Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
03/2014
03/19/2014CN103649367A Raw material gas supply device for semiconductor manufacturing device
03/19/2014CN103649366A Plasma treatment of hollow bodies
03/19/2014CN103649000A Method for manufacturing layered-film-bearing glass substrate
03/19/2014CN103648974A Oxide film deposition method and oxide film deposition device
03/19/2014CN103648789A Primer composition, structure comprising primer layer that is formed of primer composition, and method for producing structure
03/19/2014CN103646972A TCO thin film and preparation method thereof
03/19/2014CN103643222A Passivation coating process based on double-membrane polycrystalline solar cell PECVD (Plasma Enhanced Chemical Vapor Deposition)
03/19/2014CN103643221A Plasma device equipped with magnetic field enhancement rotation array electrodes
03/19/2014CN103643220A Method for decreasing impurity particles in low pressure furnace tube
03/19/2014CN103643219A Preparation method of boron-doped diamond film electrode taking porous titanium as matrix
03/19/2014CN103643218A Simple apparatus for preparing diamond film
03/19/2014CN103643217A Method for preparing self-supporting graphite porous amorphous carbon thin film
03/19/2014CN103643216A Device for depositing carbon film on Si wafer
03/19/2014CN102560442B Method and device for generating offset
03/19/2014CN102369307B Apparatus for manufacture of solar cells
03/19/2014CN102272351B Reagent dispensing apparatuses and delivery methods
03/18/2014US8675806 Dielectric coating for surfaces exposed to high temperature water
03/18/2014US8674399 Semiconductor layer
03/18/2014US8674273 Heat treatment apparatus
03/18/2014US8674127 Antimony compounds useful for deposition of antimony-containing materials
03/18/2014US8673436 Nanoengineered material for hydrogen storage
03/18/2014US8673413 Method for packing solid organometallic compound and packed container
03/18/2014US8673410 Adhesion layer for thin film transistors
03/18/2014US8673409 Formation method of coating
03/18/2014US8673407 Three dimensional engineering of planar optical structures
03/18/2014US8673404 Barrier film and laminated material, container for wrapping and image display medium using the same, and manufacturing method for barrier film
03/18/2014US8673396 Method of forming continuous thin film and linear glass substrate with thin film
03/18/2014US8673395 Film deposition apparatus, film deposition method, and storage medium
03/18/2014US8673394 Deposition method and apparatus
03/18/2014US8673393 Hydrophobic materials made by vapor deposition coating and applications thereof
03/18/2014US8673390 Methods of making crystalline tantalum pentoxide
03/18/2014US8673389 Process for controlling coating deposition
03/18/2014US8673111 Plasma processing chamber for bevel edge processing
03/18/2014US8673082 Crucible and deposition apparatus
03/18/2014US8673080 Temperature controlled showerhead
03/18/2014US8673079 Film deposition apparatus and substrate processing apparatus
03/18/2014US8673078 Take-up vacuum processing apparatus
03/18/2014US8673077 Vapor deposition device, vapor deposition method, and organic EL display device
03/18/2014US8673076 Substrate processing apparatus and semiconductor device producing method
03/18/2014US8671882 Plasma processing apparatus
03/18/2014US8671879 Systems and methods for plasma processing of microfeature workpieces
03/18/2014US8671878 Profile and CD uniformity control by plasma oxidation treatment
03/18/2014US8671877 Coating apparatus
03/18/2014CA2595498C A chemical vapor infiltration method for densifying porous substrates with pyrolytic carbon
03/13/2014WO2014039647A1 Plasma treatment system
03/13/2014WO2014039420A1 In-situ tco chamber clean
03/13/2014WO2014038803A1 Catalyst metal film-supporting device and method and apparatus for synthesizing multiple graphene films
03/13/2014WO2014038752A1 Method for manufacturing graphene layer
03/13/2014WO2014038642A1 Film forming device, film forming method, and film forming program
03/13/2014WO2014038634A1 Epitaxial wafer and method for producing same
03/13/2014WO2014038453A1 Substrate treatment device, substrate treatment method, and method of manufacturing semiconductor device
03/13/2014WO2014038106A1 Epitaxial wafer, method for producing same and ultraviolet light emitting device
03/13/2014WO2014038105A1 Epitaxial wafer and method for producing same
03/13/2014WO2014038090A1 Measuring apparatus and film-forming apparatus
03/13/2014WO2014037736A1 Method of coating and etching
03/13/2014WO2014037486A1 A chamber cleaning method using low pressure f2
