Patents for C25D 3 - Electroplating; Baths therefor (11,896)
07/2002
07/03/2002EP0975826B1 Method for electroplating metallic and non-metallic endless products and device for carrying out said method
07/03/2002EP0869867B1 Tin coated electrical connector
07/03/2002CN1357060A Acid bath for galvanic deposition of shining gold and gold alloy layers and brightener therefor
07/03/2002CN1356407A Process for plating Cr on iner cavity of cylinder sleeve
07/03/2002CN1356185A High-precision ultra-thin very-wide cold-rolled steel band, chrome-plated steel band for shield of optical fibre cable and technology thereof
07/02/2002US6413405 Active carbon electro-deposited with Ag-I system having sterilizing effect
07/02/2002US6413271 Method of making a radioactive stent
06/2002
06/27/2002WO2002049773A1 Bond enhancement antitarnish coatings
06/27/2002WO2002026381A3 Ionic liquids and their use
06/27/2002US20020079229 Anode inserted in a hole of a work, and a member for rotating the work about its center axis and supplying a plating current; plating a ring shaped bonded magnet
06/27/2002US20020079215 Workpiece processor having processing chamber with improved processing fluid flow
06/27/2002US20020079133 Copper foil and metal foil with carrier foil for printed wiring board, and semi-additive process for producing printed wiring board using the same
06/25/2002US6410985 Silver metallization by damascene method
06/25/2002US6410178 Separator of fuel cell and method for producing same
06/25/2002US6410164 Antifouling member and process for producing the same
06/25/2002US6409906 Electroplating solution for plating antimony and antimony alloy coatings
06/20/2002WO2002049077A2 Barrier layer for electrical connectors and methods of applying the layer
06/20/2002US20020077520 Device and method for dilating and irradiating a vascular segment or body passageway
06/20/2002US20020074231 Bottom-up fill of recesses increasing the rotation speed of a substrate and contacting with a soluble copper salt and electrolyte until a desired thickness is achieved
06/20/2002DE10059139A1 Acid aqueous electrolyte, used for coating electronic components with a tin-copper alloy, comprises alkyl sulfonic acids and/or alkanol sulfonic acids, soluble tin (II) salts, soluble copper (II) salts, and organic sulfur compounds
06/19/2002EP1215305A1 Method for preparing an electroplating bath and related copper plating process
06/19/2002EP1215304A1 Two-layer chrome-plating process
06/19/2002EP1214739A2 Copper deposit process
06/19/2002EP1214191A1 Treated copper foil and process for making treated copper foil
06/18/2002US6406611 Nickel cobalt phosphorous low stress electroplating
06/18/2002US6406609 Semiconductor wafers, dielectric layers and copper
06/13/2002WO2002046500A2 Improvements relating to metal finishes
06/13/2002WO2002045476A2 Apparatus and method for electrochemically depositing metal on a semiconductor workpiece
06/13/2002DE10058896C1 Elektrolytisches Kupferbad, dessen Verwendung und Verfahren zur Abscheidung einer matten Kupferschicht Electrolytic copper bath, the use thereof and method for depositing a matt layer of copper
06/12/2002EP1213372A2 Process and arrangement for the galvanic deposition of nickel, cobalt, nickel alloys or cobalt alloys with periodic current pulses and use of the process
06/12/2002CN1353779A System for electrochemically processing workpiece
06/12/2002CN1353778A Workpiece processor having processing chamber with improved processing fluid flow
06/11/2002US6403235 Adhering to heat affected zone of steel a cladding of high strength precipitation or age hardenable inconel? alloy; heat treatment to concurrently soften and harden
06/11/2002US6403234 Plated material for connectors
06/11/2002US6402924 Programmed pulse electroplating process
06/11/2002US6402922 Pulse plating
06/11/2002US6402592 Electrochemical methods for polishing copper films on semiconductor substrates
06/06/2002WO2000061838A9 Method for depositing ni-co and ni-fe-co alloys
06/06/2002US20020066673 Method for plating copper conductors and devices formed
06/06/2002DE10060127A1 Elektrolytisches Eisenabscheidungsbad Electrolytic Eisenabscheidungsbad
06/05/2002EP1211011A1 Solder coating material and production method therefor
06/04/2002US6399220 Conformable nickel coating and process for coating an article with a conformable nickel coating
05/2002
05/30/2002WO2002042519A1 Zinc-plated article free from occurrence of whisker and having rust-resistant, multi-layered film, composition for forming rust-resistant multi-layered film and method for preparing zinc-plated article free from occurrence of whisker and having rust-resistant, multi-layered film
05/30/2002US20020064591 Substrate plating method and apparatus
05/30/2002US20020063064 Connecting electronically resistive substrate to a negative terminal of electrical power source; disposing substrate and an anode in solution comprising metal compound and supporting electrolyte; electrodepositing metal onto substrate
05/30/2002US20020063063 Non-cyanide-type gold-tin alloy plating bath
