Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
10/2013
10/09/2013EP2646596A1 Method for producing a carbon-containing layer system and apparatus for implementing the method
10/09/2013EP2646595A1 Apparatus for coating a substrate
10/09/2013CN203229570U Alignment type multi-sheet transmission system and thin film deposition equipment using alignment type multi-sheet transmission system
10/09/2013CN103348044A Base, substrate with gallium nitride crystal layer, and process for producing same
10/09/2013CN103343334A Vapor deposition method
10/09/2013CN103343333A Graphite disk structure capable of avoiding wafer flying
10/09/2013CN103343332A Chemical vapor deposition method
10/09/2013CN103343331A Chemical vapor deposition reaction device
10/09/2013CN103343330A Method for improving metal pollution on back surface of silicon slice
10/09/2013CN103343329A Equipment and method for growing silicon carbide film
10/09/2013CN103343328A Method for synthesizing graphene under positive pressure condition
10/09/2013CN102615490B Preparation method of complex CVD (chemical vapor deposition) diamond cutter
10/09/2013CN102418089B Preparation method of three-dimensional TiO2 crystal film
10/09/2013CN102341760B Fluid control apparatus
10/09/2013CN102197157B Apparatus and method for atomic layer deposition
10/09/2013CN101942645B Film plating machine
10/09/2013CN101842166B Apparatus for anisotropic focusing
10/08/2013US8552650 Plasma formation region control apparatus and plasma processing apparatus
10/08/2013US8551765 Solid support having electrostatic layer and use thereof
10/08/2013US8551580 Method for producing polycrystalline silicon
10/08/2013US8551565 Film forming method and film forming apparatus
10/08/2013US8551564 Chemical vaporizer for material deposition systems and associated methods
10/08/2013US8551558 Techniques for enhancing efficiency of photovoltaic devices using high-aspect-ratio nanostructures
10/08/2013US8551557 Method for manufacturing light-emitting device
10/08/2013US8551289 Plasma processing apparatus
10/08/2013US8551249 Film cassette for gaseous vapor deposition
10/08/2013US8551248 Showerhead for CVD depositions
10/03/2013WO2013148475A1 Methods and apparatus for supplying process gas in a plasma processing system
10/03/2013WO2013148473A1 Shared gas panels in plasma processing chambers employing multi-zone gas feeds
10/03/2013WO2013148468A1 Substrate processing system having susceptorless substrate support with enhanced substrate heating control
10/03/2013WO2013148446A1 Scanning injector assembly module for processing substrate
10/03/2013WO2013148126A1 Three-dimensional photoresists via functionalization of polymer thin films fabricated by icvd
10/03/2013WO2013147491A1 Source container and vapour-deposition reactor
10/03/2013WO2013147119A1 Gas-barrier film and process for producing same, and gas-barrier laminate
10/03/2013WO2013146982A1 Trap mechanism, exhaust system, and film formation device
10/03/2013WO2013146964A1 Laminated film, organic electroluminescence device, photoelectric converter, and liquid crystal display
10/03/2013WO2013146680A1 Vaporization device
10/03/2013WO2013146655A1 Plasma processing apparatus and high frequency generator
10/03/2013WO2013146632A1 Semiconductor device manufacturing method, substrate processing method, substrate processing apparatus, and program
10/03/2013WO2013146595A1 Substrate processing apparatus, method for controlling substrate processing apparatus, method for maintaining substrate processing apparatus, and recording medium
10/03/2013WO2013146278A1 Semiconductor device manufacturing method, substrate processing method, and substrate processing apparatus
10/03/2013WO2013145943A1 Gas barrier film and method for producing gas barrier film
10/03/2013WO2013145932A1 Heating mechanism, film-forming device, and film-forming method
10/03/2013WO2013145813A1 Film-forming apparatus
10/03/2013WO2013145630A1 Film-forming apparatus
10/03/2013WO2013145404A1 Laminated substate of silicon single crystal and group iii nitride single crystal with off angle
10/03/2013WO2013144640A1 Process for producing two-dimensional nanomaterials
10/03/2013WO2013143241A1 Chemical vapour deposition method for organic metal compound and apparatus therefor
10/03/2013WO2013106006A9 Method for applying aluminum alloy coatings for corrosion protection of steel
10/03/2013US20130260488 Chemical vapor deposition apparatus and method for manufacturing light-emitting devices using same
10/03/2013US20130260157 Nanocrystalline diamond film and method for fabricating the same
10/03/2013US20130260119 Multi-Material Thermal Barrier Coating System
10/03/2013US20130260057 Continuous plasma and rf bias to regulate damage in a substrate processing system
10/03/2013US20130260054 Three-Dimensional Photoresists via Functionalization of Polymer Thin Films Fabricated by iCVD