03/13/2014WO2014037485A1 A chamber cleaning method using f2 and a process for manufacture of f2 for this method
03/13/2014WO2014037380A1 Method and apparatus for the fabrication of nanostructures, network of interconnected nanostructures and nanostructure
03/13/2014WO2014037212A1 Method for depositing silicon layers
03/13/2014WO2014037139A1 Storage vessel for a coating installation and coating installation
03/13/2014WO2014037101A1 Plasma treatment device and method for treating at least one substrate
03/13/2014WO2014036886A1 Reaction chamber for vapor deposition process
03/13/2014WO2014036881A1 Mask frame and corresponding evaporation mask component of mask frame
03/13/2014WO2014036880A1 Mask frame and corresponding mask component of mask frame
03/13/2014US20140073143 Process Gas Management for an Inductively-Coupled Plasma Deposition Reactor
03/13/2014US20140073135 Method for depositing tungsten film with low roughness and low resistivity
03/13/2014US20140072726 Deposition apparatus and method of depositing thin film using the same
03/13/2014US20140072725 Load lock chamber with slit valve doors
03/13/2014US20140072711 Reel to reel deposition processing
03/13/2014US20140072710 Method for the Infiltration of a Porous Material with a Second Material Related Plant
03/13/2014US20140069331 Mask and manufacturing method thereof
03/13/2014DE202012011892U1 Kohlenstoffnanomaterial Carbon nanomaterial
03/13/2014DE102012216070A1 Door for closing loading opening of process chamber of epitaxial reactor used in semiconductor industry, has a closure plate heat-absorption reducing unit arranged towards the process chamber pointing surface of closure plate
03/13/2014DE102012214284B4 Gleitelement, insbesondere Kolbenring, mit einer widerstandsfähigen Beschichtung Sliding element, in particular piston ring, with a durable coating
03/13/2014DE102012017894A1 Applying oxide layer made of base element to surface of substrate comprises plasma coating surface of substrate with preparation layer using process gas containing base element in gaseous compound, and plasma treating preparation layer
03/12/2014EP2706130A2 Method for manufacturing high quality graphene using continuous heat treatment chemical vapor deposition method
03/12/2014CN203474892U Gas mixer
03/12/2014CN203474891U Device for preventing air pipe from blocking
03/12/2014CN203474890U Furnace tube sealing structure applied to crystalline silicon photovoltaic cell PECVD (Plasma Enhanced Chemical Vapor Deposition) device
03/12/2014CN203474883U Coating apparatus
03/12/2014CN103635605A Atomic layer deposition with plasma source
03/12/2014CN103635313A Method for affixing water-and-oil-repellent layer to amorphous carbon film layer, and layered product formed by said method
03/12/2014CN103633159A Method for preparing antireflection film of novel solar cell
03/12/2014CN103632932A Chip loading and unloading device, plasma device and mechanical arm coordinate zero point positioning method
03/12/2014CN103630272A Device for measuring object stress by utilizing graphene membrane, and preparation method and testing method of device
03/12/2014CN103628048A Microwave plasma chemical vapor deposition device
03/12/2014CN103628047A Device for preparing SiNx dielectric film by chemical vapor deposition
03/12/2014CN103628046A Temperature control system and temperature control method for adjusting substrate surface temperature
03/12/2014CN103628045A Detachable nozzle and device for manufacturing atomic layer deposited film
03/12/2014CN103628044A Device for preparing alpha-SiH film by photochemical vapor deposition
03/12/2014CN103628043A Selenylation method for solar battery and selenylation device thereof
03/12/2014CN103628042A Method for improving film coating quality of crystalline silicon cell
03/12/2014CN103628041A Normal-pressure CVD (Chemical Vapor Deposition) film continuous growth furnace
03/12/2014CN103628040A MOCVD apparatus and MOCVD heating method
03/12/2014CN103628039A MOCVD reaction chamber and MOCVD apparatus
03/12/2014CN103628038A Chemical vapor deposition equipment, and method used for cleaning crawler belts in chemical vapor deposition
03/12/2014CN103628037A Preparation method of high-dielectric-constant oxide
03/12/2014CN103628036A Preparation method of cubic boron nitride-coated cutting tool
03/12/2014CN103628035A Wafer carrying platform structure for batch production of small-sized wafers
03/12/2014CN103624270A Method of preparing multicomponent metal-hybrid nanocomposite using co-gasification, and multicomponent metal-hybrid nanocomposite prepared thereby
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