Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
12/2013
12/17/2013US8609193 Poly(ethylene glycol) and poly(ethylene oxide) by initiated chemical vapor deposition
12/17/2013US8609192 Method and device for controlling oxidizing-reducing of the surface of a steel strip running continuously through a radiant tubes furnace for its galvanizing
12/17/2013US8609189 Method of forming carbon nanotubes from carbon-rich fly ash
12/17/2013US8608903 Plasma processing apparatus and plasma processing method
12/17/2013US8608902 Plasma processing apparatus
12/17/2013US8608901 Process chamber cleaning method in substrate processing apparatus, substrate processing apparatus, and substrate processing method
12/17/2013US8608900 Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes
12/17/2013US8608856 Sealing part and substrate processing apparatus
12/17/2013US8608855 Electrode cover and evaporation device
12/17/2013US8608854 CVD device
12/17/2013US8608853 Thermal reactor with improved gas flow distribution
12/17/2013US8608852 Temperature controlled plasma processing chamber component with zone dependent thermal efficiencies
12/17/2013US8608851 Plasma confinement apparatus, and method for confining a plasma
12/17/2013US8608422 Particle sticking prevention apparatus and plasma processing apparatus
12/17/2013US8607733 Atomic layer deposition apparatus and atomic layer deposition method
12/17/2013US8607732 In-liquid plasma film-forming apparatus, electrode for in-liquid plasma, and film-forming method using in-liquid plasma
12/17/2013US8607731 Cathode with inner and outer electrodes at different heights
12/17/2013CA2566173C Al2o3 ceramic tools with diffusion bonding enhanced layer
12/12/2013WO2013183660A1 Film-forming apparatus
12/12/2013WO2013182880A2 Deposition systems having deposition chambers configured for in-situ metrology with radiation deflection and related methods
12/12/2013WO2013182372A1 Plasma-assisted chemical gas separation method having increased plasma density and device for implementing the method
12/12/2013US20130330935 REMOTE PLASMA BASED DEPOSITION OF SiOC CLASS OF FILMS
12/12/2013US20130330912 Silicon oxycarbide, growth method of silicon oxycarbide layer, semiconductor device and manufacture method for semiconductor device
12/12/2013US20130330482 Carbon-doped silicon nitride thin film and manufacturing method and device thereof
12/12/2013US20130330474 Apparatus for Coating a Substrate
12/12/2013US20130330473 Atomic Layer Deposition of Transition Metal Thin Films Using Boranes as the Reducing Agent
12/12/2013US20130330472 Substrate conveyance roller, thin film manufacturing device and thin film manufacturing method
12/12/2013US20130330467 Method of applying a thin spray-on liner and robotic applicator therefor
12/12/2013US20130330466 Spray Plume Position Feedback for Robotic Motion to Optimize Coating Quality, Efficiency, and Repeatability
12/12/2013US20130327273 Substrate processing apparatus
12/12/2013US20130327272 Diagnostic and control systems and methods for substrate processing systems using dc self-bias voltage
12/12/2013US20130327271 Vapor deposition process and apparatus therefor
12/12/2013DE102013204566A1 Substratträger und Halbleiterherstellungsvorrichtung Carrier substrate and semiconductor manufacturing apparatus
12/12/2013DE102012209650A1 Plasma-unterstütztes chemisches Gasabscheidungs-Verfahren mit erhöhter Plasmadichte und Vorrichtung zur Umsetzung des Verfahrens Plasma-assisted chemical vapor deposition process with increased plasma density and device for implementation of the method
12/12/2013DE102012108231A1 Coating strip-shaped substrate comprises transporting substrate strip in linear transport path without contacting sides of support rollers in coating zone, supporting strip in strip distance for coating source, and coating strip
12/11/2013EP2671967A1 Diamond film for cutting-tools
12/11/2013EP2671966A2 Method of forming thin film poly silicon layer
12/11/2013EP2671965A2 Method of forming thin film polysilicon layer and method of forming thin film transistor
12/11/2013EP2671260A2 Structure for forming solar cells
12/11/2013EP2670883A1 Apparatus and method for atomic layer deposition
12/11/2013EP2670882A1 Apparatus for atomic layer deposition
12/11/2013EP2670881A1 Apparatus for atomic layer deposition
12/11/2013EP2670880A1 Method for producing a three-dimensional structure and three-dimensional structure
12/11/2013CN203333761U PECVD (Plasma Enhanced Chemical Vapor Deposition) furnace with double-high vacuum pump system
12/11/2013CN203333760U Heating pipe positioning mechanism for coating machine
12/11/2013CN203333759U Gas path system for PECVD (plasma enhanced chemical vapor deposition) coating at silicon solar cell manufacturing section
12/11/2013CN203333758U Production equipment of silicon dioxide film
12/11/2013CN203333757U Fault nano polymer pulling-out protective device of fine nano vacuum coating equipment
