Patents for C30B 19 - Liquid-phase epitaxial-layer growth (1,562)
01/2003
01/16/2003US20030010978 Semiconductor wafers with integrated heat spreading layer
01/15/2003CN1390987A Composite flash crystal doped by lutetium cerialuminate and yttrium aluminate and its preparing process
01/09/2003WO2003002457A1 Thin sheet producing method, and solar cell
01/03/2003WO2003000963A1 Substrate for forming magnetic garnet single crystal film, optical device, and its production method
01/02/2003EP1268883A1 Large size single crystal seed crystal fabrication by intergrowth of tiled seed crystals
12/2002
12/19/2002WO2002101123A1 Method for preparing oxide crystal film/substrate composite and solution for use therein
12/12/2002WO2002099169A1 Single crystal silicon carbide and method for producing the same
12/04/2002CN1382558A Directional setting technique for laser epitaxial technology
10/2002
10/22/2002US6468884 Method of forming silicon-contained crystal thin film
10/17/2002DE10117306A1 Production of structured multiple layer arrangement comprises growing island structures from metallic solution on substrate or layer using liquid phase epitaxy, and growing covering layer on island structures
10/03/2002US20020139293 Method of manufacturing a magnet-free faraday rotator
08/2002
08/27/2002US6440212 Low cost method for making thermoelectric coolers
08/22/2002US20020112660 Liquid phase growth method of silicon crystal, method of producing solar, cell, and liquid phase growth apparatus
08/15/2002US20020108559 Liquid phase growth methods and liquid phase growth apparatus
08/08/2002US20020106874 Crystal growth process, semiconductor device, and its production process
08/06/2002US6429035 Method of growing silicon crystal in liquid phase and method of producing solar cell
07/2002
07/25/2002US20020096104 Single crystal SiCand method of producing the same as well as SiC semiconductor device and SiC composite material
07/24/2002EP1225257A2 Single crystal SiC and method of producing the same as well as SiC semiconductor device and SiC composite material
07/18/2002US20020092464 Liquid phase growth process, liquid phase growth system and substrate member production method
06/2002
06/20/2002US20020076882 Wafer cassette, and liquid-phase growth system and liquid-phase growth process which make use of the same
06/13/2002US20020072203 Thin film-structure and a method for producing the same
06/11/2002US6402836 Method for epitaxial growth on a substrate
05/2002
05/23/2002US20020061632 Method and apparatus for producing semiconductor thin films
05/21/2002US6391108 Liquid phase growth method of silicon crystal, method of producing solar cell, and liquid phase growth apparatus
05/07/2002US6383286 Method of making semiconductor super-atom and aggregate thereof
05/01/2002CN1347138A Heterogeneous liquid-phase epitaxial growth process of magnetic semiconductor/semiconductor
04/2002
04/17/2002CN1345096A Method and device for manufacture of gallium phosphide luminous component
04/09/2002US6368401 Method of producing magnetic garnet single crystal film and magnetic garnet single crystal film having a nonuniform thickness
03/2002
03/28/2002WO2002024982A1 Method for producing crystal thin plate and solar cell comprising crystal thin plate
03/21/2002WO2002022920A1 Rare earth-iron garnet single crystal material and method for preparation thereof and device using rare earth-iron garnet single crystal material
03/07/2002WO2002018678A1 Method for preparing single crystal oxide thin film
02/2002
02/21/2002WO2001063024A8 Production of ceramic layers
02/14/2002DE10026911A1 Verfahren zur Herstellung einer halbleitenden Nanostruktur und Aggregat davon A process for producing a semiconducting nanostructure and aggregate thereof
02/07/2002US20020014198 Silicon carbide and method for producing the same
02/06/2002EP1178494A1 Oxide superconductor, method of manufacture thereof, and base material of oxide superconductor
02/06/2002CN1334360A Method for mfg. microwave device
01/2002
01/31/2002US20020013053 Method of producing a microwave device
01/29/2002CA2205918C Epitaxial growth of silicon carbide and resulting silicon carbide structures
01/17/2002US20020005158 Liquid phase growth method of silicon crystal, method of producing solar cell, and liquid phase growth apparatus
01/15/2002US6338755 Method for producing a single crystalline member
01/02/2002CN1329184A Bismuth-substituted garnets thick film material and producing method thereof
12/2001
12/20/2001US20010052828 Material for bismuth substituted garnet thick film and a manufacturing method thereof
12/13/2001US20010051387 Method of growing silicon crystal in liquid phase and method of producing solar cell
12/12/2001EP1162635A1 Material for bismuth substituted garnet thick film and a manufacturing method thereof
12/06/2001CA2349871A1 Material for bismuth substituted garnet thick film and a manufacturing method thereof
11/2001
11/29/2001WO2001090449A1 A method for growing single crystals
10/2001
10/30/2001US6309557 Magnetic garnet material and faraday rotator using the same
10/10/2001EP1143042A1 Magnetic garnet single-crystal film and method of producing the same, and faraday rotator comprising the same
10/10/2001EP1143033A2 Silicon carbide and method for producing the same
10/03/2001CN1072282C Growth of silicon carbide monocrystal using silicon substrate beta-silicon carbide crystal
09/2001
09/27/2001US20010023932 Bismuth-substituted rare earth-iron; minimal cracking while growing, cooling or polishing and worked; controlled liquid-phase epitaxial growth
09/26/2001CN1314506A Magnetic garnet monocrystal film and its preparation, and Faraday rotor using said monocrystal film
09/26/2001CN1314505A Method and device for restraining growth of artificial crystal
