Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
02/2014
02/06/2014DE102012106439A1 Verfahren zum Herstellen eines Kunststoffverpackungsbehälters und Kunststoffverpackungsbehälter A method of manufacturing a plastic packaging container and plastic packaging containers
02/05/2014EP2693466A1 Device for tempering a vessel in a chamber
02/05/2014EP2692899A1 Rolled film formation apparatus
02/05/2014EP2692898A1 Plasma cvd apparatus, plasma cvd method, reactive sputtering apparatus, and reactive sputtering method
02/05/2014EP2692897A1 Non-oxygen containing silicon-based films and methods of forming the same
02/05/2014EP2692467A1 Member coated with hard film, process for producing same, and bit-exchangeable rotary tool equipped therewith
02/05/2014EP2692466A1 Surface-coated cutting tool and method for manufacturing same
02/05/2014CN203419982U Convenient-to-store graphite boat sheet for solar silicon chip
02/05/2014CN203419981U Reaction cavity cleaning device and chemical vapor deposition equipment
02/05/2014CN103562435A Light emission analyzing device
02/05/2014CN103562434A Method for manufacturing molybdenum oxide-containing thin film, starting material for forming molybdenum oxide-containing thin film, and molybdenum amide compound
02/05/2014CN103560171A Method for saturating solar cell graphite boats
02/05/2014CN103556148A Surface modification method for NiTi shape memory alloys
02/05/2014CN103556131A High-temperature heating deposition table for chemical vapor deposition (CVD)
02/05/2014CN103556130A Mechanical autorotating MOCVD (metalorganic chemical vapor deposition) accessory substrate tray
02/05/2014CN103556129A Method for coating fluorescent powder with nanoscale oxide film by use of atomic layer deposition technology
02/05/2014CN103556128A Close-coupled spray head and reaction chamber
02/05/2014CN103556127A Cleaning method of vapor deposition film-forming equipment
02/05/2014CN103556126A Multi-chamber MOCVD reaction system with optimal configuration
02/05/2014CN103556125A Coating film process for metallurgical grade monocrystalline silicon solar cell double-layer anti-reflection film
02/05/2014CN103556124A Method for depositing tantalum or niobium on substrate material
02/05/2014CN103556116A Method and device for preparing parylene coating in special gas cylinder
02/05/2014CN103554861A Graphene high polymer plate as well as preparation method thereof
02/05/2014CN102373439B Chemical deposition reactor and spraying device thereof
02/05/2014CN102265407B Film-forming device and film-forming method for forming passivation films as well as manufacturing method for solar cell elements
02/04/2014US8643281 Signal generation system
02/04/2014US8642797 Amidate precursors for depositing metal containing films
02/04/2014US8642796 Organoruthenium compound for chemical deposition and chemical deposition process using the organoruthenium compound
02/04/2014US8642136 Substrate processing method and substrate processing apparatus for performing a deposition process and calculating a termination time of the deposition process
02/04/2014US8642135 Systems and methods for plasma doping microfeature workpieces
02/04/2014US8642128 Enhanced scavenging of residual fluorine radicals using silicon coating on process chamber walls
02/04/2014US8642127 Method of forming titanium nitride film
02/04/2014US8642125 System and method for depositing a material on a substrate
02/04/2014US8642124 Gas dispersion shield method
02/04/2014US8642123 Integration of ZnO nanowires with nanocrystalline diamond fibers
02/04/2014US8641999 Carbon grit
02/04/2014US8641862 High dose implantation strip (HDIS) in H2 base chemistry
02/04/2014US8641829 Substrate processing system
02/04/2014US8641826 Coater platter homing tool
02/04/2014US8641825 Substrate temperature regulation fixed apparatus
02/04/2014US8641824 Method and apparatus for a cleanspace fabricator
02/04/2014CA2665685C Sliding mating part in lubricated regime, coated by a thin film
01/2014
01/30/2014WO2014018480A1 Process gas flow guides for large area plasma enhanced chemical vapor deposition systems and methods
01/30/2014WO2014018372A1 Method for producing nickel-containing films
01/30/2014WO2014018285A1 Roughened substrate support
01/30/2014WO2014018122A1 Method of forming a light emitting diode module
01/30/2014WO2014017650A1 Susceptor, crystal growing apparatus, and crystal growing method
01/30/2014WO2014017638A1 Substrate processing apparatus, method for manufacturing semiconductor device, and recording medium
01/30/2014WO2014017229A1 ZnO FILM PRODUCTION DEVICE, AND PRODUCTION METHOD
01/30/2014WO2014017132A1 Film-forming device
01/30/2014WO2014017130A1 Plasma treatment device
01/30/2014WO2014016835A1 Diamond-coated substrates
01/30/2014WO2014016297A1 Gas separation
01/30/2014US20140030532 Method of forming metal thin film using electroless deposition and thin film device fabricated using the method
