Patents for C25D 3 - Electroplating; Baths therefor (11,896)
12/2002
12/18/2002CN1385556A Stabilizer for plating tin-bismuth alloy and preparation method thereof
12/17/2002US6495022 Electolysis to create an alloy of copper, tungsten and/or molybdenum, nickel, cobalt, iron and/or zinc and chlorine
12/17/2002US6495001 For the production of electrical contact components, by applying a film of tin or tin alloy to a strip of electroconductive base material, and subsequently depositing a silver film
12/12/2002WO2002068727A3 Copper-plating solution, plating method and plating apparatus
12/12/2002US20020187364 Electrodeposition; electronics
12/12/2002US20020187355 High speed electroplating; uniform deposits
12/12/2002US20020185716 Metal article coated with multilayer finish inhibiting whisker growth
12/11/2002EP1264918A1 Electrolytic copper plating method
12/11/2002EP1264009A2 Method for applying a metal layer to a light metal surface
12/11/2002EP0844316B1 Surface-treated steel sheet excellent in corrosion resistance after working
12/11/2002CN1384782A Treated copper foil and process for making treated copper foil
12/11/2002CN1384226A Ni-Co alloy electroplating process for copper plate working surface of continuously casting crystallizer
12/11/2002CN1384225A Ferro-nickel alloy electroplating process for copper plate working surface of continuously casting crystallizer
12/10/2002US6492262 Process and structure for an interlock and high performance multilevel structures for chip interconnects and packaging technologies
12/10/2002US6491806 Electroplating bath composition
12/05/2002WO2002097165A2 Apparatus and methods for electrochemical processing of microelectronic workpieces
12/05/2002US20020182433 Composite metal layer, comprises (I) copper, (II) tungsten or molybdenum and (III) nickel, cobalt, iron or zinc; and a roughened layer of copper formed on the composite metal layer.
12/05/2002DE10123585C1 Production of metals which foam on heat treatment or metal foams comprises suspending a propellant which splits gas on heat treatment in a galvanic electrolyte, and galvanically depositing the metal with the electrolyte on a substrate
12/04/2002EP1114207B1 Pellistor
11/2002
11/28/2002US20020175080 Plating a wafer by exposing to a first solution of a sulfur depolarizing compound to brighten and level; exposing to a metal compound solution, applying a current; elimination of depletion/monitoring of additives and defects (bumps)
11/27/2002EP1260614A1 Tin plating
11/27/2002EP1260198A1 Movable joint
11/27/2002CN1382306A Copper deposit process
11/27/2002CN1094995C Method for electroplating alloy powder for H-Ni battery and its apparatus
11/26/2002US6486533 Metallization structures for microelectronic applications and process for forming the structures
11/26/2002US6485863 Battery container with surface treated steel sheet
11/21/2002WO2002092211A2 Bis (perfluoroalkanesulfonyl) imides and their salts as surfactants/additives for applications having extreme environments and methods therefor
11/21/2002US20020173853 Movable joint and method for coating movable joints
11/21/2002US20020170828 Electroplating composition and process
11/20/2002EP1257693A1 Composite copper foil and manufacturing method thereof
11/20/2002CN1380915A Electrolysis apparatus for electrolytic copper foil and electrolytic copper foil produced in electrolysis apparatus
11/20/2002CN1380445A Electroplating tin-bithmuth alloy plating liquor and its preparation method
11/17/2002CA2386972A1 Movable joint and method for coating joints
11/14/2002WO2002090623A1 Copper plating bath and method for plating substrate by using the same
11/14/2002US20020166774 Alloy composition and plating method
11/13/2002EP1257004A1 Metal article with multilayer coating
11/13/2002CN1379123A Complexing agent for electroplating Sn-Bi alloy and its preparing process
11/13/2002CN1379122A Brightening agent for electroplated Sn-Bi alloy and its preparing process
11/12/2002US6479176 Gradient interface magnetic composites and methods therefor
11/12/2002US6478944 Functional Sn-Bi alloy plating using a substitute material for Pb
11/07/2002WO2002088434A1 Aluminium electroplating formulations
11/07/2002WO2002088423A1 Copper plating solution and method for copper plating
11/07/2002WO2002058775A3 Device for dilating and irradiating a vascular segment or body passageway
11/07/2002US20020164262 For producing optical mirror
11/07/2002US20020162751 Cleaning and activating workpiece; exposing to a galvanic chrome plating bath to formhard chromium plating having a pearl or columnar structure type surface, and filling in and smoothing surface with galvanically applied silver layer
11/07/2002US20020162748 Method for surface treatment of gold-plated body and surface-treated product, and process for producing gold-plated body and gold-plated body, and method for immobilization of sulfur-containing molecules
11/07/2002DE10121593A1 Verfahren zur Beschichtung von Werkstücken mit einem Lagermetall A method of coating workpieces with a bearing metal
11/06/2002EP1254973A1 Method of coating of workpieces with a bearing metal
11/06/2002CN1378607A Method for producing electrolytically coated cold rolled strip, preferably for use in production of battery sheaths, and battery sheath produced according to said method
