Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
12/2013
12/25/2013CN103469201A Coating process, coating, and coated component
12/25/2013CN103469176A PECVD (plasma enhanced chemical vapor deposition) carrier conversion device
12/25/2013CN103469175A Spliced PECVD (plasma enhanced chemical vapor deposition) support plate guiding rail
12/25/2013CN103469174A Preparation method of cyanate ester resin thin film as well as reaction equipment thereof
12/25/2013CN103469173A Preparation method of gallium oxide film with hole conduction characteristic as well as gallium oxide film with hole conduction characteristic
12/25/2013CN103467506A CVD precursors
12/25/2013CN103466609A Preparation method of double-layer graphene films
12/25/2013CN102653856B Method for improving first wall fuel recycling of full-superconducting tokomak by using lithium metal coating layer
12/25/2013CN102534563B Inclined entering gas spray header applied to metal organic chemical vapor deposition reactor
12/25/2013CN102465282B Method for saving gases in direct PECVD production
12/25/2013CN102383106B Metal organic chemical vapour deposition reaction chamber for fast removing residual reaction gas
12/25/2013CN102171384B Silicon carbide-based antireflective coating
12/25/2013CN102160141B Device and method for producing dielectric layers in microwave plasma
12/25/2013CN102076882B Synthesis and use of precursors for ALD of tellurium and selenium thin films
12/25/2013CN102017169B Apparatus for manufacturing thin film solar cell
12/24/2013US8613984 Plasma vapor deposition system and method for making multi-junction silicon thin film solar cell modules and panels
12/24/2013US8613976 Method of forming silicon oxide containing films
12/24/2013US8613975 Methods of producing high-K dielectric films using cerium-based precursors
12/24/2013US8613972 Papermaking coating station with pressure-sensitive film roll
12/24/2013US8613828 Procedure and device for the production of a plasma
12/24/2013US8613827 Plasma treatment system
12/24/2013DE102012222927A1 Gerät zur Abscheidung organischer Schichten, Verfahren zum Fertigen von Geräten mit organischer lichtemittierender Anzeige unter Verwendung desselben und unter Verwendung des Verfahrens gefertigte Geräte mit organischer lichtemittierender Anzeige Apparatus for deposition of organic layers, methods of fabricating devices with organic light-emitting display using the same and fabricated using the method of devices with organic light-emitting display
12/24/2013DE102011083139B4 Substratbehandlungsverfahren und Substratbehandlungsanlage The substrate processing method and substrate processing system
12/24/2013CA2576935C Method of making vapour deposited oxygen-scavenging particles
12/19/2013WO2013188808A1 Cylinder preparation for maintaining stability of stored materials
12/19/2013WO2013188613A1 Gas permeation barrier material
12/19/2013WO2013188202A1 Ald apparatus with o-ring protected by purge gas
12/19/2013WO2013187078A1 Semiconductor substrate, method of manufacturing semiconductor substrate, and method of manufacturing composite substrate
12/19/2013WO2013187076A1 Semiconductor substrate, method of manufacturing semiconductor substrate, and method of manufacturing composite substrate
12/19/2013WO2013186427A1 Coating a substrate web by atomic layer deposition
12/19/2013WO2013186426A1 Coating a substrate web by atomic layer deposition
12/19/2013WO2013149807A3 Surface-modified low surface area graphite, processes for making it, and applications of the same
12/19/2013US20130337257 High surface area carbon opals and inverse opals obtained therefrom
12/19/2013US20130337193 Modular coater separation
12/19/2013US20130337172 Reactor in deposition device with multi-staged purging structure
12/19/2013US20130337171 N2 purged o-ring for chamber in chamber ald system
12/19/2013US20130337170 Methods and Apparatus for the Synthesis of Large Area Thin Films
12/19/2013US20130335822 Method for manufacturing touch-sensitive element on polarizer and polarization device
12/19/2013US20130335190 Tunable resistance coatings
12/19/2013US20130334472 Graphene based structures and methods for shielding electromagnetic radiation
12/19/2013US20130333923 MODULATED COMPOSITIONAL AND STRESS CONTROLLED MULTILAYER ULTRATHIN CONFORMAL SiNx DIELECTRICS USED IN NANO DEVICE FABRICATION
12/19/2013US20130333835 Process for manufacturing gas permeation barrier material and structure
12/19/2013US20130333621 Apparatus for the deposition of high dielectric constant films
12/19/2013US20130333620 Feed-through apparatus for a chemical vapour deposition device
12/19/2013US20130333618 Hall effect plasma source
12/19/2013US20130333617 Plasma processing apparatus
12/19/2013US20130333616 Plasma processing system with movable chamber housing parts