09/20/2001WO2001068957A1 Large size single crystal seed crystal fabrication by intergrowth of tiled seed crystals
09/13/2001DE10007946A1 Production of ceramic layers, especially carbide layers, on a substrate comprises feeding ceramic particles to the substrate using a transfer medium enriched with ceramic particles by heating a ceramic part to a high temperature
09/06/2001US20010019877 Method of forming silicon-contained crystal thin film
08/2001
08/30/2001WO2001063024A1 Production of ceramic layers
08/22/2001CN1069935C Method for reducing formation of microtransistor defect in epitaxial growth of silicon carbide, and resulting silicon carbide structure
08/14/2001US6273946 Method for production of multi-layered epitaxially grown crystal and apparatus therefor
08/07/2001US6270569 Melting a group iii metal, injecting ammonia into melt produces nitride microcrystal; the two then react on the surface of a seed/substrate crystal, allowing the nitride crystal to be grown; blue laser diodes
08/02/2001US20010010375 Gallium phosphide semiconductor configuration and production method
07/2001
07/25/2001CN1305241A Magnetostatic wave element and its manufacturing method
05/2001
05/22/2001US6235116 Method and apparatus for growing layer on one surface of wafer
05/15/2001US6231667 Liquid phase growth method and liquid phase growth apparatus
04/2001
04/11/2001CN1290959A Liquid phase growing method liquid growing equipment and solar cell
04/04/2001EP1088913A2 Liquid-phase growth method, liquid-phase growth apparatus, and solar cell
03/2001
03/21/2001EP1084514A1 GaP-SEMICONDUCTOR ARRANGEMENT AND METHOD FOR PRODUCING THE SAME
03/20/2001US6203728 To decrease an absorption coefficient for a light in a blue light range; optics
02/2001
02/22/2001DE19938631A1 Production of thin single crystalline layers or layer system by depositing on a substrate comprises deviating the surface normals from the specified directions of the substrate to produce steps
02/20/2001US6190937 Method of producing semiconductor member and method of producing solar cell
02/15/2001DE10036672A1 Gallium arsenide single crystal wafer has surfaces formed as a substrate for growing an n-type layer and a p-type layer by means of liquid phase epitaxy using silicon as amphoteric dopant
02/13/2001US6187279 Used as a semiconductor substrate wafer for a light-emitting diode, an x-ray optical element such as a monochromatic sorter, a high-temperature semiconductor electronic element, and a power device.
02/01/2001DE10029550A1 Verfahren zur Herstellung einer magnetischen einkristallinen Granatschicht und magnetische einkristalline Granatschicht von ungleichmäßiger Dicke A process for producing a magnetic garnet single-crystal layer and magnetic garnet single crystal layer of uniform thickness
01/2001
01/18/2001DE10026319A1 Single crystalline body production comprises preparing substrate, forming seed crystal part on surface of substrate and contacting seed crystal part with solution containing chemical element in saturation
01/03/2001CN1278649A Method for making magnetic garnet monocrystal film and mangetic garnet monocrystal film with ununiform thickness
12/2000
12/28/2000DE10011697A1 Oxide superconductor film for switching element, has bi-crystal oxide superconductor film formed on bi-crystal board which has junction of predetermined length
11/2000
11/08/2000EP1049820A1 Method for epitaxial growth on a substrate
11/08/2000EP1049813A1 T proced
11/08/2000EP0444209B1 Thin film of lithium niobate single crystal and production thereof
10/2000
10/26/2000WO2000063926A1 Oxide superconductor, method of manufacture thereof, and base material of oxide superconductor
09/2000
09/20/2000CN2397130Y Container for liquid phase epitaxial horizontal growth of crystal film
06/2000
06/07/2000EP1005580A1 Liquid phase epitaxy through a porous material
06/02/2000WO2000031322A1 Method for epitaxial growth on a substrate
06/02/2000WO2000031317A1 Reactor and method for chemical vapour deposition
05/2000
05/09/2000US6059878 Liquid phase epitaxial; hydrogen reduction
04/2000
04/18/2000US6051062 Producing an optical single crystal epitaxial film from a melt containing a transition metal on a single crystal substrate by a liquid phase epitaxial method
03/2000
03/14/2000US6036770 Growing laterally continuous mercury-cadmium-telluride filmwith a constanrt ratio of mercury to cadmium, laterally non-uniformly heating film to reduce this ratio
03/08/2000EP0983395A1 Epitaxy boat and method for liquid phase epitaxial deposit of cdhgte
02/2000
02/16/2000CN1244724A Crystal growth technology and semiconductor device and its producing method
01/2000
01/05/2000EP0969499A2 Crystal growth process for a semiconductor device
01/05/2000EP0515682B1 Thin film of lithium niobate single crystal
12/1999
12/28/1999US6008162 Production method of oxide superconductive film
12/15/1999EP0964081A2 Single crystal SiC and a method of producing the same
12/09/1999WO1999063602A1 GaP-SEMICONDUCTOR ARRANGEMENT AND METHOD FOR PRODUCING THE SAME
12/07/1999US5998050 Rare earth (or yttium) barium copper oxide
12/02/1999DE19824566C1 GaP-Halbleiteranordnung und Verfahren zur Herstellung derselben GaP semiconductor device and method of manufacturing the same
11/1999
11/16/1999US5985023 Method for growth of a nitrogen-doped gallium phosphide epitaxial layer
11/16/1999US5985022 Optoelectric articles and a process for producing the same
07/1999
07/28/1999CN1224084A Film growth of silicon carbide monocrystal using silicon substrate beta-silicon carbide crystal
07/13/1999US5922126 Semiconductor liquid phase epitaxial growth method and apparatus, and its wafer holder
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