrystals using multidentate polymer ligands
04/20/2006DE102004048453A1 Verfahren zur Erhöhung des Umsatzes von Gruppe-III-Metall zu Gruppe-III-Nitrid in einer Gruppe-III-haltigen Metallschmelze A method for increasing the conversion of group III metal to group III nitride in a group-III-containing molten metal
04/13/2006WO2006037310A1 Method for the production of group iii nitride bulk crystals or crystal layers from fused metals
04/13/2006DE102004048454A1 Verfahren zur Herstellung von Gruppe-III-Nitrid-Volumenkristallen oder-Kristallschichten aus Metallschmelzen A process for the production of group III-nitride bulk crystals or crystal layers of molten metal
04/11/2006US7026696 Thin film-structure and a method for producing the same
04/04/2006US7022181 Liquid phase growth process, liquid phase growth system and substrate member production method
03/2006
03/22/2006CN1246507C Method for suppressing hetero crystal forming and growing at seed crystal starting end, and casting case construction thereof
03/21/2006US7014711 Liquid-phase growth apparatus and method
03/16/2006US20060054078 Liquid-phase growth apparatus and method
03/15/2006EP1634980A1 Method for producing group iii nitride single crystal and apparatus used therefor
03/09/2006WO2006025420A1 Method for preparing silicon carbide single crystal
03/09/2006US20060048698 Methods and systems for purifying elements
03/08/2006CN1244724C Magnetic garnet monocrystal film and its preparation, and Faraday rotor using said monocrystal film
03/02/2006WO2005065143A3 Isotopically pure silicon-on-insulator wafers and method of making same
02/2006
02/22/2006EP1627940A1 Method for producing single crystal of multi- element oxide single crystal containing bismuth as constituting element
02/14/2006US6998286 Thin film-structure and a method for producing the same
02/14/2006US6997986 Method for preparing single crystal
01/2006
01/19/2006DE10036672B4 GaAs-Flüssigphasenepitaxiewafer und Verfahren zum Herstellen desselben GaAs Flüssigphasenepitaxiewafer thereof and methods for preparing
01/11/2006CN1236112C Method for preparing compound laser crystal of yttrium aluminate with neodymium adulterated and yttrium aluminate
01/11/2006CN1236111C Method for preparing superconducting block material with thick film being as seed crystal fustion texture
01/10/2006US6984265 Three dimensional array films
12/2005
12/14/2005CN1706994A Homoepitaxial superconductor lump material growing process with RE, Ba and Cu oxide film as crystal seed
12/08/2005WO2005117079A1 Silicon layer production method and solar cell production method
12/08/2005WO2005116305A1 Method for producing calcium fluoride crystal
11/2005
11/30/2005CN1229876C Method and device for manufacture of gallium phosphide luminous component
11/16/2005EP1595979A1 Substrate for forming magnetic garnet single-crystal film, process for producing the same, optical device and process for producing the same
11/16/2005CN1696356A Self-assembly method for developing film of zinc oxide through induction of seed crystal and liquid phase epitaxy in low temperature
11/09/2005EP1593759A1 Substrate for forming magnetic garnet single-crystal film, optical device and process for producing the same
11/05/2005CA2506388A1 Surface modification of nanocrystals using multidentate polymer ligands
10/2005
10/27/2005US20050239225 Thin sheet production method and thin sheet production device
10/13/2005DE10117306B4 Verfahren zur Herstellung einer strukturierten Dünnschicht-Anordnung A method for producing a structured thin-film arrangement
10/11/2005US6953506 Wafer cassette, and liquid phase growth system and liquid-phase growth process which make use of the same
10/06/2005WO2005093795A1 Lithographic methods to reduce stacking fault nucleation sites and structures having reduced stacking fault nucleation sites
10/06/2005CA2554408A1 Lithographic methods to reduce stacking fault nucleation sites and structures having reduced stacking fault nucleation sites
10/04/2005US6951585 Liquid-phase growth method and liquid-phase growth apparatus
10/04/2005US6951584 Apparatus for producing semiconductor thin films on moving substrates
09/2005
09/22/2005US20050205871 Lithographic methods to reduce stacking fault nucleation sites and structures having reduced stacking fault nucleation sites
09/21/2005CN1670916A Group III nitride crystal substrate, method of its manufacture, and group-III nitride semiconductor device
09/21/2005CN1670269A Sliding mechanism of semiconductor material growing system