10/03/2013US20130260047 Coating and methods thereof
10/03/2013US20130260034 Scanning Injector Assembly Module for Processing Substrate
10/03/2013US20130260026 Method For Manufacturing A Thin Film On A Substrate
10/03/2013US20130256272 Low electron temperature microwave surface-wave plasma (swp) processing method and apparatus
10/03/2013US20130255881 Internal member of a plasma processing vessel
10/03/2013US20130255576 Process kit shield for plasma enhanced processing chamber
10/03/2013US20130255575 Plasma generator
10/02/2013EP2644741A1 Methods of preparing titanium containing thin films by atomic layer deposition using monocyclopentadienyl titanium-based precursors
10/02/2013EP2644609A2 Precursors for depositing silicon-containing films and methods for making and using same
10/02/2013EP2643495A2 Thermal gradient enhanced chemical vapour deposition (tge-cvd)
10/02/2013EP2643494A1 Method of forming conformal barrier layers for protection of thermoelectric materials
10/02/2013EP2643493A1 Colloidal infrared reflective and transparent conductive aluminum-doped zinc oxide nanocrystals
10/02/2013EP2643268A1 System and method for hydrogen production
10/02/2013DE102013103045A1 Vorrichtung zur chemischen Gasphasen-Abscheidung mit Suszeptor Apparatus for chemical vapor deposition with susceptor
10/02/2013DE102012205254A1 Tempering band-shaped substrate, comprises guiding and transporting substrate band along transport path and is tempered by guide segment, with thermal band as heat exchangers, by which guide segment leads thermal band along transport path
10/02/2013DE102012102661A1 Method for cleaning walls of process chamber of CVD reactor, involves passing etching gas under different hydrodynamic conditions in process chamber, so that distinct surface portions of walls are subjected to different etching degrees
10/02/2013DE102006010929B4 Beschichtungsverfahren Coating process
10/02/2013CN203222620U 监控装置及气相沉积设备 Monitoring devices and vapor deposition equipment
10/02/2013CN203222619U Recognition device for electrode hole direction of graphite boat
10/02/2013CN203222618U Picking and placing device for reaction source bottle
10/02/2013CN103339707A A microwave plasma reactor for manufacturing synthetic diamond material
10/02/2013CN103339286A Filament for hot wire chemical vapour deposition
10/02/2013CN103339285A Method for synthesizing a material, in particular diamonds, by chemical vapor deposition, as well as device for applying the method
10/02/2013CN103338928A Gas-barrier plastic molded product and manufacturing process therefor
10/02/2013CN103334106A Surface-hardening treatment method of sealing pairs and friction pairs of titanium and titanium alloy ball valves
10/02/2013CN103334092A Pipeline cooled gas distribution device used for metal organic chemical vapour deposition reactor
10/02/2013CN103334091A Vacuum treatment device
10/02/2013CN103334090A Preparation method of InN (indium nitride)/AlN (aluminum nitride)/glass structure
10/02/2013CN103334089A Preparation method of InN (indium nitride) thin film through low-temperature deposition on self-supporting diamond thick film by ECR-PEMOCVD (electron cyclotron resonance-plasma enhanced metal organic chemical vapor deposition)
10/02/2013CN103334088A Method for low-temperature deposition of InN film on glass substrate
10/02/2013CN103334087A Preparation method of silicon nitride film
10/02/2013CN103334041A Hard alloy with surface coating and preparation process of hard alloy
10/02/2013CN102424954B Shutdown clean scheme for reducing particles of high density plasma chemical vapor deposition process
10/02/2013CN101144153B Substrate supporting device and thin film transistor array panel production method
10/01/2013US8546270 Atomic layer deposition apparatus
10/01/2013US8546249 Selective growth of polycrystalline silicon-containing semiconductor material on a silicon-containing semiconductor surface
10/01/2013US8546205 Detecting a deposition condition
10/01/2013US8545972 Controlled vapor deposition of multilayered coatings adhered by an oxide layer
10/01/2013US8545940 Atomic layer deposition apparatus
10/01/2013US8545939 Method and device for the infiltration of a structure of a porous material by chemical vapour deposition
10/01/2013US8545938 Method of fabricating a ceramic component
10/01/2013US8545926 Method of forming insulated conductive element having substantially continuously coated sections separated by uncoated gaps
10/01/2013US8545689 Gallium electrodeposition processes and chemistries
10/01/2013US8545672 Plasma processing apparatus
10/01/2013US8545671 Plasma processing method and plasma processing apparatus
10/01/2013US8545670 Plasma processing apparatus and plasma processing method
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