Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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01/28/2014 | US8637123 Oxygen radical generation for radical-enhanced thin film deposition |
01/28/2014 | US8637118 Method of production of graphene |
01/28/2014 | US8637117 Inhibiting excess precursor transport between separate precursor zones in an atomic layer deposition system |
01/28/2014 | US8636882 Producing method of semiconductor device and substrate processing apparatus |
01/28/2014 | US8636873 Plasma processing apparatus and structure therein |
01/28/2014 | US8636871 Plasma processing apparatus, plasma processing method and storage medium |
01/28/2014 | US8636847 Chemical vapor deposition flow inlet elements and methods |
01/28/2014 | US8635972 Device for forming a film by deposition from a plasma |
01/28/2014 | US8635971 Tunable uniformity in a plasma processing system |
01/23/2014 | WO2014015248A1 Organosilane precursors for ald/cvd silicon-containing film applications |
01/23/2014 | WO2014015237A1 Organosilane precursors for ald/cvd silicon-containing film applications |
01/23/2014 | WO2014015232A1 Organosilane precursors for ald/cvd silicon-containing film applications |
01/23/2014 | WO2014014568A1 Symmetrical inductively coupled plasma source with coaxial rf feed and coaxial shielding |
01/23/2014 | WO2014014566A1 Symmetrical inductively coupled plasma source with symmetrical flow chamber |
01/23/2014 | WO2014013941A1 Method for manufacturing semiconductor device |
01/23/2014 | WO2014013214A1 An alkyltelluroether precursor for use in the single source chemical vapour deposition of a metal telluride |
01/23/2014 | WO2014013168A1 Chemical vapour infiltration apparatus having a high loading capacity |
01/23/2014 | WO2014012237A1 Method and apparatus for growing nitride-based compound semiconductor crystals |
01/23/2014 | WO2013178563A3 Multilayer structure as reflector |
01/23/2014 | US20140023996 Three Dimensional Model Objects |
01/23/2014 | US20140023856 Coat as well as method and device for coating |
01/23/2014 | US20140023796 Plasma cvd apparatus, plasma cvd method, reactive sputtering apparatus, and reactive sputtering method |
01/23/2014 | US20140023794 Method And Apparatus For Low Temperature ALD Deposition |
01/23/2014 | US20140023785 Method For Producing Nickel-Containing Films |
01/23/2014 | US20140023784 Method for deposition of conformal films with catalysis assisted low temperature cvd |
01/23/2014 | US20140023783 Apparatus for manufacturing graphene film and method for manufacturing graphene film |
01/23/2014 | US20140022700 Graphene Composite Electrodes for Energy Storage Devices |
01/23/2014 | US20140020629 Two piece shutter disk assembly for a substrate process chamber |
01/23/2014 | US20140020627 Roll-to-roll thin film coating machine |
01/23/2014 | DE112011104976T5 Gasphasenabschneidungsvorrichtung und Gasphasenabschneidungsverfahren Gasphasenabschneidungsvorrichtung and Gasphasenabschneidungsverfahren |
01/23/2014 | DE102012107630B3 Magnetron sputtering device, useful in plant for treating strip-like substrate, comprises anode housing as etching surface of first surface of substrate to be treated, and magnet arrangement as second etching surface of substrate |
01/22/2014 | EP2687621A2 Vapor delivery device |
01/22/2014 | EP2686463A1 Coated body, use thereof, and method for production of same |
01/22/2014 | EP2686462A1 Coated body and method for the production thereof |
01/22/2014 | EP2686461A1 Tool for harvesting polycrystalline silicon-coated rods from a chemical vapor deposition reactor |
01/22/2014 | CN103534383A Thin film forming device |
01/22/2014 | CN103531658A Atomic layer deposition preparation method for aluminum oxide thin film |
01/22/2014 | CN103531647A Heterojunction photovoltaic cell and preparation method thereof |
01/22/2014 | CN103526190A Device for controlling light-emitting wavelength and uniformity of epitaxial wafers in MOCVD (Metal Organic Chemical Vapor Deposition) system and method thereof |
01/22/2014 | CN103526189A MOCVD (Metal Organic Chemical Vapor Deposition) automatic control system |
01/22/2014 | CN103526188A Plasma enhanced chemical vapor deposition (PECVD) equipment with automatic control system of hot exhaust fan |
01/22/2014 | CN103526187A Large-area microwave plasma chemical vapor deposition system |
01/22/2014 | CN103526186A Wafer loading disc for MOCVD (metal organic chemical vapor deposition) reactor and MOCVD reactor |
01/22/2014 | CN103526185A 喷淋头及反应腔室 Sprinklers and the reaction chamber |
01/22/2014 | CN103526184A Method of operating film deposition apparatus and film deposition apparatus |
01/22/2014 | CN103526183A Film deposition apparatus, and method of depositing a film |
01/22/2014 | CN103526182A Preparation method for nitrogen-doped graphene by utilization of nonmetal substrate surfaces |
01/22/2014 | CN103526181A LPCVD (low pressure chemical vapor deposition) automatic water supplementing system |
01/22/2014 | CN103526180A Film forming method |
01/22/2014 | CN103526179A Porous low-permittivity thin film material and preparation method thereof |
01/22/2014 | CN103526178A Silicon oxide film forming method and forming apparatus |
