C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes

Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
11/2013
11/14/2013	WO2013170052A1 Saccharide protective coating for pharmaceutical package
11/14/2013	WO2013170044A1 Inspection methods for pecvd coatings
11/14/2013	WO2013169427A1 Deposition of an amorphous carbon layer with high film density and high etch selectivity
11/14/2013	WO2013169391A1 Improved hydrothermal stability of oxides with carbon coatings
11/14/2013	WO2013169109A1 Adjustable chemical vapour deposition process and reactor
11/14/2013	WO2013168941A1 Magnesium oxide precursor, method for producing same, and method for forming a thin film using same
11/14/2013	WO2013168747A1 Composite heating element, production method for molded body comprising thin film using said composite heating element, and heating element cvd device
11/14/2013	WO2013168739A1 Gas barrier film and method for producing same
11/14/2013	WO2013168715A1 Gas barrier film and method for producing gas barrier film
11/14/2013	WO2013064613A3 Cvd-reactor and substrate holder for a cvd reactor
11/14/2013	WO2012171661A8 Method for the plasma treatment of workpieces and workpiece with a gas barrier layer
11/14/2013	US20130302918 Plasma processing apparatus and plasma processing method
11/14/2013	US20130302616 Method for coating a graphite material with pyrolytic boron nitride and a coated article obtained by that method
11/14/2013	US20130302592 Method for growth of carbon nanoflakes and carbon nanoflake structure
11/14/2013	US20130302536 Method for depositing a transparent barrier layer system
11/14/2013	US20130302528 Apparatus for producing polycrystalline silicon and method for producing polycrystalline silicon
11/14/2013	US20130302521 Method of making aluminum oxynitride coated article
11/14/2013	US20130302520 Co-evaporation system comprising vapor pre-mixer
11/14/2013	US20130301028 Substrate Table, Lithographic Apparatus and Device Manufacturing Method
11/14/2013	US20130298971 Cost-efficent high power pecvd deposition for solar cells
11/14/2013	US20130298947 Substrate processing system
11/14/2013	US20130298834 Liquid vaporizer
11/14/2013	US20130298833 Evaporation apparatus
11/14/2013	US20130298831 Automated process chamber cleaning in material deposition systems
11/14/2013	DE112012000726T5 Suszeptor und Verfahren zum Herstellen eines Epitaxialwafers unter Verwendung desselben Of the same susceptor and method for producing an epitaxial wafer using
11/14/2013	DE102013207490A1 Kosteneffiziente PECVD-Abscheidung mit hoher Leistung für Solarzellen Cost-effective PECVD deposition with high performance of solar cells
11/14/2013	DE102013007809A1 Verfahren zum beschichten eines graphitmaterials mit pyrolytischem bornitrid und nach diesem verfahren erhaltener beschichteter artikel A method of coating a graphite material with pyrolytic boron nitride and coated article obtained by this method
11/13/2013	EP2662471A1 Adjustable chemical vapour deposition process
11/13/2013	EP2661516A2 Chuck for chemical vapor deposition systems and related methods therefor
11/13/2013	EP2661515A1 Filament for hot wire chemical vapour deposition
11/13/2013	CN203284467U Tubular furnace epitaxy system
11/13/2013	CN203284466U PECVD device
11/13/2013	CN203284465U PECVD stove with fluorine cleaning device
11/13/2013	CN203284464U PECVD coating system
11/13/2013	CN203284463U Backing plate for plasma vapor deposition device and plasma vapor deposition device
11/13/2013	CN203284462U Air supply system for plasma chemical vapor deposition coating equipment
11/13/2013	CN203284461U Gas distribution vertical type PECVD furnace
11/13/2013	CN203284460U Back plate used for cleaning process cavity and cleaning device of process cavity
11/13/2013	CN203284459U Seal cover of vacuum apparatus, and vacuum apparatus
11/13/2013	CN203284452U Single reaction cavity film deposition equipment with film transferring cavity
11/13/2013	CN103392218A A microwave plasma reactor for manufacturing synthetic diamond material
11/13/2013	CN103392217A A microwave plasma reactor for manufacturing synthetic diamond material
11/13/2013	CN103391842A Method for producing functional film
11/13/2013	CN103388146A A preparation method for an InN / ZnO / free-standing diamond film structure by using an ECR-PEMOCVD (Electron Cyclotron Resonance Plasma-Enhanced Chemical Vapor Deposition) system
11/13/2013	CN103388134A Preparation method for thin films with uniform thickness by capacitively coupled plasma-enhanced chemical vapor deposition
11/13/2013	CN103388133A MOCVD (Metal-organic Chemical Vapor Deposition) equipment and adjustment method for interval between tray and spray header of equipment
11/13/2013	CN103388132A Gas spraying head, manufacturing method thereof, and film growth reactor