12/19/2013DE112011105041T5 Filmbildungsvorrichtung Film-forming apparatus
12/19/2013DE102012210332A1 Ald-beschichtungsanlage Ald-coating plant
12/19/2013DE102012210003A1 Collecting device, used to sputter material during ion beam etching under vacuum, comprises ion beam sources arranged on each side of substrate to be etched, and surface areas, which reflect beam generated by ion source towards substrate
12/18/2013EP2674792A1 Optical component and manufacturing method therefor
12/18/2013EP2674513A2 Vessel coating and inspection
12/18/2013EP2674512A1 Engine component
12/18/2013EP2276871B1 Method for producing an n-semiconductive indium sulfide thin layer
12/18/2013EP2050831B1 Coated cutting tool insert for milling
12/18/2013EP1769158B1 Gas abatement
12/18/2013EP1563529B1 Silicon-containing layer deposition with silicon compounds
12/18/2013CN203346476U Single cavity coating equipment
12/18/2013CN203346475U Auxiliary front-end module of plasma gas phase film deposition equipment
12/18/2013CN203346474U Deposition equipment and rotating device
12/18/2013CN203346473U Substrate and graphite plate applicable to chemical vapor deposition process
12/18/2013CN203346472U Reaction cavity for epitaxial deposition of III-V material layer
12/18/2013CN203346471U Reaction cavity for epitaxial deposition of III-V material layer
12/18/2013CN203346470U High-temperature chemical vapor deposition device for preparing TiC coating by hot wire method
12/18/2013CN103460812A Substrate processing apparatus
12/18/2013CN103459665A Rolled film formation apparatus
12/18/2013CN103459664A Plasma enhanced chemical vapor deposition apparatus and method for controlling same
12/18/2013CN103459663A Apparatus for atomic layer deposition
12/18/2013CN103459662A Chuck for chemical vapor deposition systems and related methods therefor
12/18/2013CN103459661A Plasma CVD apparatus, plasma CVD method, reactive sputtering apparatus, and reactive sputtering method
12/18/2013CN103459660A Deposition reactor with plasma source
12/18/2013CN103459659A Apparatus and process for atomic layer deposition
12/18/2013CN103459070A Member coated with hard film, process for producing same, and bit-exchangeable rotary tool equipped therewith
12/18/2013CN103451630A Substrate loading device and PECVD equipment
12/18/2013CN103451629A Automatic controller for MOCVD (Metal-Organic Chemical Vapor Deposition)
12/18/2013CN103451628A 样品支持器 Sample holder
12/18/2013CN103451627A Integrated spray head for vapor deposition
12/18/2013CN103451626A Spray head, vapor deposition device and method for replacing thermal wallboard
12/18/2013CN103451625A Deposition apparatus and method for manufacturing organic light emitting diode display using the same
12/18/2013CN103451624A Deposition furnace tube and method for depositing thin films
12/18/2013CN103451623A Atomic layer deposition method and atomic layer deposition device for coating ultrafine powder
12/18/2013CN103451622A Apparatus and method for the synthesis of graphene by chemical vapor deposition
12/18/2013CN103451621A MOCVD (metal-organic chemical vapor deposition) reaction cavity and process equipment
12/18/2013CN103451620A Surface treatment method of metal silicide barrier layer
12/18/2013CN103451619A Organoaminodisilane precursors and methods for depositing films comprising same
12/18/2013CN103451597A Tensioning apparatus for mask, mask sheet, and manufacturing system for mask
12/18/2013CN103450242A Organoaminodisilane precursors and methods for depositing films comprising same
12/18/2013CN103449428A Graphene growing device and method
12/18/2013CN103447600A Surface coating cutting tool provided with hard coating layer having excellent anti-tipping performance
12/18/2013CN103446804A Carbon nanotube air filtering material with gradient structure and preparation method thereof
12/18/2013CN102586758B Method for pre-depositing high-density plasma machine platform
12/18/2013CN102392225B Method for preparing graphene nanoribbon on insulating substrate
12/18/2013CN102286730B Thin film deposition apparatus
12/18/2013CN102162092B Method for constant concentration evaporation and device using same
12/18/2013CN101665922B Film deposition apparatus, substrate processing apparatus and film deposition method
12/18/2013CN101379214B Epitaxial deposition process and apparatus
12/17/2013US8612038 Target object processing system and method of controlling the same
12/17/2013US8609442 Vapor deposition method, vapor deposition device and organic EL display device
12/17/2013US8609206 Continuous or discrete metallization layer on a ceramic substrate
12/17/2013US8609203 Method and apparatus for plasma surface treatment of moving substrate
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