Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
03/2014
03/26/2014CN103687978A Hot-wire method for depositing semiconductor material on substrate and device for performing the method
03/26/2014CN103681412A Semiconductor processing apparatus including a plurality of reactors, and method for providing the same with process gas
03/26/2014CN103668453A Two-dimensional silylene film and preparation method thereof
03/26/2014CN103668128A MOCVD (metal organic chemical vapor deposition) equipment, temperature control system and control method
03/26/2014CN103668127A Domical microwave plasma chemical vapor deposition diamond film device
03/26/2014CN103668126A Laser CVD (chemical vapor deposition) device
03/26/2014CN103668125A Substrate table suitable for being used in tubular plasma film deposition device
03/26/2014CN103668124A Substrate holder of a chemical vapor deposition (CVD) apparatus
03/26/2014CN103668123A Slide glass disc of chemical vapor deposition equipment for metal organic matters
03/26/2014CN103668122A Plasma equipment and support plate recovery device thereof
03/26/2014CN103668121A Microwave plasma chemical vapor deposition device
03/26/2014CN103668120A Multi-substance atomic layer deposition film making method and apparatus thereof
03/26/2014CN103668119A Silicate type fluorescent powder as well as device and process for coating oxide diaphragm film on surface of fluorescent powder
03/26/2014CN103668118A Gas injector and injector pipe thereof
03/26/2014CN103668117A Process gas management for inductively-coupled plasma deposition reactor
03/26/2014CN103668116A Gas suction and exhaust unit and atomic layer deposition device with same
03/26/2014CN103668115A Vapor phase epitaxy reaction tube with cavity wall temperature set by growth program in real time
03/26/2014CN103668114A Cleaning device and cleaning method for spraying tray of metallorganics chemical vapor deposition device
03/26/2014CN103668113A Method for maintaining morphology of ADN (ammonium dinitramide) spherical particle
03/26/2014CN103668112A Powder rotating CVD (chemical vapor deposition) device
03/26/2014CN103668111A Method and device for depositing diamond film in micropore wire-drawing die inner hole
03/26/2014CN103668110A Atomic layer deposition device
03/26/2014CN103668109A Laser-induced deposition on a seed layer
03/26/2014CN103668108A Atomic layer deposition method of oxide medium
03/26/2014CN103668107A Barrier film and manufacture method thereof
03/26/2014CN103668106A Method for preparing monolayer hexagonal boron nitride
03/26/2014CN103668105A Method for preparing coating on cutting blade
03/26/2014CN103668104A Method for preparing silicon film by carrying out hot filament chemical vapor deposition with ionic liquid as substrate
03/26/2014CN103668103A Graphite tray transferring device of metallorganics chemical vapor deposition device
03/26/2014CN103668102A Clamping device used for chemical deposition equipment
03/26/2014CN103668101A Wafer fixing device used in deposition film forming device
03/26/2014CN103668099A Coating system and method for coating substrate in coating system
03/26/2014CN103668066A Net structural body capable of accommodating workpiece
03/26/2014CN103668053A Mask frame and corresponding mask component thereof
03/26/2014CN103668052A Composite mask plate assembly
03/26/2014CN103668051A Mask frame and corresponding mask component thereof for vapor deposition
03/26/2014CN103668050A Assembling method of mask component
03/26/2014CN103668048A Manufacture method of composite mask plate assembly
03/26/2014CN103667831A Method for processing spinning cup by using Al-Cu-Mn-Mg hard aluminum alloy as material
03/26/2014CN102719802B Device for increasing metal adhesivity of diamond through wrapping silicon on diamond and application method thereof
03/26/2014CN102362337B Plasma processing apparatus and method of producing amorphous silicon thin film using same
03/26/2014CN102277561B System and method for a gas treatment of a number of substrates
03/26/2014CN102171116B Conveyor assembly and method for conveying a substrate carrier
03/26/2014CN102076881B Plant for forming electronic circuits on substrates
03/26/2014CN102054663B Substrate process apparatus, substrate process method
03/26/2014CN101801987B Methods of forming thin metal-containing films by CVD
03/25/2014US8680766 Organic electroluminescence display device and manufacturing method thereof
03/25/2014US8680424 Microwave plasma processing device
03/25/2014US8680289 Complexes of imidazole ligands
03/25/2014US8679956 Multiple precursor showerhead with by-pass ports
03/25/2014US8679594 Index modified coating on polymer substrate
03/25/2014US8679574 Unlimited movable printing system and printing method thereof
03/25/2014US8679573 Stent coating method and apparatus
