Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
12/2013
12/05/2013WO2013180005A1 Rolled film formation device
12/05/2013WO2013179886A1 Resin container coating device
12/05/2013WO2013179837A1 Semiconductor device and method for manufacturing same
12/05/2013WO2013179561A1 Film-forming apparatus and film-forming method
12/05/2013WO2013179489A1 Substrate placing apparatus and substrate placing method
12/05/2013WO2013178563A2 Multilayer structure as reflector
12/05/2013WO2013136052A3 Chemical vapor deposition process for depositing zinc oxide coatings, method for forming a conductive glass article and the coated glass articles produced thereby
12/05/2013US20130324390 Scalable lead zirconium titanate (pzt) thin film material and deposition method, and ferroelectric memory device structures comprising such thin film material
12/05/2013US20130323860 Substrate support providing gap height and planarization adjustment in plasma processing chamber
12/05/2013US20130323859 System and method of monitoring and controlling atomic layer deposition of tungsten
12/05/2013US20130323422 Apparatus for CVD and ALD with an Elongate Nozzle and Methods Of Use
12/05/2013US20130323421 Film forming method and film forming device
12/05/2013US20130323420 Apparatus and method for atomic layer deposition on a surface
12/05/2013US20130323407 Method for coating with an evaporation material
12/05/2013US20130323157 Apparatus and Methods for the Synthesis of Graphene by Chemical Vapor Deposition
12/05/2013US20130319333 Injector and Material Layer Deposition Chamber Including the Same
12/05/2013DE102012108742A1 Transporting a band-shaped material in a vacuum treatment plant, comprises e.g. treating band-shaped material in many vacuum treatment sections, and transporting the band-shaped material in a transport path within vacuum treatment section
12/05/2013DE102012104583A1 Pressure element, used in electric power steering system of motor vehicle, comprises hard material coating that is applied on pressure element by chemical or physical vapor deposition and contains carbon as alloying element and hydrogen
12/05/2013DE102007058052B4 Vakuumbeschichtungsanlage Vacuum coating system
12/05/2013DE10043600B4 Vorrichtung zum Abscheiden insbesondere kristalliner Schichten auf einem oder mehreren, insbesondere ebenfalls kristallinen Substraten Device for depositing in particular crystalline layers on one or more, in particular likewise crystalline substrates
12/04/2013EP2669249A1 Organoaminodisilane precursors and methods for depositing films comprising same
12/04/2013EP2669248A1 Organoaminodisilane precursors and methods for depositing films comprising same
12/04/2013CN203320124U Device for promoting productivity of aluminum oxide coating equipment
12/04/2013CN203320123U Polycrystalline silicon preparation device
12/04/2013CN103430327A Systems and methods for charging solar cell layers
12/04/2013CN103430290A 干洗方法 Dry Cleaning Methods
12/04/2013CN103429786A Apparatus and method for coating using hot wire
12/04/2013CN103429785A Coated body and method for the production thereof
12/04/2013CN103428908A Silicon shell tungsten core heater strip and preparation method
12/04/2013CN103422075A Method for forming film layer
12/04/2013CN103422074A Reaction chamber for sedimentation technology and regulating method for temperature of tray therein
12/04/2013CN103422073A Pallet and plasma processing equipment for induction heating
12/04/2013CN103422072A Loading bench used in vacuum processing device
12/04/2013CN103422071A Vacuum cavity chamber capable of rapidly changing gas-homogenizing mode
12/04/2013CN103422070A PECVD device, carrier board visual identification system and method
12/04/2013CN103422069A Low K precursors having superior integration attributes
12/04/2013CN103422068A Manufacture equipment and method for polysilicon film
12/04/2013CN103421494A Titanium and magnesium codoped alumina luminescent thin film and preparation method and application thereof
12/04/2013CN103421361A Modified carbon nanometer coating used for scale inhibition of inner member of rectifying tower
12/04/2013CN102421935B 锶钌氧化物界面 Strontium ruthenium oxide interface
12/04/2013CN102315283B Antireflective film for solar panel and preparation method thereof
12/04/2013CN102312212B Scanning coating device and scan coating assembly
12/04/2013CN102292795B Device and method for coating a substrate using CVD
12/04/2013CN102110639B Method for preparing diffusion impervious layer
12/04/2013CN102078921B Surface-treated mold and method of producing surface-treated mold
12/04/2013CN101812677B Plasma-reinforced chemical vapor deposition process cavity
12/04/2013CN101346492B Apparatus for an optimized plasma chamber grounded electrode assembly