01/22/2014 | CN103526177A Cleaning method used in amorphous carbon deposition process |
01/22/2014 | CN103526176A Method for directly growing helical carbon nanofibers on nanoporous copper |
01/22/2014 | CN103523216A Carbon-carbon composite material guide rail and preparation method thereof |
01/22/2014 | CN103522693A Flexible laminate and method for the production thereof |
01/22/2014 | CN102206815B Plasma film coating device |
01/22/2014 | CN102080218B Gas distribution plate and treatment chamber equipped therewith |
01/21/2014 | US8633329 Titanium-containing precursors for vapor deposition |
01/21/2014 | US8632854 Substrate centering device and organic material deposition system |
01/21/2014 | US8632853 Use of nitrogen-containing ligands in atomic layer deposition methods |
01/21/2014 | US8632635 Vapor deposition apparatus and vapor deposition method |
01/21/2014 | US8632634 Coating apparatus and coating method |
01/21/2014 | US8631762 Plasma CVD apparatus, method for manufacturing semiconductor film, method for manufacturing thin-film solar cell, and method for cleaning plasma CVD apparatus |
01/21/2014 | US8631761 Mask frame assembly for thin-film deposition |
01/21/2014 | US8631756 Apparatus for processing substrate and method of maintaining the apparatus |
01/21/2014 | DE202013105600U1 Objekt-Halte-und-Ausricht-Vorrichtung, Vorrichtung zum Ausrichten eines Objekts und einer Maske zueinander sowie Vakuumkammer mit einer dieser beiden Vorrichtungen Object-holding-and-alignment apparatus, apparatus for aligning a mask of an object and to each other and vacuum chamber with one of these two devices |
01/16/2014 | WO2014011674A2 Methods and apparatuses for forming semiconductor films |
01/16/2014 | WO2014011647A1 Manufacturing apparatus for depositing a material and a socket for use therein |
01/16/2014 | WO2014011617A1 Apparatus for deposition including a socket |
01/16/2014 | WO2014011292A1 Gas injection system for energetic-beam instruments |
01/16/2014 | WO2014010630A1 Pattern forming method and substrate processing system |
01/16/2014 | WO2014010356A1 Acquisition method for s-parameters in microwave introduction modules, and malfunction detection method |
01/16/2014 | WO2014010333A1 METHOD FOR FORMING Cu WIRING, AND COMPUTER-READABLE MEMORY MEDIUM |
01/16/2014 | WO2014010317A1 Plasma treatment device |
01/16/2014 | WO2014009606A1 Apparatus and method for processing substrate |
01/16/2014 | WO2014008983A1 Dlc coatings with increased corrosion resistance |
01/16/2014 | WO2014008557A1 Apparatus and method for film formation |
01/16/2014 | US20140017575 Metal coating of objects using plasma polymerisation pretreatment |
01/16/2014 | US20140017514 Finishing agent for trivalent chromium chemical conversion coating film, and method for finishing black trivalent chromium chemical conversion coating film |
01/16/2014 | US20140017469 Hard-coated member and its production method, and indexable rotary tool comprising it |
01/16/2014 | US20140017414 Method for Forming Aluminum Oxide Film Using Al Compound Containing Alkyl Group and Alkoxy or Alkylamine Group |
01/16/2014 | US20140017403 Methods For Depositing Oxygen Deficient Metal Films |
01/16/2014 | US20140015159 Array of metallic nanotubes |
01/16/2014 | US20140014745 Multi-gas straight channel showerhead |
01/16/2014 | US20140014039 Vapor-phase growth apparatus |
01/16/2014 | US20140014038 Plasma enhanced chemical vapor deposition apparatus and method for controlling the same |
01/16/2014 | DE112012001613T5 Halbleiterlaminat und Prozess für seine Herstellung und Halbleiterelement Semiconductor laminate and process for its production and semiconductor element |
01/16/2014 | DE112012000980T5 System und Verfahren zur Schnellpulsgaszuleitung System and method for fast pulse gas feed line |
01/16/2014 | DE102012013941A1 Preparing trialkylmetal compounds comprises reaction of metal trichloride with alkylaluminum sesquichloride in the presence of alkali metal halide as auxiliary base, heating the reaction mixture, and separating trialkylmetal compound |
01/16/2014 | DE102012013726A1 Apparatus, used to cool band-shaped substrate in vacuum, comprises cooling body having convex cooling surface as a perimeter, unit for guiding substrate such that substrate partially encircles cooling surface at contact area, and openings |
01/16/2014 | DE102012013576A1 DLC Beschichtungen mit erhöhter Korrosionsbeständigkeit DLC coatings with increased corrosion resistance |
01/16/2014 | CA2876507A1 Manufacturing apparatus for depositing a material and a socket for use therein |
01/15/2014 | EP2684988A1 Base, substrate with gallium nitride crystal layer, and process for producing same |
01/15/2014 | EP2684979A1 Vapor deposition apparatus |
01/15/2014 | EP2683836A2 Method and apparatus for treating containers |
01/15/2014 | CN203393225U Chemical vapor deposition furnace |
01/15/2014 | CN203393224U Novel graphite boat trolley for plasma enhanced chemical vapor deposition (PECVD) charging |
01/15/2014 | CN103518008A Semiconductor laminate and process for production thereof, and semiconductor element |
01/15/2014 | CN103518005A Method and apparatus for gas delivery |
01/15/2014 | CN103515486A Method for preparing backside point contact solar battery through plate type PECVD |