Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
01/2014
01/28/2014US8637123 Oxygen radical generation for radical-enhanced thin film deposition
01/28/2014US8637118 Method of production of graphene
01/28/2014US8637117 Inhibiting excess precursor transport between separate precursor zones in an atomic layer deposition system
01/28/2014US8636882 Producing method of semiconductor device and substrate processing apparatus
01/28/2014US8636873 Plasma processing apparatus and structure therein
01/28/2014US8636871 Plasma processing apparatus, plasma processing method and storage medium
01/28/2014US8636847 Chemical vapor deposition flow inlet elements and methods
01/28/2014US8635972 Device for forming a film by deposition from a plasma
01/28/2014US8635971 Tunable uniformity in a plasma processing system
01/23/2014WO2014015248A1 Organosilane precursors for ald/cvd silicon-containing film applications
01/23/2014WO2014015237A1 Organosilane precursors for ald/cvd silicon-containing film applications
01/23/2014WO2014015232A1 Organosilane precursors for ald/cvd silicon-containing film applications
01/23/2014WO2014014568A1 Symmetrical inductively coupled plasma source with coaxial rf feed and coaxial shielding
01/23/2014WO2014014566A1 Symmetrical inductively coupled plasma source with symmetrical flow chamber
01/23/2014WO2014013941A1 Method for manufacturing semiconductor device
01/23/2014WO2014013214A1 An alkyltelluroether precursor for use in the single source chemical vapour deposition of a metal telluride
01/23/2014WO2014013168A1 Chemical vapour infiltration apparatus having a high loading capacity
01/23/2014WO2014012237A1 Method and apparatus for growing nitride-based compound semiconductor crystals
01/23/2014WO2013178563A3 Multilayer structure as reflector
01/23/2014US20140023996 Three Dimensional Model Objects
01/23/2014US20140023856 Coat as well as method and device for coating
01/23/2014US20140023796 Plasma cvd apparatus, plasma cvd method, reactive sputtering apparatus, and reactive sputtering method
01/23/2014US20140023794 Method And Apparatus For Low Temperature ALD Deposition
01/23/2014US20140023785 Method For Producing Nickel-Containing Films
01/23/2014US20140023784 Method for deposition of conformal films with catalysis assisted low temperature cvd
01/23/2014US20140023783 Apparatus for manufacturing graphene film and method for manufacturing graphene film
01/23/2014US20140022700 Graphene Composite Electrodes for Energy Storage Devices
01/23/2014US20140020629 Two piece shutter disk assembly for a substrate process chamber
01/23/2014US20140020627 Roll-to-roll thin film coating machine
01/23/2014DE112011104976T5 Gasphasenabschneidungsvorrichtung und Gasphasenabschneidungsverfahren Gasphasenabschneidungsvorrichtung and Gasphasenabschneidungsverfahren
01/23/2014DE102012107630B3 Magnetron sputtering device, useful in plant for treating strip-like substrate, comprises anode housing as etching surface of first surface of substrate to be treated, and magnet arrangement as second etching surface of substrate
01/22/2014EP2687621A2 Vapor delivery device
01/22/2014EP2686463A1 Coated body, use thereof, and method for production of same
01/22/2014EP2686462A1 Coated body and method for the production thereof
01/22/2014EP2686461A1 Tool for harvesting polycrystalline silicon-coated rods from a chemical vapor deposition reactor
01/22/2014CN103534383A Thin film forming device
01/22/2014CN103531658A Atomic layer deposition preparation method for aluminum oxide thin film
01/22/2014CN103531647A Heterojunction photovoltaic cell and preparation method thereof
01/22/2014CN103526190A Device for controlling light-emitting wavelength and uniformity of epitaxial wafers in MOCVD (Metal Organic Chemical Vapor Deposition) system and method thereof
01/22/2014CN103526189A MOCVD (Metal Organic Chemical Vapor Deposition) automatic control system
01/22/2014CN103526188A Plasma enhanced chemical vapor deposition (PECVD) equipment with automatic control system of hot exhaust fan
01/22/2014CN103526187A Large-area microwave plasma chemical vapor deposition system
01/22/2014CN103526186A Wafer loading disc for MOCVD (metal organic chemical vapor deposition) reactor and MOCVD reactor
01/22/2014CN103526185A 喷淋头及反应腔室 Sprinklers and the reaction chamber
01/22/2014CN103526184A Method of operating film deposition apparatus and film deposition apparatus
01/22/2014CN103526183A Film deposition apparatus, and method of depositing a film
01/22/2014CN103526182A Preparation method for nitrogen-doped graphene by utilization of nonmetal substrate surfaces
01/22/2014CN103526181A LPCVD (low pressure chemical vapor deposition) automatic water supplementing system
01/22/2014CN103526180A Film forming method
01/22/2014CN103526179A Porous low-permittivity thin film material and preparation method thereof
01/22/2014CN103526178A Silicon oxide film forming method and forming apparatus
01/22/2014CN103526177A Cleaning method used in amorphous carbon deposition process