12/11/2013CN203333740U Novel door body structure of vacuum coating equipment
12/11/2013CN103443912A Vapor phase growth device
12/11/2013CN103443904A Susceptor and method for manufacturing epitaxial wafer using the same
12/11/2013CN103443903A Multiple level showerhead design
12/11/2013CN103443658A Optical component and manufacturing method therefor
12/11/2013CN103443327A Plasma enhanced chemical vapor deposition apparatus and method for controlling the same
12/11/2013CN103443326A Plasma enhanced chemical vapor deposition apparatus and method for controlling the same
12/11/2013CN103443325A Apparatus and process for atomic layer deposition
12/11/2013CN103438348A Super-lubricity basic structure, multi-stage super-lubricity structure, component with super-lubricity basic structure or with multi-stage super-lubricity structure and forming method of super-lubricity basic structure
12/11/2013CN103436863A Method for automatically generating tubular PECVD (Plasma Enhanced Chemical Vapor Deposition) coating time
12/11/2013CN103436862A MOCVD reactor and support shaft for MOCVD reactor
12/11/2013CN103436861A Separating spray header device
12/11/2013CN103436860A Gas passage and gas intake device
12/11/2013CN103436859A Spray head and vapor deposition reaction chamber
12/11/2013CN103436858A Spray header and vapor deposition reaction chamber
12/11/2013CN103436857A Spray header and vapor deposition reaction chamber
12/11/2013CN103436856A Reaction cavity
12/11/2013CN103436855A Preparation method of diamond composite coating of micro milling cutter
12/11/2013CN103436854A Preparation method of graphene and carbon nanotube composite material
12/11/2013CN103436853A Fluorine-doped diamond-like film, preparation method thereof and impressing template comprising fluorine-doped diamond-like film
12/11/2013CN103436836A Method of coating semiconductor processing apparatus with protective yttrium-containing coatings
12/11/2013CN103435035A Device and method for continuous preparing and transferring graphene
12/11/2013CN102677017B Loading and unloading mechanism, chemical vapor deposition (CVD) equipment and control method of CVD equipment
12/11/2013CN102627413B Composite fiber preparation method of microwave-assisted diamond-like carbon film covered glass fiber
12/11/2013CN102505112B Device and method for sticking graphene film
12/11/2013CN102465283B Chuck and semiconductor processing device
12/11/2013CN102296355B Guide shell made from carbon/carbon composite material and production method
12/11/2013CN102162091B Low k precursors providing superior integration attributes
12/11/2013CN101663417B Showerhead electrodes and showerhead electrode assemblies having low-particle performance for semiconductor material processing apparatuses
12/11/2013CN101240446B Apparatus of supplying organometallic compound
12/10/2013US8606731 Coating color database creating method, search method using the database, their system, program, and recording medium
12/10/2013US8604231 Metal complexes for chemical vapour deposition of platinum
12/10/2013US8603582 Non-stick masking fixtures and methods of preparing same
12/10/2013US8603581 Manufacture of n-type chalcogenide compositions and their uses in photovoltaic devices
12/10/2013US8603580 High stability and high capacity precursor vapor generation for thin film deposition
12/10/2013US8603575 Thin-film absorber formation method
12/10/2013US8603293 Plasma processing apparatus and method
12/10/2013US8603250 System and method for deposition of a material on a substrate
12/10/2013US8603249 Lift pin driving device and manufacturing apparatus having same
12/10/2013US8603248 System and method for varying wafer surface temperature via wafer-carrier temperature offset
12/10/2013US8603247 Apparatus for counting particles in a gas
12/10/2013US8603246 Growth reactor systems and methods for low-temperature synthesis of nanowires
12/10/2013US8603245 Systems and methods for sealing in site-isolated reactors
12/10/2013US8603244 Vapor deposition device
12/10/2013US8601978 Substrate processing apparatus, and magnetic recording medium manufacturing method
12/10/2013US8601976 Gas supply system for semiconductor manufacturing facilities
12/10/2013CA2527732C Ultraviolet (uv) and plasma assisted metalorganic chemical vapor deposition (mocvd) system
12/05/2013WO2013181521A2 Source reagent-based delivery of fluid with high material flux for batch deposition
12/05/2013WO2013181216A1 Apparatus for cvd and ald with an elongate nozzle and methods of use
12/05/2013WO2013180204A1 Method and device for fabricating protective film for light emitting element
12/05/2013WO2013180058A1 Semiconductor laminate structure and semiconductor element
12/05/2013WO2013180057A1 Semiconductor layered structure and semiconductor element
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