Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
03/2014
03/12/2014CN102634776B Chemical vapor deposition device for continuously preparing two-dimensional nanofilm
03/12/2014CN102471888B Method for texturing DLC coatings, and thus-textured DLC coatings
03/12/2014CN102459692B Coating installation and coating method
03/12/2014CN102433549B Process of making optical film by atomic layer deposition (ALD) at atmospheric pressure
03/12/2014CN102373436B Substrate holder stocker device, substrate processing apparatus, and substrate holder moving method
03/12/2014CN102315150B Movable ground ring for plasma processing chamber
03/12/2014CN102224277B Reaction chamber of epitaxial reactor
03/12/2014CN102146553B Method of depositing metal film on substrate with patterned features
03/12/2014CN102104088B Method for depositing amorphous silicon film in solar battery production
03/12/2014CN101678497B Gas distributor comprising plurality of diffusion-welded panes and method for production of such gas distributor
03/12/2014CN101319310B Plasma chemical vapor deposition vacuum apparatus for photovoltaic assembly scale manufacture
03/11/2014US8669496 System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energy
03/11/2014US8669463 Method for depositing a transparent conductive oxide (TCO) film on a substrate and thin-film solar cell
03/11/2014US8669192 Vapor deposition device, vapor deposition method, organic EL element and organic EL display device
03/11/2014US8669185 Method of tailoring conformality of Si-containing film
03/11/2014US8668962 Microwave plasma reactors
03/11/2014US8668957 Method of forming dielectric films, new precursors and their use in semiconductor manufacturing
03/11/2014US8668956 Vapor deposition particle emitting device, vapor deposition apparatus, vapor deposition method
03/11/2014US8668951 Liquid material arrangement method, color filter manufacturing method, and organic EL display device manufacturing method
03/11/2014US8668815 Process kit for RF physical vapor deposition
03/11/2014US8668776 Gas delivery apparatus and method for atomic layer deposition
03/11/2014US8668775 Machine CVD shower head
03/06/2014WO2014035899A1 A method of controlling the switched mode ion energy distribution system
03/06/2014WO2014035344A1 Apparatus and method of producing diamond
03/06/2014WO2014034730A1 Surface-coated cutting tool
03/06/2014WO2014034687A1 Gan crystal and method for manufacturing semiconductor element
03/06/2014WO2014034318A1 Plasma emission device and substrate processing device
03/06/2014WO2014034229A1 Plasma processing apparatus and substrate processing apparatus provided with same
03/06/2014WO2014033648A1 Particles containing one or more multi-layered dots on their surface, their use, and production of such particles
03/06/2014WO2014033359A1 Protecting a target pump interior with an ald coating
03/06/2014WO2014032457A1 Preparing method of anti-reflection film having anti-pid effect
03/06/2014WO2013182879A3 Gas injection components for deposition systems and related methods
03/06/2014WO2013182878A3 Gas injection components for deposition systems, deposition systems including such components, and related methods
03/06/2014WO2012122559A3 Method and apparatus for treating containers
03/06/2014US20140065803 Patterned thin film dielectric stack formation
03/06/2014US20140065368 Superhydrophobic films and methods for making superhydrophobic films
03/06/2014US20140065319 Seed Layer Laser-Induced Deposition
03/06/2014US20140061165 Method and arrangement for building metallic objects by solid freeform fabrication
03/06/2014US20140060937 Polycrystalline diamond compact coated with high abrasion resistance diamond layers
03/06/2014US20140060648 Inorganic multilayer stack and methods and compositions relating thereto
03/06/2014US20140060430 Semiconductor processing apparatus including a plurality of reactors, and method for providing the same with process gas
03/06/2014DE102012221080A1 Verfahren zur Herstellung einer Schicht auf einem Oberflächenbereich eines elektronischen Bauelements A method for producing a layer on a surface region of an electronic component
03/06/2014DE102012215708A1 Vorratsbehälter für eine beschichtungsanlage und beschichtungsanlage Reservoir for a coating machine and coating machine
03/06/2014DE102012215676A1 Method for depositing layer on semiconductor wafer, involves depositing semiconductor wafer on carrier and performing relative movement between semiconductor wafer and carrier for depositing specific layer
03/06/2014DE102012108250A1 Verfahren zur Abscheidung von Siliciumschichten A process for the deposition of silicon layers
03/06/2014DE102012017453A1 Plasmabehandlungseinrichtung und Verfahren zur Behandlung zumindest eines Substrats Plasma treatment device and method for treating at least one substrate
03/06/2014DE102010002688C5 Schraubendruckfeder für einen Ölabstreifring eines Kolbens in einem Verbrennungsmotor und Verfahren zur Beschichtung einer Schraubendruckfeder Helical compression spring for an oil scraper ring of a piston in an internal combustion engine and method for coating a helical compression spring
03/05/2014EP2703521A1 Forming method and apparatus for amorphous carbon films