11/13/2013	CN103388131A A preparation method for an InN / AlN / free-standing diamond film structure by using an ECR-PEMOCVD (Electron Cyclotron Resonance Plasma-Enhanced Chemical Vapor Deposition) system
11/13/2013	CN103388130A Method for preparing InN films through low temperature deposition on ZnO buffer layers / diamond films / multilayer film-structured Si substrates by means of ECR-PEMOCVD
11/13/2013	CN103388129A Method for depositing thin film on inner surface of long tube by virtue of plasma enhanced chemical vapor deposition (PECVD)
11/13/2013	CN103388128A 沉积掩模 Deposition mask
11/13/2013	CN103388127A Etching cleaning method of high-density plasma chemical vapor deposition equipment cavity
11/13/2013	CN103387418A A method for coating a graphite material with pyrolytic boron nitride and a coated article obtained by that method
11/13/2013	CN102634712B Nb-W alloy and preparation method thereof
11/13/2013	CN102112658B Apparatus and method for high-throughput atomic layer deposition
11/13/2013	CN102057077B Preparation of lanthanide-containing precursors and deposition of lanthanide-containing films
11/12/2013	US8580343 Method for fabricating composite carbon nanotube structure
11/12/2013	US8580342 Low temperature CNT growth using gas-preheat method
11/12/2013	US8580332 Thin-film battery methods for complexity reduction
11/12/2013	US8580092 Adjustable process spacing, centering, and improved gas conductance
11/12/2013	US8580078 Bevel etcher with vacuum chuck
11/12/2013	US8580076 Plasma apparatus, gas distribution assembly for a plasma apparatus and processes therewith
11/12/2013	US8580075 Method and system for introduction of an active material to a chemical process
11/12/2013	US8580037 Method of depositing materials on a non-planar surface
11/12/2013	US8578879 Apparatus for VHF impedance match tuning
11/07/2013	WO2013165981A2 Graphite foil-bonded device and method for preparing same
11/07/2013	WO2013165889A1 Radical reactor with inverted orientation
11/07/2013	WO2013165649A1 Methods for improving corrosion resistance and applications in electrical connectors
11/07/2013	WO2013164700A2 Tco layer with improved long-term stability and method for manufacturing thereof
11/07/2013	WO2013032746A9 Sheet wafer furnace with gas preservation system
11/07/2013	WO2013010864A3 Device and method for determining the vapour pressure of a starting substance vaporized in a carrier gas stream
11/07/2013	US20130295408 Polycrystalline silicon rod and process for production thereof
11/07/2013	US20130295401 Polycrystalline silicon producing method, apparatus for producing polycrystalline silicon, and polycrystalline silicon
11/07/2013	US20130295387 Method for synthesis of cubic boron nitride and cubic boron nitride structure
11/07/2013	US20130295385 Granular polycrystalline silicon and production thereof
11/07/2013	US20130295297 Semiconductor film formation apparatus and process
11/07/2013	US20130295283 Chemical vapor deposition apparatus with multiple inlets for controlling film thickness and uniformity
11/07/2013	US20130295278 Method for removing a coating and a method for rejuvenating a coated superalloy component
11/07/2013	US20130292370 Method and device for measuring temperature of substrate in vacuum processing apparatus
11/07/2013	US20130291798 Thin film deposition apparatus and substrate treatment system including the same
11/07/2013	US20130291797 Vaporizer
11/07/2013	US20130291796 Crucible and deposition apparatus
11/07/2013	US20130291795 Thin film deposition system with cooling module
11/07/2013	DE112007003616B4 Veraschungsvorrichtung Ashing device
11/07/2013	DE102011121078B4 Zyklisches Verdampfungsverfahren Cyclic evaporation method
11/07/2013	DE102009010556B4 Verfahren zur Herstellung von epitaxierten Siliciumscheiben Process for producing epitaxially coated silicon wafers
11/06/2013	EP2660354A1 Method and apparatus for vapor condensation and recovery
11/06/2013	EP2660353A1 Method for producing gas barrier plastic molded body
11/06/2013	EP2660049A1 Gas-barrier plastic molded product and manufacturing process therefor
11/06/2013	EP2659504A1 Deposition systems and processes
11/06/2013	EP2659026A1 Wafer processing with carrier extension
11/06/2013	EP2659025A1 Piston assembly for alernative compressor
11/06/2013	EP2659024A1 Thermal diffusion chamber with heat exchanger
11/06/2013	CN203270029U Plasma enhanced chemical vapor deposition equipment and positioning device thereof
11/06/2013	CN203270028U PECVD (Plasma Enhanced Chemical Vapor Deposition) plate type coating film plate frame
11/06/2013	CN203270027U 石墨框 Graphite Box
11/06/2013	CN203270026U Graphite frame
11/06/2013	CN203264325U Impurity gas adsorption device for graphene chemical vapor deposition equipment
11/06/2013	CN103382554A Monitoring method and system for abnormity of normal pressure chemical vapor deposition machine
11/06/2013	CN103382553A Cooling method for treating system

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