11/05/2002US6475645 Electrodeposited paint containing cobalt and zinc
11/05/2002US6475644 Medical devices for delivery of targeted radioisotopes
11/05/2002US6475643 Lead-free alloy of tin and gallium, oxidation resistance
10/2002
10/31/2002WO2002086196A1 Copper acid baths, system and method for electroplating high aspect ratio substrates
10/31/2002US20020160222 Electrolessly depositing on copper and copper alloys a ternary amorphous-microcrystalline cobalt alloy of cobalt, tungsten and phosphorus from an aqueous bath to achieve a barrier layer to impede the migration of copper atoms to the overplate
10/31/2002US20020160221 Hot-dip galvanized steel sheet
10/30/2002EP1253220A1 Sliding member
10/30/2002EP1252650A1 Substrate processing apparatus
10/30/2002CN1093572C Technology for producing Cu-P anode
10/29/2002US6472086 Multilayer; steel support; alloy overcoating; lead-free
10/24/2002WO2002046500A3 Improvements relating to metal finishes
10/24/2002US20020154442 Magnetic head for hard disk drive having varied composition nickel-iron alloy magnetic poles
10/24/2002US20020153260 For use in electroplating printed circuit boards and other electronic packaging devices
10/24/2002US20020153259 Providing aqueous solution comprising source of copper, additive to adjust pH to a predetermined value, and a complexing agent for complexing copper; providing electrons from a source not being in direct contact with solution
10/24/2002US20020153255 Method of electroplating a nickel-iron alloy film with a graduated composition
10/24/2002US20020153210 Plated wear surface for alloy components and methods of manufacturing the same
10/24/2002DE10108893A1 Production of metals and their alloys and compound semiconductors comprises galvanically depositing metals, alloys or compound semiconductors from an ionic liquid or suitable molten salt in an electrolysis device
10/23/2002EP1250472A1 Method for the deposition of a chromium alloy
10/23/2002CN1376214A Method for electrodeposition of emtallic multilayers
10/23/2002CN1093179C Foil with controlled properties for printed circuit board and procedures and electrolyte bath solutions for preparing same
10/22/2002US6468411 Brightener for zinc-nickel plating bath and method of electroplating
10/17/2002WO2002081782A1 Back-end metallisation process
10/16/2002EP1249861A2 A multi-step method for metal deposition
10/16/2002EP1249517A1 Copper electroplating liquid, pretreatment liquid for copper electroplating and method of copper electroplating
10/16/2002EP1248868A2 Electrolyte for use in electrolytic plating
10/16/2002CN1092537C Process for producing palladium hydroxide compound
10/10/2002WO2002058113A3 Electrochemical methods for polishing copper films on semiconductor substrates
10/10/2002US20020146259 Fixing belt and image heating and fixing apparatus
10/10/2002US20020144910 Method for preventing the thermal oxidation yellowing of tin-plated wires
10/10/2002US20020144909 Palladium plating solution
10/10/2002US20020144908 Back-end metallisation process
10/09/2002EP1194616A4 Copper replenishment technique for precision copper plating system
10/09/2002EP0948670B1 Electrolyte for aluminium electroplating
10/08/2002US6461745 Copper foil overcoated with nickel, cobalt and molybdenum alloy; tape automatic bonding
10/03/2002WO2001083854A3 Electroplating bath composition and method of using
10/02/2002EP1244827A1 Bath for electrochemically depositing highly lustrous white rhodium coatings and whitening agent for the same
10/02/2002EP1009869B1 Cyanide-free monovalent copper electroplating solutions
10/02/2002EP0925388B1 Electroplating of nickel-phosphorus alloys coatings
10/02/2002CN1372017A Method for producing and using compound additives used in electric deposition to level and polish metal
10/02/2002CN1371783A Method for making miniature cutter and stereo microstructure
10/01/2002US6458264 Containing at least one of alkane or alkanol sulfonic acid or sulfuric acid and a thiourea
10/01/2002US6458218 Deposition and thermal diffusion of borides and carbides of refractory metals
09/2002
09/26/2002WO2002075797A2 Method of forming copper interconnects
09/26/2002WO2002049077A3 Barrier layer for electrical connectors and methods of applying the layer
09/26/2002US20020135972 Electronic parts, and process for manufacturing electronic parts
09/25/2002CN1371432A Copper replenishment technique for precision copper plating system
09/24/2002US6454928 Tin-plating which includes gallium and copper
09/19/2002WO2002072923A2 Electrolyte media for the deposition of tin alloys and methods for depositing tin alloys
09/19/2002WO2002038326A3 Brazing product having a low melting point
09/19/2002US20020132137 Soft magnetic film having high saturation magnetic flux density, thin-film magnetic head using the same, and manufacturing method of the same
09/19/2002US20020130046 Positioning substrate in an electroplating bath; forming doped copper layer on substrate; wherein the doped copper layer comprises an amount of non-metal that is controlled for increasing electromigration resistance in doped copper layer
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