09/07/2005CN1665968A Thin sheet production method and thin sheet production device
09/07/2005CN1664179A Method of manufacturing group-III nitride crystal
08/2005
08/16/2005US6929695 Method for preparing single crystal oxide thin film
08/04/2005WO2005071143A1 Process for producing single crystal of gallium-containing nitride
07/2005
07/28/2005US20050164419 Group III Nitride Crystal Substrate, Method of Its Manufacture, and Group-III Nitride Semiconductor Device
07/27/2005EP1557870A2 Group III nitride crystal substrate, method of its manufacture, and group-III nitride semiconductor device
07/21/2005WO2005067049A1 Isotopically pure silicon-on-insulator wafers and method of making same
07/21/2005WO2005065143A2 Isotopically pure silicon-on-insulator wafers and method of making same
07/14/2005WO2005064661A1 Method for producing group iii nitride crystal, group iii nitride crystal obtained by such method, and group iii nitride substrate using same
07/14/2005US20050153471 Method of manufacturing group-III nitride crystal
07/13/2005EP1553216A2 Method of manufacturing group-III nitride crystal
06/2005
06/23/2005WO2005056887A1 Method for manufacturing garnet single crystal and garnet single crystal manufactured thereby
06/22/2005CN1207449C Substrate clamping devices for film growth by liquid phase extension
06/09/2005WO2005053003A2 Method of production of silicon carbide single crystal
06/07/2005US6902617 Method of welding single crystals
06/02/2005DE10392847T5 Verfahren und Vorrichtung zum Herstellen einer dünnen Lage Method and apparatus for producing a thin layer
06/01/2005CN1622409A Zinc oxide bluish violet light semiconductor growth using liquid phase epitaxial method
05/2005
05/19/2005US20050103258 Epitaxial organic layered structure and method for making
05/10/2005US6890781 Transparent layer of a LED device and the method for growing the same
04/2005
04/14/2005US20050076829 Method of manufacturing potassium niobate single crystal thin film, surface acoustic wave element, frequency filter, frequency oscillator, electronic circuit, and electronic apparatus
04/07/2005WO2005032217A1 Epitaxial organic layered structure and method for making
04/05/2005US6875270 Magnetic garnet single-crystal film and method of producing the same, and Faraday rotator comprising the same
03/2005
03/29/2005US6872248 Liquid-phase growth process and liquid-phase growth apparatus
03/17/2005US20050059229 Method of manufacturing Group III nitride crystal substrate, etchant used in the method, Group III nitride crystal substrate, and semiconductor device including the same
03/15/2005US6867459 Isotopically pure silicon-on-insulator wafers and method of making same
02/2005
02/24/2005WO2005017236A1 Device and method for treating a crystal by applying microdrops thereto
02/23/2005CN1585150A Growth of ferroelectric thick films with films as seeds by liquid phase epitaxy
02/23/2005CN1190526C Liquid phase epitaxial growth superconductive thick film material with overheated seed film as seed crystal
02/17/2005US20050034756 Method for forming a Si film, Si film and solar battery
02/17/2005DE10334522A1 Process for the liquid phase epitaxial production of a semiconductor arrangement for producing IR emitters comprises epitaxially forming a semiconductor layer of a III-V compound semiconductor from a melt containing an arsenide dopant
02/16/2005CN1189899C Method for making magnetic garnet monocrystal film and mangetic garnet monocrystal film with ununiform thickness
02/09/2005EP1505179A1 Procedure for identifying weakly binding molecule fragments with ligand properties with the molecule fragments being applied to the crystal as micro-drops of a corresponding solution
01/2005
01/26/2005CN1570224A Method for suppressing stray crystal forming and growing at seed crystal starting end, and casting case construction thereof
01/26/2005CN1186483C Preparation of Nd-Y-Al garnet dosed and Y-Al garnet composite laser crystals
01/26/2005CN1186482C Process for preparing low temperature phase barium metaborate mono-crystal film
01/25/2005US6846578 Method of colloid crystal growth on patterned surfaces
01/20/2005US20050011432 Method of manufacturing Group III nitride crystals, method of manufacturing semiconductor substrate, Group III nitride crystals, semiconductor substrate, and electronic device
12/2004
12/15/2004EP1487008A2 Method for forming a Si film, si film and solar battery
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