Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
02/2014
02/18/2014US8652297 Symmetric VHF plasma power coupler with active uniformity steering
02/18/2014US8652260 Apparatus for holding semiconductor wafers
02/18/2014US8652259 Scalable, high-throughput, multi-chamber epitaxial reactor for silicon deposition
02/18/2014US8652258 Substrate treatment device
02/18/2014US8651049 Plasma processing apparatus
02/13/2014WO2014024404A1 Production method for epitaxial silicon wafer and epitaxial silicon wafer
02/13/2014WO2014023414A1 Heating element for a planar heater of a mocvd reactor
02/13/2014WO2014023413A1 Terminal for mechanical support of a heating element
02/13/2014WO2014022872A2 Apparatus and method for the plasma coating of a substrate, in particular a press platen
02/13/2014WO2013173896A8 A cylinder for application on an internal combustion engine
02/13/2014US20140045340 Method and apparatus for processing a semiconductor workpiece
02/13/2014US20140044875 In-line deposition chamber design for multi-stage physical vapor deposition
02/13/2014US20140044874 Graphene manufacturing system and the method thereof
02/13/2014US20140044873 Single-walled carbon nanotube (swcnt) fabrication by controlled chemical vapor deposition (cvd)
02/13/2014US20140044863 Deposition apparatus capable of measuring residual amount of deposition material and method of measuring the residual amount of the deposition material using the deposition apparatus
02/13/2014US20140043615 System, apparatus and method for emittance control and suppressing stray light
02/13/2014US20140043216 Boron nitride antistiction films and methods for forming same
02/13/2014US20140041590 Canister
02/13/2014US20140041589 Heating element for a planar heater of a mocvd reactor
02/13/2014US20140041588 Method for Supplying Gas With Flow Rate Gradient Over Substrate
02/13/2014US20140041585 Exhaust gas processing conduit, manufacturing apparatus and gas flow guiding method thereof
02/13/2014US20140041186 Method for loading and unloading a cassette
02/13/2014DE102013213897A1 Verfahren und Vorrichtung zum Bilden von amorphen, harten Kohlenstoffbeschichtungen Method and apparatus for forming the amorphous hard carbon coatings
02/13/2014DE102012219897A1 Mehrlagige Beschichtung für eine Form Multilayer coating for a form
02/13/2014DE102012214284A1 Gleitelement, insbesondere Kolbenring, mit einer widerstandsfähigen Beschichtung Sliding element, in particular piston ring, with a durable coating
02/13/2014DE102012110052B3 Batch plant e.g. vacuum coating plant for processing tubular substrates for solar heat collectors, has carrier and substrate carrier train that are arranged to form prism or truncated pyramid shaped structure in process chamber
02/13/2014DE102009014067B4 Plasmabearbeitungsvorrichtung The plasma processing apparatus
02/12/2014EP2695966A1 Insulator material for use in RRAM
02/12/2014EP2694701A1 Deposition reactor with plasma source
02/12/2014EP2694700A1 Atomic layer deposition with plasma source
02/12/2014EP2694699A1 Method for depositing one or more polycrystalline silicon layers on substrate
02/12/2014CN203429251U Novel PECVD (plasma enhanced chemical vapour deposition) radio frequency electrode contact
02/12/2014CN203429250U Table board for placing vacuum high-temperature baking oven
02/12/2014CN203429249U Device for automatically assembling/disassembling chip in PECVD (Plasma Enhanced Chemical Vapor Deposition) workpiece rack
02/12/2014CN203429248U Waterproof device of amorphous silicon thin film solar PECVD (plasma-enhanced chemical vapor deposition) substrate loading box
02/12/2014CN203429247U Manufacturing device of PECVD (plasma enhanced chemical vapor deposition) flexible solar cells
02/12/2014CN203429246U Leakproof structure, reaction chamber and semiconductor processing equipment
02/12/2014CN103582956A A chemical bath deposition apparatus for fabrication of semiconductor films through roll-to-roll processes
02/12/2014CN103582719A Compositions and processes for depositing carbon-doped silicon-containing films
02/12/2014CN103582718A Organic ruthenium compound for chemical vapor deposition raw material and production method for said organic ruthenium compound
02/12/2014CN103579589A Graphene-silicon-graphene composite material, preparation method of graphene-silicon-graphene composite material, lithium ion battery and preparation method of lithium ion battery
02/12/2014CN103579419A Grapheme/MoS2/Si heterojunction thin-film solar cell and manufacturing method thereof
02/12/2014CN103572262A Light CVD film manufacturing method and light CVD film manufacturing apparatus
02/12/2014CN103572261A 石墨加热器 Graphite heater
