Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
11/2013
11/27/2013CN103409729A Method for preparing diamond-like film by virtue of high-power laser irradiation
11/27/2013CN103409728A Method for preparing graphene through chemical vapor deposition
11/27/2013CN103408598A Organoruthenium complex, and method for production of ruthenium thin film using the ruthenium complex
11/27/2013CN103408316A A connection method for a C/SiC composite material
11/27/2013CN102796998B Method for operating and controlling position of nano-grating deposition substrate in vacuum vessel and device therefor
11/27/2013CN102543884B Method for manufacturing one time programmable (OTP) device
11/27/2013CN102465280B Double-side growth type MOCVD reactor
11/27/2013CN102465277B Reverse radial MOCVD reactor
11/27/2013CN102443769B Method for recovering physical vapor deposition (PVD) false sheets
11/27/2013CN102251227B Diffuser support
11/27/2013CN101903562B Apparatus and method for manufacturing photoelectric converting element, and photoelectric converting element
11/27/2013CN101802254B Chemical vapor deposition reactor
11/27/2013CN101504980B Non-aqueous electrolyte secondary battery negative electrode material, making method, lithium ion secondary battery, and electrochemical capacitor
11/26/2013US8594310 Intelligent call transfer between call centers
11/26/2013US8592862 Gallium nitride semiconductor structures with compositionally-graded transition layer
11/26/2013US8592606 Liquid precursor for depositing group 4 metal containing films
11/26/2013US8592324 Method for forming laminated structure including amorphous carbon film
11/26/2013US8592015 Container having improved ease of discharge product residue, and method for the production thereof
11/26/2013US8592004 Film deposition method
11/26/2013US8591993 Epitaxial wafer manufacturing apparatus and manufacturing method
11/26/2013US8591991 Fabrication method and fabrication apparatus for fabricating metal oxide thin film
11/26/2013US8591989 SiCN film formation method and apparatus
11/26/2013US8591988 Method of fabrication of anchored nanostructure materials
11/26/2013US8591824 Heat treating furnace
11/26/2013US8591809 Substrate transfer container, gas purge monitoring tool, and semiconductor manufacturing equipment with the same
11/26/2013US8591697 Transmission electron microscopy sample etching fixture
11/26/2013US8591657 Substrate processing apparatus and method of manufacturing semiconductor device
11/26/2013US8591656 Compound semiconductor manufacturing device, compound semiconductor manufacturing method, and jig for manufacturing compound semiconductor
11/26/2013US8591655 Apparatus for the preparation of film
11/26/2013US8591654 Device for manufacturing sic single crystal and method for the same
11/26/2013US8591223 Evaporator for organic materials and method for evaporating organic materials
11/26/2013US8590485 Small form factor plasma source for high density wide ribbon ion beam generation
11/26/2013US8590484 Semiconductor device manufacturing method and substrate processing apparatus
11/26/2013DE202013010250U1 Glanzgradeinstellung von Kunststoffsubstraten mit metallischen Finish Gloss level setting of plastic substrates with metallic finish
11/21/2013WO2013173152A1 Rotating disk reactor with ferrofluid seal for chemical vapor deposition
11/21/2013WO2013172941A1 Late-stage customization of steel
11/21/2013WO2013172456A1 Plasma processing apparatus and plasma processing method
11/21/2013WO2013172359A1 Gas barrier film, manufacturing method for gas barrier film, and electronic device
11/21/2013WO2013172203A1 Solar cell manufacturing method and plasma processing apparatus
11/21/2013WO2013171988A1 Film deposition method and film deposition apparatus
11/21/2013WO2013171975A1 Method for manufacturing nitride semiconductor device
11/21/2013WO2013171360A1 Powder particle coating using atomic layer deposition cartridge
11/21/2013WO2013170854A1 Dlc coating for an optical ir component and optical ir components having said dlc coating
11/21/2013WO2013108189A3 Chemical vapour deposition of ptsi from organometallic complexes of pt
11/21/2013WO2013084160A3 Graphene composite and a method of manufacturing a graphene composite
11/21/2013US20130309522 Sliding member and method for manufacturing the same
11/21/2013US20130309419 Ceramic Coating Deposition
11/21/2013US20130309417 Methods for forming multi-component thin films
11/21/2013US20130309416 Atmospheric pressure plasma treatment apparatus and atmospheric pressure plasma treatment method
