| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 01/07/2014 | US8622021 High lifetime consumable silicon nitride-silicon dioxide plasma processing components |
| 01/03/2014 | WO2014004949A1 Deposition of films containing alkaline earth metals |
| 01/03/2014 | WO2014003338A1 Nanostructure and method for manufacturing same |
| 01/03/2014 | WO2014003275A1 Adhesive film and adhesion method using same |
| 01/03/2014 | WO2014003172A1 Molded body of dlc film |
| 01/03/2014 | WO2014003110A1 Diamond single crystal and production method thereof, and single crystal diamond tool |
| 01/03/2014 | WO2014002586A1 Plasma processing method and plasma processing apparatus |
| 01/03/2014 | WO2014002493A1 Plasma-generating device and method for generating plasma |
| 01/03/2014 | WO2014001631A1 Apparatus for processing surface of substrate and nozzle head |
| 01/03/2014 | WO2014001151A1 Continuous reel-to-reel arrangement |
| 01/03/2014 | WO2014000994A1 Method for producing a laminate that has to undergo frictional loads, a laminate and use of a metallo-organic compound for producing a functional layer of the laminate |
| 01/03/2014 | WO2014000880A1 Ferroelectric memory device and manufacturing method thereof |
| 01/03/2014 | WO2014000076A1 Sliding element and internal combustion engine |
| 01/03/2014 | WO2013165981A3 Graphite foil-bonded device and method for preparing same |
| 01/03/2014 | CA2877898A1 Covalently-bonded graphene coating and its applications thereof |
| 01/02/2014 | US20140004381 Enhanced materials and interfacial performance via infiltration |
| 01/02/2014 | US20140004274 Deposition Of Films Containing Alkaline Earth Metals |
| 01/02/2014 | US20140000519 Substrate processing apparatus |
| 01/02/2014 | US20140000515 Microwave excursion detection for semiconductor processing |
| 01/02/2014 | DE102012220953A1 Membran-Elektroden-Anordnung mit verstärkter Hydrophobizität und Herstellungsverfahren dafür The membrane electrode assembly with enhanced hydrophobicity and production method thereof |
| 01/02/2014 | DE102012211242A1 Verfahren zum Bearbeiten der Oberfläche eines Bauteils A method for modifying the surface of a component |
| 01/02/2014 | DE102012210807A1 Producing bactericidal layer on base body made of titanium/titanium based alloy, comprises forming silver-containing silicon oxide layer on base body by plasma enhanced chemical vapor deposition method under atmospheric pressure conditions |
| 01/02/2014 | DE102012210796A1 Verfahren zur Herstellung eines tribologisch belasteten Schichtverbunds, Schichtverbund und Verwendung einer metallorganischen Verbindung zur Herstellung einer Funktionsschicht des Schichtverbunds A method for manufacturing a tribologically loaded layer composite, laminated composite, and using an organometallic compound for the manufacture of a functional layer of the layer composite |
| 01/02/2014 | DE102012105521A1 Use of a carbon coating for coating a masking agent for section-wise masking of surface portions of a component, which is provided for thermal spraying |
| 01/01/2014 | EP2678617A1 Method for manufacturing thermal absorber for solar thermal collector |
| 01/01/2014 | CN203373422U Spray combustion device |
| 01/01/2014 | CN203373421U MOCVD (Metal Oxide Chemical Vapor Deposition) reaction equipment |
| 01/01/2014 | CN103493602A Plasma processing apparatus |
| 01/01/2014 | CN103493181A Material vaporization supply device |
| 01/01/2014 | CN103492399A Organic platinum compound for chemical vapor deposition, and chemical vapor deposition method using organic platinum compound |
| 01/01/2014 | CN103489762A Method of forming thin film poly silicon layer |
| 01/01/2014 | CN103484838A Welded type guide rail for PECVD carrier plate |
| 01/01/2014 | CN103484837A Substrate support and semiconductor manufacturing apparatus |
| 01/01/2014 | CN103484836A Vapor deposition apparatus |
| 01/01/2014 | CN103484835A Multi jet slit burner and device used for deposing materials on substrate |
| 01/01/2014 | CN103484834A Production process of DLC (Diamond Like Carbon) composite coating cylinder liner |
| 01/01/2014 | CN103484833A Low-stress silicon compound super thick film material, preparation method and application |
| 01/01/2014 | CN103484832A Body coated with hard material |
| 01/01/2014 | CN103484831A Method for growing graphene thin film on gallium-containing nitride |
| 01/01/2014 | CN103484830A Preparation method of thick tungsten coating material and tungsten coating material |
| 01/01/2014 | CN103484829A Method and device for preparing film in tube through chemical vapor deposition |
| 01/01/2014 | CN103482589A One-dimensional tin selenide nanoarray as well as preparation method and application thereof |
| 01/01/2014 | CN103480877A Diamond film for cutting-tools |
| 01/01/2014 | CN103480043A Porous medical tantalum implant material and preparation method thereof |
| 01/01/2014 | CN102766852B MOCVD reactor |
| 01/01/2014 | CN102766851B Metal organic chemical vapor deposition reactor |