02/12/2014CN103572260A Heating device, CVD equipment reaction chamber with heating device, and CVD equipment
02/12/2014CN103572259A Film forming apparatus and film forming method
02/12/2014CN103572258A Vapor delivery device, methods of manufacture and methods of use thereof
02/12/2014CN103572257A Surface low-friction orthodontics arch wire and preparation method thereof
02/12/2014CN103572256A Device for preparing P type doped amorphous silicon carbon film
02/12/2014CN103572255A Metal chemical vapor deposition equipment and reaction chamber thereof
02/12/2014CN103572254A Heat exchange jacekt
02/12/2014CN103572253A Reaction cavity and semiconductor device with same
02/12/2014CN103572252A Device and technology for double-glow chemical vapor deposition
02/12/2014CN103572251A Non-oxygen containing silicon-based films and methods of forming the same
02/12/2014CN103572250A 表面包覆切削工具 Coated cutting tool
02/12/2014CN103572249A Method and device for forming amorphous carbon coating
02/12/2014CN103572248A Diamond producing method and DC plasma enhanced CVD apparatus
02/12/2014CN103572247A Method for preparing thin layer graphene on surface of metal catalyst
02/12/2014CN103572246A Mask for deposition and method for alignment thereof
02/12/2014CN103572245A Mask module and organic vapor deposition device and thermal evaporation device using mask module
02/12/2014CN103571476A Cerium-doped Group-III molybdate light-emitting film, preparation method and application thereof
02/12/2014CN103571460A Titanium-ion-containing co-doped zinc oxide light-emitting film and preparation method and application thereof
02/12/2014CN103569998A Device and method for preparing carbon nanotube
02/12/2014CN103567735A Surface coating cutting device
02/12/2014CN103567520A Blind groove diamond coating milling cutter
02/12/2014CN102618851B Tool for compacting thick-walled hollow carbon/carbon (C/C) composite product
02/12/2014CN102308368B Chemical vapor deposition flow inlet elements and methods
02/12/2014CN102234791B Gas distribution shower module and coating equipment
02/12/2014CN102002685B Film formation apparatus and film formation method
02/12/2014CN101974735B Inductively coupled plasma processing apparatus
02/12/2014CN101798673B Film forming method, panel manufacturing device and annealing device
02/12/2014CN101748405B Transparent conducting film and preparation method thereof, solar battery and flat panel display device
02/11/2014US8647992 Flowable dielectric using oxide liner
02/11/2014US8647714 Nickel film forming method
02/11/2014US8647707 Method of forming pattern and method of manufacturing organic light emitting device
02/11/2014US8647706 Film forming apparatus and method of manufacturing light emitting device
02/11/2014US8647704 Method for the translation of a white light color palette to a black light color palette
02/11/2014US8647580 Gas abatement
02/11/2014US8647485 Process kit shield for plasma enhanced processing chamber
02/11/2014US8647438 Annular baffle
02/11/2014US8647437 Apparatus, tool and methods for depositing annular or circular wedge coatings
02/11/2014US8646409 Plasma booster for plasma treatment installation
02/11/2014US8646408 Flux monitor
02/11/2014US8646407 Film formation apparatus for semiconductor process and method for using the same
02/11/2014US8646405 Deposition mask and method of fabricating the same
02/06/2014WO2014022219A1 Chemical precursor bubbler
02/06/2014WO2014021365A1 Semiconductor structure, semiconductor device, and method for producing semiconductor structure
02/06/2014WO2014021259A1 Nitride semiconductor element structure and method for producing same
02/06/2014WO2014021220A1 Substrate processing apparatus, method for manufacturing semiconductor device, and recording medium
02/06/2014WO2014020776A1 SiC MOLDED BODY AND METHOD FOR PRODUCING SiC MOLDED BODY
02/06/2014WO2014019571A1 Method for producing protective layers containing silicides and/or oxidized silicides on substrates
02/06/2014US20140038421 Deposition Chamber and Injector
02/06/2014US20140038395 Vapor deposition device and vapor deposition method
02/06/2014US20140038393 Method and system for ion-assisted processing
02/06/2014US20140037983 Titanium aluminide components and methods for manufacturing the same from articles formed by consolidation processes
02/06/2014US20140037865 Migration and plasma enhanced chemical vapor deposition
02/06/2014US20140037857 Methods for applying fixed images to electrochemical devices
02/06/2014US20140036340 Thin film stack with surface-conditioning buffer layers and related methods
02/06/2014US20140033980 Deposition apparatus
02/06/2014US20140033978 Method of Parallel Shift Operation of Multiple Reactors
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