01/22/2014CN103526176A Method for directly growing helical carbon nanofibers on nanoporous copper
01/22/2014CN103523216A Carbon-carbon composite material guide rail and preparation method thereof
01/22/2014CN103522693A Flexible laminate and method for the production thereof
01/22/2014CN102206815B Plasma film coating device
01/22/2014CN102080218B Gas distribution plate and treatment chamber equipped therewith
01/21/2014US8633329 Titanium-containing precursors for vapor deposition
01/21/2014US8632854 Substrate centering device and organic material deposition system
01/21/2014US8632853 Use of nitrogen-containing ligands in atomic layer deposition methods
01/21/2014US8632635 Vapor deposition apparatus and vapor deposition method
01/21/2014US8632634 Coating apparatus and coating method
01/21/2014US8631762 Plasma CVD apparatus, method for manufacturing semiconductor film, method for manufacturing thin-film solar cell, and method for cleaning plasma CVD apparatus
01/21/2014US8631761 Mask frame assembly for thin-film deposition
01/21/2014US8631756 Apparatus for processing substrate and method of maintaining the apparatus
01/21/2014DE202013105600U1 Objekt-Halte-und-Ausricht-Vorrichtung, Vorrichtung zum Ausrichten eines Objekts und einer Maske zueinander sowie Vakuumkammer mit einer dieser beiden Vorrichtungen Object-holding-and-alignment apparatus, apparatus for aligning a mask of an object and to each other and vacuum chamber with one of these two devices
01/16/2014WO2014011674A2 Methods and apparatuses for forming semiconductor films
01/16/2014WO2014011647A1 Manufacturing apparatus for depositing a material and a socket for use therein
01/16/2014WO2014011617A1 Apparatus for deposition including a socket
01/16/2014WO2014011292A1 Gas injection system for energetic-beam instruments
01/16/2014WO2014010630A1 Pattern forming method and substrate processing system
01/16/2014WO2014010356A1 Acquisition method for s-parameters in microwave introduction modules, and malfunction detection method
01/16/2014WO2014010333A1 METHOD FOR FORMING Cu WIRING, AND COMPUTER-READABLE MEMORY MEDIUM
01/16/2014WO2014010317A1 Plasma treatment device
01/16/2014WO2014009606A1 Apparatus and method for processing substrate
01/16/2014WO2014008983A1 Dlc coatings with increased corrosion resistance
01/16/2014WO2014008557A1 Apparatus and method for film formation
01/16/2014US20140017575 Metal coating of objects using plasma polymerisation pretreatment
01/16/2014US20140017514 Finishing agent for trivalent chromium chemical conversion coating film, and method for finishing black trivalent chromium chemical conversion coating film
01/16/2014US20140017469 Hard-coated member and its production method, and indexable rotary tool comprising it
01/16/2014US20140017414 Method for Forming Aluminum Oxide Film Using Al Compound Containing Alkyl Group and Alkoxy or Alkylamine Group
01/16/2014US20140017403 Methods For Depositing Oxygen Deficient Metal Films
01/16/2014US20140015159 Array of metallic nanotubes
01/16/2014US20140014745 Multi-gas straight channel showerhead
01/16/2014US20140014039 Vapor-phase growth apparatus
01/16/2014US20140014038 Plasma enhanced chemical vapor deposition apparatus and method for controlling the same
01/16/2014DE112012001613T5 Halbleiterlaminat und Prozess für seine Herstellung und Halbleiterelement Semiconductor laminate and process for its production and semiconductor element
01/16/2014DE112012000980T5 System und Verfahren zur Schnellpulsgaszuleitung System and method for fast pulse gas feed line
01/16/2014DE102012013941A1 Preparing trialkylmetal compounds comprises reaction of metal trichloride with alkylaluminum sesquichloride in the presence of alkali metal halide as auxiliary base, heating the reaction mixture, and separating trialkylmetal compound
01/16/2014DE102012013726A1 Apparatus, used to cool band-shaped substrate in vacuum, comprises cooling body having convex cooling surface as a perimeter, unit for guiding substrate such that substrate partially encircles cooling surface at contact area, and openings
01/16/2014DE102012013576A1 DLC Beschichtungen mit erhöhter Korrosionsbeständigkeit DLC coatings with increased corrosion resistance
01/16/2014CA2876507A1 Manufacturing apparatus for depositing a material and a socket for use therein
01/15/2014EP2684988A1 Base, substrate with gallium nitride crystal layer, and process for producing same
01/15/2014EP2684979A1 Vapor deposition apparatus
01/15/2014EP2683836A2 Method and apparatus for treating containers
01/15/2014CN203393225U Chemical vapor deposition furnace
01/15/2014CN203393224U Novel graphite boat trolley for plasma enhanced chemical vapor deposition (PECVD) charging
01/15/2014CN103518008A Semiconductor laminate and process for production thereof, and semiconductor element
01/15/2014CN103518005A Method and apparatus for gas delivery
01/15/2014CN103515486A Method for preparing backside point contact solar battery through plate type PECVD
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