01/30/2014US20140030448 Non-oxygen containing silicon-based films and methods of forming the same
01/30/2014US20140030447 Deposition of Graphene or Conjugated Carbons Using Radical Reactor
01/30/2014US20140030445 Apparatus for atomic layer deposition
01/30/2014US20140030444 High pressure, high power plasma activated conformal film deposition
01/30/2014US20140030436 Methods for Producing Nickel-Containing Films
01/30/2014US20140030434 Apparatus and method for high-throughput chemical vapor deposition
01/30/2014US20140029712 Dielectric coating for surfaces exposed to high temperature water
01/30/2014US20140027664 Ternary tungsten boride nitride films and methods for forming same
01/30/2014US20140026925 Chemical vaporizer for material deposition systems and associated methods
01/30/2014US20140026825 Heat equalizer
01/30/2014US20140026815 Separating Device and Method for Producing A Crucible For Said Separating Device
01/30/2014US20140026813 Apparatus for Dielectric Deposition Process
01/30/2014DE102012212918A1 Verfahren zur Herstellung mindestens eines Bauteils und Steuer- und/oder Regeleinrichtung A process for preparing at least one component and control and / or regulating device
01/30/2014DE102012106796A1 Device useful for thermal treatment of a semiconductor substrate, comprises susceptor, which forms the base of a process chamber and comprises substrate support base, substrate support ring and heat source
01/30/2014DE102012106439B4 Verfahren zum Herstellen eines Kunststoffverpackungsbehälters und Kunststoffverpackungsbehälter A method of manufacturing a plastic packaging container and plastic packaging containers
01/30/2014DE102012015025A1 Lock inlet comprises sensor for closed chamber, movable valve for gas-tight sealing of duct opening which is movable by translational movement of sensor between removal position working position, and gas-tight linear guide of the sensor
01/29/2014EP2690193A1 Method for cleaning gas conveying device, and method and reaction device for film growth
01/29/2014EP2689050A2 Plasma enhanced chemical vapor deposition apparatus and method for controlling the same
01/29/2014EP2689049A2 Plasma enhanced chemical vapor deposition apparatus and method for controlling the same
01/29/2014EP2689048A2 Plasma enhanced chemical vapor deposition apparatus and method for controlling the same
01/29/2014EP2688850A1 Method of depositing zinc oxide coatings by chemical vapor deposition
01/29/2014CN203411609U Crucible vapor deposition component
01/29/2014CN203411608U MOCVD (Metal Organic Chemical Vapor Deposition) feeding device
01/29/2014CN203411607U Wire-drawing die device with micro aperture and diamond coating
01/29/2014CN203411606U Mass diamond-like coating membrane plating device
01/29/2014CN103547704A Method for depositing one or more polycrystalline silicon layers on substrate
01/29/2014CN103547703A Thermal diffusion chamber with heat exchanger
01/29/2014CN103547702A Shadow mask alignment using coded apertures
01/29/2014CN103547445A Method for producing fiber composite resin layer-containing multilayered sheet, and optical device
01/29/2014CN103545384A Protection film for high-power concentrating photovoltaic system receiver and production method thereof
01/29/2014CN103545197A Tube-type PECVD double-layer silicon nitride film preparation process
01/29/2014CN103540914A Bucket-type CVD (chemical vapor deposition) equipment reaction chamber using radio-frequency heating
01/29/2014CN103540913A Reactive apparatus for vapor deposition
01/29/2014CN103540912A MOCVD (metal organic chemical vapor deposition) equipment and pallet supporting and rotating system in equipment
01/29/2014CN103540911A Manufacturing method of spray header
01/29/2014CN103540910A Spray header and reaction cavity
01/29/2014CN103540909A LPCVD (Low Pressure Chemical Vapor Deposition) method of polycrystalline silicon
01/29/2014CN103540908A Method of depositing silicone dioxide films
01/29/2014CN103540907A Concentration-controllable graphene material growth method utilizing covering of Si3N4 template with Ni metal film
01/29/2014CN103540905A Rack and pinion mechanism, vacuum processing apparatus, method of driving and controlling rack and pinion mechanism, drive control program, and recording medium
01/29/2014CN102268026B Organic-phosphine-stabilized alkyl-substituted imide silver complex and synthesis method and application thereof
01/29/2014CN102197158B Plasma CVD apparatus, method for producing semiconductor film, method for manufacturing thin film solar cell, and method for cleaning plasma CVD apparatus
01/29/2014CN102094185B Barrel-shaped metal organic chemical vapor deposition reaction tube
01/29/2014CN102047751B Manufacturing apparatus for depositing a material and an electrode for use therein
01/28/2014US8637349 Method and apparatus for integrated-circuit battery devices
01/28/2014US8637146 Metallized opaque films with robust metal layer attachment
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