| 01/01/2014 | CN102517562B Device for manufacturing thin-film battery in way of vertical gradient condensation |
| 01/01/2014 | CN102383108B Furnace for carrying out plasma chemical vapour deposition |
| 01/01/2014 | CN102356452B Vacuum processing apparatus |
| 01/01/2014 | CN101609797B Method for reducing the surface roughness of SiGe virtual substrate |
| 12/31/2013 | US8618446 Substrate support with substrate heater and symmetric RF return |
| 12/31/2013 | US8617704 Surface modification for enhanced silanation of ceramic materials |
| 12/31/2013 | US8617669 Laser formation of graphene |
| 12/31/2013 | US8617652 Depositing material on fibrous textiles using atomic layer deposition for increasing rigidity and strength |
| 12/31/2013 | US8617651 Low work function diamond surface and radiation energy converters using same |
| 12/31/2013 | US8617650 Synthesis of aligned carbon nanotubes on double-sided metallic substrate by chemical vapor depositon |
| 12/31/2013 | US8617349 Showerhead assembly for plasma processing chamber |
| 12/31/2013 | US8617347 Vacuum processing chambers incorporating a moveable flow equalizer |
| 12/31/2013 | US8617314 Organic deposition apparatus and method of depositing organic substance using the same |
| 12/31/2013 | US8617305 Metal complexes for metal-containing film deposition |
| 12/31/2013 | US8617301 Compositions and methods for forming and depositing metal films on semiconductor substrates using supercritical solvents |
| 12/27/2013 | WO2013192510A1 Reduction of radiation thermometry bias errors in a cvd reactor |
| 12/27/2013 | WO2013192295A1 Atomic layer deposition with rapid thermal treatment |
| 12/27/2013 | WO2013192220A1 Tungsten nitrido precursors for the cvd of tungsten nitride, carbonitride, and oxide films |
| 12/27/2013 | WO2013191471A1 Atomic layer deposition apparatus and method |
| 12/27/2013 | WO2013191201A1 SiC EPITAXIAL WAFER AND METHOD FOR MANUFACTURING SAME |
| 12/27/2013 | WO2013191065A1 Method for forming film containing manganese |
| 12/27/2013 | WO2013190269A1 Method and device for manufacturing a barrier layer on a flexible substrate |
| 12/27/2013 | WO2013189716A1 Ald coating system |
| 12/26/2013 | US20130344268 Moulded article and label therefor |
| 12/26/2013 | US20130344257 Manufacturing method of functional film |
| 12/26/2013 | US20130344248 Method for depositing dielectric films |
| 12/26/2013 | US20130344246 Dual-Chamber Reactor for Chemical Vapor Deposition |
| 12/26/2013 | US20130344245 Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region |
| 12/26/2013 | US20130344244 Method for cleaning gas conveying device, and method and reaction device for film growth |
| 12/26/2013 | US20130344243 Organic Platinum Compound For Chemical Vapor Deposition, And Chemical Vapor Deposition Method Using Organic Platinum Compound |
| 12/26/2013 | US20130341598 Organic layer deposition apparatus, method of manufacturing organic light-emitting display apparatus using the same, and organic light-emitting display apparatus manufactured using the method |
| 12/26/2013 | US20130340681 Reduced pressure processing chamber and exhaust arrangement |
| 12/26/2013 | US20130340679 Vacuum deposition device |
| 12/26/2013 | US20130340678 Gas supply apparatus and film forming apparatus |
| 12/26/2013 | US20130340677 Control of stray radiation in a cvd chamber |
| 12/26/2013 | US20130340243 System and method for sealing a vapor deposition source |
| 12/25/2013 | EP2677061A2 Vessel with Filter |
| 12/25/2013 | EP2677060A1 Atomic layer deposition apparatus and atomic layer deposition method |
| 12/25/2013 | EP2677059A2 CVD coating scheme including alumina and/or titanium-containing materials and method of making the same |
| 12/25/2013 | EP2675938A1 Method for producing a photocatalytic material |
| 12/25/2013 | EP2675937A2 Method of operating filament assisted chemical vapor deposition system |
| 12/25/2013 | CN203360573U Chemical vapor deposition (CVD) system |
| 12/25/2013 | CN203360572U Pipeline cooling type gas distribution device used for metal organic chemical vapor deposition reactor |
| 12/25/2013 | CN203360571U Comb-type gas mixing unit and comb-type gas mixer |
| 12/25/2013 | CN203360570U Reaction chamber, equipment and device |
| 12/25/2013 | CN203360569U Split type mechanical claw for transmitting graphite tray |
| 12/25/2013 | CN103477721A Processing apparatus |
| 12/25/2013 | CN103476965A Method of deposition of AL2O3/SIO2 stacks, from aluminium and silicon precursors |
| 12/25/2013 | CN103476702A Process for manufacturing electro-mechanical systems |
| 12/25/2013 | CN103474390A Aluminum metal wire making method |
| 12/25/2013 | CN103474356A Method for preparing nitrogen oxygen zinc thin film |
| 12/25/2013 | CN103474344A Batch processing method for forming structure including amorphous carbon film |
| 12/25/2013 | CN103469205A Coating process for lotus leaf-like diamond film |
| 12/25/2013 | CN103469203A Base material for coating two-dimensional atomic crystals, and continuous production line and method thereof |