03/05/2014EP2703520A1 Laser-induced deposition on a seed layer
03/05/2014EP2703102A1 Surface-coated cutting tool and method for manufacturing same
03/05/2014CN203463639U Cylinder liner with DLC (Diamond Like Carbon) composite coating
03/05/2014CN203462123U Substrate frame and glass fixing device thereof
03/05/2014CN203462122U Improved substrate frame
03/05/2014CN203461974U Homogenization fast device of CVI (Chemical Vapor Infiltration) compact carbon/carbon crucible
03/05/2014CN103620745A Semiconductor device manufacturing method, substrate processing method, substrate processing apparatus, and recording medium
03/05/2014CN103620086A Method and device for depositing oleds, in particular evaporation device therefor
03/05/2014CN103620085A Method for coating at least the inner face of a piston ring and piston ring
03/05/2014CN103619771A Temperable and non-temperable transparent nanocomposite layers
03/05/2014CN103614709A Combined base type electromagnetic heating device used in metal organic chemical vapor deposition (MOCVD) reaction chamber
03/05/2014CN103614708A Graphite boat with gradient type spacing
03/05/2014CN103614707A Graphite plate for improving uniformity of MOCVD (Metal Organic Chemical Vapor Deposition) epitaxial wafer
03/05/2014CN103614706A Production technology of high-corrosion-resistance gas distributor with yttrium oxide coating
03/05/2014CN103614705A Large uneven surface deposition device and method
03/05/2014CN103614704A Precursor flow field control rod
03/05/2014CN103614703A Method for making antireflection film by using plasma enhanced chemical vapor deposition
03/05/2014CN103614702A Method for depositing silicon nitride gradient gradual-change film by using OTB apparatus
03/05/2014CN103614701A Germanium nanotube top raised array modified by silver nano-particles as well as preparation method and application thereof
03/05/2014CN102713001B Fluid bed reactor
03/05/2014CN102619081B Preparation technology for preparing interface layer of boron nitride fabric through CVD (Chemical Vapor Deposition)
03/05/2014CN102575349B Plasma CVD device
03/04/2014US8664699 Methods and devices for fabricating and assembling printable semiconductor elements
03/04/2014US8664560 Method and apparatus for abatement of reaction products from a vacuum processing chamber
03/04/2014US8664098 Plasma processing apparatus
03/04/2014US8663876 Photomask blank, method of manufacturing the same, photomask, and method of manufacturing the same
03/04/2014US8663753 High throughput multi-wafer epitaxial reactor
03/04/2014US8663751 Method for stable hydrophilicity enhancement of a substrate by atmospheric pressure plasma disposition
03/04/2014US8663736 Germanium complexes with amidine derivative ligand and process for preparing the same
03/04/2014US8663735 In situ generation of RuO4 for ALD of Ru and Ru related materials
03/04/2014US8663572 Micro plasma jet generator
03/04/2014US8663437 Deposition apparatus and electronic device manufacturing method
03/04/2014US8663424 Plasma processing apparatus and gas supply member support device
03/04/2014US8663391 Electrostatic chuck having a plurality of heater coils
03/04/2014US8663390 Independent radiant gas preheating for precursor disassociation control and gas reaction kinetics in low temperature CVD systems
03/04/2014US8662011 Apparatus for carrying out plasma chemical vapour deposition and method of manufacturing an optical preform
03/04/2014US8662010 Plasma processing apparatus, plasma processing method, plasma film deposition apparatus, and plasma film deposition method
02/2014
02/27/2014WO2014030776A1 Method for growing zirconium nitride crystal
02/27/2014WO2014030609A1 Chemical vapor deposition material formed of ruthenium complex, method for producing same and chemical vapor deposition method
02/27/2014WO2014030558A1 Method for forming silicon nitride film, method for manufacturing organic electronic device, and apparatus for forming silicon nitride film
02/27/2014WO2014030516A1 Nitride semiconductor element substrate and method for production thereof, and red light-emitting semiconductor element and method for production thereof
02/27/2014WO2014030414A1 FILM FORMING APPARATUS, METHOD OF FORMING LOW-PERMITTIVITY FILM, SiCO FILM, AND DAMASCENE INTERCONNECT STRUCTURE
02/27/2014WO2014029694A1 Apparatus for chemical vapour deposition having carbon fibre filaments
02/27/2014WO2014029152A1 Semiconductor structure and manufacturing method thereof
02/27/2014WO2013181521A3 Source reagent-based delivery of fluid with high material flux for batch deposition
02/27/2014WO2013178535A3 Free-standing non-planar polycrystalline synthetic diamond components and method of fabrication
02/27/2014WO2013104583A3 Apparatus and method for surface processing of a substrate
02/27/2014US20140057456 Substrate Processing Apparatus and Method of Manufacturing Semiconductor Device
02/27/2014US20140057453 Deposition of thin films on energy sensitive surfaces
02/27/2014US20140057390 Multi-nozzle organic vapor jet printing
02/27/2014US20140057089 Hardmask layer with alternating nanolayers
02/27/2014US20140057051 Process and apparatus for producing fluorinated organosilicon compound thin film
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