12/03/2013US8598047 Substrate processing apparatus and producing method of semiconductor device
12/03/2013US8597732 Thin film depositing method
12/03/2013US8597731 Method for applying a diamond layer onto a graphite substrate
12/03/2013US8597487 Method of producing aluminum structure and aluminum stucture
12/03/2013US8597464 Inductively coupled plasma reactor with multiple magnetic cores
12/03/2013US8597463 Inductively coupled plasma processing apparatus
12/03/2013US8597462 Movable chamber liner plasma confinement screen combination for plasma processing apparatuses
12/03/2013US8597430 Modular system and process for continuous deposition of a thin film layer on a substrate
12/03/2013US8597429 Manufacturing apparatus and method for semiconductor device
12/03/2013US8597428 Vacuum sealing radio frequency (RF) and low frequency conducting actuator
12/03/2013CA2582573C Alloyed tungsten produced by chemical vapour deposition
12/02/2013DE202013104902U1 Bandsubstratbehandlungsanlage Tape substrate treatment plant
11/2013
11/28/2013WO2013177326A1 Silicon precursors for low temperature ald of silicon-based thin-films
11/28/2013WO2013177292A1 Titanium-containing precursors for vapor deposition
11/28/2013WO2013177284A1 Hafnium-containing precursors for vapor deposition
11/28/2013WO2013176986A2 Vapor delivery apparatus
11/28/2013WO2013176475A1 Organic vapor deposition apparatus
11/28/2013WO2013176408A1 Nozzle unit and substrate-processing system including the nozzle unit
11/28/2013WO2013176132A1 Method for manufacturing glass substrate and glass substrate
11/28/2013WO2013176048A1 Method for feeding raw material and device for feeding raw material
11/28/2013WO2013176029A1 Patterned roll and manufacturing method therefor
11/28/2013WO2013175562A1 Semiconductor manufacturing apparatus
11/28/2013WO2013175470A1 Nanoshell, method of fabricating same and uses thereof
11/28/2013WO2013173896A1 A cylinder for application on an internal combustion engine
11/28/2013US20130316544 Method for replacing chlorine atoms on a film layer
11/28/2013US20130316167 Copper substrate for deposition of graphene
11/28/2013US20130316108 Gas-barrier plastic molded product and manufacturing process therefor
11/28/2013US20130316096 Device and Method for Vacuum Coating
11/28/2013US20130316095 Retaining device for substrates and method for coating a substrate
11/28/2013US20130316094 Rf-powered, temperature-controlled gas diffuser
11/28/2013US20130316079 Device and Process for Coating a Substrate
11/28/2013US20130316077 Mechanically fluidized silicon deposition systems and methods
11/28/2013US20130312855 Vessel with Filter
11/28/2013US20130312666 Apparatus for depositing thin film
11/28/2013US20130312665 Method and apparatus
11/28/2013US20130312663 Vapor Delivery Apparatus
11/28/2013DE102012208492A1 Dehnmessstreifenanordnung Dehnmessstreifenanordnung
11/28/2013DE102012104475A1 Device useful for depositing layer on substrate comprises processing chamber having susceptor heated by heating device for receiving substrate, gas inlet element, gas outlet element and gas-tight reactor housing which is outwardly arranged
11/28/2013DE102012010151A1 Holder, used to hold electrostatic substrate, includes identical layered structure that includes support and electrode and cover layers, where geometric ratio of support surface to thickness of layered structure has specified value
11/27/2013EP2666883A1 Method for modifying a border area of a substrate
11/27/2013EP2666544A1 Process for deposition and characterization of a coating
11/27/2013EP2666181A1 Plasma treatment device for producing coatings
11/27/2013CN203307432U Special gas pipeline device and PECVD (plasma enhanced chemical vapor deposition) equipment
11/27/2013CN203307420U Hinge mechanism for vacuum coating equipment
11/27/2013CN103415911A Catalytic chemical vapor deposition device, and deposition method and catalyst body surface treatment method using same
11/27/2013CN103415650A Apparatus and method for atomic layer deposition
11/27/2013CN103415649A Atomic layer deposition carousel with continuous rotation and methods of use
11/27/2013CN103415648A Apparatus for atomic layer deposition
11/27/2013CN103415647A Microwave power delivery system for plasma reactors
11/27/2013CN103413860A Preparation method of local region back surface passivated crystalline silicon cell
11/27/2013CN103413839A AlGaN based ultraviolet detector with double layers of passive films and manufacturing method thereof
11/27/2013CN103409731A Spray head and vapor-deposition reaction chamber
11/27/2013CN103409730A MOCVD (Metal Organic Chemical Vapor Deposition) equipment and spraying head thereof
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