11/21/2013US20130309415 Systems and methods for modulating step coverage during conformal film deposition
11/21/2013US20130309402 Interdigitated substrate support assembly for synthesis of large area thin films
11/21/2013US20130309401 Atomic layer deposition apparatus and atomic layer deposition method
11/21/2013US20130306240 System and Method for Controlling Plasma With an Adjustable Coupling to Ground Circuit
11/21/2013US20130305988 Inline Capacitive Ignition of Inductively Coupled Plasma Ion Source
11/21/2013US20130305985 Plasma processing device
11/21/2013DE112012000579T5 Anlage, Verfahren und Reaktionskammer System, method and reaction chamber
11/21/2013DE102012010603B4 Beschichteter Dichtungsartikel Lined rubber products
11/21/2013DE102012009801A1 Device for coating electrical conductive fiber material used for e.g. artificial heart valve, applies high frequency electrical alternating voltage to fiber that is moved through separation chamber
11/21/2013DE102007004744B4 Verfahren und Vorrichtung zur partiellen Beschichtung von Bauteilen Method and apparatus for the partial coating of components
11/20/2013EP2558614B1 Method for producing a coating on an extrusion die
11/20/2013EP2262043B1 Method for manufacturing at least one micro-component with a single mask
11/20/2013EP2145987B1 Fabrication method of a group III nitride crystal substance
11/20/2013EP2072149B1 Method for manufacturing process gases for vapour deposition
11/20/2013EP1551768B1 Process for manufacturing a gallium rich gallium nitride film
11/20/2013EP1533834B1 Vapor phase epitaxial apparatus and vapor phase epitaxial method
11/20/2013CN203295602U Device for coating antireflection film
11/20/2013CN203295601U Equipment for preparing diamond-coated woodworking double-edge end milling cutters in large batches
11/20/2013CN203295599U Jig structure for preventing product port from being evaporated
11/20/2013CN103403857A Thin heated substrate support
11/20/2013CN103403841A Gas phase growth device and gas phase growth method
11/20/2013CN103403837A Microwave plasma reactors and substrates for synthetic diamond manufacture
11/20/2013CN103403222A Coating layer for cutting tool
11/20/2013CN103403221A Apparatus for coating a substrate
11/20/2013CN103403220A Device and process for coating a substrate
11/20/2013CN103397312A Control method and system for low pressure chemical vapor deposition (LPCVD) technical production environment
11/20/2013CN103397311A PECVD (Plasma Enhanced Chemical Vapor Deposition) flexible solar battery manufacturing equipment
11/20/2013CN103397310A Spray head and reaction chamber
11/20/2013CN103397309A Air-inlet device and reaction chamber
11/20/2013CN103397308A Spray head used for MOCVD equipment
11/20/2013CN103397307A Method to prepare silicon-containing film
11/20/2013CN103397306A Process for producing silicon oxide film from organoaminosilane precursors
11/20/2013CN102732834B Apparatus for preparing two-dimensional nanometer film
11/20/2013CN102560423B Carbon plate lifting table of automatic loading and unloading system of plate plasma enhanced chemical vapor deposition (PECVD) device
11/20/2013CN102496658B Preparation method for antireflective film of solar cell
11/20/2013CN102264639B Composite carbon and manufacturing method therefor
11/20/2013CN102108495B Method for cleaning reaction cavity for growing films of compounds of group III elements and group V elements
11/20/2013CN102027603B Process for depositing organic materials
11/20/2013CN101384747B Dual mode ion source for ion implantation
11/19/2013US8586456 Use of CL2 and/or HCL during silicon epitaxial film formation
11/19/2013US8586195 Method for forming an acoustic mirror with reduced metal layer roughness and related structure
11/19/2013US8586151 Process for the preparation of photoluminescent nanostructured silicon thin films using radio frequency plasma discharge
11/19/2013US8586140 Film formation method for forming hafnium oxide film
11/19/2013US8586139 Method for producing electrode composite material
11/19/2013US8585877 Multi-step deposition control
11/19/2013US8585862 Plasma processing device and plasma discharge state monitoring device
11/19/2013US8585823 CVD apparatus having a rotating heater
11/19/2013US8585820 Abatement of reaction gases from gallium nitride deposition
11/19/2013US8584612 UV lamp assembly of degas chamber having rotary shutters
11/19/2013US8584611 In-line vacuum coating system
11/19/2013CA2634297C Article having patterned decorative coating
1 ... 34 35 36 37 38 39 40 41 42 43 44 45 46 47 48 49 50 51 52 53 54 ... 719