03/25/2014US8679288 Showerhead electrode assemblies for plasma processing apparatuses
03/25/2014US8679255 Gas supply device, substrate processing apparatus and substrate processing method
03/25/2014US8679254 Vapor phase epitaxy apparatus of group III nitride semiconductor
03/25/2014US8679253 Deposition apparatus and method for depositing film
03/25/2014US8679252 Actively heated aluminum baffle component having improved particle performance and methods of use and manufacture thereof
03/25/2014US8677932 Apparatus for metering granular source material in a thin film vapor deposition apparatus
03/25/2014US8677590 Plasma confinement structures in plasma processing systems and methods thereof
03/25/2014CA2627664C Method and device for coating a polymer film with an oxide layer
03/25/2014CA2526257C Device for area-based surface treatment of an article by electric dielectric barrier discharge
03/20/2014WO2014040446A1 Method for growing inn-based thin film material
03/20/2014WO2014014541A3 Wear resistant coatings and process for the application thereof
03/20/2014WO2014007894A3 Composites including silicon-oxy-carbide layers and methods of making the same
03/20/2014WO2013165889A8 Radical reactor with inverted orientation
03/20/2014WO2013104949A3 Method for treating an object
03/20/2014WO2012006433A3 Method and apparatus for applying a coating at a high rate onto non-line-of-sight regions of a substrate
03/20/2014US20140080320 Semiconductor processing system including vaporizer and method for using same
03/20/2014US20140079879 Method for producing tubular body
03/20/2014US20140077222 Gallium Nitride Devices with Aluminum Nitride Alloy Intermediate Layer
03/20/2014US20140076236 Method and system for supplying a cleaning gas into a process chamber
03/20/2014US20140076235 Evaporating device and vaccum evaporation device using the same
03/20/2014US20140076234 Multi chamber processing system
03/20/2014DE102013108405A1 Durchlauf-Substratbehandlungsanlage und Reinigungsverfahren Pass substrate treatment plant and cleaning procedures
03/20/2014DE102012216929A1 Motor component, useful as valve and piston of internal combustion engine, comprises thermal oxidation-resistant protective layer on its area, heat-conducting coating for distributing heat generated in operation, shaft, and disc
03/20/2014DE102012107959A1 Electronic components, useful for passivating metal oxide layer functional layer, include functional layer that comprises metal oxides and is coated with protective layer comprising epoxide compound and/or rearrangement product
03/20/2014DE102012018525A1 Vorrichtung zur Herstellung einer klebefreien Gasbarrierefolie mit einer keramischen Barriereschicht An apparatus for producing an adhesive-free gas-barrier film with a ceramic barrier layer
03/20/2014DE102006035854B4 Elektrode aus leitfähigem Diamant und Verfahren zu deren Herstellung Plate of conductive diamond, and processes for their preparation
03/19/2014EP2708617A1 Carbon film laminate, method of manufacturing said laminate, and lubricant using said laminate
03/19/2014EP2708545A1 Pentadienyl strontium-organic compounds and their use for thin films deposition
03/19/2014EP2708544A1 Pentadienyl barium-organic compounds and their use for thin films deposition
03/19/2014EP2708543A1 Salen-type strontium precursors for vapor phase deposition of thin films
03/19/2014EP2708542A1 Salen-type barium precursors for vapor phase deposition of thin films
03/19/2014EP2708300A1 Surface-coated cutting tool
03/19/2014EP2707521A1 Improved microwave plasma reactors
03/19/2014EP2707375A1 Group 11 mono-metallic precursor compounds and use thereof in metal deposition
03/19/2014CN203491232U Graphit boat
03/19/2014CN203487234U Sprayer for metal-organic chemical vapour deposition equipment
03/19/2014CN203487233U Tool for charcoal/charcoal throat lining CVI (Chemical Vapor Infiltration) treatment
03/19/2014CN203487232U Square-tapered graphite boat
03/19/2014CN203487231U Polishing and maintaining device of thin film substrate loading work rest
03/19/2014CN203487230U Air tack device for preparing airplane carbon brake plate by utilizing internal heat gradient directional airflow CVI (chemical vapor infiltration) method
03/19/2014CN203487229U Ring slot type graphite boat
03/19/2014CN203487224U NCVM (Non Conductive Vacuum Metalization) multi-coating electroplating imitated metal shell
03/19/2014CN103650169A Method for manufacturing silicon-containing film
03/19/2014CN103649385A SiC epitaxial wafer and method for producing same, and device for producing SiC epitaxial wafer
03/19/2014CN103649370A Vacuum film formation device
03/19/2014CN103649369A Gas inlet member of a cvd reactor
03/19/2014CN103649368A Gas-injection apparatus, atomic layer deposition apparatus, and atomic layer deposition method using the apparatus
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