05/29/2002EP0956600B1 PREPARATION OF Cu x In y Ga z Se n (x=0-2, y=0-2, z=0-2, n=0-3) PRECURSOR FILMS BY ELECTRODEPOSITION FOR FABRICATING HIGH EFFICIENCY SOLAR CELLS
05/29/2002DE10143076A1 Material für die Kupfergalvanisierung, Verfahren für dessen Herstellung und Kupfergalvanisierungsverfahren Material for the copper plating, process for its preparation and Kupfergalvanisierungsverfahren
05/29/2002CN1351678A 合金电镀 Alloy plating
05/28/2002US6395230 Pellistor
05/23/2002US20020061715 Modified plating solution for plating and planarization and process utilizing same
05/23/2002US20020060159 Chrome-plated sliding member and manufacturing method thereof
05/22/2002EP1207730A1 Electroplating solution, method for fabricating multilayer printed wiring board using the solution, and multilayer printed wiring board
05/22/2002EP1207219A1 Equipment and method for covering a metallic element with a layer of copper
05/22/2002EP0977911A4 Preparation of copper-indium-gallium-diselenide precursor films by electrodeposition for fabricating high efficiency solar cells
05/21/2002US6391181 Coloring, metal alloys of zinc, copper and zinc
05/21/2002US6391179 Plating and antideposit agents
05/16/2002WO2002038835A1 Method for the deposition of a chromium alloy
05/16/2002WO2002038326A2 Brazing product having a low melting point
05/16/2002US20020056649 Method of fabricating thin magnetic film and electrolytic plating apparatus for fabricating thin magnetic film
05/16/2002US20020056644 Pulse plating by pulsed electrolysis by periodically applying electricity while controlling pulse frequency and current density
05/15/2002EP1205582A1 Process for electrolytic deposition from a chrome containing solution
05/15/2002EP1205577A1 Process for preparing of metallic materials for their use as electrodes
05/14/2002US6387229 Alloy plating
05/10/2002CA2351791A1 Preparation process of metal materials for their use as electrodes
05/09/2002US20020053519 Seed layer repair
05/09/2002US20020053518 Material for copper electroplating, method for manufacturing same and copper electroplating method
05/09/2002US20020053517 Electolysis to create an alloy of copper, tungsten and/or molybdenum, nickel, cobalt, iron and/or zinc and chlorine
05/08/2002EP1203654A2 Tin coated electrical connector
05/08/2002EP1203110A2 Method for the production of a self-supporting copper foil
05/08/2002CN1348326A Production method of copper foil for fine line use
05/08/2002CN1348224A Indium plating method for copper nail as negative pole current collector of mercury-free alkali Zn-Mn battery
05/08/2002CN1348022A Electrolyte for electrothermal film of electromolding alloy
05/08/2002CN1084396C Silver plating bath and silver plating method with the same bath
05/08/2002CN1084307C Glass forming mold and its producing method, and application in cathode ray tube
05/07/2002US6383661 Method of manufacturing an aluminum product
05/07/2002US6381893 Weapon barrel having a hard chromium inner layer
05/02/2002US20020052292 Depositing platinum or a mixture of platinum with ruthenium on a metallic substrate from a Pt- or Pt- and Ru-containing sulfuric acid solution
05/02/2002US20020050628 Metallization structures for microelectronic applications and process for forming the structures
05/02/2002EP1201790A1 Seed layer
05/02/2002EP1201789A2 Plating bath and method for electroplating tin-zinc alloys
05/02/2002EP1200646A2 Alloy plating
05/02/2002EP1200640A1 Coating method
04/2002
04/30/2002US6379522 Electrodeposition chemistry for filling of apertures with reflective metal
04/25/2002WO2002033153A2 Copper bath and method of depositing a matt copper coating
04/25/2002US20020046954 Aqueous solution for electrodepositing tin-zinc alloys
04/25/2002DE10046600A1 Acid aqueous electrolyte, used for coating electronic components with a tin-copper alloy, comprises alkyl sulfonic acids and/or alkanol sulfonic acids, soluble tin (II) salts, soluble copper (II) salts, and organic sulfur compounds
04/25/2002CA2419595A1 Copper bath and method of depositing a matt copper coating
04/24/2002EP1199386A2 Plating methods and systems
04/24/2002EP1199384A2 Plating Bath
04/24/2002EP1199383A2 Seed layer repair bath
04/24/2002EP1198623A1 Method for producing a cyanide-free solution of a gold compound that is suitable for galvanic gold baths
04/24/2002CN1083497C Nickel-ceramic compound plating technology for aluminium alloy cylinder inner wall
04/23/2002US6375885 Methods for coating surfaces with magnetic composites exhibiting distinct flux properties
04/18/2002WO2002031228A1 Copper electroplating using insoluble anode
04/18/2002US20020043468 Source of metal ions, an electrolyte and one or more branched suppressor compounds comprising branched polymers, dendrimers or star polymers
04/18/2002US20020043467 Electrolyte
04/17/2002EP1197587A2 Seed layer repair and electroplating bath
04/17/2002EP1197586A2 Electrolyte
04/16/2002US6373683 Electronic parts
1 ... 73 74 75 76 77 78 79 80 81 82 83 84 85 86 87 88 89 90 91 92 93 ... 119